• Magazine of the Korean Society of Agricultural Engineers
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• v.56 no.2
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• pp.52-63
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• 2014

• Proceedings of the Optical Society of Korea Conference
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• 2002.11a
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• pp.22-25
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• 2002

• Proceedings of the Optical Society of Korea Conference
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• 2002.11a
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• pp.34-35
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• 2002

• Journal of Integrative Natural Science
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• v.5 no.4
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• pp.253-256
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• 2012

The rugate porous silicons containing multiple photonic band gaps have been generated by applying a composite waveform summed three computer-generated pseudo-sinusoidal current waveforms and exhibit three sharp photonic band gaps in the optical reflectivity spectrum. Generated multiple rugate porous silicons display three rugate peaks corresponding to the each of the sine components varied from 0.42, 0.36, and 0.30 Hz, with a spacing of 0.06 Hz between each sine component. The resulting rugate PSi films have been removed from the silicon substrate by applying an lift-off current and are then made into particles by ultrasono-method in a organic solution. The sensing experiments using these particles for organic solvents such as toluene, hexane, acetone, and methanol have been achieved. Condensing of organic vapors in the pores increases the refractive indices of entire particle which results a red shift in the photonic peaks.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.123-126
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• 2004

We have demonstrated the fabrication of patterned 3D photonic crystals by holographic lithography in conjunction with soft lithography. Holographic lithography created 3D ordered macroporous structures and soft lithography made tailored defects. Because the hard baked photoresist pattern possessed high resistance against the uncured photoresist solution and the refractive index did not change appreciably by hard baking, a crosslinked photoresist was used as a relief pattern for the holographic fabrication of patterned 3D photonic crystals. More complicated defect geometries might be easily obtained with more complicated patterns on PDMS stamps. Moreover, the present results might be used as templates for 3D PCs of highindex defects that can be exploited as optical waveguides and optical circuits.

• Journal of Integrative Natural Science
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• v.2 no.1
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• pp.41-44
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• 2009

Photonic crystals containing multiple rugate structure are prepared by electrochemical etchings. Typically etched rugate PSi prepared in this study. Etching is carried out in a Teflon cell by using a two-electrode configuration with a Pt mesh counter electrode. They exhibit sharp photonic band gaps in the optical reflectivity spectrum. This reflectivity can be tuned to appear anywhere in the visible to near-infrared spectral range, depending on the programmed etch waveform. We study the method of full width half maxima and reflectivity index control by using amplitude.

• Korean Journal of Optics and Photonics
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• v.20 no.4
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• pp.211-216
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• 2009

Much research into two-dimensional (2-D) photonic crystal (PC) structures has been conducted for realization of ultrasmall optical integrated circuits. A 2-D silicon (Si) PC slab structure with air cladding (n=1) is one of the representative structures in 2-D PCs. While air-clad Si PC slab structures have good optical characteristics, their suspension in air can lead to mechanical weakness, making integration with some optical devices difficult. In this paper, we propose improving the mechanical robustness of PC structure by developing a 2-D Si PC structure with symmetric silica cladding (n=1.44) and comparing its optical properties to that of the air-clad structure. First, we investigate the optical properties of a 2-D Si PC slab structure with air cladding by using a 3-D finite difference time domain method. We determined that a photonic bandgap of 330 nm and a non-leaky propagating bandwidth of 100 nm in the optical communication range are possible. Next, we investigate the optical properties of 2-D Si PC slab structures with silica cladding. Even though the refractive index of the silica cladding is higher than that of air, we developed a silica-clad structure with good optical properties: a photonic band gap of approximately 230 nm and a non-leaky propagating bandwidth of 90 nm, comparable to that of the air-clad PC structures.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.883-886
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• 2008

In optical information technology, an electro-controllable Photonic Band Gap (PBG) in a photonic crystal (PC) material is potentially useful for the manipulation of light. Despite a great deal of research on PBGs, the reliable use of electro-active PBG material systems is restricted to only a few cases because of the complex and limiting nature of the structures involved. Here, we propose a PBG system that uses a liquid crystal (LC) polymer composite. The composite is made of nematic LCs (NLCs) embedded in polymeric helical networks of photo-polymerized cholesteric LCs (CLCs). The composite film shows a large field-induced reversible color shift over 150 nm of the reflection band, due to the reorientational undulation of the helical axis, similar to the Helfrich effect.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.194-197
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• 2006

One novel electrode-architecture has been adapted to fabricate transparent OTFTs. The device has more than 70% transmittance, yet reminds high performance. Furthermore, we also use transfer line method to prove that the device performance enhancement indeed contributes from the reduction of the contact resistances. It is anticipated that the transparent OTFTs would be very suitable to be the driving circuits for liquid crystal displays (LCDs).

• Proceedings of the Optical Society of Korea Conference
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• 2007.07a
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• pp.319-320
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• 2007

We report on the fabrication of two-dimensional Silicon On Insulator (SOI) photonic crystal (PhC) superprism. To optimize the design of 2-D SOI PhC superprism, the photonic band structures (TE-polarization) for triangular lattices and the dispersion surfaces were calculated and analyzed by the plane wave expansion method. Dense 2-D SOI PhC superprism nanostructures with taper input and output waveguide microstructures were successfully fabricated by nanoimprint lithography, followed by inductively coupled plasma (ICP) etching.