• 제목/요약/키워드: Phosphor layer

검색결과 170건 처리시간 0.022초

진단 X선 영상을 위한 CsI:Na/a-Se 구조설계 및 신호특성 (The signal property and structure design of CsI:Na/a-Se for diagnostic x-ray imaging)

  • 박지군;허예지;박정은;박상진;김현희;노시철;강상식
    • 한국방사선학회논문지
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    • 제3권4호
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    • pp.35-38
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    • 2009
  • 최근 의료영상분야에서 형광체와 광도전체 물질을 이용한 디지털 평판형 X선 영상검출기가 폭넓게 이용되고 있다. 본 연구는 CsI:Na 형광체층과 광민감도가 우수한 비정질 셀레늄(a-Se)층의 이중 접합구조로 구성된 변환구조 설계를 위한 몬테카를로 시뮬레이션과 X선에 대한 광학적 및 전기적 반응특성을 조사하였다. 먼저 CsI:Na의 발광스펙트럼과 a-Se의 광흡수 스펙트럼을 측정하여 X선에 의한 신호 변환특성을 분석하였다. 또한, 인가전기장의 함수에 따른 X선 민감도을 측정하여 상용화된 a-Se($500{\mu}m$)의 직접변환 검출기와 비교 평가하였다. 측정결과로부터, $10V/{\mu}m$에서 CsI:Na($180{\mu}m$)/a-Se($30{\mu}m$) 변환센서의 X선 민감도는 $7.31nC/mR-cm^2$ 이고, a-Se($500{\mu}m$) 검출기는 $3.95nC/mR-cm^2$로 약 2배 정도 높은 값을 보였다.

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LCD 백라이트용 면방전형 FFL의 방전 특성 (Discharge Characteristics of Surface Discharge Type FFL for LCD Backlighting)

  • 임민수;윤성현;신유섭;정득영;권순석;임기조
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1786-1788
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    • 1999
  • In this paper, we studied Surface Discharge Type Flat Fluorescent Lamp with High Luminance for LCD Backlighting, Liquid Crystal display(LCDs) demand the use of fluorescent lamp as the backlighting source. This lamp is Surface Discharge Type structure with a pair of Sodalime glass, insulator layer, phosphor layer, and Xe gas gap. In spite of its simple structure, the lamp has uniform and stable discharge over entire volume. Till now, we measured the current-voltage(V-I), Firing Voltage, Sustain Voltage for 0.5mm, 1mm electrode gap. In experiment result, long gap cell structure cause high firing voltage. The rising in firing voltage in long gap structure could not be explained by paschen's law because of non-uniform electric field.

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니오비움 실리사이드가 코팅된 실리콘 팁 전계 방출 소자의 제조 및 동작 특성 (Fabrication and Operating Properties of Nb Silicide-coated Si-tip Field Emitter Arrays)

  • 주병권;박재석;이상조;김훈;이윤희;오명환
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권7호
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    • pp.521-524
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    • 1999
  • Nb silicide was formed on the Si micro-tip arrays in order to improve field emission properties of Si-tip field emitter array. After silicidization of the tips, the etch-back process, by which gate insulator, gate electrode and photoresist were deposited sequentially and gate holes were defined by removing gradually the photoresist by $O_2$ plasma from the surface, was applied. Si nitride film was used as a protective layer in order to prevent oxygen from diffusion into Nb silicide layer and it was identified that the NbSi2 was formed through annealing in $N_2$ ambient at $1100^{\circ}C$ for 1 hour. By the Nb silicide coating on Si tips, the turn-on voltage was decreased from 52.1 V to 32.3 V and average current fluctuation for 1 hour was also reduced from 5% to 2%. Also, the fabricated Nb silicide-coated Si tip FEA emitted electrons toward the phosphor and light emission was obtained at the gate voltage of 40~50 V.

