• Title/Summary/Keyword: Particle Contamination

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Detection of Tobamoviruses and Survey on Contamination Rate in Commercial Pepper Seeds Using Gelatin Particle Agglutination Test (젤라틴입자응집반응법을 이용한 국내 시판 고추종자의 Tobamovirus 검출 및 오염률 조사)

  • 한정헌;장태호;이철호;김영호;나용준
    • Research in Plant Disease
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    • v.7 no.3
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    • pp.170-174
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    • 2001
  • Gelatin particle agglutination test (GPAT) was optimized for detection of Tobamovirus and contamination of the virus in commercial pepper seeds was evaluated. The optimum concentration of ${\gamma}$-globulin G, specific to tobacco mosaic virus pepper strain, was 100 ug/ml. The sensitivity of GPAT for the detection of Tobamovirus in pepper seeds was as high as enzyme-linked immunosorbent and dot immunoblotting assays. Optimum dilution ranges of the seed extract for GPAT was 5-25 folds. Using the optimized GPAT with above conditions, the rate of Tobamovirus contamination in seeds was turned out to be average of 79.1%.

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A Control Algorithm for Wafer Edge Exposure Process

  • Park, Hong-Lae;Joon Lyou
    • 제어로봇시스템학회:학술대회논문집
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    • 2002.10a
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    • pp.55.4-55
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    • 2002
  • In the semiconductor fabrication, particle contamination is wide-spread and one of major causes to yield loss. Extensive testing has revealed that even careful handling of wafers during processing may cause photo-resist materials to flake off wafer edges. So, to remove the photo-resist at the outer 5mm of wafers, UV(Ultraviolet) rays are exposed. WEE (Wafer Edge Exposure) process station is the system that exposes the wafer edge as prespecified by controlling the positioning mechanism and maintaining the light intensity level In this work, WEE process station has been designed so as to significantly lower the amount of particle contamination which occurs even during the most r...

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Study on the Unsteady Contaminated Particle Transportation in the Flow Field for the Super Clean Room (초청정 클린룸 난류유동장내에서의 오염입자 비정상 전파거동에 관한 연구)

  • 오명도;임학규;배귀남
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.14 no.2
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    • pp.430-439
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    • 1990
  • Steady state turbulent airflow and unsteady characteristics of generation, transportation, and recovery behavior of contaminate particles in the simplified 2 dimensional Vertical Laminar Flow (VLF) type clean room was numerically simulated using the low Reynolds number k-over bar.epsilon- turbulent model. Characteristics of airflow in VLF type clean room are greatly affected by the recirculation zone around working surface. The recirculation zone must be considered at the time of clean room design because the recirculation zone whose area increases with increment of inlet velocity exerts bad influence upon the performance of clean room in terms of particle contamination. The location of maximum particle concentration changes from the location of particle source to the recirculation zone, while averaged particle concentration is reduced exponentially with time. Recovery time of clean room with spontaneous particle generation source is inversely proportional to inlet velocity. We introduce nondimensionalized recovery time through the dimensional analysis, which can indicates the general performance of clean room with design structure change. It was identified that .tau. is independent of inlet velocity and background concentration. Therefore .tau. can be the simple factor to compare the different structure of clean room in terms of dynamic response to contamination and becomes larger with better structure of clean room.

Theoretical study on the particle contamination in silane plasma reactor for semiconductor processing (반도체 제조용 사일렌 플라즈마 반응기 내에서의 입자 오염에 관한 이론적 연구)

  • 김동주;김교선
    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.172-178
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    • 2000
  • We developed the model equations to investigate the particle movement and growth theoretically in a-Si plasma CVD reactor, where those particles act as the source of contamination. We included the effects of fluid convection, particle diffusion and external forces (ion drag force, electrostatic force and gravitational force) onto the particles to analyze the movements of particles in plasma reactor. Taking into account the particle charge distribution, the particle growth by coagulation between the charged particles was investigated. Most of those particles are located in the region near the sheath boundaries by the balance between the ion drag and electrostatic forces. The particle concentrations in the sheath region and in the bulk plasma region are almost zero. The sizes of the predator particles increase with time by the coagulation with protoparticles and, as a result, the surface area and the average charge of predator particles also increase with time.

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Effect of particulate contamination on the friction of wear of pico/nano-slider (오염입자가 pico/nano-slider의 마찰 마모에 미치는 영향)

  • ;Bharat Bhushan
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2000.06a
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    • pp.24-33
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    • 2000
  • The effect of particulate contamination on friction and wear between a negative-pressure picoslider / tri-pad nanoslider and laser-textured disk was studied. Particles of different concentration were injected at the head-disk interface consisting of disks with various textures and slider types at different speed. Durability increased and coefficient of friction decreased as the disk speed increased in a contaminated environment. Frictional characteristics and durability in the data zone were better for those of the laser-textured zone. It was also found that durability of head-disk interface (HDI)decreased as the particle concentration increased. The interface durability with a picoslider was better than that with a nanoslider at any condition in a contaminated environment. Based on the test results, mechanisms were proposed to explain the reasons why durability with a picoslider was superior to that with a nanoslider.

