• Title/Summary/Keyword: Plasma Cell

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High Resolution Melting Analysis for Epidermal Growth Factor Receptor Mutations in Formalin-fixed Paraffin-embedded Tissue and Plasma Free DNA from Non-small Cell Lung Cancer Patients

  • Jing, Chang-Wen;Wang, Zhuo;Cao, Hai-Xia;Ma, Rong;Wu, Jian-Zhong
    • Asian Pacific Journal of Cancer Prevention
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    • 제14권11호
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    • pp.6619-6623
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    • 2013
  • Background:The aim of the research was to explore a cost effective, fast, easy to perform, and sensitive method for epidermal growth factor receptor (EGFR) mutation testing. Methods: High resolution melting analysis (HRM) was introduced to evaluate the efficacy of the analysis for dectecting EGFR mutations in exons 18 to 21 using formalin-fixed paraffin-embedded (FFPE) tissues and plasma free DNA from 120 patients. Results: The total EGFR mutation rate was 37.5% (45/120) detected by direct sequencing. There were 48 mutations in 120 FFPE tissues assessed by HRM. For plasma free DNA, the EGFR mutation rate was 25.8% (31/120). The sensitivity of HRM assays in FFPE samples was 100% by HRM. There was a low false-positive mutation rate but a high false-negative rate in plasma free DNA detected by HRM. Conclusions: Our results show that HRM analysis has the advantage of small tumor sample need. HRM applied with plasma free DNA showed a high false-negative rate but a low false-positive rate. Further research into appropriate methods and analysis needs to be performed before HRM for plasma free DNA could be accepted as an option in diagnostic or screening settings.

Dual-frequency Capacitively Coupled Plasma-enhanced Chemical Vapor Deposition System for Solar Cell Manufacturing

  • Gwon, Hyeong-Cheol;Won, Im-Hui;Sin, Hyeon-Guk;Rehman, Aman-Ur;Lee, Jae-Gu
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.310-311
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    • 2011
  • Dual-frequency (DF) capacitively coupled plasmas (CCP) are used to separately control the mean ion energy and flux at the electrodes [1]. This separate control in capacitively coupled radio frequency discharges is one of the most important issues for various applications of plasma processing. For instance, in the Plasma Enhanced Chemical Vapor Deposition processes such as used for solar cell manufacturing, this separate control is most relevant. It principally allows to increase the ion flux for high deposition rates, while the mean ion energy is kept constant at low values to prevent highly energetic ion bombardment of the substrate to avoid unwanted damage of the surface structure. DF CCP can be analyzed in a fashion similar to single-frequency (SF) driven with effective parameters [2]. It means that DF CCP can be converted into SF CCP with effective parameters such as effective frequency and effective current density. In this study, comparison of DF CCP and its converted effective SF CCP is carried out through particle-in-cell/Monte Carlo (PIC-MCC) simulations. The PIC-MCC simulation shows that DF CCP and its converted effective SF CCP have almost the same plasma characteristics. In DF CCP, the negative resistance arises from the competition of the effective current and the effective frequency [2]. As the high-frequency current increases, the square of the effective frequency increases more than the effective current does. As a result, the effective voltage decreases with the effective current and it leads to an increase of the ion flux and a decrease of the mean ion energy. Because of that, the negative resistance regime can be called the preferable regime for solar cell manufacturing. In this preferable regime, comparison of DF (13.56+100 or 200 MHz) CCP and SF (60 MHz) CCP with the same effective current density is carried out. At the lower effective current density (or at the lower plasma density), the mean ion energy of SF CCP is lower than that of DF CCP. At the higher effective current density (or at the higher plasma density), however, the mean ion energy is lower than that of SF CCP. In this case, using DF CCP is better than SF CCP for solar cell manufacturing processes.

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Relationship between Vaginal Cytology and Reproductive Hormone during the Estrous Cycle and Optimal Mating Time in Beagle Dogs (비글개에서 발정 주기 및 교배 적기 동안 질세포상과 번식 호르몬의 관계)

