• Title/Summary/Keyword: PZT Film

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Structural and Electrical Properties of PZT(10/90)/PZT(90/10) Heterolayered Thin Films (PZT(10/90)/PZT(90/10) 이종층 박막의 구조적, 전기적 특성)

  • Lee, Seong-Gap;Kim, Gyeong-Tae;Bae, Seon-Gi;Lee, Yeong-Hui
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.2
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    • pp.98-102
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    • 2000
  • Ferroelectric PZT heterolayered thin films were fabricated by spin coating method on the Pt/Ti/SiO2/Si substrate using PZT(10/90) and PZT(90/10) m7etal alkoxide solutions. All PZT heterolayered films showed a homogeneous grain structures without presence of rosette structure. It can be assumed that the lower PZT layers played a role of nucleation site for the formation of the upper PZT layer. Pb-deficient PZT phase was formed at PZT/Pt interface due to the diffusion of Pb element into a Pt bottom electrode. The relative dielectric constant and the dielectric loss of the PZT-6 film were 567 and 3.6%, respectively. Increasing the number of coatings, remanent polarization and coercive field were decreased and the values of the PZT-6 heterolayered film were $7.18\muC/cm^2$ and 68.5kV/cm, respectively. Leakage current densities were increased with increasing the number of coatings, and the value of the PZT-4 film was about $7\times10-8A/cm^2$ at 0.05MV/cm.

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Ferroelectric properties of Sm-doped PZT thin films (Sm 첨가에 따른 PZT 박막의 유전 특성)

  • Son, Young-Hoon;Kim, Kyoung-Tae;Kim, Chang-Il;Lee, Byoung-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.190-193
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    • 2003
  • Sm-doped lead zirconate titanate($Pb_{1.1}(Zr_{0.6}Ti_{0.4})O_3$; PZT) thin films on the Pt(111)/Ti/$SiO_2$/Si(100) substrates prepared by a sol-gel method. The effect on structural and electrical properties of PZT thin films measured according to the Sm content. Sm-doping altered significantly dielectric and ferroelectric properties. The remanent polarization and the coercive field decreased with the increasing Sm content. The dielectric constant and the dielectric loss of PZT thin films decreased with the increasing Sm content. At 100 kHz, the dielectric constant and the dielectric loss of. the 0.3 mol% of Sm-doped PZT thin film were 1200 and 0.12 respectively. The remanent polarization (2Pr) of the 0.3 mol% of Sm-doped PZT thin film was $52.13{\mu}C/cm^2$ and the coercive field was 94.01 kV/cm. The 0.3 mol% of Sm-doped PZT thin film showed an improved fatigue characteristic comparing to the undoped PZT thin film.

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Development of Stretchable PZT/PDMS Nanocomposite Film with CNT Electrode

  • Yun, Ji Sun;Jeong, Young Hun;Nam, Joong-Hee;Cho, Jeong-Ho;Paik, Jong-Hoo
    • Journal of Sensor Science and Technology
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    • v.22 no.6
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    • pp.400-403
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    • 2013
  • The piezoelectric composite film of ferroelectric PZT ceramic ($PbZr_xTi_{1-x}O_3$) and polymer (PDMS, Polydimethylsiloxane) was prepared to improve the flexibility of piezoelectric material. The bar coating method was applied to fabricate flexible nanocomposite film with large surface area by low cost process. In the case of using metal electrode on the composite film, although there is no problem by bending process, the electrode is usually broken away from the film by stretching process. However, the well-attached, flexible CNT electrode on PZT/PDMS film improved flexibility, especially stretchability. PZT particles was usually settled down into polymer matrix due to gravity of the weighty particle, so to improve the dispersion of PZT powder in polymer matrix, small amount of additives (CNT powder, Carbon nanotube powder) was physically mixed with the matrix. By stretching the film, an output voltage of PZT(70 wt%)/PDMS with CNT (0.5 wt%) was measured.

