• 한국대기환경학회지
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• 제19권2호
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• pp.157-165
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• 2003

A combined process of non-thermal plasma and catalytic technique has been investigated to treat $CH_3$CN gas in the atmosphere. A planar type dielectric barrier discharge (DBD) reactor has been used to generate the non-thermal plasma that produces various chemically active species, such as O, N, OH, $O_3$, ion, electrons, etc. Several different types of the beads. which are Molecular Sieve (MS) 5A, MS 13X, Pt/alumina beads, are packed into the DBD reactor, and have been tested to characterize the effects of adsorption and catalytic process on treating the $CH_3$CN gas in the DBD reactor. The test results showed that the operating power consumption and the amounts of the by-products of the non-thermal plasma process can be reduced by the assistance of the adsorption and catalytic process.

• 한국자동차공학회논문집
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• 제10권2호
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• pp.48-54
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• 2002

Since photocatalysts are activated by lights of UV wavelengths, plasma is alternatively used as a light source for a photocatalytic reactor. Light intensity generated by plasma is proportional to the surface area of catalytic material, and this, in many practical applications, is prescribed by the geometry of a plasma generator. Thus, it is crucial to increase the surface area far sufficient light intensity for photocatalytic reaction. For example, in a pack-bed type reactor, multitudes of beads are used as a substrate in order to increase the surface area. Honeycomb monolith type substrate, which has very good surface area to volume ratio, has been difficult to apply plasma as a light source due to the fact that light penetration depth through the honeycomb monolith was too short to cover sufficient area, thus resulting in poor intensity for photocatalytic reaction. In this study, nonthermal plasma generation through a photocatalytic reactor of honeycomb monolith substrate is investigated to lengthen this short penetration depth. The ceramic honeycomb monolith substrate used in this study has the same length as a three way catalyst used fur automotive applications, and it is shown that sufficient light intensity for photocatalytic reaction can also be obtained with honeycomb monolith type reactor.

• 한국표면공학회지
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• 제56권6호
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• pp.386-392
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• 2023

In this work, we describe the reduction kinetics of gold nanoparticles synthesized by plasma discharge in aqueous solutions with varied voltages and precursor (HAuCl₄) concentrations. The reduction rate of [AuCl₄]^- was determined by introducing NaBr to the gold colloidal solution synthesized by plasma discharge, serving as a catalyst in the reduction process. We observed that [AuCl₄]^- was completely reduced when its characteristic absorption peak at 380 nm disappeared, indicating the absence of [AuCl₄]^- for ligand exchange with NaBr. The reduction rate notably increased with the rise in discharge voltage, attributable to the intensified plasma generated by ionization and excitation, which in turn accelerated the reduction kinetics. Regarding precursor concentration, a lower concentration was found to retard the reduction reaction, significantly influencing the reduction kinetics due to the presence of active H⁺ and H radicals. Therefore, the production of strong plasma with high plasma density was observed to enhance the reduction kinetics, as evidenced by optical emission spectroscopy.

• Korean Chemical Engineering Research
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• 제56권1호
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• pp.125-132
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• 2018

유전체 장벽 방전 반응기에서 규칙적인 메조기공 갖는 촉매를 사용하여 플라즈마 에너지를 이용한 메탄의 직접전환반응 연구를 수행하였다. 촉매는 MgO/OMA (ordered mesoporous alumina), $MgO/{\gamma}-Al_2O_3$와 $MgO/{\alpha}-Al_2O_3$를 사용하여 반응하였다. Pulse 고전압을 이용한 플라즈마 반응기에서 촉매 MgO/OMA를 사용하였을 때 $C_2$ 화합물의 선택도는 67%로 최고의 성능을 나타내었다. 금속산화물 종류, 규칙적인 메조기공 구조, 알루미나의 상변화 그리고 전원공급방식에 따른 효과를 고려하여 반응기 성능 및 생성물 분포를 비교하였다. BET (Brunauer, Emmett, Teller), X 선 회절, 주사전자현미경, 열 무게 분석으로 촉매의 반응 전후의 특성을 분석하였다.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2010년도 춘계학술대회 논문집
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• pp.462-463
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• 2010

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 추계학술대회 논문집
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• pp.511-512
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• 2006

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.151-151
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• 2012

A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

• 공업화학
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• 제31권1호
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• pp.57-60
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• 2020

An acetaldehyde, a representative food waste odor, was decomposed using a hybrid system comprised of a non-thermal plasma and catalyst at an ambient temperature under high humidity. A five wt.% Mn was impregnated on two differently structured microporous zeolites, namely Beta and ZSM-5, with a different molar ratio of SiO₂/Al₂O₃. Under high humidity conditions, the acetaldehyde degradation was higher in zeolites with the high ratio of SiO₂/Al₂O₃. Among studied catalysts, a five wt.% Mn/Beta (SiO₂/Al₂O₃ = 300) showed the highest acetaldehyde removal activity owing to its high hydrophobicity and reducibility. During long term stability test using the same catalyst for 110 hours, the acetaldehyde removal activity was relatively well-maintained.

• 웰빙융합연구
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• 제6권1호
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• pp.17-22
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• 2023

Purpose: VOCs (volatile organic compounds) are all the organic compounds that react with solar rays and increase the concentration of ozone in the troposphere and are partially also known as carcinogens. The adsorption using activated carbon is usually applied to remove VOCs. Research design, data and methodology: The 20 places of surface coating facilities were selected to evaluate the emission amount of VOCs in Seoul. In addition, the removal efficiency of VOCs in 25 places of automobile coating facilities was evaluated. Results: The average emission amount of VOCs was 10.903 kg/hr from automobile coating facilities, while 3.520 kg/hr from other surface coating facilities. The removal efficiency in adsorption with the combustion catalytic process has the mean value of 87.9% and the regeneration efficiency of activated carbon has the mean value of 95.0%. Conclusions: The removal efficiency in adsorption with the biofiltration process has the mean value of 89.8% and the regeneration efficiency of activated carbon has the mean value of 94.8%. The removal efficiency in the plasma catalyst process has the mean value of 79.3%.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1236-1239
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• 2005

Aligned carbon nanotubes(CNTs) array were synthesized using DC plasma-enhanced chemical vapor deposition. Silicon substrate Ni-coated of 5nm thickness were pretreated by $NH_3$ gas with a flow rate of 180sccm, for 10min. CNTs were grown on the pretreated substrates at $30%\;C_2H_2:NH_3$ flow ratios for 10min. Carbon nanotubes with diameters from 60 to 80 nanometers and lengths about 2.7 micrometers were obtained. Vertical alignment of carbon nanotubes were observed by FESEM.