  • Lee K.C.;Kang H.G.;Cheun H.M.;Kim I.H.
    • Journal of Embryo Transfer
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    • 제21권2호
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    • pp.109-119
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    • 2006
  • This study was conducted to examine relationship between vaginal cytology and reproductive hormones during the estrous cycle and to provide basic data to estimate for ovulation time and optimal mating time in 6 beagle dogs The duration of proestrus, estrus and diestrus were $8.5{\pm}1.4,\;10.0{\pm}1.4\;and\;54.0{\pm}2.8$ days at pregnant respectively, and $7.9{\pm}2.1,\;9.5{\pm}0.7\;and\;62.0{\pm}11.3$ days at non-pregnant respectively. The duration of interestrous intervals were $246.2{\pm}24.5$ days at pregnancy, and $175.3{\pm}34.5$ days at non-pregnancy. The duration of interestrous intervals at pregnancy was longer than that of non-pregnancy. A characteristic features of vaginal cytology during the estrous cycle were the high proportion of superficial cell, anuclear cell and erythrocyte in proestrus and estrus, parabasal cell, small intermediate cell and leukocyte in diestrus, and parabasal cell and small intermediate cell in anestrus, respectively. Cornification index (CI) in proestrus and estrus were significantly higher than that of CI in diestrus and anestrus. Plasma progesterone concentration was below 1.0 ng/ml at the first day of vulval bleeding at pregnancy and non-pregnancy, and then it was above 2.0 ng/ml at Day -2 in all bitches. When plasma progesterone concentration was first increased above 4.0 ng/ml, it was the second day after the first day of male acceptance. Plasma progesterone concentration showed above 40 ng/ml on Day $20{\sim}22$ in all bitches, and then it was gradually decreased until Day 35. Plasma progesterone concentration at pregnancy was higher than that of non-pregnancy from Day 35 to Day 63. Plasma estradiol-$17\;{\beta}$ concentration was above 9.0 pg/ml at the first day of vulval bleeding, and it showed 26.4 pg/ml on Day -2. When it was timed from the first day of male acceptance (Day 0), plasma estradiol-$17{\beta}$ concentration showed a peak on Day 0 and plasma progesterone concentration was first increased above 4.0 ng/ml on Day 2 which was the third day after plasma estradiol-$17{\beta}$ peak. CI was first increased above 80 and 90% on Day -1 and Day 1, respectively. CI was maintained above 80% from Day -1 to Day 8 (10 days) and above 90% from Day 1 to Day 6 (6 days), respectively. CI was maintained above 80% from Day 0 to Day 8 (9 days) and above 90% from Day 1 to Day 6 (6 days), respectively. Plasma progesterone concentration was first increased above 4.0 ng/ml on the second day after the day which CI was first increased above 90%. In conclusion, beagle bitches ovulated on the second day after the day which CI was first increased above 90% and on the day which plasma progesterone concentration was first increased 4.0 ng/ml, and it was estimated that the optimal mating time was the day which the second day after CI was first increased above 90% and plasma concentration was between $2{\sim}25ng/ml$. The measurement of plasma progesterone was used to determine of and accurate ovulation time and the optimal mating time, but vaginal cytology is low-priced and simple method to estimate estrous cycle, optimal mating time and ovulation time.

Analysis of Single Crystal Silicon Solar Cell Doped by Using Atmospheric Pressure Plasma

  • Cho, I-Hyun;Yun, Myoung-Soo;Son, Chan-Hee;Jo, Tae-Hoon;Kim, Dong-Hae;Seo, Il-Won;Roh, Jun-Hyoung;Lee, Jin-Young;Jeon, Bu-Il;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.357-357
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    • 2012
  • The doping process of the solar cell has been used by furnace or laser. But these equipment are so expensive as well as those need high maintenance costs and production costs. The atmospheric pressure plasma doping process can enable to the cost reduction. Moreover the atmospheric pressure plasma can do the selective doping, this means is that the atmospheric pressure plasma regulates the junction depth and doping concentration. In this study, we analysis the atmospheric pressure plasma doping compared to the conventional furnace doping. the single crystal silicon wafer doped with dopant forms a P-N junction by using the atmospheric pressure plasma. We use a P type wafer and it is doped by controlling the plasma process time and concentration of dopant and plasma intensity. We measure the wafer's doping concentration and depth by using Secondary Ion Mass Spectrometry (SIMS), and we use the Hall measurement because of investigating the carrier concentration and sheet resistance. We also analysis the composed element of the surface structure by using X-ray photoelectron spectroscopy (XPS), and we confirm the structure of the doped section by using Scanning electron microscope (SEM), we also generally grasp the carrier life time through using microwave detected photoconductive decay (u-PCD). As the result of experiment, we confirm that the electrical character of the atmospheric pressure plasma doping is similar with the electrical character of the conventional furnace doping.

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Association between Plasma Tocopherol Levels and Related Factors in Middle-Aged Korean Men (한국 성인 남자의 혈장 Tocopherol 수준과 관련 요인 분석)

  • Kim, Kyung-Ja;Lee, Hye-Jin;Park, Yoo-Kyoung;Kang, Myung-Hee
    • Journal of Nutrition and Health
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    • 제39권8호
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    • pp.773-785
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    • 2006
  • Vitamin E in the body system plays an important role in preventing chronic diseases by decreasing the oxidative stress by free-radicals. However, there are not enough researches on analyzing the primary factors affecting vitamin E levels in the blood in Korean adults. Therefore, the purpose of this research was to examine blood tocopherol levels and the primary factors affecting the status. A complete lifestyle survey was performed on 314 Korean adult men and surveyed their smoking, drinking and exercising habits. The average plasma level of ${\alpha}-\;and\;{\gamma}-tocopherol$ showed similar mutual relations with plasma total cholesterol (TC), triglyceride (TG), or low density lipoprotein cholesterol (LDL-C) levels (p<0.001). Plasma ${\alpha}-tocopherol$ level of the subjects did not show any difference as smoking, drinking and exercising habits changed. However, ${\gamma}-tocopherol$ per TG showed much lower figure in smokers than non smokers (p < 0.05). Amongst diet factors, plasma ${\alpha}-tocopherol$ level showed negative correlations with Vitamin E intake, while ${\gamma}-tocopherol$ level showed positive correlations with Vitamin E intake. Erythrocyte superoxide dismutase (SOD) activity and plasma tocopherol showed negative correlations, and catalase activity and plasma ${\alpha}-tocopherol$ showed positive correlationship. The level of cell DNA damage of Iymphocyte and plasma ${\alpha}-\;or\;{\gamma}-tocopherol$ showed negative correlations. As a result of this research, the factors that affect Korean adult men's plasma ${\alpha}-tocopherol$ level are plasma TG, LDL-C and cell DNA damage in Iymphocyte, while the factors that affect ${\gamma}-tocopherol$ level are plasma TG, LDL-C and vitamin E intake based on multiple regression analysis. These findings implies that the level of different types of tocopherol depends on slightly different factors. A further research is needed on the factors involved in the differentiation of the types of tocopherol.

