• 제목/요약/키워드: Patterned thin films

검색결과 122건 처리시간 0.028초

레이저 어블레이션에 의한 초전도 이중모드 공진기 제작 (Fabrication of Superconducting Dual Mode Resonator using Laser Ablation)

  • 박주형;양승호;이상렬;안달;석중현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.41-44
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    • 1998
  • Dual mode resonators were fabricated using high temperature superconductor. The deposited material was $Y_1Ba_2Cu_3O_{7-x}$(YBCO) on MgO(100) substrate using pulsed laser deposition. Dual mode resonators were patterned by standard photolithography process and wet etching. At the back-side of the substrate, the ground plane with the metal layer of Ti and Ag was fabricated. The transition temperatures of YBCO films were 85-88 K, and network analyzer was used for testing the performance of the resonators. The input/output feedline angles of each resonator were $60^{\circ}$and $100^{\circ}$. The resonant frequency of resonators was 10 GHz. In this paper, dual mode resonator was fabricated for the application of satellite communication.

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PEDOT:PSS Thin Films with Different Pattern Structures Prepared Using Colloidal Template

  • Yu, Jung-Hoon;Lee, Jin-Su;Nam, Sang-Hun;Boo, Jin-Hyo
    • Applied Science and Convergence Technology
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    • 제23권5호
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    • pp.254-260
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    • 2014
  • Organic solar cells have attracted extensive attention as a promising approach for cost-effective photovoltaic devices. However, organic solar cell has disadvantage of low power conversion efficiency in comparison with other type of solar cell, due to the recombination ratio of hole and electron is too large in the active layer. Thus we have change the surface structure of PEDOT:PSS layers to improve the current density by colloidal lithography method using various-size of polystyrene sphere. The two types of coating method were applied to fabricate the different pattern shape and height, such as spin coating and drop casting. Using the organic solvent, we easily eliminate the PS sphere and could make the varied pattern shapes by controlling the wet etching time. Also we have measured the electrical properties of patterned PEDOT:PSS film to check whether it is suitable for organic photovoltaics.

저항형 초전도 한류기에서의 퀀치 전파 (Quench propagationin resistive SFCL)

  • 김혜림;현옥배;최효상;황시돌;김상준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.85-88
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    • 1999
  • We fabricated resistive superconducting fault current lmiters based on YBa$_2$Cu$_3$O$_{7}$ thin films and investigated their quench propagation characteristics. The YBa$_2$Cu$_3$O$_{7}$ film was coated with a gold layer and patterned into 1 mm wide meander lines by photolithography. The limiters were tested with simulated fault currents of various fault angles and amplitudes. The quench propagation characteristics were explained based on the heat transfer within the film as well as between the film and the surrounding liquid nitrogen. The quench completion time strongly depended on the potential fault current. It was 1 msec at the peak fault current of 76 A/peak/ and corresponding quench propagation speed was 43 m/sec (film cross section: 4 x 10$^{-6}$ $\textrm{cm}^2$).

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양극반응으로 제조된 다공질 WO3 박막의 가스센서 특성 (The gas sensing characteristic of the porous tungsten oxide thin films based on anodic reaction)

  • 이홍진;송갑득;이덕동
    • 센서학회지
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    • 제17권1호
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    • pp.9-14
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    • 2008
  • In this paper, the gas responses of tungsten oxide films prepared by anodic reaction was discussed. Sensing electrodes and heating electrodes were patterned by photolithography method on quartz substrate. Porous tungsten oxide was fabricated in electrolyte solutions of 5 % HF (HF :$C_2H_6OH:H_2O$=3 : 2 : 20) by anodic reaction. The anodic reaction with metal (platinum wire) as a cathode and the sensing device as an anode was conducted under the various reaction times (1-10 min) at 10 mA/$cm^2$ The surface structure and morphology of the fabricated sensor have been analysed by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM). All the peaks of XRD results were well indexed to the pure phase pattern. The average diameter of the porous tungsten oxide surface were ranged about 100 nm. The fabricaed sensor showed good sensitivity to 200 ppm toluene at operating temperature of $250^{\circ}C$.

