• Title/Summary/Keyword: Photoconductivity

Search Result 63, Processing Time 0.025 seconds

Photoconductivity spectra of undoped and co-doped $Cd_4GeSe_6$ single crystals ($Cd_4GeSe_6$$Cd_4GeSe_6:Co^{2+}$ 단결정의 광전도도 특성)

  • 김덕태
    • Electrical & Electronic Materials
    • /
    • v.9 no.2
    • /
    • pp.152-158
    • /
    • 1996
  • Optical absorption and photoconductivity spectra of undoped and Co-doped Cd$_{4}$GeSe$_{6}$ single crystals, grown by the chemical transport reaction using iodine as a transporting agent, were investigated. At 20K, the optical energy gaps of the single crystals are 1.934eV for Cd$_{4}$GeSe$_{6}$ and 1.815eV for Cd$_{4}$GeSe$_{6}$ :Co$^{2+}$. The photoconductivity spectra of these single crystals were closely investigated over the temperature range 20-290K. At 20K, the photoconductivity peaks were located at 1.797eV, 1.347eV for Cd$_{4}$GeSe$_{6}$ and 1.815eV, I,.57eV, 1.46eV and 1.38eV for Cd$_{4}$GeSe$_{6}$ :Co$^{2+}$, respectively.ely.

  • PDF

Effect of Hydrogen Plasma Treatment on the Photoconductivity of Free-standing Diamond Film (다이아몬드막의 광전도성에 관한 수소 플라즈마 표면 처리의 효과)

  • Sung-Hoon, Kim
    • Proceedings of the Korea Association of Crystal Growth Conference
    • /
    • 1999.06a
    • /
    • pp.337-350
    • /
    • 1999
  • Thick diamond film having ~700${\mu}{\textrm}{m}$ thickness was deposited on polycrystalline molybdenum (Mo) substrate using high power (4kW) microwave plasma enhanced chemical vapor deposition (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconductivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

  • PDF

Boosting up the photoconductivity and relaxation time using a double layered indium-zinc-oxide/indium-gallium-zinc-oxide active layer for optical memory devices

  • Lee, Minkyung;Jaisutti, Rawat;Kim, Yong-Hoon
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.278-278
    • /
    • 2016
  • Solution-processed metal-oxide semiconductors have been considered as the next generation semiconducting materials for transparent and flexible electronics due to their high electrical performance. Moreover, since the oxide semiconductors show high sensitivity to light illumination and possess persistent photoconductivity (PPC), these properties can be utilized in realizing optical memory devices, which can transport information much faster than the electrons. In previous works, metal-oxide semiconductors are utilized as a memory device by using the light (i.e. illumination does the "writing", no-gate bias recovery the "reading" operations) [1]. The key issues for realizing the optical memory devices is to have high photoconductivity and a long life time of free electrons in the oxide semiconductors. However, mono-layered indium-zinc-oxide (IZO) and mono-layered indium-gallium-zinc-oxide (IGZO) have limited photoconductivity and relaxation time of 570 nA, 122 sec, 190 nA and 53 sec, respectively. Here, we boosted up the photoconductivity and relaxation time using a double-layered IZO/IGZO active layer structure. Solution-processed IZO (top) and IGZO (bottom) layers are prepared on a Si/SiO2 wafer and we utilized the conventional thermal annealing method. To investigate the photoconductivity and relaxation time, we exposed 9 mW/cm2 intensity light for 30 sec and the decaying behaviors were evaluated. It was found that the double-layered IZO/IGZO showed high photoconductivity and relaxation time of 28 uA and 1048 sec.

  • PDF

Fabrication of Semiconductor Devices and Its Characteristics for $MgGa_{2-x}In_xSe_4$ Single Crystals ($MgGa_{2-x}In_xSe_4$ 단결정을 이용한 광전반도체소자 제작과 그 특성 연구)

  • 김형곤;김화택
    • Journal of the Korean Vacuum Society
    • /
    • v.2 no.1
    • /
    • pp.65-72
    • /
    • 1993
  • MgGa2-xInxSe4 single crystal을 bridgman technique로 성장시켰다. 성장된 단결정은 rhombohedral 구조를 가지고 있었으며, lattice constant는 a=3.950~4.070$\AA$, c=38.89~39.50$\AA$으로 주어졌고, 높은 photoconductivity를 가지고 있었다. 이 단결정의 energy gap은 2.20~1.90eV이었고, photoconductivity spectrum에 peak의 energy는 2.31~2.01eV로 주어졌으며, photoconductivity의 time constant는 0.24~0.34sec로 주어졌다.

