• Title/Summary/Keyword: PZT capacitor

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Microstructural and piezoelectric properties of low temperature sintering PMN-PZT ceramics for multilayer piezoelectric transformer with the variations of sintering times (적층 압전변압기용 저온소결 PMN-PZT 압전세라믹의 소성시간에 따른 미세구조 및 압전특성)

  • Lee, Chang-Bae;Yoo, Ju-Hyun;Lee, Sang-Ho;Paik, Dong-Soo;Jeong, Yeong-Ho;Yoon, Hyun-Sang;Im, In-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.425-430
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    • 2004
  • In this paper, in order to develop the low temperature sintering ceramics for multilayer piezoelectric transformer, PMN-PZT ceramics were manufactured with the variations of sintering times, and their microstructural, piezoelectric and dielectric properties were investigated. To manufacture multilayer piezoelectric transformer, the low temperature sintering composition is need, hence, $Li_2CO_3$ and $Bi_2O_3$ were used as sintering aids and the specimens were sintered during 30, 60, 90, 120, 150 and 180 minutes, respectively. At the specimen sintered during 90 minute, mechanical quality factor(Qm), electromechanical coupling factor(kp) and dielectric constant were showed the optimum values of 2356, 0.504 and 1266, respectively. All the specimens showed tetragonality phase, and pyrochlore phase was not shown.

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A Study on the Dielectric Properties of PZT Ceramics with 2 and 6 Valent Additives (2가 및 6가의 첨가제에 따른 PZT 자기의 유전적 성질에 관한 연구)

  • 안영필;이기옥
    • Journal of the Korean Ceramic Society
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    • v.20 no.1
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    • pp.19-24
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    • 1983
  • Dielectrics used as capacitor was studied in the system of $Pb(MgW)_{0.5} O_3-PbTiO_3-PbZrO_3$ Curie tempera-tures of $PbTiO_3 PbZrO_3$ and $Pb[MgW]_{0.5} O_3$ were 49$0^{\circ}C$ 23$0^{\circ}C$ and 39$0^{\circ}C$ respectively. When these materials formed solid solution the more amount of $Pb(MgW)_{0.5}O_3$ was increased the more Curie temperature lowered and dielectric constant increased. Higher dielectric constants were measured in the solid solution of which X-Ray diffraction patterns were changed. Especially Curie temperature and dielectric constant were 85$^{\circ}C$ and 4159 respectively in the composition of 60 $Pb(MgW)_{0.5}O_3-30 PbTiO_3-10PbZrO_3$. Also in this composition ferroeletric material with thermal stability was obtained.

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Study on behavior of multilayer ceramic capacitor caused by piezoelectricity (압전효과에 의한 적층 세라믹 콘덴서의 거동 분석)

  • Park, No-Cheol;Ko, Byung-Han;Park, Young-Pil;Ahn, Younggyu
    • Transactions of the Society of Information Storage Systems
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    • v.10 no.2
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    • pp.61-64
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    • 2014
  • Vibration and acoustic noise arise from the Multilayer Ceramic Capacitor (MLCC) because of the piezoelectric effect of dielectric substance which consists of $BaTiO_3$. However, the phenomenon is not analyzed clearly because the MLCC shows different behavior compare with ordinary piezoelectric substance like PZT. Thus, MLCC was tested under the several DC bias conditions and heat treatment effect was also tested and analyzed in this paper. From the test, MLCC shows not only piezoelectric effect but also another physical phenomenon like electrostriction. Also, it was verified that DC bias affect to the piezoelectric constant of MLCC.

Fabrication and Electrical Properties of Piezoelectric Inverter Module using Piezoelectric Transformer (압전변압기를 이용한 압전인버터 모듈 제작 및 전기적 특성)

  • Yoon, Jung-Rag;Lee, Chang-Bae;Woo, Byong-Chul
    • Journal of the Microelectronics and Packaging Society
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    • v.16 no.1
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    • pp.39-43
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    • 2009
  • In order to develop piezoelectric inverter module for CCFL driving, Rosen-type multilayer piezoelectric transformer was fabricated. The output power and efficiency of mutilayer piezoelectric transformer according to the variation inner electrode layer were investigated. Mutilayer piezoelectric transformer was fabricated conventional mutilayer ceramic method using PZT base ceramics. Also, piezoelectric inverter module was adopted driving circuit with half-bridge type. The piezoelectric inverter module was set up with input voltage 12.5 V, switching frequency 104.3 KHz. The results showed the value of step-up ratio 100, efficiency 87% at load resistance of $100k{\Omega}$.