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Effect of Particulate Contamination on the Friction and Wear of Pico/Nano-Slider (오염입자가 pico/nano-slider의 마찰 마모에 미치는 영향)

  • ;Bharat Bhushan
    • Tribology and Lubricants
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    • v.16 no.6
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    • pp.469-476
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    • 2000
  • The effect of particulate contamination on the friction and wear between a negative-pressure picoslider/tri-pad nanoslider and laser-textured disk was studied. Particles of different concentration were injected at the head-disk interface consisting of disks with various textures and slider types at different speed. Durability increased and coefficient of friction decreased as the disk speed increased in a contaminated environment. Frictional characteristics and durability in the data Bone were better than those in the laser-textured zone. It was also found that durability of head-disk interface (HDI) decreased as the particle concentration increased. The interface durability with a picoslider was better than that with a nanoslider at any condition in a contaminated environment. Based on the test results, mechanisms were proposed to explain the reasons why durability with a picoslider was superior to that with a nanoslider.

Effect of Particulate Contamination on the Friction and Wear of Head-Disk Interface with Picoslider (오염입자가 Picoslider의 헤드-디스크 인테페이스 마찰 마모에 미치는 영향)

  • ;Bharat Bhushan
    • Tribology and Lubricants
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    • v.16 no.5
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    • pp.395-402
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    • 2000
  • The effect of particulate contamination on friction and wear between a negative-pressure picoslider and a laser-textured disk was studied. Particles of different concentrations, materials and sizes were injected to the head-disk interface (HDI), consisting of disks with various textures, at the same speed. In a contaminated environment, durability of head-disk interface gradually decreased as the particle concentration increased. Large particles caused HDI failure early and resulted in an extensive damage to the slider and disk surfaces. Hard particles also caused HDI failure earlier and damages more extensive than soft ones. Based on the test results, mechanisms of HDI failure with picoslider were presented.

Development of Particle Deposition System for Cleaning Process Evaluation in Semiconductor Fabrication (반도체 세정 공정 평가를 위한 나노입자 안착 시스템 개발)

  • Nam, Kyung-Tag;Kim, Young-Gil;Kim, Ho-Joong;Kim, Tae-Sung
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.4
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    • pp.49-52
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    • 2007
  • As the minimum feature size decrease, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT. Charged monodisperse particles are generated using SMPS (Scanning Mobility Particle Sizer) and deposited on the wafer by electrostatic force. The Experimental results agreed with the simulation results well. We calculate the particles loss in pipe flow theoretically and compare with the experimental results.

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Numerical Investigation of Contamination Particle's Trajectory in a Head/slider Disk Interface (헤드/디스크 인터페이스 내에서 오염 입자의 거동에 관한 수치적 연구)

  • Park, Hee-Sung;Hwang, Jung-Ho;Choa, Sung-Hoon
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.24 no.3
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    • pp.477-484
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    • 2000
  • Microcontamination caused by particle deposition on the head disk interface threatens the reliability of hard disk drive. Design of slider rail to control contamination becomes an important issue in magnetic recording. In this paper, how particles adhere to the slider and the disk is examined. To investigate accumulation mechanism of the particles, trajectory of the particles in a slider/disk interface is simulated with considering various forces including drag force, gravitational force, Saffman lift force, and electrostatic force. It is found that the charged particles can easily adhere to the slider or disk surface, if an electric field exists between the slider and the disk. It is supposed that the vertical motion of the particles should be related with not only Saffman force but also electrostatic force.

Contamination measurement, Analysis & Control for Satellite (인공위성의 오염 측정, 분석 및 관리)

  • Lee, Sang-Hoon;Hong, Seok-Jong;Cho, Hyok-Jin;Seo, Hee-Jun;Moon, Guee-Won
    • Aerospace Engineering and Technology
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    • v.9 no.2
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    • pp.116-122
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    • 2010
  • It is necessary to be careful about contamination control to minimize the accumulation of the contamination material on satellite surface during the I&T phase. In the space environment which characterized by high vacuum, high and very low temperature, contamination material causes satellite to lose its own performance. Especially, contamination material can accumulate on critical surfaces such as lenses, mirrors, and sensors. KARI(Korea Aerospace Research Institute) conducts the clean room to control and minimize the contamination effect. This paper introduces the principle of contamination and the method of measure and analysis for the contamination.