• 제목/요약/키워드: Physical Vapor Deposition

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플라즈마 용사 및 전자빔 물리기상 증착법으로 제조된 4YSZ 코팅의 고온마찰마모 거동 (High Temperature Tribology Behavior of 4YSZ Coatings Fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD))

  • 양영환;박찬영;이원준;김선주;이성민;김성원;김형태;오윤석
    • 한국표면공학회지
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    • 제46권6호
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    • pp.258-263
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    • 2013
  • 4 mol% Yttria-stabilized zirconia (4YSZ) coatings are fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) with top coating of thermal barrier coating (TBC). NiCrAlY based bond coat is prepared as 150 ${\mu}m$ thickness by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. Each 4YSZ top coating shows different tribological behaviors based on the inherent layer structures. 4YSZ by APS which has splat-stacked structure shows lower friction coefficient but higher wear rate than 4YSZ by EB-PVD which has columnar structure. For 4YSZ by APS, such results are expected due to the sliding wear accompanied with local delamination of splats.

Physical Vapor Deposition 방법으로 제조된 Al-Ni 전극의 두께가 알칼라인 수전해 수소발생반응에 미치는 영향 연구 (Understanding the Effect on Hydrogen Evolution Reaction in Alkaline Medium of Thickness of Physical Vapor Deposited Al-Ni Electrodes)

  • 한원비;조현석;조원철;김창희
    • 한국수소및신에너지학회논문집
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    • 제28권6호
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    • pp.610-617
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    • 2017
  • This paper presents a study of the effect of thickness of porous Al-Ni electrodes, on the Hydrogen Evolution Reaction (HER) in alkaline media. As varying deposition time at 300 W DC sputtering power, the thickness of the Al-Ni electrodes was controlled from 1 to $20{\mu}m$. The heat treatment was carried out in $610^{\circ}C$, followed by selective leaching of the Al-rich phase. XRD studies confirmed the presence of $Al_3Ni_2$ intermetallic compounds after the heat treatment, indicating the diffusion of Ni from the Ni-rich phase to Al-rich phase. The porous structure of the Al-Ni electrodes after the selective leaching of Al was also confirmed in SEM-EDS analysis. The double layer capacitance ($C_{dl}$) and roughness factor ($R_f$) of the electrodes were increased for the thicker Al-Ni electrodes. As opposed to the general results in above, there were no further improvements of the HER activity in the case of the electrode thickness above $10{\mu}m$. This result may indicate that the $R_f$ is not the primary factor for the HER activity in alkaline media.

Polyimide 기판을 이용한 CVD-Cu 박막 형성기술 (Formation of CVD-Cu Thin Films on Polyimide Substrate)

  • 조남인;임종설;설용태
    • 한국산학기술학회논문지
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    • 제1권1호
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    • pp.37-42
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    • 2000
  • 유기금속 화학기상증착기술에 의해 폴리이미드 기판과 질화티탄 기판 위에 구리박막을 형성하였다. 구리박막을 화학기상증착기술에 의해 형성하면 종래의 물리적증착기술에 비하여 증착속도가 빠르고 층덮힘 성질이 좋아 산업체의 제품생산 응용에서 많은 장점이 있다. 이 장점은 제품의 생산성과 신뢰성에 영향을 미친다. 기판의 온도와 구리전구체 증기압력 조건을 변화시키며 반복실험을 실시하였으며, 시편에 따라서는 전기적 성질 향상을 위하여 후속 열처리를 수행하였다. 형성된 구리박막의 미세구조는 전자현미경으로 관찰하였으며, 전기비저항은 4점 프로브를 이용하여 측정하였다. 질화티탄을 기판으로 사용한 경우 구리박막에서는 섭씨 180도의 기판온도에서 만들어진 시편에서 가장 좋은 전기적 성질이 측정되었다. 한편, 폴리이미드 기판을 사용한 경우, 기상과 액상의 혼합상태 전구체를 이용하여 250 nm/min의 매우 높은 증착속도를 얻을 수 있었다.

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탄소의 원료로 일산화탄소를 사용한 다이아몬드 박막 성장 관찰에 대한 분광 Ellipsometry의 응용 (The Spectroscopic Ellipsometry Application to the Diamond Thin Film Growth Using Carbon Monoxide(CO) as a Carbon Source)

  • 홍병유
    • 한국전기전자재료학회논문지
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    • 제11권5호
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    • pp.371-377
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    • 1998
  • The plasma chemical vapor deposition is one of the most utilized techniques for the diamond growth. As the applications of diamond thin films prepared by plasma chemical vapor deposition(CVD) techniques become more demanding, improved fine-tuning and control of the process are required. The important parameters in diamond film deposition include the substrate temperature, $CO/H_2$gas flow ratio, total gas pressure, and gas excitation power. With the spectroscopic ellipsometry, the substrate temperature as well as the various parameters of the film can be determined without the physical contact and the destructiveness under the extreme environment associated with the diamond film deposition. Through this paper, the important parameters during the diamond film growth using $CO+H_2$are determined and it is shown that $sp^2$ C in the diamond film is greatly reduced.