A Study on Feasibility of the Phosphoric Acid Doping for Solar Cell Using Newly Atmospheric Pressure Plasma Source (새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인산 도핑 가능성에 관한 연구)

  • Cho, I-Hyun;Yun, Myoung-Soo;Jo, Tae-Hoon;Kwon, Gi-Chung
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • 제27권6호
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    • pp.95-99
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    • 2013
  • Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

Electric field distribution and discharge characteristics in accordance with various ITO electrode structures in AC-PDP

  • Cho, Seok-H.;Oh, P.Y.;Kim, J.H.;Hong, Y.J.;Kwon, G.C.;Cho, G.S.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.396-399
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    • 2008
  • In this study, the electric field distributions have been investigated by simulation in accordance with the various shapes of ITO-electrodes. Also we have measured the density of excited Xe atoms in the 1s5 state in discharge cell, where the gap distance of 60 um, gas pressure of 400 Torr, Xe contents of 7%, and sustaining voltage of 200 V are kept in this experiment. The maximum density of excited Xe atoms in the 1s5 state in a discharge cell for the fish-boned, T shaped and squared ITO electrodes have been measured to be $3.01\;{\times}\;10^{13}\;cm^{-3}$, $2.66\;{\times}\;10^{13}\;cm^{-3}$ and $2.06\;{\times}\;10^{13}\;cm^{-3}$, respectively. It is shown that the electric field distribution with different ITO Electrodes is essential factor for these maximum density of excited Xe atoms in discharge cell.

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New PDP cell structure for high luminous efficacy with low voltage driving

  • Jung, Hae-Yoon;Kim, Tae-Jun;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.480-484
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    • 2006
  • We propose a new PDP cell structure named DIDE (Dual Ignition Discharge Electrodes) structure with a long electrode gap to realize a high luminous efficacy. Suggested DIDE structure basically has a long electrode gap $(200{\mu}m{\sim}400{\mu}m)$, nevertheless, because of auxiliary electrodes formed on the front panel, can be driven at relatively low voltage. The discharge characteristic of DIDE structure was much different from that of conventional structure, which was analyzed by IR emission images using IICCD (Image Intensified Charge Coupled Device). The study can explain some particular characteristics of DIDE structure. As a result, the long electrode gap and low voltage effect can be expected in DIDE structure, and a very high luminous efficacy of 7.5 lm/W has been achieved in monochrome green test panel adopting the new cell structure with Ne-Xe (12%) mixture at 400 torr.

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The effect of the cell size on the discharge characteristics of a plasma display panel

  • Moon, Cheol-Hee
    • Journal of Information Display
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    • 제12권1호
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    • pp.29-35
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    • 2011
  • In this study, plasma display panels with three different cell volumes were prepared by changing the spaces between the vertical barrier ribs into two and three times the reference structure. The discharge gap and area of the segmented ITO electrode were the same for the three cases, and Ne.20%Xe gas was used. The luminance and luminance efficiency were measured using applied voltage variations. The time evolution and intensity distribution of the infrared, which are related to the vacuum ultraviolet, were observed via intensified, charged, coupled device, and the visible-light intensity profiles were observed using PR-900 to analyze the discharge phenomena in the discharge cell.

Initial Performance Degradation of Hydrogen-Fueled Ceramic Fuel Cell with Plasma-Enhanced Atomic Layer-Deposited Ultra-Thin Electrolyte (플라즈마 원자층증착 초박막전해질 수소 세라믹연료전지의 초기성능 저하)

  • JI, SANGHOON
    • Transactions of the Korean hydrogen and new energy society
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    • 제32권5호
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    • pp.340-346
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    • 2021
  • The initial electrochemical performance of ceramic fuel cell with thin-film electrolyte fabricated by plasma-enhanced atomic layer deposition method was evaluated in terms of peak power density ratio, open circuit voltage ratio, and activation/ohmic resistance ratios at 500℃. Hydrogen and air were used as anode fuel and cathode fuel, respectively. The peak power density ratio reduced as ~52% for 30 min, which continually decreased as time increased but degradation rate gradually decreased. The open circuit voltage ratio decreased with respect time; however, its behavior was evidently different from the reduction behavior of the peak power density. The activation resistance ratio increased as ~127% for 30 min, which was almost similar with the reduction behavior of the peak power density ratio.