• Title/Summary/Keyword: Patterning techniques

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Nanoscale Patterning Using Femtosecond Laser and Self-assembled Monolayers (SAMs) (펨토초레이저와 자기조립박막을 이용한 나노스케일 패터닝)

  • Chang, Won-Seok;Choi, Moo-Jin;Kim, Jae-Gu;Cho, Sung-Hak;Whang, Kyung-Hyun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.9
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    • pp.1270-1275
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    • 2004
  • Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

Implementation of Biosensor Pattern Using Micro Patterning Technique (미세전극 패터닝 기술을 이용한 바이오센서 패턴 구현)

  • Ko, Jeong Beom;Kim, Hyung Chan;Yang, Young Jin;Kim, Hyun Bum;Yang, Seong Wook;Oh, Seung Ho;Doh, Yang Hoi;Choi, Kyung Hyun
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.6
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    • pp.122-128
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    • 2016
  • The Biosensor biosensor pattern was developed by via an EHD (electro-hydro-dynamics (EHD) patterning process that was performed under atmospheric pressure at room temperature in a single step. The drop diameter was smaller than nozzle diameter and applied high viscosity conductive ink was applied in the EHD patterning method to provide a clear advantage over the piezo and thermal inkjet printing techniques. The Biosensor's biosensor's micro electrode pattern was printed by via a continuous EHD patterning method using 3three- type types of control parameters parameter (input voltage, patterning speed, nozzle pressure). High viscosity (1000 cps) conductive ink with 75 wt% of silver nanoparticles was used for experimentation. The incremental result of impedance of biosensor impedance was measured between the antibody ($10ug{\mu}g/ml$) to spore (0.1 ng/ml, 10 ng/ml, and $1ug{\mu}g./ml$) reaction at frequency 493 MHz frequency.

Simultaneous Transfer and Patterning of CVD-Grown Graphene with No Polymeric Residues by Using a Metal Etch Mask

  • Jang, Mi;Jeong, Jin-Hyeok;Trung, T.Q.;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.642-642
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    • 2013
  • Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as high electron mobility, high thermal conductivity and optical transparency. Especially, chemical vapor deposition (CVD) grown graphene has been used as a promising material for high quality and large-scale graphene film. Unfortunately, although CVD-grown graphene has strong advantages, application of the CVD-grown graphene is limited due to ineffective transfer process that delivers the graphene onto a desired substrate by using polymer support layer such as PMMA(polymethyl methacrylate). The transferred CVD-grown graphene has serious drawback due to remaining polymeric residues generated during transfer process, which induces the poor physical and electrical characteristics by a p-doping effect and impurity scattering. To solve such issue incurred during polymer transfer process of CVD-grown graphene, various approaches including thermal annealing, chemical cleaning, mechanical cleaning have been tried but were not successful in getting rid of polymeric residues. On the other hand, lithographical patterning of graphene is an essential step in any form of microelectronic processing and most of conventional lithographic techniques employ photoresist for the definition of graphene patterns on substrates. But, application of photoresist is undesirable because of the presence of residual polymers that contaminate the graphene surface consistent with the effects generated during transfer process. Therefore, in order to fully utilize the excellent properties of CVD-grown graphene, new approach of transfer and patterning techniques which can avoid polymeric residue problem needs to be developed. In this work, we carried out transfer and patterning process simultaneously with no polymeric residue by using a metal etch mask. The patterned thin gold layer was deposited on CVD-grown graphene instead of photoresists in order to make much cleaner and smoother surface and then transferred onto a desired substrate with PMMA, which does not directly contact with graphene surface. We compare the surface properties and patterning morphology of graphene by scanning electron microscopy (SEM), atomic force microscopy(AFM) and Raman spectroscopy. Comparison with the effect of residual polymer and metal on performance of graphene FET will be discussed.

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A Novel Patterning Method for Silver Nanowire-based Transparent Electrode using UV-Curable Adhesive Tape (광경화 점착 테이프를 이용한 은 나노와이어 기반 투명전극 패터닝 공법)

  • Ju, Yun Hee;Shin, Yoo Bin;Kim, Jong-Woong
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.3
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    • pp.73-76
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    • 2020
  • Silver nanowires (AgNWs) intrinsically possess high conductivity, ductility, and network structure percolated in a low density, which have led to many advanced applications of transparent and flexible electronics. Most of these applications require patterning of AgNWs, for which photolithographic and printing-based techniques have been widely used. However, several drawbacks such as high cost and complexity of the process disturb its practical application with patterning AgNWs. Herein, we propose a novel method for the patterning of AgNWs by employing UV-curable adhesive tape with a structure of liner/adhesive layer/polyolefin (PO) film and UV irradiation to simplify the process. First, the UV-curable adhesive tape was attached to AgNWs/polyurethane (PU), and then selectively exposed to UV irradiation by using a photomask. Subsequently, the UV-curable adhesive tape was peeled off and consequently AgNWs were patterned on PU substrate. This facile method is expected to be applicable to the fabrication of a variety of low-cost, shape-deformable transparent and wearable devices.