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TiN증착 조건에 따른 박막의 특성에 대한 실험적 연구 (A study on an experimental basis a special quality character of thin film use in order to TiN a conditioned immersion)

  • 박일수
    • 한국산학기술학회논문지
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    • 제12권11호
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    • pp.4711-4717
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    • 2011
  • PVD방식에 의한 TiN박막의 형성은 DC와 RF sputtering deposition 방식을 적용할 수 있지만, 플라즈마 생성을 위해 주입된 가스의 이온화율이 떨어져 박막성형 속도가 느려지며, 박막과의 접착력을 높이는 것에도 한계성을 가지고 있다. 이를 개선하기 위해 증착과 동시에 이온빔을 조사하는 이온빔 진공증착 IBAD(Ion beam assisted deposition)를 이용 하게 되면, 코팅 전에 소재 표면을 Ion beam으로 조사하기 때문에 표면cleaning의 효과가 크고, 접착력이 높은 박막을 얻을 수 있다. 또한 고 진공과 낮은 온도에서도 균일한 두께의 고순도의 박막을 얻을 수 있는 이점이 있다.

Ti-6Al-4V합금의 절삭성에 관한 연구 (A Study on the Machinability of Ti-6Al-4V Alloy)

  • 박종남;김재열;조규재
    • 한국생산제조학회지
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    • 제19권1호
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    • pp.128-133
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    • 2010
  • The Titanium has many superior characteristics which are specific strength, heat resistance, corrosion resistance, organism compatibility, non-magnetic and etc. and their quantity are abundant. this study performed turning operation of Ti-6Al-4V alloy using the TiAlN Coated Tool which treated Physical Vapor Deposition. Experimental works are also executed to measure cutting force, tool wear, chip figuration and surface roughness for different cutting conditions. As a result of study. Cutting depth influences on the cutting force much more than the feed rate and the value of the cutting force is the most stable at the depth of 1.0mm. And tool wear was serious at over 100m/min of cutting speed and cutting condition was excellent at 1.0mm of cutting depth.

Ti-6Al-4V 합금의 선삭가공시 칩처리성에 관한 연구 (A Study on the Chip Treatment of Ti-6Al-4V Alloy in Turning processing)

  • 박종남;이승철;조규재
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1551-1554
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    • 2005
  • The Titanium has many superior characteristics Which are specific strength, heat resistance, corrosion resistance, organism compatibility, non-magnetic and etc. and their quantity are abundant. this study performed turning operation of Ti-6Al-4V alloy using the TiAlN Coate Tool which treated PVD (Physical Vapor Deposition). Experimental works are also executed to measure cutting force, chip figuration and surface roughness for different cutting conditions. As a result of study. Tool wear was serious at over 100m/min of cutting speed and cutting condition was excellent at 1.0mm of cutting depth.

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진공증착법으로 제조한 PVDF 박막의 열자격전류에 관한 연구 (A Study on the Thermally Stimulated Current of PVDF Thin Film Prepared by Physical Vapor Deposition Method)

  • 이선우;박수홍;김형권;임응춘;김수정;육재호;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.755-757
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    • 1998
  • The thermally stimulated current (TSC) of PVDF thin film prepared by physical vapor deposition method was investigated. PVDF shows three TSC peaks designated $P_1$, $P_2$ and $P_3$ in ascending order of temperature. The $P_1$ peak is associated with water in the PVDF specimen. $P_2$ and $P_3$ Peaks are specific peaks of $\alpha$ and $\beta$ type PVDF, respectively. The peak temperature was shifted to higher temperature, and peak intensity was decreased with increasing substrate temperature under thin film preparation.

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TiAlN 코팅공구를 사용한 Ti-6Al-4V 티타늄합급의 절삭특성에 관한 연구 (A Study on the Cutting Characteristics in the Machining of Ti-6Al-4V Alloy using TiAlN Coated Tool)

  • 이승철;박종남;조규재
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 추계학술대회 논문집
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    • pp.451-456
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    • 2004
  • The Titanium has many superior characteristics Which are specific strength, heat resistance, corrosion resistance, organism compatibility, non-magnetic and etc. and their quantity are abundant this study performed turning operation of Ti-6Al-4V alloy using the TiAlN Coate Tool which treated PVD (Physical Vapor Deposition). Experimental works are also executed to measure cutting force, chip figuration and surface roughness for different cutting conditions. As a result of study. Tool wear was serious at over 100m/min of cutting speed and cutting condition was excellent at 1.0mm of cutting depth.

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