Electronic properties of PZT(20/80) thick film and PZT(80/20) thin film multilayer with variation of sintering temperature (다층 PZT(20/80)후막과 PZT(80/20)박막의 소결온도에 따른 전기적 특성)

  • Noh, Hyun-Ji;Lee, Sung-Gap;Park, Sang-Man;Bae, Seon-Gi
    • Proceedings of the KIEE Conference
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    • 2006.07d
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    • pp.2209-2210
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    • 2006
  • In this paper, PZT(20/80) thick films were fabricated by the screen-printing method. And the PZT(80/20) coating solution was synthesized by the sol-gel method. PZT(20/80) thick films were screen-printed on the alumina substrates. PZT(80/20) thin film was spin-coaled on the PZT(20/80) thick films to obtain densification. And the structural and electrical properties of PZT thick films were investigated with variation of sintering temperature. The PZT specimen sintered at $650^{\circ}C$ showed good relative dielectric constant of 219 and dielectric loss of 2.45%. Also the remanent polarization and the coercive field wore 16.48 ${\mu}C/cm^2$ and 35.48kV/cm, respectively.

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Electronic properties of PZT(20/80) thick film and PZT(80/20) thin film multilayer with variation of sintering temperature (다층 PZT(20/80)후막과 PZT(80/20)박막의 소결온도에 따른 전기적 특성)

  • Noh, Hyun-Ji;Lee, Sung-gap;Park, Sang-Man;Bae, Seon-Gi
    • Proceedings of the KIEE Conference
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    • 2006.07a
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    • pp.577-578
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    • 2006
  • In this paper, PZT(20/80) thick films were fabricated by the screen-printing method. And the PZT(80/20) coating solution was synthesized by the sol-gel method. PZT(20/80) thick films were screen-printed on the alumina substrates. PZT(80/20) thin film was spin-coated on the PZT(20/80) thick films to obtain densification. And the structural and electrical properties of PZT thick films were investigated with variation of sintering temperature. The PZT specimen sintered at 650f showed good relative dielectric constant of 219 and dielectric loss of 2.45%. Also the remanent polarization and the coercive field were 16.48${\mu}C/cm^2$ and 35.48kV/cm, respectively.

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Electronic properties of PZT(20/80) thick film and PZT(80/20) thin film multilayer with variation of sintering temperature (다층 PZT(20/80) 후막과 PZT(80/20) 박막의 소결온도에 따른 전기적 특성)

  • Noh, Hyun-Ji;Lee, Sung-Gap;Park, Sang-Man;Bae, Seon-Gi
    • Proceedings of the KIEE Conference
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    • 2006.07b
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    • pp.1243-1244
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    • 2006
  • In this paper, PZT(20/80) thick films were fabricated by the screen-printing method. And the PZT(80/20) coating solution was synthesized by the sol-gel method. PZT(20/80) thick films were screen-printed on the alumina substrates. PZT(80/20) thin film was spin-coated on the PZT(20/80) thick films to obtain densification. And the structural and electrical properties of PZT thick films were investigated with variation of sintering temperature. The PZT specimen sintered at $650^{\circ}C$ showed good relative dielectric constant of 219 and dielectric loss of 2.45%. Also the remanent polarization and the coercive field were $16.48{\mu}C/cm^2$ and 35.48kV/cm, respectively.

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Electronic properties of PZT(20/80) thick film and PZT(80/20) thin film multilayer with variation of sintering temperature (다층 PZT(20/80)후막과 PZT(80/20)박막의 소결온도에 따른 전기적 특성)

  • Noh, Hyun-Ji;Lee, Sung-Gap;Park, Sang-Man;Bae, Seon-Gi
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1703-1704
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    • 2006
  • In this paper, PZT(20/80) thick films were fabricated by the screen-printing method. And the PZT(80/20) coating solution was synthesized by the sol-gel method. PZT(20/80) thick films were screen-printed on the alumina substrates. PZT(80/20) thin film was spin-coated on the PZT(20/80) thick films to obtain densification. And the structural and electrical properties of PZT thick films were investigated with variation of sintering temperature. The PZT specimen sintered at $650^{\circ}C$ showed good relative dielectric constant of 219 and dielectric loss of 2.45%. Also the remanent polarization and the coercive field were $16.48{\mu}C/cm^2$ and 35.48kV/cm, respectively.

