• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.1066-1068
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• 1999

Magnetic field is commonly used in low temperature processing plasmas in order to obtain high density. E $\times$ B magnetron or surface multipole configuration were most popular. However, the properties of capacitively coupled rf plasma confined by axially applied static magnetic fields have rarely been studied. In this paper, the effects of magnetic field on the characteristics of 13.56MHz/40KHz argon plasma will be reported. Ion saturation current, electron temperature and plasma potential were measured by Langmuir probe and omissive probe. At low pressure region ($\sim$10mTorr), ion current was increased by a factor of 3 - 4 due to reduction of diffusion loss of charged particles to the wall. It was observed that magnetic field induces large time variation of the plasma potential. The experimental result was compared with particle-in-cell simulation. It was also observed that electron temperature tend to decrease with increasing magnetic induction level for 40KHz discharge.

• 한국세라믹학회지
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• 제45권11호
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• pp.707-712
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• 2008

Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{\circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{\circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.

• 전기학회논문지
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• 제56권3호
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• pp.577-582
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• 2007

The plasma display panel is an image expression display using gas discharge plasma. However, gas discharge characteristics vary with temperature as gas discharge is sensitive to temperature. The discharge time lag extends a lot in low temperature and it is known as the cause which hinders high speed addressing which is essential for the size enlargement of the panel. Accordingly this research aims at identifying the temperature-dependent discharge characteristic. The lower temperature becomes, the longer addressing discharge time lag becomes. Particularly the statistical time lag extends much in low temperature. The increasing of electric field shortens discharge time lag in low temperature. Also, when priming particles are sufficiently supplied, stable discharge can be performed regardless of the influence of temperature.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.420-421
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• 2006

In the present study, ultrafined Zr-V-Fe based alloy powder prepared by a plasma arc discharge process with changing process parameters. The chemical composition of synthesized powder was strongly influenced by the process parameters, especially the hydrogen volume fraction in the powder synthesis atmosphere. The synthesized powder had an average particle size of 50 nm. The synthesized Zr-V-Fe based particles had a shell-core structure composed of metal in the core and oxidse in the shell.

• Advances in materials Research
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• 제9권1호
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• pp.1-14
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• 2020

The hybrid method of three-dimensional ion implantation and electric arc is presented as a novel plasma-ion technique that allows by means of high voltage pulsed and electric arc discharges, the bombardment of non-metallic and metallic ions then implanting upon the surface of a solid surface, especially out of metallic nature. In this study AISI/SAE 4140 samples, a tool type steel broadly used in the industry due to its acceptable physicochemical properties, were metallographically prepared then surface modified by implanting titanium and simultaneously titanium and nitrogen particles during 5 min and 10 min. The effect of the ion implantation technique over the substrate surface was analysed by characterization and electrochemical techniques. From the results, the formation of Ti micro-droplets upon the surface after the implantation treatment were observed by micrographs obtained by scanning electron microscopy. The presence of doping particles on the implanted substrates were detected by elemental analysis. The linear polarization resistance, potentiodynamic polarization and total porosity analysis demonstrated that the samples whose implantation treatment with Ti ions for 10 min, offer a better protection against the corrosion compared with non-implanted substrates and implanted at the different conditions in this study.

• 한국재료학회지
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• 제27권9호
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• pp.507-511
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• 2017

An optimum route to fabricate oxide dispersion strengthened ferritic superalloy with desired microstructure was investigated. Two methods of high energy ball milling or polymeric additive solution route for developing a uniform dispersion of $Y_2O_3$ particles in Fe-Cr-Al-Ti alloy powders were compared on the basis of the resulting microstructures. Microstructural observation revealed that the crystalline size of Fe decreased with increases in milling time, to values of about 15-20 nm, and that an FeCr alloy phase was formed. SEM and TEM analyses of the alloy powders fabricated by solution route using yttrium nitrate and polyvinyl alcohol showed that the nano-sized Y-oxide particles were well distributed in the Fe based alloy powders. The prepared powders were sintered at 1000 and $1100^{\circ}C$ for 30 min in vacuum. The sintered specimen with heat treatment before spark plasma sintering at $1100^{\circ}C$ showed a more homogeneous microstructure. In the case of sintering at $1100^{\circ}C$, the alloys exhibited densified microstructure and the formation of large reaction phases due to oxidation of Al.

• Nuclear Engineering and Technology
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• 제55권5호
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• pp.1830-1837
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• 2023

The thermal cutting of contaminated or activated metals during decommissioning nuclear power plants inevitably results in the release of radioactive aerosol. Since radioactive aerosols are pernicious particles that contribute to the internal dose of workers, air conditioning units with a HEPA filter are used to remove radioactive aerosols. However, a HEPA filter cannot be used permanently. This study evaluates the efficiency and lifetime of filters in actual metal cutting condition using a plasma arc cutter and a high-resolution aerosol detector. The number concentration and size distribution of aerosols from 6 nm to 10 ㎛ were measured on both the upstream and downstream sides of the filter. The total aerosol removal efficiency of HEPA filter satisfies the standard of removing at least 99.97% of 0.3 ㎛ airborne particles, even if the pressure drop increases due to dust feeding load. The pressure drop and particle size removal efficiency at 0.3 ㎛ of the HEPA filter were found to increase with repeated cutting experiments. By contrast, the efficiency of used HEPA filter reduced in removing nano-sized aerosols by up to 79.26%. Altogether, these results can be used to determine the performance guidance and replacement frequency of HEPA filters used in nuclear power plants.

