Reactive Ion Etching and Magnetically Enhanced Reactive Ion Etching Process of Low-K Methylsilsequioxane Insulator Film using $CF_4$ and $O_2$
($CF_4$ 와 $O_2$ 를 이용한 저유전율 물질인 Methylsilsequioxane의 RIE와 MERIE 공정)
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- Proceedings of the KIEE Conference
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- 2000.07c
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- pp.1491-1493
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- 2000