• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.123-124
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• 2010

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.171-175
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics and metal, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter level dielectrics and metal. Especially, defects like (micro-scratch) lead to severe circuit failure, and affects yield. Current conditioning method - bladder type, orbital pad motion - usually provides unsuitable pad profile during ex-situ conditioning near the end of pad life. Since much of the pad wear occurs by the mechanism of bladder tripe conditioning and its orbital motion without rotation, we need to implement new ex-situ conditioner which can prevent abnormal regional force on pad caused by bladder-type and also need to rotate the pad during conditioning. Another important study of ADPC is related to the orbital scratch of which source is assumed as diamond grit dropped from the strip during ex-situ conditioning. Scratch from diamond grit damaged wafer severely so usual1y scraped. Figure 1 shows the typical shape of scratch damaged from diamond. We suspected that intensive forces to the edge area of bladder type stripper accelerated the drop of Diamond grit during conditioning, so new designed Flat stripper was introduced.

• 마이크로전자및패키징학회지
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• 제8권4호
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• pp.1-10
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• 2001

유리 기판상에 증착된 패드(pad)의 접합부 가열에 의한 면배열(area array) 형태 선자 패키지의 chip-on-glass(COG) 마운팅 공정이 시도되었다. 패드는 접합층(즉, Cr 또는 Ti)과 상부 코팅층(즉, Ni 또는 Cu)으로 구성되었으며, 이 중 접합층이 유리 기판을 투과하는 UV레이저에 의해 가열되었다. 접합층에 흡수된 레이저 에너지는 열전노 과정을 통하여 패드와 물리적으로 접촉되어 있는 솔더볼의 온도를 상승시켰으며, 리플로우 과정을 통하여 솔더 범프를 형성하였다. 레이저 가열 동안 솔더볼의 온도 이력(profile)을 측정함으로써 레이저 리플로우 솔더링시 접합층 및 상부 코팅층의 영향이 조사되었다. 그 결과들은 접합층의 반사율 측정 견과에 기초하여 논의되었다. 아울러 솔더 범프의 미세구조와 기계적 특성이 조사되었다.

• 한국전자통신학회논문지
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• 제17권6호
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• pp.1175-1180
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• 2022

STI는 반도체 소자의 소형화 및 고집적화에 따른 광역 평탄화를 위한 공정 기술로써 많은 연구가 이루어져 왔다. 본 연구에서는 STI의 profile 개선을 위한 방법으로 STI 건식각 후 HF 용액에 의한 pad oxide 습식각과 O₂+CF₄ 건식각을 제안하였다. 이 공정 기술은 기존의 방법보다 소자의 밀집도에 따른 패턴간의 프로파일 불균형과 누설전류의 개선을 나타내었다. 또한 동일한 STI 깊이와 HLD 증착를 갖는 디바이스에 대하여 CMP 후 HLD 두께를 측정한 결과 디바이스 밀도에 따라 측정값이 다르게 나타났고 이는 CMP 후 디바이스 밀도에 따른 질화막의 두께 차이 및 슬러리의 선택비에 기인됨을 확인하였다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2001년도 The IMAPS-Korea Workshop 2001 Emerging Technology on packaging
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• pp.119-126
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• 2001

Chip-on-glass(COG) mounting of area array electronic packages was attempted by heating the rear surface of a contact pad film deposited on a glass substrate. The pads consisted of an adhesion(i.e. Cr or Ti) and a top coating layer(i.e. Ni or Cu) was heated by an UV laser beam transmitted through the glass substrate. The laser energy absorbed on the pad raised the temperature of a solder ball which is in physical contact with the pad, forming a reflowed solder bump. The effects of the adhesion and top coating layer on the laser reflow soldering were studied by measuring temperature profile of the ball during the laser heating process. The results were discussed based on the measurement of reflectivity of the adhesion layer. In addition, the microstructures of solder bumps and their mechanical properties were examined.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.58-58
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• 2009