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Fabrication of Piezoelectric PZT Thick Film by Sol-gel Process (Sol-Gel 법에 의한 압전 PZT 후막의 제조)

  • Park, Jong-whan;Bang, Kook-soo;Park, Chan
    • Journal of Ocean Engineering and Technology
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    • v.29 no.1
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    • pp.94-99
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    • 2015
  • Lead zirconate titanate (PZT) thick films with thicknesses of ㎛ were fabricated on silicon substrates using an aerosol deposition method. A PZT powder solution was prepared using a sol-gel process. The average diameters (d50) obtained were 1.67, 1.98, and 2.40μm when the pyrolysis temperatures were 300℃, 350℃, and 450℃ respectively. The as-deposited film had a uniform microstructure without any cracks or pores. The as-deposited films on silicon were annealed at a temperature of 700℃. The 20-㎛-thick PZT film showed good adherence between the PZT film and substrate, with no tearing observed in the conventional solid phase process. This was probably because the presence of pores produced from organic residue during annealing relieved the residual stresses in the deposited film.

Deposition of Piezoelectric PZT(53/47) Film by Metalorganic Decomposition for Micro electro mechanical Device (Microelectromechnical system 소자 제작을 위한 유기금속분해법에 의한 압전성 PZT(53/47)박막의 증착)

  • 윤영수;정형진;신영화
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.6
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    • pp.458-464
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    • 1998
  • This paper gives characterization of substrate and PZT(53/47) thin film deposited by metalorganic decomposition, which is concerned in deposition process and device fabrication process, to fabricate micro electro mechanical system (MEMS) device with piezoelectric material. The PZT thin films deposited by MOD at 700^{\circ}C$ for 30 minutes had a polycrystallinity, that is, no substrate dependence, while different interface were developed depending on the bottom electrodes. Such a structural variation could influence on not only the properties of the PZT film but also etching process for fabricating MEMS devices. Therefore the electrode structure is a very important factor in the deposition of the PZT film during etching process by HF acid for MEMS device with piezoelectric material. Piezoelectric coefficients of the PZT films on the different substrates were 40 and 80 pm/V at an applied voltage of 4V. Based in these results, it was possible for deposition of the PZT film by MOD to apply MEMS device fabrication process based on piezoelectricity after selection of proper bottom electrode.

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Ferroelectric properties of sol-gel derived Tb-doped PZT thin films (Sol-gel법으로 제조된 Tb-doped PZT(60/40) 박막의 강유전 특성)

  • Son, Young-Hoon;Kim, Kyoung-Tae;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.51-54
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    • 2003
  • Tb-doped lead zirconate titanate($Pb_{1.1}(Zr_{0.6}Ti_{0.4})O_3$; PZT) thin films on $Pt(111)/Ti/SiO_2/Si(100)$ substrates prepared by a sol-gel method. Films have a Zr/Ti ratio of 60:40 and perovskite phase structure. The effect on the structural and electrical properties of films measured according to Tb content. Dielectric and ferroelectric properties of PZT thin films were altered significantly by Tb-doping. The PZT thin film with higher dielectric constant and improved leakage current characteristic was obtained by adding 0.3 mol% Tb. At 100 kHz, the dielectric constant and the dielectric loss of the 0.3 mol% Tb-doped PZT thin film were 1611 and 0.24, respectively The remanent polarization(2Pr) of the 0.3 mol% Tb-doped PZT thin film was $61.4\;{\mu}C/cm^2$ and the coercive field was 61.9 kV/cm. Tb-doped PZT thin films showed improved fatigue characteristics comparing to the undoped PZT thin film.

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