• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.11a
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• pp.123-124
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• 2010

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.171-175
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics and metal, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter level dielectrics and metal. Especially, defects like (micro-scratch) lead to severe circuit failure, and affects yield. Current conditioning method - bladder type, orbital pad motion - usually provides unsuitable pad profile during ex-situ conditioning near the end of pad life. Since much of the pad wear occurs by the mechanism of bladder tripe conditioning and its orbital motion without rotation, we need to implement new ex-situ conditioner which can prevent abnormal regional force on pad caused by bladder-type and also need to rotate the pad during conditioning. Another important study of ADPC is related to the orbital scratch of which source is assumed as diamond grit dropped from the strip during ex-situ conditioning. Scratch from diamond grit damaged wafer severely so usual1y scraped. Figure 1 shows the typical shape of scratch damaged from diamond. We suspected that intensive forces to the edge area of bladder type stripper accelerated the drop of Diamond grit during conditioning, so new designed Flat stripper was introduced.

• Journal of the Microelectronics and Packaging Society
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• v.8 no.4
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• pp.1-10
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• 2001

Chip-on-glass(COG) mounting of area array electronic packages was attempted by heating the rear surface of a contact pad film deposited on a glass substrate. The pads consisted of an adhesion (i.e. Cr or Ti) and a top coating layer(i.e. Ni or Cu) were healed by the UV laser beam transmitted through the glass substrate. The lather energy absorbed on the pad raised the temperature of a solder ball which is in physical contact with the pad, and formed a reflowed solder bump. The effects of the adhesion and top coating layer on the laser reflow soldering were studied by measuring temperature profile of the ball during the laser heating process. The results were discussed based on the measurement of reflectivity of the adhesion layer. In addition, the microstructures of solder bumps and their mechanical properties were examined.

• The Journal of the Korea institute of electronic communication sciences
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• v.17 no.6
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• pp.1175-1180
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• 2022

STI has been studied a lot as a process technology for wide area planarization according to miniaturization and high integration of semiconductor devices. In this study, as methods for improving the STI profile, wet etching of pad oxide using hydrofluorine solution and dry etching of O₂+CF₄ after STI dry etching were proposed. This process technology showed improvement in profile imbalance and leakage current between patterns according to device density compared to the conventional method. In addition, as a result of measuring the HLD thickness after CMP for a device having the same STI depth and HLD deposition, the measured value was different depending on the device density. It was confirmed that this was due to the difference in the thickness of the nitride film according to the device density after CMP and the selectivity of the slurry.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2001.07a
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• pp.119-126
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• 2001

Chip-on-glass(COG) mounting of area array electronic packages was attempted by heating the rear surface of a contact pad film deposited on a glass substrate. The pads consisted of an adhesion(i.e. Cr or Ti) and a top coating layer(i.e. Ni or Cu) was heated by an UV laser beam transmitted through the glass substrate. The laser energy absorbed on the pad raised the temperature of a solder ball which is in physical contact with the pad, forming a reflowed solder bump. The effects of the adhesion and top coating layer on the laser reflow soldering were studied by measuring temperature profile of the ball during the laser heating process. The results were discussed based on the measurement of reflectivity of the adhesion layer. In addition, the microstructures of solder bumps and their mechanical properties were examined.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.58-58
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• 2009

Uniformity related issues in chemical mechanical polishing (CMP) are within wafer non-uniformity (WIWNU), wafer to wafer non-uniformity (WTWNU), planarity and dishing/erosion. Here, the WIWNU that originates from spatial distribution of independent variables such as temperature, sliding distance, down force and material removal rate (MRR) during CMP, relies to spatial dependency. Among various sources of spatial irregularity, hardness and modulus of pad and surface roughness in sources for pad uniformity are great, especially. So, we investigated the spatial variation of pad surface characteristics using pad measuring system (PMS) and roughness measuring system. Reduced peak height ($R_{pk}$) of roughness parameter shows a strong correlation with the removal rate, and the distribution of relative sliding distance onwafer during polishing has an effect on the variation of $R_{pk}$ and WIWNU. Also, the results of pad wear profile thorough developed pad profiler well coincides with the kinematical simulation of conditioning, and it can contribute for the enhancement of WIWNU in CMP process.