A Study on Patterning Techniques by sliced unit with square woods's color bars (각목 색상 배치에 의한 문양막대의 횡절단 무늬편을 이용한 문양구성 연구)

  • Kim, Ji-Geon
    • Journal of the Korea Furniture Society
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    • v.20 no.5
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    • pp.431-439
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    • 2009
  • When we look at the pattern techniques of wooden furniture in the 19th century Joeson Dynasty, we see that furniture patterns in the main living room were showy and colorful while furniture patterns in the library room, where noble men used to study, were natural and moderate, retaining the actual color of the material without any artificial coloring. Even the serial patterns in the Hwe-Jang technique, Which were used rarely, used moderate techniques. such as weaving in patterns with colorless woods - willow and black persimmon ets. - rather than using excessive techniques. However, considering the marquetry&intarsia technique of ceramic and the silver string intarsia technique of metal then current, wood work must also have been technically advanced. Korean modern wood furniture needs remedies to improve the standard of sound wood work techniques. This study shows that pattern unit production, composition techniques, and color effects etc. Using colored patterns bars, by improving the pattern composition techniques of Marquetry&Intarsia, can be substituted for the production logic of modern manufactured furniture.

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Micro Patterning of Nano Metal Ink for Printed Circuit Board Using Inkjet Printing Technology (잉크젯 프린팅 기술을 이용한 나노 금속잉크의 인쇄회로기판용 미세배선 형성)

  • Park, Sung-Jun;Seo, Shang-Hoon;Joung, Jae-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.89-96
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    • 2007
  • Inkjet printing has become one of the most attractive manufacturing techniques in industry. Especially inkjet printing technology will soon be part of the PCB (Printed Circuit Board) fabrication processes. Traditional printing on PCB includes screen printing and photolithography. These technologies involve high costs, time-consuming procedures and several process steps. However, by inkjet technology manufacturing time and production costs can be reduced, and procedures can be more efficient. PCB manufacturers therefore willingly accept this inkjet technology to the PCB industry, and are quickly shifting from conventional to inkjet printing. To produce the printed circuit board by the inkjet technology, it must be harmonized with conductive nano ink, printing process, system, and inkjet printhead. In this study, micro patterning of conductive line has been investigated using the piezoelectric printhead driven by a bipolar voltage signal is used to dispense 20-40 ${\mu}m$ diameter droplets and silver nano ink which consists of 1 to 50 nm silver particles that are homogeneously suspended in an organic carrier. To fabricate a conductive line used in PCB with high precision, a printed line width was calculated and compared with printing results.

Induction Heating Apparatus for Rapid Heating of Flat-Type Metallic Mold in Hot Embossing (미세 패턴 성형용 판형 금형의 급속 가열을 위한 유도가열기구)

  • Hong, S.K.;Lee, S.H.;Heo, Y.M.;Kang, J.J.
    • Transactions of Materials Processing
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    • v.16 no.4 s.94
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    • pp.282-287
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    • 2007
  • Hot embossing, one of Nanoimprint Lithography(NIL) techniques, has been getting attention as an alternative candidate of next generation patterning technologies by the advantages of simplicity and low cost compared to conventional photolithographies. A typical hot embossing usually, however, takes more than ten minutes for one cycle of the process because of a long thermal cycling. Over the last few years a number of studies have been made to reduce the cycle time for hot embossing or similar patterning processes. The target of this research is to develop an induction heating apparatus for heating a metallic micro patterning mold at very high speed with the large-area uniformity of temperature distribution. It was found that a 0.5 mm-thick nickel mold can be heated from $25^{\circ}C\;to\;150^{\circ}C$ within 1.5 seconds with the temperature variation of ${\pm}5^{\circ}C$ in 4-inch diameter area, using the induction heating apparatus.

Vibration Characteristics of Patterned IPMC Actuator (패턴된 IPMC 작동기의 진동특성)

  • Jeon, Jin-Han;Oh, Il-Kwon
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2007.11a
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    • pp.718-721
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    • 2007
  • The ionic-polymer-metal-composite actuators have the best merit for bio-mimetic locomotion because of their large bending performance. Especially, they have the advantage for mimicking a fish-like motion because IPMCs are useful to be actuated in water. So we have developed IPMC actuators with multiple electrodes for realization of biomimetic motion. This actuator is fabricated by combining electroless plating and electroplating techniques capable of patterning precisely and controlling a thickness of Pt electrode layer. The FRF analysis was conducted by a mechanical shaker and direct electrical excitation which is based on sweep sine wave function. From this result, the proper young‘s modulus of Platinum was investigated and applied on expecting the vibration characteristics of patterned IPMC actuator. The calculated maximum displacement of the patterned IPMC was 2.32mm under an applied 4mN/mm. The natural frequency was increased however displacement was decreased in according to increase a thickness of Pt.

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Patterning issues for the fabrication of sub-micron memory capacitors′ electrodes (초미세 메모리 커패시터의 전극형성을 위한 식각 기술)

  • 김현우
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.160-160
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    • 2003
  • This paper describes some of the key issues associated with the patterning of metal electrodes of sub-micron (especially at the critical dimension (CD) of 0.15 $\mu\textrm{m}$) dynamic random access memory (DRAM) devices. Due to reactive ion etching (RIE) lag, the Pt etch rate decreased drastically below the CD of 0.20 $\mu\textrm{m}$ and thus the storage node electrode with the CD of 0.15 $\mu\textrm{m}$ could not be fabricated using the Pt electrodes. Accordingly, we have proposed novel techniques to surmount the above difficulties. The Ru electrode for the stack-type structure is introduced and alternative schemes based on the introduction of the concave-type structure using Pt or Ru as an electrode material are outlined.

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