• Title/Summary/Keyword: Planar waveguide

Search Result 221, Processing Time 0.022 seconds

A General Design Method for the Broadband Multi-Section Power Divider (광대역 다단 전력 분배기의 일반화된 설계 방법)

  • Park, Jun-Seok;Kim, Hyeong-Seok;Im, Jae-Bong
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.51 no.2
    • /
    • pp.85-91
    • /
    • 2002
  • A novel multi-section power divider configuration is Proposed to obtain wide-band frequency performance up to microwave frequency region. Design procedures for the proposed microwave broadband power divider are composed of a Planar multi-section three-Ports hybrid and a waveguide transformer design procedures. The multi∼section power divider is based on design theory of the optimum quarter- wave transformer Furthermore, in order to obtain the broadband isolation performance between the two adjacent output ports, the odd mode equivalent circuit should be matched by using the lossy element such as resistor. The derived design formula for calculating these odd mode∼matching elements is based on the singly terminated filter design theory. The waveguide transformer section is designed to suppress the propagation of the higher order modes such as waveguide modes due to employing the metallic electric wall. Simulation and experiment show excellent performance of multi section power divider.

Effective Silicon Oxide Formation on Silica-on-Silicon Platforms for Optical Hybrid Integration

  • Kim, Tae-Hong;Sung, Hee-Kyung;Choi, Ji-Won;Yoon, Ki-Hyun
    • ETRI Journal
    • /
    • v.25 no.2
    • /
    • pp.73-80
    • /
    • 2003
  • This paper describes an effective method for forming silicon oxide on silica-on-silicon platforms, which results in excellent characteristics for hybrid integration. Among the many processes involved in fabricating silica-on-silicon platforms with planar lightwave circuits (PLCs), the process for forming silicon oxide on an etched silicon substrate is very important for obtaining transparent silica film because it determines the compatibility at the interface between the silicon and the silica film. To investigate the effects of the formation process of the silicon oxide on the characteristics of the silica PLC platform, we compared two silicon oxide formation processes: thermal oxidation and plasma-enhanced chemical vapor deposition (PECVD). Thermal oxidation in fabricating silica platforms generates defects and a cristobalite crystal phase, which results in deterioration of the optical waveguide characteristics. On the other hand, a silica platform with the silicon oxide layer deposited by PECVD has a transparent planar optical waveguide because the crystal growth of the silica has been suppressed. We confirm that the PECVD method is an effective process for silicon oxide formation for a silica platform with excellent characteristics.

  • PDF

The Analysis of Light Coupling and Propagation for The Composite Fiber-Dielectric Slab with a Conductor Cladding Using The Three Dimensional Finite Difference-Beam Propagating Method (3차원 FD-BPM을 이용한 측면 연마된 광섬유와 완전도체면 아래의 유전체 사이에서의 결합과 전파 특성의 해석)

  • 권광희;송재원;이동호
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.28 no.9A
    • /
    • pp.754-762
    • /
    • 2003
  • The coupled and propagated property of the composite side-polished fiber and infinite planar waveguide with conductor cladding (PWGCC) is presented by using the 3-D finite difference beam propagating method (FD-BPM) in according to the variety of refractive indexes between the fiber and the infinite planar waveguide. It is also introduced for the technique to be applied at and consisted of the analysis domain of 3-D FD-BPM for the coupling between the side-polished fiber and PWG. It is also compared the properties of coupling between the side-polished fiber and PWGCC with them of the general symmetric and asymmetric PWG without perfect conductor (PEC), which has been investigated by many researcher.

A Study on Dip-Pen Nanolithography Process to fabricate Two-dimensional Photonic Crystal for Planar-type Optical Biosensor (평판형 광-바이오센서용 2차원 광자결정 제작을 위한 Dip-Pen Nanolithography 공정 연구)

  • Kim Jun-Hyong;Lee Jong-Il;Lee Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.19 no.3
    • /
    • pp.267-272
    • /
    • 2006
  • Optical waveguide based on symmetric and asymmetric Mach-Zehnder interferometer(MZI) type was designed, fabricated and measured the optical characteristics for the application of biosensor. The wavelength of the input optical signal for the device was 1550 nm. And the difference of refractive index was $0.45\;{\Delta}\%$ between core and cladding of the device. The TM(Transverse Magnetic) mode optical properties of the biosensor were analyzed with the refractive index variation of gold thin film deposited for overclad. Nowadays, nano-photonic crystal structures have been paied much attention for its high optical sensitivity. There is a technique to realize the structure, which is called Dip-Pen Nanolithography(DPN) process. The process requires a nano-scale process patterning resolution and high reliability. In this paper, two dimensional nano-photonic crystal array on the surface was proposed for improving the sensitivity of optical biosensor. And the Dip-Pen Nanolithogrphy process was investigated to realize it.

A New Expression of Near-Field Gain Correction Using Photonic Sensor and Planar Near-Field Measurements

  • Hirose, Masanobu;Kurokawa, Satoru
    • Journal of electromagnetic engineering and science
    • /
    • v.12 no.1
    • /
    • pp.85-93
    • /
    • 2012
  • We propose a new expression of the near-field gain correction to calculate the on-axis far-field gain from the onaxis near-field gain for a directive antenna. The new expression is represented by transversal vectorial transmitting characteristics of two antennas that are measured by planar near-field equipment. Due to the advantages of the photonic sensor, the utilization of the new expression realizes the measurements of the on-axis far-field gains for two kinds of double ridged waveguide horn antennas within 0.1 dB deviation from 1 GHz to 6 GHz without calibrating the photonic sensor system.

Novel Phase Noise Reduction Method for CPW-Based Microwave Oscillator Circuit Utilizing a Compact Planar Helical Resonator

  • Hwang, Cheol-Gyu;Myung, Noh-Hoon
    • ETRI Journal
    • /
    • v.28 no.4
    • /
    • pp.529-532
    • /
    • 2006
  • This letter describes a compact printed helical resonator and its application to a microwave oscillator circuit implemented in coplanar waveguide (CPW) technology. The high quality (Q)-factor and spurious-free characteristic of the resonator contribute to the phase noise reduction and the harmonic suppression of the resulting oscillator circuit, respectively. The designed resonator showed a loaded Q-factor of 180 in a chip area of only 40% of the corresponding miniaturized hairpin resonator without any spurious resonances. The fully planar oscillator incorporated with this resonator showed an additional phase noise reduction of 10.5 dB at a 1 MHz offset and a second harmonic suppression enhancement of 6 dB when compared to those of a conventional CPW oscillator without the planar helical resonator structure.

  • PDF