New polymeric host material for efficient organic electro phosphorescent devices

  • Jung, Choong-Hwa;Park, Moo-Jin;Eom, Jae-Hoon;Shim, Hong-Ku;Lee, Seong-Taek;Yang, Nam-Choul;Liand, Duan;Suh, Min-Chul;Chin, Byung-Doo;Hwang, Do-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.843-845
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    • 2009
  • A polymeric host for triplet emitters composed of N-alkylcarbazole and tetramethylbenzene units was successfully synthesized. Efficient energy transfer was observed between this polymeric host and green phosphorescent dyes. The device fabricated using 5 wt% green 1 in the polymeric host as the emitting layer showed the best performance. Thin films of this host-guest system, exhibiting clear stripe patterns could be prepared through the LITI process. The patterned films were then used to fabricate electrophosphorescent devices, which show performance characteristics similar to those of spin-coated devices. The new host material is a good candidate to be used in polymer-based full-color electrophosphorescent light-emitting displays.

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Tribological performance of the laser surface treated CrZrSiN thin films

  • Kim, DongJun;La, JoungHyun;Lee, SangYul
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 춘계학술발표회 논문집
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    • pp.141-142
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    • 2012
  • Recently, surface texturing by atmospheric laser processing has been received lots of attention to improve the tribological performance of various surfaces and this laser texturing of surfaces could be considered in a large extent to improve tribological performance of PVD coated surface. Surface texturing could be performed by various manufacturing techniques such as indentation with hard materials, ion etching, abrasive jet machining, lithography, and Laser Surface Texturing (LST). Out of all these techniques, however it is generally accepted that laser surface texturing (LST) by atmospheric laser processing offers the most promising process as LST is very fast, environmentally-friendly, easy to control the shape and size of the microdimples. In this work various preliminary experimental results from the laser texturing on the PVD-coated steel substrate will be presented. Our results indicated that laser texturing definitely affect the tribological performance of the surfaces and the size as well as pattern type of laser texturing are one of the key factors. From the wear tests against an alumina counterpart ball at room temperature under oil-lubricated condition, laser surface texturing on the CrZrSiN films reduced the friction coefficients by approximately more than 5 times in the case of narrow patterned surfaces.

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나선형태로 제작된 고온초전도 한류기의 특성해석 (Characterization of the Spiral Type Fault Current Limiters Using High-$T_c$ Superconducting Thin Films)

  • 정동철;박성진;강형곤;최효상;곽민환;임해용;황종선;최명호;추철원
    • 한국전기전자재료학회논문지
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    • 제14권6호
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    • pp.518-524
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    • 2001
  • We report the current limiting properties of superconducting fault current limiters (SFCL). Our SFCL was patterned in a spiral type on a YB $a_2$C $u_3$$O_{7-x}$(YBCO) film deposited using rf sputtering techniques and was coated with a gold shunt layer in order to disperse the heat generated at hot spots in the YBCO film. Current increased up to 13.5 $A_{peak}$ at 60 Hz for the voltage of 13 $V_{peak}$, which is the minimum quench point, and increased up to 17.6 $A_{peak}$ at 60 Hz fo the voltage fo 141.4 $V_{peak}$. The quench completion time was 5 msec at 13 $V_{peak}$ and 4 msec at 141. $V_{peak}$ respectively. we think that this architecture using spiral-type SFCL can be useful for the protection of the power delivery systems from fault currents.s. currents.s.

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The Effects of Doping Hafnium on Device Characteristics of $SnO_2$ Thin-film Transistors

  • 신새영;문연건;김웅선;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.199-199
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    • 2011
  • Recently, Thin film transistors (TFTs) with amorphous oxide semiconductors (AOSs) can offer an important aspect for next generation displays with high mobility. Several oxide semiconductor such as ZnO, $SnO_2$ and InGaZnO have been extensively researched. Especially, as a well-known binary metal oxide, tin oxide ($SnO_2$), usually acts as n-type semiconductor with a wide band gap of 3.6eV. Over the past several decades intensive research activities have been conducted on $SnO_2$ in the bulk, thin film and nanostructure forms due to its interesting electrical properties making it a promising material for applications in solar cells, flat panel displays, and light emitting devices. But, its application to the active channel of TFTs have been limited due to the difficulties in controlling the electron density and n-type of operation with depletion mode. In this study, we fabricated staggered bottom-gate structure $SnO_2$-TFTs and patterned channel layer used a shadow mask. Then we compare to the performance intrinsic $SnO_2$-TFTs and doping hafnium $SnO_2$-TFTs. As a result, we suggest that can be control the defect formation of $SnO_2$-TFTs by doping hafnium. The hafnium element into the $SnO_2$ thin-films maybe acts to control the carrier concentration by suppressing carrier generation via oxygen vacancy formation. Furthermore, it can be also control the mobility. And bias stability of $SnO_2$-TFTs is improvement using doping hafnium. Enhancement of device stability was attributed to the reduced defect in channel layer or interface. In order to verify this effect, we employed to measure activation energy that can be explained by the thermal activation process of the subthreshold drain current.