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구조 및 두께 변화에 따른 후막 전계발광 소자에 관한 연구 (A Study on Powder Electroluminescent Device through Structure and Thickness Variation)

  • 한상무;이종찬;박대회
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1379-1381
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    • 1998
  • Powder electroluminescent device (PELD) structured conventionally dielectric and phosphor layer, between electrode and their layer fabricated by screen printing splaying or spin coating method. To promote performance of PELDs, we approached the experiments for different structure and thickness variation of PELD. Thickness variation($30{\mu}m{\sim}130{\mu}m$) was taken. To investigate electrical and optical properties of PELDs, EL spectrum, transferred charge density using Sawyer-Tower's circuit brightness was measured. Variation of structure in PELDs was as follows: WK-1 (ITO/BaTiO3/ZnS:Cu/Silver paste), WK-2 (ITO/BaTiO3/ZnS:Cu/BaTiO3/ZnS:Silver paste), WK-3 (ITO/BaTiO3/ZnS:Cu/BaTiO3/Silver paste), WK-4(ITO/BaTiO3+ZnS:Cu/Silver paste) As a result, structure of the highest brightness appeared WK-4 possessed 60 ${\mu}m$ thickness. The brightness was 2719 cd/$m^2$ at 100V, 400Hz.

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X선 조사에 의해 (Ba, Sr) FBr : Eu 형광 물질에 생성되는 결함 특성 (Defect Analysis of Phospher (Ba, Sr) FBr : Eu by X-Ray Irradiation)

  • 신중기;이종용;배석환;김재홍;권준현
    • 한국재료학회지
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    • 제18권8호
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    • pp.427-431
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    • 2008
  • The mechanical property of a phosphore layer was investigated by measuring the resolution (LP/mm) and by positron annihilation spectroscopy and SEM. Image plate samples containing the phosphore layer were irradiated by X-rays in a hospital numerous times over a course of several years. The LP/mm values of a (Ba,Sr)FBr : Eu image plate irradiated by X-rays varied between 2.2 and 2.0 over a period of four years. Coincidence Doppler Broadening (CDB) positron annihilation spectroscopy was used to analyze defect structures. The S parameters of the samples from hospital use varied from 0.6219 to 0.6232. There was a positive relationship between the time of exposure to the X-rays and the S parameters. Most of the defects were found to have been generated by X-rays.

훌륭한 휘도 균일도를 갖는 LCD 후면 광원용 평판 형광램프 (Flat Fluorescent Lamp with Good Uniformity for LCD Back-Light)

  • 권순석;윤길중
    • 대한전자공학회논문지TE
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    • 제37권1호
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    • pp.12-17
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    • 2000
  • 본 논문은 가스의 방전 현상으로부터 발생되는 자외선을 이용하는 평판 형광 램프의 주파수 특성에 대하여 연구하였다. 램프는 절연층, 형광층, 가스층으로 구성된다. 램프의 특성에서 불꽃 전압과 휘도 균일 전압은 주파수의 증가에 따라 감소하였다. 이것은 가스 갭내에서의 공간 전하 효과로 설명이 가능하였다. FFL의 휘도는 700Vrms, 80 kHz의 구동 조건에서 2700cd/$m^2$ 을 얻었으며, 최대 휘도 효율은 5 lm/W를 보였다.

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증착속도에 따른 CSI layer의 기하학적 특성 연구 (Investigation of Geometrical Properties on Deposition Rate in Cesium Iodine Film)

  • 이규홍;박지군;강상식;차병열;조성호;남상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.415-417
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    • 2003
  • CsI 형광체는 X선에 대한 분해능 및 변환효율이 우수한 물질이다. 최근 대면적 평판형 X선 영상검출기의 변환층으로 이용하기 위해 CsI 형광체의 대면적 제조에 대한 연구가 활발히 진행되고 있다. 본 논문은 진공 열증착법을 이용하여 증착속도(3, 3.8, $4.5\;{\mu}m/min$)에 따라 $20\;{\mu}m$ 두께의 CsI 필름을 제조하였고, XRD 및 SEM 분석을 통해 CsI 필름의 기하학적 구조를 조사하였다. 증착된 CsI 필름은 증착속도에 관계없이 복잡한 다결정 구조를 가지며, $3\;{\mu}m/min$의 증착속도에서 약 $1\;{\mu}m$ 크기로 needle-like 한 columnar structure를 가졌다. As results, about 3um/min evaporation rate formed as good geometry characteristics CsI layer.

