• Macromolecular Research
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• v.12 no.4
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• pp.352-358
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• 2004

For their application as one-component photoresists, we prepared epoxy terpolymers containing oxime-urethane and benzophenone groups by the radical polymerization of glycidyl methacrylate (GMA), metha-cryloxyethyl benzophenoneoxime urethane (MBU), and N-(4-benzoyl)phenylmaleimide (BPMI). The terpolymer composition was optimized to provide the most photosensitive photoresist. The photo-decomposition reaction of the oxime-urethane groups in the terpolymer was monitored by UV absorption spectroscopy, and the photo-crosslinking reaction of the epoxy terpolymer was observed by measuring the normalized thickness. The photosensitivity of the epoxy terpolymer increased as the amount of BPMI and MBU units increased up to 16 and 24 mol%, respectively. Among the terpolymers we prepared, terpolymer T-II(contents of GMA, MBU, BPMI are 75, 19, 6.1 mole%, respectively) exhibited the highest photosensitivity ( $D_{c}$ $^{0.5}$ = 430 mJ/$\textrm{cm}^2$) and had a moderate contrast (${\gamma}$$^{p}$ = 1.23). Negative-tone micropatterns having a line width of ca. 10 ${\mu}{\textrm}{m}$ were obtained by developing the system with chloroform.m.

• Journal of Environmental Science International
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• v.17 no.11
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• pp.1255-1263
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• 2008

The efficiency of PP-g-AA and PP-g-St nonwoven fabric synthesized by photoinduced polymerization as an adsorbent for removal $NH_3-N$ from waste water was evaluated. The results evidently indicate that the adsorption capacities of $NH_3-N$ onto PP-g-AA nonwoven fabric were extremely superior to those onto sulfonated PP-g-St nonwoven fabric, PK and zeolite. PP-g-AA nonwoven fabric showed the maximum adsorption capacity of $NH_3-N$ at the degree of grafting of 80 wt.%. The adsorption behaviour of $NH_3-N$ onto PP-g-AA and sulfonated PP-g-St nonwoven fabric was controlled by an ion exchange reaction, and tended to be similar to both trends of Langmiur and Freundlish isotherm. Futhermore, PP-g-AA non-woven fabric could be regenerated more than 5 times by a simple washing with 0.1N HCl with no decrease of adsorption capacity and no degradation of physical properties. Also sulfonated PP-g-St nonwoven fabric could be regenerated by washing with 0.1N ${H_2}{O_4}$. However, their regeneration efficiency was significantly low because grafting layer acted as functional radical for adsorption was continuously desquamated in the adsorption or regeneration processes, which resulted in decrease of adsorption capacity and weight of adsorbent. All results obtained from this study indicate that the $NH_3-N$ removal capacity of PP-g-AA non-woven fabric was extremely superior to those of PP-g-St non-woven fabric, PK and zeolite.

• Polymer(Korea)
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• v.25 no.5
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• pp.642-648
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• 2001

An attempt was made to synthesize an ammonia adsorbent by the photo-induced grafting of styrene (St) onto polypropylene (PP) nonwoven using benzoin ethyl ether (BEE) as a photosensitizer with urea and trimethylol propane triacrylate in methanol medium. As styrene concentration was increased, the graft yield was increased. It was also found that the graft yield increased with reaction time. The polypropylene grafted with styrene (PP-g-St) was sulfonated by chlorosulfonic acid in dichloroethane and complexed with several metal ion, such as $cO^{+2}$, $nI^{+2}$, $cU^{+2}$, $Zn^{+2}$. The amount of ammonia gas adsorbed by these sample was dependent on the degree of sulfonation, adsorption time, and ammonia gas pressure. The adsorption capacity of ammonia gas by the sulfonated PP-g-St(SPP-g-St) nonwoven with 4. 25 mmol $H^+$/g was 6.61 mmol/g. Metal ion complexed SPP-g-St nonwovens had higher adsorption capacity than SPP-g-St nonwoven and the $Co^{+2}$ complexed SPP-g-St showed 9.90 mmol $NH_3$/g, which was much higher than that of active carbon or silica gel.

• Macromolecular Research
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• v.12 no.2
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• pp.195-205
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• 2004