• The KSFM Journal of Fluid Machinery
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• v.20 no.2
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• pp.63-68
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• 2017

This paper predicts the rotordynamic force coefficients of tilting pad journal bearings (TPJBs) with ball-socket pivot and compares the predictions to the published test data obtained under load-between-pad (LBP) configuration. The present TPJB model considers the pivot stiffness calculated based on the Hertzian contact stress theory. Due to the compliance of the pivot, the predicted journal eccentricity agree well with the measured journal center trajectory for increasing static loads, while the early prediction without pivot model consideration underestimates it largely. The predicted pressure profile shows the significant pressure development even on the unloaded pads along the direction opposite to the loading direction. The predicted stiffness coefficients increase as the static load and the rotor speed increase. They agree excellently with test data from open literature. The predicted damping coefficients increase as the static load increases and the rotor speed decreases. The prediction underestimates the test data slightly. In general, the current predictive model including the pivot stiffness improves the accuracy of the rotordynamic performance predictions when compared to the previously published predictions.

• Journal of Welding and Joining
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• v.16 no.4
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• pp.109-116
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• 1998

The three-dimensional profile of a solder fillet is predicted by minimizing the surface tension and gravity energies of the solder joint using finite element modeling. Geometric complexity stemming from the inclined plane of the gullwing lead is resolved by employing three element types. These element types are used to describe the joint profile formed on the vertical, inclined and interfacial planes. The predicted solder joint profiles show good agreements with the experimental data provided that the solder volume is adjusted considering the wicking effects. Effects of the pad length, inclined lead angle and solder volume on joint profiles are also investigated.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.3
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• pp.289-294
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• 2012

There are several indicators to represent characteristics of chemical mechanical planarization (CMP) such as material removal rate (MRR), surface quality and removal uniformity on a wafer surface. Especially, the removal uniformity on the wafer edge is one of the most important issues since it gives a significant impact on the yield of chip production on a wafer. Non-uniform removal rate at the wafer edge (edge effect) is mainly induced by a non-uniform pressure from nonuniform pad curvature during CMP process, resulting in edge exclusion which means the region that cannot be made to a chip. For this reason, authors tried to minimize the edge exclusion by using an edge profile control (EPC) ring. The EPC ring is equipped on the polishing head with the wafer to protect a wafer from the edge effect. Experimental results showed that the EPC ring could dramatically minimize the edge exclusion of the wafer. This study shows a possibility to improve the yield of chip production without special design changes of the CMP equipment.

• Tribology and Lubricants
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• v.33 no.6
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• pp.309-314
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• 2017

This paper presents a theoretical investigation of the dynamic characteristics of externally pressurized air pad bearings with closed loop grooves. These grooves are made on the surface of bearings to reduce the number of supply holes so that manufacturing costs can be reduced. The semi-implicit method is applied to calculate the time varying pressure profile on the air bearing surface owing to the advantages of numerical stability and fast time tracing characteristics. The static pressure of the groove bearings is much higher than that without grooves, so the groove bearings can provide high load carrying capacity. The equation of motion considering vertical motion and tilting motion are also solved using the Runge-Kutta 4th order method. By combining the semi-implicit method and the Runge-Kutta method, fast calculations of the dynamic behavior of the air bearing can be achieved. The variations of bearing reaction force, air film reaction moment, height, and tilting angle are investigated for the step force input, which is 20% higher than the bearing reaction, when the nominal clearance is 6 mm. The effect of the groove width and the groove depth are investigated by calculating the dynamic behavior. The possibility of the air hammering with the depth of the groove is found and discussed.