  • PDF

Effect of hydrogen plasma treatment on the photoconductivity of free-standing diamond film

  • Kim, Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.9 no.4
    • /
    • pp.441-445
    • /
    • 1999
  • Thick diamond film having $~700\mu\textrm{m}$ thickness was deposited on polycrystalline molybdenum(Mo) substrate using high power (4 kW) microwave plasma-enhanced chemical vapor depostion (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconcuctivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

  • PDF

Anomalous Photoluminescence and Persistent Photoconductivity of AlxGal-xN/GaN Epilayers (AlxGal-xN/GaN 에피층의 비정상적인 광발광과 Persistent Photoconductivity 현상)

  • Chung, S.J.;Jun, Y.K.
    • Korean Journal of Materials Research
    • /
    • v.13 no.10
    • /
    • pp.673-676
    • /
    • 2003
  • We have investigated $Al_{x}$ $Ga_{l-x}$ N/GaN epilayers (x = 0.08, 0.15) grown by metal organic vapor phase epitaxy on sapphire with photoluminescence(PL), and persistent photoconductivity(PPC) experiments. An anomalous S-shaped shift behavior of temperature dependencies of PL peak energy is observed for the x = 0.15 sample. In PPC measurement, showed that the dark current recovery time of $Al_{x}$$Ga_{l-x}$ N/GaN epilayers mainly depends on the Al content. These behaviors are usually attributed to the presence of carrier localization states. All these phenomena are explained based on the alloy compositional fluctuations in the $Al_{x}$ /$Ga_{l-x}$ N/ epilayers. The photocurrent quenching observed in PPC measurements for $Al_{x}$ $Ga_{l-x}$ N/ epilayers less than 0.2 $\mu\textrm{m}$ thickness indicates that the presence of metastable state in the bandgap of GaN layer, and that the excess holes in the valence band recombine with free electrons.

Photorefractive Performance of Poly[methyl-3-(9-carbazolyl) propylsiloxane] Based Composites Sensitized with Poly(3-hexylthiophene) in a 0.2-1wt % Range

  • Oh, Jin-Woo;Kim, Nak-Joong
    • Bulletin of the Korean Chemical Society
    • /
    • v.31 no.1
    • /
    • pp.41-46
    • /
    • 2010
  • In this work, we report on the characterization of six low-$T_g$ poly[methyl-3-(9-carbazolyl) propylsiloxane] based photorefractive (PR) composites sensitized with poly(3-hexylthiophene) (P3HT) in different concentrations, ranging from 0.2 to 1 wt %. At 632.8 nm, photoconductivity, space charge field, refractive index modulation, and grating buildup time were measured versus external electric field. The photoconductivity was strongly dependent on the visible light absorption and mobility. The magnitude of space charge field was affected by the conductivity contrast $\sigma_{ph}/(\sigma_{ph}+\sigma_d)$. The refractive index modulation increased with the magnitude of space charge field and the PR grating buildup speed increased with the photoconductivity.

Electrical Properties of Amphiphillic Squarylium Dye Ultra Thin Films (양친매성 스쿠아릴리움색소 초박막의 전기적 특성)

  • Jeong, Soon-Wook
    • Journal of the Korean Applied Science and Technology
    • /
    • v.20 no.2
    • /
    • pp.177-181
    • /
    • 2003
  • Ultra-thin films of amphiphillic squarylium dye were prepared on the hydrophillic substrate by Langmuir-Blodgett(LB) technique. In this study, the photoelectric properties of a amphiphillic squarylium dye LB film was investigated. The visible light(${\lambda}$ = 684nm ) of xenon lamp was illuminated on the amphiphillic squarylium dye LB films and light absorptivity and photoconductivity were observed. The photoconductivity was nearly constant regardless of nominal layer number. The photoelectric properties of the amphiphillic squarylium dye LB films with bottom electrode showed better than that top electrode.

Photoconductivity study for GaN

  • 박창수;박승호;지창순;이창명;정운형;양석진;강태원;윤갑수;김채옥
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 1998.06a
    • /
    • pp.73-73
    • /
    • 1998
  • PDF

Influence of Trap Passivation by Hydrogen on the Electrical Properties of Polysilicon-Based MSM Photodetector

  • Lee, Jae-Sung
    • Transactions on Electrical and Electronic Materials
    • /
    • v.18 no.6
    • /
    • pp.316-319
    • /
    • 2017
  • A new approach to improving the electrical characteristics and optical response of a polysilicon-based metal-semiconductor-metal (MSM) photodetector is proposed. To understand the cause of current restriction in the MSM photodetector, modified trap mechanisms are suggested, which include interfacial electron traps at the metal/polysilicon interface and silicon dangling bonds between silicon crystallite grains. Those traps were passivated using hydrogen ion implantation with subsequent post-annealing. Photodetectors that were ion-implanted under optima conditions exhibited improved photoconductivity and reduced dark current instability, implying that the hydrogen bonds in the polysilicon influence the simultaneous decreases in the density of dangling bonds at grain boundaries and the trapped positive charges at the contact interface.