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$BrO_2/a-Se$ 필름의 a-Se에 첨가된 As 변화에 따른 X선 검출특성 비교 (The Comparision of X-ray Detection Characteristics as Additive ratio of As in a-Se of $BrO_2/a-Se$ Film)

  • 박지군;최장용;김대환;문치웅;남상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.424-427
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    • 2002
  • In this papaer, there is a basic research for the development of the Hybrid digital radiation detector with a new system, make up for existing digital radiation detector of direct/indirect method with a weak point. for enhance the efficiency characteristics of signal response from X-ray detector using the a-Se, We make sample with various kinds of layer, through the ratio of As(0.l%,0.3%,0.5%,1%,1.5%,5%,10%). We measure net charge with a leakage current and photo current for electric charateristics. Ratio of As in a-Se consist of 7 stage, It made of using the thermal deposition system, In the made of samples, we made multi layer using the EFIRON optical adhesives from phosphor layer consist of Oxybromide$(BrO_2)$. As a result of X-ray measurement, the best result is ; leakage current(0.30nA/cm2), net charge(610.13pC/cm2/mR) when the condition is voltage(9V/um), 0.3% ratio of As in multi layer(BrO2 + a-Se)

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ZnS:Mn/$ZnS:TbF_{3}$ 적층구조의 형광층을 이용한 TFEL소자의 제작 및 그 특성 (Fabrication and characteristics of TFEL device using phosphor layer ZnS:Mn/$ZnS:TbF_{3}$ slatted structure)

  • 박경빈;김호운;배승춘;김영진;조기현;김기완
    • 센서학회지
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    • 제6권1호
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    • pp.63-71
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    • 1997
  • ZnS:Mn/$ZnS:TbF_{3}$적층구조의 TFEL(thin-film eletroluminescent)소자를 제작하였으며, 이때 절연층으로 (Pb,La)$TiO_{3}$(이하PLT)와 $SiO_{2}$박막을 이용하였다. TFEL소자는 $78V_{rms}$의 문턱전압과 $100V_{rms}$의 인가전압에서 $400{\mu}W/cm^{2}$의 휘도를 나타내었다. TFEL소자의 발광스펙트럼은 450nm에서 630nm사이의 파장대를 보이고 있다. 제작된 TFEL소자는 컬러필터를 병용함으로서, 적 녹 청의 색상을 구현하는 TFEL소자로 활용할 수 있다.

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키토산을 이용한 유기 발광 소자에 관한 연구 (A Sutdy on Organic Emission Device of Chitosan Used)

  • 정기택;강수정;김남기;노승용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1062-1065
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    • 2004
  • The importance of display is becoming increasingly important due to the development of information and industry where it leads to diverse and abundant information in today's society. The demand and application range for FPD(Flat Panel Display), specifically represented by LCD(Liquid Crystal Display) and PDP(Plasma Display Panel), have been rapidly growing for its outstanding performance and convenience amongst many other forms of display. The current focus has been on OLED(Organic Light Emitting Diode) in the mobile form, which has just entered into mass production amid the different types of FPD. Many studies are being conducted in regards to device, vacuum evaporation, encapsulation, and drive circuits with the development of device as a matter of the utmost concern. This study develops a new type of light-emitting materials by synthesizing medical polymer organic chitosan and phosphor material CuS. Chitosan itself satisfies the Pool-Frenkel Effect, an I-V specific curve, with a thin film under $20{mu}m$, and demonstrates production possibility for a living body sensors solely with the thin film. Furthermore, it enables production possibility for EML of organic EL device(Emitting Layer) with liquid Green light emitting and Blue light emitting as a result of synthesis with phosphor material.

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