• Title/Summary/Keyword: Patterned Roll

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The Laminating process for Single Substrate Flexible LCD

  • Bae, Kwang-Soo;Choi, Yoon-Seuk;Kim, Hak-Rin;Kim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1125-1128
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    • 2007
  • The laminating technique for developing flexible liquid crystal display was demonstrated by using a thin UV curable polymer film and a plastic substrate with patterned polymer wall structure. We adopted the rigid wall structure to provide a solid mechanical support for the stable molecular alignment of liquid crystals (LCs) in the device. The cover film was prepared to have an ability of aligning LC molecules by patterning a micro-groove structure using the soft-lithographic process. These two substrates can be assembled tightly by the laminating and one-step UV irradiation process because of the adhesive nature of the used UV curable polymers. Proposed method can be used to fabricate the flexible LC display with simplicity and also be applicable for a cost-effective roll-to-roll process.

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Laser Direct Patterning of Carbon Nanotube Film

  • Yun, Ji-Uk;Jo, Seong-Hak;Jang, Won-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.203-203
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    • 2012
  • The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

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Development of a Large Surface Mechanical Micro Machining System & Machine (대면적 미세가공시스템 및 장비 개발)

  • Park, Chun-Hong;Oh, Jeong-Seok;Shim, Jong-Youp;Hwang, Joo-Ho
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.7
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    • pp.761-768
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    • 2011
  • The large surface micro machining system includes the equipments and processes for manufacturing the ultra precision micro patterned products with large surface through the mechanical machining. Recent major issue on the micro machining technology may be the development of optical parts for the back light unit of display which has the largest market. This special issue makes up with three parts; the large surface micro machining system and machine, machining process and forming process. In this paper, the state-of-the-art and core technology of large surface micro machining system is introduced with focus on the manufacturing technology for the back light unit of LCD TV. Then, some research results on the development of a roll die lathe is introduced which involves the concept of machine design, improvement of thermal characteristics in the spindle system, improvement of relative parallelism and straightness between spindle system and long stroke feed table, machining of micro pitch patterns. Finally, the direct forming process is introduced as the future work in the large surface micro machining field.

Fabrication of Transparent Electrode Film for Organic Photovoltaic using Ag grid and Conductive Polymer (Ag grid와 전도성 고분자를 이용한 인쇄기반 OPV용 투명전극 형성)

  • Yu, Jongsu;Kim, Jungsu;Yoon, Sungman;Kim, Dongsoo;Kim, Dojin;Jo, Jeongdai
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.116.1-116.1
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    • 2011
  • Materials with a combination of high electrical conductivity and optical transparency are important components of many electronic and optoelectronic devices such as liquid crystal displays, solar cells, and light emitting diodes. In this study, to fabricate a low-resistance and high optical transparent electrode film for organic photovoltaic, the following steps were performed: the design and manufacture of an electroforming stamp mold, the fabrication of thermal roll imprinted (TRI) poly-carbonate (PC) patterned films, the manufacture of high-conductivity and low-resistance Ag paste which was filled into patterned PC film using a doctor blade process and then coated with a thin film layer of conductive polymer by a spin coating process. As a result of these imprinting processes the PC films obtained a line width of $10{\pm}0.5{\mu}m$, a channel length of $500{\pm}2{\mu}m$, and a pattern depth of $7.34{\pm}0.5{\mu}m$. After the Ag paste was used to fill part of the patterned film with conductive polymer coating, the following parameters were obtained: a sheet resistance of $9.65{\Omega}$/sq, optical transparency values were 83.69 % at a wavelength of 550 nm.

