• Journal of Sensor Science and Technology
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• v.33 no.3
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• pp.173-178
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• 2024

Development of pressure sensors for harsh environments with high pressure, humidity, and temperature is essential for many applications in the aerospace, marine, and automobile industries. However, existing materials such as polymers, adhesives, and semiconductors are not suitable for these conditions and require materials that are less sensitive to the external environment. This study proposed a pressure sensor that could withstand harsh environments and had high durability and precision. The sensor comprised a piezoresistor pattern and an insulating film directly formed on a stainless-steel membrane. To achieve the highest sensitivity, a pattern design method was proposed that considered the stress distribution in a circular membrane using finite element analysis. The manufacturing process involved depositing and etching a dielectric insulating film and metal piezoresistive material, resulting in a device with high linearity and slight hysteresis in the range of a maximum of 40 atm. The simplicity and effectiveness of this sensor render it a promising candidate for various applications in extreme environments.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.6
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• pp.305-310
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• 2013

In this paper, the pressure sensor usable in a high temperature, using a SDB(silicon-direct-bonding) wafer of Si/$SiO_2$/Si-sub structure was provided and studied the characteristic thereof. The pressure sensor produces a piezoresistor by using a single crystal silicon as a first layer of SDB wafer, to thus provide a prominent sensitivity, and dielectrically isolates the piezoresistor from a silicon substrate by using a silicon dioxide layer as a second layer thereof, to be thus usable even under the high temperature over $120^{\circ}C$ as a limited temperature of a general silicon sensor. The measured result for a pressure sensitivity of the pressure sensor has a characteristic of high sensitivity, and its tested result for an output of the sensor further has a very prominent linearity and hysteresis characteristic.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.2134-2136
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• 2004

A microcantilever-based biosensor with piezoresistor has been fabricated using surface micromachining technique, which is cost effective and simplifies a fabrication procedure. To evaluate the characteristics of the cantilever, the cystamine terminated with thiol was covalently immobilized on the gold-coated side of the cantilever and glutaraldehyde that would be bonded with amine group in the cystamine was injected subsequently. This process was characterized by measuring the deflection of the cantilever in real time monitoring. Using a piezoresistive read-out and a well-known optical beam deflection method as well carried out the measurement of deflection.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.05a
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• pp.497-502
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• 2002

This paper describes a design methodology of a tri-axial silicon-based farce sensor with square membrane by using micromachining technology (MEMS). The sensor has a maximum farce range of 5 N and a minimum force range of 0.1N in the three-axis directions. A simple beam theory was adopted to design the shape of the micro-force sensor. Also the optimal positions of piezoresistors were determined by the strain distribution obtained from the commercial finite element analysis program, ANSYS. The Wheatstone bridge circuits were designed to consider the sensitivity of the force sensor and its temperature compensation. Finally the process for microfabrication was designed using micromachining technology.

• Proceedings of the KSME Conference
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• 2001.06a
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• pp.865-870
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• 2001

A sensing element for tri-axial force measurement, unit sensor of tactile sensor, was designed and evaluated by using finite element method (ANSYS). The sensor has a maximum force range of ${\pm}10$ N in the x, y, and z direction. Optimal cell structures and piezoresistor positions were determined by the strain distribution obtained from finite element analysis. Finally three Wheatstone birdge circuits were arranged and verified by $F_x$, $F_y$, and $F_z$ loading conditions. In addition, in case of sensing element subjected to thermal loading, the outputs of three bridge circuits were also evaluated.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1979-1981
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• 2002

새로운 방식의 일체형 flexible sensor module을 제작하였다. MEMS공정을 이용하여 제작된이 센서 모듈은 배선기판은 물론 strain sensor 역시 임의의 곡면에 실장을 위해 자유로운 굽힘이 가능하도록 제작되었다. 실리콘웨이퍼에 구현된 piezoresistor 스트레인 센서는 release-etch 방법을 통해 웨이퍼로부터 분리되어, 폴리이미드를 기판으로 하는 Flexible Sensor Array Module로 완성되었다. 소자와 기판을 따로 제작한 후 조립하는 기존의 방식에 비해, 웨이퍼 위에서 flexible 기판을 형성하여 수율이 높고 사진공정의 정밀도를 그대로 보전한 기판과 센서 어레이의 패키징이 가능하였으며, 칩을 기판에 실장하기 위한 정밀한 조립공정도 불필요하였다. 폴리이미드 기판은 전기도금을 통해 회로를 구성하여 1단계 패키징 (die to chip carrier)과 2단계 패키징 (chip to substrate)을 웨이퍼 레벨에서 완성하였다. 마지막으로 불산 용액을 통해 희생층을 제거함으로서 웨이퍼로 부터 센서어레이 모듈을 분리 하였다.