• Nuclear Engineering and Technology
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• 제54권7호
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• pp.2586-2591
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• 2022

In the present work, we have irradiated the DI-BSCCO superconducting tapes with the 100 keV deuterium ions to investigate the effect of ion irradiation on their critical current (Ic). The damage simulations are carried out using the binary collision approximation method to get the spatial distribution and depth profile of the damage events in the high temperature superconducting (HTS) tape. The point defects are formed near the surface of the HTS tape. These point defects change the vortex profile in the superconducting tape. Due to the long-range interaction of vortices with each other, the Ic of the tape degrades at the 77 K and self magnetic field. The radiation dose of 2.90 MGy degrades the 44% critical current of the tape. The results of the displacement per atom (dpa) and dose deposited by the deuterium ions are used to fit an empirical relation for predicting the degradation of the Ic of the tape. We include the dpa, dose and columnar defect terms produced by the incident particles in the empirical relation. The fitted empirical relation predicts that light ion irradiation degrades the Ic in the DI-BSCCO tape at the self field. This empirical relation can also be used in neutron irradiation to predict the lifetime of the DI-BSCCO tape. The change in the Ic of the DI-BSCCO tape due to deuterium irradiation is compared with the other second-generation HTS tape irradiated with energetic radiation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.169-169
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• 2008

To keep pace with scaling trends of CMOS technologies, high-k metal oxides are to be introduced. Due to their high permittivity, high-k materials can achieve the required capacitance with stacks of higher physical thickness to reduce the leakage current through the scaled gate oxide, which make it become much more promising materials to instead of $SiO_2$. As further studying on high-k, an understanding of the relation between the etch characteristics of high-k dielectric materials and plasma properties is required for the low damaged removal process to match standard processing procedure. There are some reports on the dry etching of different high-k materials in ICP and ECR plasma with various plasma parameters, such as different gas combinations ($Cl_2$, $Cl_2/BCl_3$, $Cl_2$/Ar, $SF_6$/Ar, and $CH_4/H_2$/Ar etc). Understanding of the complex behavior of particles at surfaces requires detailed knowledge of both macroscopic and microscopic processes that take place; also certain processes depend critically on temperature and gas pressure. The choice of $BCl_3$ as the chemically active gas results from the fact that it is widely used for the etching o the materials covered by the native oxides due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. In this study, the surface reactions and the etch rate of $Al_2O_3$ films in $BCl_3/Cl_2$/Ar plasma were investigated in an inductively coupled plasma(ICP) reactor in terms of the gas mixing ratio, RF power, DC bias and chamber pressure. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by AFM and SEM. The chemical states of film was investigated using X-ray photoelectron spectroscopy (XPS), which confirmed the existence of nonvolatile etch byproducts.

• 한국진공학회지
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• 제18권3호
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• pp.186-196
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• 2009

하이퍼써멀 영역의 에너지 ($1{\sim}100\;eV$), 특히, 50 eV 이하의 에너지를 갖는 높은($10^{16}$ particles/$cm^2\;s$ 이상) 플럭스의 이온빔을 직접 인출하기는 어렵지만, 이온을 중성화한 중성입자빔 경우에는 가능하다. 높은 플럭스의 하이퍼써멀 중성입자빔을 생성하고 효율적으로 수송하기 위해서는 낮은 플라즈마 운전압력(0.3 mTorr 이하)에서도 높은 이온밀도($10^{11}\;cm^{-3}$ 이상)를 유지할 수 있는 대면적 플라즈마 발생원이 요구된다. 이러한 하이퍼써멀 중성입자빔의 생성을 위해 요구되는 플라즈마 발생원을 구현하기 위해서는 자기장에 의한 전자가둠 방식이 도입되어야 하는데, 영구자석을 이용한 다양한 자기장 구조를 갖는 Electron Cyclotron Resonance (ECR) 플라즈마 발생 방식이 하나의 해결 방법이 될 수 있음을 제안하였다. 여기에는 마그네트론 구조를 갖는 자기장을 채택한 평면형 ECR 플라즈마 발생 방식과 원통형 플라즈마 용기 외벽 둘레에 영구자석 어레이를 설치하여 축방향 자기장을 형성하고 용기 중심부에 전자를 가두는 원통형 방식이 있다. 두 경우 모두 기본적으로 mirror field 구조에 의한 전자 가둠을 기반으로 하고 전자의 drift에 의해 더욱 효율적으로 전자를 플라즈마 공간에 가두는 방식을 도입하고 있어서 낮은 운전압력에서도 높은 밀도의 플라즈마를 발생시키고 유지할 수 있다.