Uniformity related issues in chemical mechanical polishing (CMP) are within wafer non-uniformity (WIWNU), wafer to wafer non-uniformity (WTWNU), planarity and dishing/erosion. Here, the WIWNU that originates from spatial distribution of independent variables such as temperature, sliding distance, down force and material removal rate (MRR) during CMP, relies to spatial dependency. Among various sources of spatial irregularity, hardness and modulus of pad and surface roughness in sources for pad uniformity are great, especially. So, we investigated the spatial variation of pad surface characteristics using pad measuring system (PMS) and roughness measuring system. Reduced peak height ($R_{pk}$) of roughness parameter shows a strong correlation with the removal rate, and the distribution of relative sliding distance onwafer during polishing has an effect on the variation of $R_{pk}$ and WIWNU. Also, the results of pad wear profile thorough developed pad profiler well coincides with the kinematical simulation of conditioning, and it can contribute for the enhancement of WIWNU in CMP process.

• 한국유체기계학회 논문집
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• 제20권2호
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• pp.63-68
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• 2017

This paper predicts the rotordynamic force coefficients of tilting pad journal bearings (TPJBs) with ball-socket pivot and compares the predictions to the published test data obtained under load-between-pad (LBP) configuration. The present TPJB model considers the pivot stiffness calculated based on the Hertzian contact stress theory. Due to the compliance of the pivot, the predicted journal eccentricity agree well with the measured journal center trajectory for increasing static loads, while the early prediction without pivot model consideration underestimates it largely. The predicted pressure profile shows the significant pressure development even on the unloaded pads along the direction opposite to the loading direction. The predicted stiffness coefficients increase as the static load and the rotor speed increase. They agree excellently with test data from open literature. The predicted damping coefficients increase as the static load increases and the rotor speed decreases. The prediction underestimates the test data slightly. In general, the current predictive model including the pivot stiffness improves the accuracy of the rotordynamic performance predictions when compared to the previously published predictions.

• Journal of Welding and Joining
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• 제16권4호
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• pp.109-116
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• 1998

The three-dimensional profile of a solder fillet is predicted by minimizing the surface tension and gravity energies of the solder joint using finite element modeling. Geometric complexity stemming from the inclined plane of the gullwing lead is resolved by employing three element types. These element types are used to describe the joint profile formed on the vertical, inclined and interfacial planes. The predicted solder joint profiles show good agreements with the experimental data provided that the solder volume is adjusted considering the wicking effects. Effects of the pad length, inclined lead angle and solder volume on joint profiles are also investigated.

• 한국정밀공학회지
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• 제29권3호
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• pp.289-294
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• 2012

There are several indicators to represent characteristics of chemical mechanical planarization (CMP) such as material removal rate (MRR), surface quality and removal uniformity on a wafer surface. Especially, the removal uniformity on the wafer edge is one of the most important issues since it gives a significant impact on the yield of chip production on a wafer. Non-uniform removal rate at the wafer edge (edge effect) is mainly induced by a non-uniform pressure from nonuniform pad curvature during CMP process, resulting in edge exclusion which means the region that cannot be made to a chip. For this reason, authors tried to minimize the edge exclusion by using an edge profile control (EPC) ring. The EPC ring is equipped on the polishing head with the wafer to protect a wafer from the edge effect. Experimental results showed that the EPC ring could dramatically minimize the edge exclusion of the wafer. This study shows a possibility to improve the yield of chip production without special design changes of the CMP equipment.

• Tribology and Lubricants
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• 제33권6호
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• pp.309-314
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• 2017

This paper presents a theoretical investigation of the dynamic characteristics of externally pressurized air pad bearings with closed loop grooves. These grooves are made on the surface of bearings to reduce the number of supply holes so that manufacturing costs can be reduced. The semi-implicit method is applied to calculate the time varying pressure profile on the air bearing surface owing to the advantages of numerical stability and fast time tracing characteristics. The static pressure of the groove bearings is much higher than that without grooves, so the groove bearings can provide high load carrying capacity. The equation of motion considering vertical motion and tilting motion are also solved using the Runge-Kutta 4th order method. By combining the semi-implicit method and the Runge-Kutta method, fast calculations of the dynamic behavior of the air bearing can be achieved. The variations of bearing reaction force, air film reaction moment, height, and tilting angle are investigated for the step force input, which is 20% higher than the bearing reaction, when the nominal clearance is 6 mm. The effect of the groove width and the groove depth are investigated by calculating the dynamic behavior. The possibility of the air hammering with the depth of the groove is found and discussed.