We have synthesized new aromatic polyesters (DiPEG-HQ and DiPEG-BP) by condensation polymerization of a terephthalic acid derivative bearing a pendant oligo(oxyethylene) (DP = 7, MW = 350), which has a methoxy terminal group, and two different aromatic diols, hydroquinone and 4,4'-biphenoI. The synthesized polymers were characterized by differential scanning calorimetry (DSC), polarizing microscopy, and X-ray diffractometry for their liquid crystallinity (LC), thermal transitions, and structural morphologies in mesophases. The morphology of the LC phases depends strongly on the length of the rigid backbone repeating unit. The DiPEG-BP polymer having a longer repeating unit exhibits both layered and nematic structures before isotropization, whereas the DiPEG-HQ polymer having a shorter repeating unit shows only the layered structure in the mesophase. We found that the layer spacing for DiPEG-HQ is larger than that for DiPEG-BP. Both polymers easily form complexes with LiCF$_3$SO$_3$; we studied this complex formation by FT-IR spectroscopy. The layer spacing of the polymer-electrolyte composites increases upon increasing the amount of the lithium salt. The polymer/salt electrolyte mixtures we investigated at molar ratios of EO:salt in the range of 5-20 exhibit electrical conductivity values at 40$^{\circ}C$ of 2.4${\times}$10$\^$5/ and 1.1${\times}$10$\^$－5/ S/cm for DiPEG-HQ/LiCF$_3$SO$_3$ and DiPEG-BP/LiCF$_3$SO$_3$, respectively. At 80 $^{\circ}C$, these values are higher: 4.6${\times}$10$\^$－3/ and 1.1${\times}$10$\^$－4/ S/cm, respectively. The activation energy of conductivity depends strongly on the salt concentration.

• Bulletin of the Korean Chemical Society
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• v.23 no.5
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• pp.683-687
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• 2002

We have investigated the effect of the number of ethylene oxide (EO) units inside poly(ethylene glycol)dimethacrylate (PEGDMA) on the ionic conductivity of its gelled polymer electrolyte, whose content ranges from 50 to 80 wt%. PEGDMA gelled polym er electrolytes, a crosslinked structure, were prepared using simple photo-induced radical polymerization by ultraviolet light. The effect of the number of EO on the ionic conductivity was clearly shown in samples of lower liquid electrolyte content. We have concluded that the ionic conductivity increased in proportion to both the number of EO units and the plasticizer content. We have also studied the electrochemical properties of 13PEGDMA (number of EO units is 13) gelled polymer electrolyte.

• Korean Journal of Materials Research
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• v.17 no.12
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• pp.676-681
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• 2007

According to progress rapidly digitalization, networked and mobilization of electronics industry, there are demands for being smaller, thinner, more light, and more efficient complex functions of electronic devices which are wireless devices, semi-conductors, packages and mobile devices. Therefore, the solder resist on a printed circuit board have been required with the high resolution and the eco-friendly materials in the surface treatments such as high heating process and coating process with electrolysis. In this study, the photoinitiator initiator and monomers of the solder resist were prepared with their contents for reducing the occurrence of the under-cut. We investigated the sample surface by UV/VIS spectrometer, FT-IR, OM after HASL and ENIG process. From our results, it is possible to get a high adhesion of resist with optimal contents between the photoinitiator initiator and monomers after surface treatments.

• Journal of Information Display
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• v.7 no.1
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• pp.7-11
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• 2006

In this paper, we report the fabrication of high quality polymer walls by using a monomer containing fluorine (F-monomer). Polymer walls with no phase retardation were fabricated by using photo-polymerization induced anisotropic phase separation of the mixture composed of liquid crystal (LC) and F-monomer. Thanks to the immiscibility of fluoride, we could form high quality polymer walls with no light leakage. We measured electro-optic characteristics of a twisted-nematic (TN) LC cell whose polymer walls were fabricated by using the F-monomer, and the measurements were compared with that fabricated by using the monomer without fluorine.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.1024-1027
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• 2003

The formation of cholesteric liquid crystal (CLC) film reflecting a broadbanded visible spectrum by application of a liquid crystalline coating followed by UV polymerization (photo-curing) is described. Also, the formation of patterned coatings obtained by a sequence of UV exposure steps is discussed. Such coatings play an important role in the improvement of the performance of liquid crystal displays. In order to make these CLC films, we synthesized new cholesteric liquid crystal molecules (Ch-chol) containing the active reaction site to UV light and investigated to broaden the bandwidth of these cholesteric filters based on the various UV treatments.

• Journal of the Korean Applied Science and Technology
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• v.15 no.1
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• pp.9-15
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• 1998

Poly(p-anol-formaldehyde) cinnamates(AGEFCs) were synthesized to prepare a photo-sensitive polymer which enabled to be photodimerized via 6-center reaction. The photocharacteristics of the mixture of the AGEFCs and a sensitizer after exposure to light was tested. The yield of the residual film, which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. AGEFC-3 revealed a good photosensitive effect such as about 73% yield of residual film at 128 min. of exposed time.

• Journal of the Semiconductor & Display Technology
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• v.8 no.3
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• pp.25-30
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• 2009

In this study, we synthesized novel UV-curable binders and applied for negative photoresist of display device. First, we synthesized UV-curable binders by radical polymerization with a mixture of Styrene/Methyl methacrylate/Methacrylic acid/Glycidyl methacrylate/N-Cyclohexylmaleimide at a fixed composition. Following the first step, we prepared a negative photoresist mixture optimized with photo sensitive initiator and others for the litho test. And then, we studied resolution and film retention with molecular weight of each binders and numerical value of Alkaline Desolution Rate(ADR). As a result of the litho test, we found that if the novel polymers have same numerical value of ADR, the resolution decreased and the film retention increased with the increasing of molecular weight of photoresist binder.