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PZT thin capacitor characteristics of the using Pt-Ir($Pt_{80}Ir_{20}$)-alloy (Pt-Ir($Pt_{80}Ir_{20}$)-alloy를 이용한 PZT 박막 캐패시터 특성)

  • Jang, Yong-Un;Chang, Jin-Min;Lee, Hyung-Seok;Lee, Sang-Hyun;Moon, Byung-Moo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.47-52
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    • 2002
  • A processing method is developed for preparing sol-gel derived $Pb(Zr_{1-x}Ti_x)O_3$ (x=0.5) thin films on Pt-Ir($Pt_{80}Ir_{20}$)-alloy substrates. The as-deposited layer was dried on a plate in air at $70^{\circ}C$. And then it was baked at $1500^{\circ}C$, annealed at $450^{\circ}C$ and finally annealed for crystallization at various temperatures ranging from $580^{\circ}C$ to $700^{\circ}C$ for 1hour in a tube furnace. The thickness of the annealed film with three layers was $0.3{\mu}m$. Crystalline properties and surface morphology were examined using X-ray diffractometer (XRD). Electrical properties of the films such as dielectric constant, C-V, leakage current density were measured under different annealing temperature. The PZT thin film which was crystallized at $600^{\circ}C$ for 60minutes showed the best structural and electrical dielectric constant is 577. C-V measurement show that $700^{\circ}C$ sample has window memory volt of 2.5V and good capacitance for bias volts. Leakage current density of every sample show $10^{-8}A/cm^2$ r below and breakdown voltage(Vb) is that 25volts.

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Evaluation of $SrRuO_3$ Buffer Layer for $Pb(Zr,Ti)O_3$ Ferroelectric Capacitor ($Pb(Zr,Ti)O_3$ 강유전체 커패시터에 적용하기 위한 $SrRuO_3$ 버퍼 층의 특성 평가)

  • Kweon, Soon-Yong;Choi, Ji-Hye;Son, Young-Jin;Hong, Suk-Kyoung;Ryu, Sung-Lim
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.280-280
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    • 2007
  • $Pb(Zr,Ti)O_3$ (PZT) 강유전체 박막은 높은 잔류 분극 (remanent polarization) 특성 때문에 현재 강유전체 메모리 (FeRAM) 소자에 적용하기 위하여 가장 활발히 연구되고 있다. 그런데 PZT 물질은 피로 (fatigue) 및 임프린트 (imprint) 등의 장시간 신뢰성 (long-term reliability) 특성이 취약한 단점을 가지고 있다. 이러한 신뢰성 문제를 해결할 수 있는 효과적인 방법 중의 하나는 $IrO_2$, $SrRuO_3$(SRO) 등의 산화물 전극을 사용하는 것이다. 많은 산화물 전극 중에서 SRO는 PZT와 비슷한 pseudo-perovskite 결정구조를 갖고 격자 상수도 비슷하여, PZT 커패시터의 강유전 특성 및 신뢰성을 향상시키는데 매우 효과적인 것으로 알려져 있다. 따라서 본 연구는 PZT 커패시터에 적용하기 위하여 SRO 박막을 증착하고 이의 전기적 특성 및 미세구조를 분석하고자 하였다. 또 실제로 SRO 박막을 상부전극과 PZT 사이의 버퍼 층 (buffer layer)으로 적용한 경우의 커패시터 특성도 평가하였다. 먼저 다결정 SRO 박막을 $SiO_2$/Si 기판 위에 DC 마그네트론 스퍼터링 법 (DC magnetron sputtering method)으로 증착하였다. 그 다음 이러한 SRO 박막의 미세구조, 결정성 및 전기적 특성이 증착 조건들의 변화에 따라서 어떤 경향성을 보이는지를 평가하였다. 기판 온도는 $350\;{\sim}\;650^{\circ}C$ 범위에서 변화시켰고, 증착 파워는 500 ~ 800 W 범위에서 변화시켰다. 또 Ar+$O_2$ 혼합 가스에서 산소의 혼합 비율을 20 ~ 50% 범위에서 변화시켰다. 이러한 실험 결과 SRO 박막의 전기적 특성 및 미세 구조는 기판의 증착 온도에 따라서 가장 민감하게 변함을 관찰할 수 있었다. 다른 증착 조건과 무관하게 $450^{\circ}C$ 이상의 온도에서 증착된 SRO 박막은 모두 주상정 구조 (columnar structure)를 형성하며 (110) 방향성을 강하게 나타내었다. 가장 낮은 전기 저항은 $550^{\circ}C$ 증착 온도에서 얻을 수 있었는데, 그 값은 약 $440\;{\mu}{\Omega}{\cdot}cm$ 이었다. SRO 버퍼 충을 적용하여 제작한 PZT 커패시터의 잔류 분극 (Pr) 값은 약 $30\;{\mu}C/cm^2$ 정도로 매우 높은 값을 나타내었고, 피로 손실 (fatigue loss)도 $1{\times}10^{11}$ 스위칭 사이클 후에 약 11% 정도로 매우 양호한 값을 나타내었다.