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Fabrication of large area OPV cells (대면적 유기 태양 전지의 제작)

  • Byun, Won-Bae;Shin, Won Suk;Ryu, Ka Yeon;Park, Hye Sung;Moon, Sang-Jin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.69.2-69.2
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    • 2010
  • Recently, bulk hetero-junction cells have been extensively studied by many researchers. Most of these cells were fabricated by spin coater. However, the spin coating process is not favorable to the large-scaled industry because it is not compatible with roll-to-roll process. One of the alternative methods is Doctor blading. In this study, we fabricated large OPV cells having total area of $100cm^2$. The buffer layer was Poly-(3,4-ethylenedioxythiophene) : poly-(styrenesulfonate) aqueous dispersion (PEDOT:PSS) and the active material is poly (3-hexythiophene) (P3HT) and phenyl-C61-butyric acid methyl ester (PCBM) blend in the solvent of Chlorobenzene. All of the organic layers were coated by dragging the blade with a speed of 5~20 mm/s on the stage with a temperature of $50^{\circ}C$. As-bladed PEDOT:PSS layer was baked at $120^{\circ}C$ for 10 minutes to eliminate the water. The cell structure is patterned ITO substrate/PEDOT:PSS/P3HT:PCBM/LiF/Al. The topmost electrode, LiF/Al, was deposited by thermal evaporation. After depositing electrode, and the cell was annealed at $150^{\circ}C$ for 30 minutes. The measured ISC, VOC, fill factor, and PCE were 2.95 A, 5.86 V, 0.32, and 0.78%, respectively. PCE was quite low but the large active area could be obtained successfully.

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Self-assembly of Helical structure by defected nanosheet

  • Yoon, Sang-hee;Sim, Eunji
    • Proceeding of EDISON Challenge
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    • 2016.03a
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    • pp.75-79
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    • 2016
  • A helical nanosturctrue can be obtained by self-assembly method. Utilizing DPD simulation coarse-grained model, we patterned 2D layer nanosheets with repeated diagonal defects and grafts, and programed to self-roll into hollow helix structure. The defected pattern side caused anisotropy, and formed helix or helix-like structure. This opens the possibility to control the helix pitch or cavity radius. In this work, we designed several patterns about diagonal defect with a variety of defect side densities and defect widths and then simulation was carried out. Thus, our results have that parameters are affecting self-assembly of nanosheets and their conformation.

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10㎛-wide Pattern Engraving using Metal Specimens coated with a heterogeneous metal for Printed Electronics (이종 금속이 코팅된 금속소재를 이용한 인쇄전자소자용 선폭 10㎛급 패턴 가공)

  • Sohn, Hyonkee;Cao, Binh Xuan;Cho, Yong-Kwon;Shin, Dong-Sig;Choi, Jiyeon
    • Laser Solutions
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    • v.17 no.4
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    • pp.20-23
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    • 2014
  • In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are patterned in microscale by the indirect laser method. Since based on the wet etch process, the indirect method is neither environment-friendly nor suitable for making a printing roll with patterns narrower than $20{\mu}m$. In this paper, we have directly engraved micro-patterns into a Zn-coated metal specimens using a picosecond laser in order both to engrave $10{\mu}m$-wide patterns and to improve the pattern profile. Experiments showed that it is possible to engrave $10{\mu}m$-wide patterns with an a rectangular-shaped profile which is necessary for the dimensionally accurate printing.

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Cu Electroplating on Patterned Substrate and Etching Properties of Cu-Cr Film for Manufacturing TAB Tape (TAB 테이프 제조를 위한 구리 도금 및 에칭에 관한 연구)

  • Kim, N. S.;Kang, T.;Yun, I. P.;Park, Y. S.
    • Journal of the Korean institute of surface engineering
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    • v.27 no.3
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    • pp.158-165
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    • 1994
  • Cu-Cr alloy thin film requires good quality of etching be used for TAB technology. The etched cross sec-tion was clean enough when the etching was performed in 0.1M $FeCl_3$ solution at $50^{\circ}C$. The etching rate was increased with the amount of $KMnO_4$. For enhanced profile of cross section and rate, the spray etchning was found to be superior compared to the immersion etching. A series of experiments were performed to improve the uniformity of the current distribution in electrodeposition onto the substrate with lithographic patterns. Copper was electrodeposited from quiescent-solution, paddle-agitated-solution, and air-bubbled-solution to in-vestigate the effect of the fluid flow. The thickness profile of the specimen measured by profilmetry has the non uniformity at feature scale in quiescent-solution, because of the longitudinal vortex roll caused by the natural convection. However, uniform thickness profile was achieved in paddle-agitated or air bubbled solu-tion.

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