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전도성 AFM 탐침에 의한 YBa2Cu3O7-x 스트립 라인의 산화피막 형성 (Anodization Process of the YBa2Cu3O7-x Strip Lines by the Conductive Atomic Force Microscope Tip)

  • 고석철;강형곤;임성훈;한병성;이해성
    • 한국전기전자재료학회논문지
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    • 제17권8호
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    • pp.875-881
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    • 2004
  • Fundamental results obtained from an atomic force microscope (AFM) chemically-induced direct nano-lithography process are presented, which is regarded as a simple method for fabrication nm-scale devices such as superconducting flux flow transistors (SFFTs) and single electron tunneling transistors (SETs). Si cantilevers with Pt coating and with 30 nm thick TiO coating were used as conducting AFM tips in this study. We observed the surfaces of superconducting strip lines modified by AFM anodization' process. First, superconducting strip lines with scan size 2 ${\mu}{\textrm}{m}$${\times}$2 ${\mu}{\textrm}{m}$ have been anodized by AFM technology. The surface roughness was increased with the number of AFM scanning, The roughness variation was higher in case of the AFM tip with a positive voltage than with a negative voltage in respect of the strip surface. Second, we have patterned nm-scale oxide lines on ${YBa}-2{Cu}_3{O}_{7-x}$ superconducting microstrip surfaces by AFM conductive cantilever with a negative bias voltage. The ${YBa}-2{Cu}_3{O}_{7-x}$ oxide lines could be patterned by anodization technique. This research showed that the critical characteristics of superconducting thin films were be controlled by AFM anodization process technique. The AFM technique was expected to be used as a promising anodization technique for fabrication of an SFFT with nano-channel.

접착방지막과 접착막을 동시에 적용한 대면적 Au/Pd 트랜스퍼 프린팅 공정 개발 (Development of the Large-area Au/Pd Transfer-printing Process Applying Both the Anti-Adhesion and Adhesion Layers)

  • 차남구
    • 한국재료학회지
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    • 제19권8호
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    • pp.437-442
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    • 2009
  • This paper describes an improved strategy for controlling the adhesion force using both the antiadhesion and adhesion layers for a successful large-area transfer process. An MPTMS (3-mercaptopropyltrimethoxysilane) monolayer as an adhesion layer for Au/Pd thin films was deposited on Si substrates by vapor self assembly monolayer (VSAM) method. Contact angle, surface energy, film thickness, friction force, and roughness were considered for finding the optimized conditions. The sputtered Au/Pd ($\sim$17 nm) layer on the PDMS stamp without the anti-adhesion layer showed poor transfer results due to the high adhesion between sputtered Au/Pd and PDMS. In order to reduce the adhesion between Au/Pd and PDMS, an anti-adhesion monolayer was coated on the PDMS stamp using FOTS (perfluorooctyltrichlorosilane) after $O_2$ plasma treatment. The transfer process with the anti-adhesion layer gave good transfer results over a large area (20 mm $\times$ 20 mm) without pattern loss or distortion. To investigate the applied pressure effect, the PDMS stamp was sandwiched after 90$^{\circ}$ rotation on the MPTMS-coated patterned Si substrate with 1-${\mu}m$ depth. The sputtered Au/Pd was transferred onto the contact area, making square metal patterns on the top of the patterned Si structures. Applying low pressure helped to remove voids and to make conformal contact; however, high pressure yielded irregular transfer results due to PDMS stamp deformation. One of key parameters to success of this transfer process is the controllability of the adhesion force between the stamp and the target substrate. This technique offers high reliability during the transfer process, which suggests a potential building method for future functional structures.