• ETRI Journal
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• v.38 no.4
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• pp.685-694
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• 2016

A surface micromachined piezoresistive pressure sensor with a novel internal substrate vacuum cavity was developed. The proposed internal substrate vacuum cavity is formed by selectively etching the silicon substrate under the sensing diaphragm. For the proposed cavity, a new fabrication process including a cavity side-wall formation, dry isotropic cavity etching, and cavity vacuum sealing was developed that is fully CMOS-compatible, low in cost, and reliable. The sensitivity of the fabricated pressure sensors is 2.80 mV/V/bar and 3.46 mV/V/bar for a rectangular and circular diaphragm, respectively, and the linearity is 0.39% and 0.16% for these two diaphragms. The temperature coefficient of the resistances of the polysilicon piezoresistor is 0.003% to 0.005% per degree of Celsius according to the sensor design. The temperature coefficient of the offset voltage at 1 atm is 0.0019 mV and 0.0051 mV per degree of Celsius for a rectangular and circular diaphragm, respectively. The measurement results demonstrate the feasibility of the proposed pressure sensor as a highly sensitive circuit-integrated pressure sensor.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.637-640
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• 2005

In this paper, we investigate the characteristics of a piezoresistive AFM cantilever in the range of $0\~30{\mu}N$ by using nano force calibrator (NFC), which consists of a high precision balance with resolution of 1 nN and 1-D fine positioning stage. Brief modeling of the cantilever is presented and then, the calibration results are shown. Tests revealed a linear relationship between the probing force and sensor output (resistance change), and the force vs. deflection. From this relationship, the force constant of the cantilever was calculated to 3.45 N/m with a standard deviation of 0.01 N/m. It shows that there is a big difference between measured and nominal spring constant of 1 N/m provided by the manufacturer s specifications.

• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1360-1362
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• 2001

본 논문에서는 다이어프램을 세라믹을 사용하여 2차 변환 소자로 금속 스트레인 게이지 대신에 thick film piezoresistor를 이용한 후막 압력센서에 관한 연구이다. 다이어프램의 미소 변형을 후막의 비저항 변화로 검출하는 압저항 효과를 이용하는 방식이다. 종래의 압력센서와 비교하여 크리프 현상이 적고, 안정성이 우수한 특징을 갖고 있다. 또한 저항선이나 박 게이지의 게이지율이 3$\sim$5 인 것이 비하면 후막저항을 사용한 경우, 약 15$\sim$20정도의 높은 게이지율을 얻을 수 있어서 측정범위를 넓게 할 수 있으며, 후막공정의 스크린 프린팅을 통한 자동화는 수율의 향상과 저 가격화를 실현할 수 있다. 또, 후막 저항형 압력센서는 두 개의 저항이 다이어프램의 중앙 부근에 위치하며, 나머지 두 개의 저항은 가장자리에 위치시킴으로써 미소 변형에서도 저항값의 변화를 읽을 수 있도록 하였고, 휘스톤 브리지의 연결 도체부는 Pt를 주성분으로 하는 conductive paste(DHC7085)를 사용하였다. 이렇게 설계.제작된 압력 센서를 지지대에 고정시킨 후 캡슐에 넣고 감도, 선형성, 히스테리시스 그리고 온도특성 등을 고찰하였다.

• Journal of the Korean Institute of Telematics and Electronics T
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• v.35T no.1
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• pp.75-81
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• 1998

This paper is to optimize single-element piezoresistor shear stress strain gauge related to aspect ratio of rectangular diaphragm. The shear stress distribution on diaphragm has been simulated by finite-element method(FEM). As simulation results, the maximum sensitivity for strain gauge was appeared at the center of diaphragm with aspect ratio 3, and in along to long edge with the ratio 2. The diaphragm with ratio 2 is not acceptable due to the yield of mask alignment in IC process technology. The optimum condition of diaphragm with respect to good sensitivity was realized in the case of ratio 3. In this case, the area by gauge was 8% of overall size of rectangular diaphragm.