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Direct Imaging of Polarization-induced Charge Distribution and Domain Switching using TEM

  • O, Sang-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.99-99
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    • 2013
  • In this talk, I will present two research works in progress, which are: i) mapping of piezoelectric polarization and associated charge density distribution in the heteroepitaxial InGaN/GaN multi-quantum well (MQW) structure of a light emitting diode (LED) by using inline electron holography and ii) in-situ observation of the polarization switching process of an ferroelectric Pb(Zr1-x,Tix)O3 (PZT) thin film capacitor under an applied electric field in transmission electron microscope (TEM). In the first part, I will show that strain as well as total charge density distributions can be mapped quantitatively across all the functional layers constituting a LED, including n-type GaN, InGaN/GaN MQWs, and p-type GaN with sub-nm spatial resolution (~0.8 nm) by using inline electron holography. The experimentally obtained strain maps were verified by comparison with finite element method simulations and confirmed that not only InGaN QWs (2.5 nm in thickness) but also GaN QBs (10 nm in thickness) in the MQW structure are strained complementary to accommodate the lattice misfit strain. Because of this complementary strain of GaN QBs, the strain gradient and also (piezoelectric) polarization gradient across the MQW changes more steeply than expected, resulting in more polarization charge density at the MQW interfaces than the typically expected value from the spontaneous polarization mismatch alone. By quantitative and comparative analysis of the total charge density map with the polarization charge map, we can clarify what extent of the polarization charges are compensated by the electrons supplied from the n-doped GaN QBs. Comparison with the simulated energy band diagrams with various screening parameters show that only 60% of the net polarization charges are compensated by the electrons from the GaN QBs, which results in the internal field of ~2.0 MV cm-1 across each pair of GaN/InGaN of the MQW structure. In the second part of my talk, I will present in-situ observations of the polarization switching process of a planar Ni/PZT/SrRuO3 capacitor using TEM. We observed the preferential, but asymmetric, nucleation and forward growth of switched c-domains at the PZT/electrode interfaces arising from the built-in electric field beneath each interface. The subsequent sideways growth was inhibited by the depolarization field due to the imperfect charge compensation at the counter electrode and preexisting a-domain walls, leading to asymmetric switching. It was found that the preexisting a-domains split into fine a- and c-domains constituting a $90^{\circ}$ stripe domain pattern during the $180^{\circ}$ polarization switching process, revealing that these domains also actively participated in the out-of-plane polarization switching. The real-time observations uncovered the origin of the switching asymmetry and further clarified the importance of charged domain walls and the interfaces with electrodes in the ferroelectric switching processes.

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Structural and Dielectric Properties of Pb[(Zr,Sn)Ti]NbO3 Thin Films Deposited by Radio Frequency Magnetron Sputtering

  • Choi, Woo-Chang
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.4
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    • pp.182-185
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    • 2010
  • $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3$ (PNZST) thin films were deposited by radio frequency magnetron sputtering on a $(La_{0.5}Sr_{0.5})CoO_3$ (LSCO)/Pt/Ti/$SiO_2$/Si substrate using a PNZST target with an excess PbO of 10 mole%. The thin films deposited at the substrate temperature of $500^{\circ}C$ crystallized to a perovskite phase after rapid thermal annealing (RTA). The thin films, which annealed at $650^{\circ}C$ for 10 seconds in air, exhibited good crystal structures and ferroelectric properties. The remanent polarization and coercive field of the fabricated PNZST capacitor were approximately $20uC/cm^2$ and 50 kV/cm, respectively. The reduction of the polarization after $2.2\;{\times}\;10^9$ switching cycles was less than 10%.

Cryogenic Behavior of Perovskite Materials

  • Paik, D.S.;Shin, H.Y.;Yoon, S.J.;Kim, H.J.;Park, C.Y.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.126-129
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    • 1999
  • Dielectric and piezoelectric properties of perovskite materials such as La modified $Pb(Zr,Ti)O_3$ ceramics and $Pb(Zn_{1/3}Nb_{2/3})O_3-PbTiO_3$ single crystals were investigated for cryogenic capacitor and actuator applications. Enhanced extrinsic contributions resulted in piezoelectric coefficient (d33) as high as 250 pC/N at 30 K, superior to that of PZT ($d_{33}$ ~ 100 pC/N). This cryogenic property enhancement was associated with retuning the MPB (or cryogenic temperatures. PZN-PT single crystals exhibited dramatic property improvements such as $d_{33}$ > 500 pC/N at 30 K as a result of an engineered domain state.

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