• 제목/요약/키워드: PVD(Physical Vapor Deposition)

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Ti Prepared by ionized physical vapor deposition (I-PVD) and TiN prepared by metal-organic chemical vapor deposition(MOCVD) as underlayers of aluminum TiN (Al 박막의 underlayer로서의 Ionized Physical Vapor Deposition (I-PVD) Ti 또는 I-PVD Ti/Metal-Organic Chemical Vapor Deposition TiN)

  • 이원준;나사균
    • Journal of the Korean Vacuum Society
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    • 제9권4호
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    • pp.394-399
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    • 2000
  • The effects of the type and thickness of underlayer on the crystallographic texture and the sheet resistance of aluminum thin film were studied. Ti and Ti/TiN were examined as the underlayer of aluminum. Ti and TiN were prepared by ionized physical vapor deposition (I-PVD) metalorganic chemical vapor deposition (MOCVD), respectively. The texture and the sheet resistance of metal thin film stacks were investigated at various thicknesses of Ti or TiN, and the sheet resistance was measured after annealing at $400^{\circ}C$ in an nitrogen ambient. For I-PVD Ti underlayer, the excellent texture of aluminum <111> was obtained even at top of 5 nm of Ti. However, the sheet resistance of the metal stack was greatly increased after annealing due to the interdiffusion and reaction of Al and Ti. MOCVD TiN between Ti and Al could suppress the Al-Ti reaction without severe degradation of aluminum <111> texture. Excellent texture of aluminum was obtained for the MOCVD TiN thinner than 4 nm.

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High Speed Zinc Coating by EML-PVD Process (EML-PVD를 이용한 고속 Zn 코팅)

  • Jeong, U-Seong;Nam, Gyeong-Hun;Eom, Mun-Jong;Kim, Tae-Yeop
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 2012년도 춘계학술발표회 논문집
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    • pp.277-277
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    • 2012
  • New concept of coating process, which is called Electro Magnetic Levitation-Physical Vapour deposition (EML-PVD) was developed and investigated. Zinc coating was performed and succeeded for the first time on the steel strip (Cold-rolled Steel) in a continuos pilot line using the EML-PVD process which is specialized in the high deposition rate and high vapor yield. EML-PVD will be expected to be the next generation coating technology to be applied to the steel industry.

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Characterization and Application of DLC Films Produced by New Combined PVD-CVD Technique

  • Chekan, N.M.;Kim, S.W.;Akula, I.P.;Jhee, T.G.
    • Journal of the Korean Society for Heat Treatment
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    • 제23권2호
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    • pp.75-82
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    • 2010
  • A new advanced combined PVD/CVD technique of DLC film deposition has been developed. Deposition of a DLC film was carried out using a pulsed carbon arc discharge in vapor hydrocarbon atmosphere. The arc plasma enhancing CVD process promotes dramatic increase in the deposition rate and decrease of compressive stress as well as improvement of film thickness uniformity compared to that obtained with a single PVD pulsed arc process. The optical spectroscopy investigation reveals great increase in radiating components of $C_2$ Swan system molecular bands due to acetylene molecules decomposition. AFM, Raman spectroscopy, XPS and nano-indentation were used to characterize DLC films. The method ensures obtaining a new superhard DLC nano-material for deposition of protective coatings onto various industrial products including those used in medicine.

Trend and Prospect of Thin Film Processing Technology (박막제조 기술의 동향과 전망)

  • Jeong, Jae-In;Yang, Ji-Hooon
    • Journal of the Korean Magnetics Society
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    • 제21권5호
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    • pp.185-192
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    • 2011
  • The technique of producing thin film plays a crucial role in modern science and technology as well as in industrial purposes. Numerous efforts have been made to get high quality thin film through surface treatment of materials. PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two of the most popular deposition techniques used in both scientific study and industrial use. It is well known that the film deposited by PVD and CVD commonly possesses a columnar microstructure which affects many film properties. In recent years, various types of deposition sources which feature high material uses and excellent film properties have been developed. Electromagnetic levitation source appeared as an alternative deposition source to realize high deposition rate for industrial use. Complex film structures such as nano multilayer and multi-components have been prepared to achieve better film properties. Glancing angle deposition (GLAD) has also been developed as a technique to engineer the columnar structure of thin films on the micro- and nanoscale. In this paper, the trends and major issues of thin film technology based on PVD and CVD have been discussed together with the prospect of thin film technology.

High Temperature Tribology Behavior of 4YSZ Coatings Fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) (플라즈마 용사 및 전자빔 물리기상 증착법으로 제조된 4YSZ 코팅의 고온마찰마모 거동)

  • Yang, Young-Hwan;Park, Chan-Young;Lee, Won-Jun;Kim, Sun-Joo;Lee, Sung-Min;Kim, Seongwon;Kim, Hyung-Tae;Oh, Yoon-Suk
    • Journal of the Korean institute of surface engineering
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    • 제46권6호
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    • pp.258-263
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    • 2013
  • 4 mol% Yttria-stabilized zirconia (4YSZ) coatings are fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) with top coating of thermal barrier coating (TBC). NiCrAlY based bond coat is prepared as 150 ${\mu}m$ thickness by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. Each 4YSZ top coating shows different tribological behaviors based on the inherent layer structures. 4YSZ by APS which has splat-stacked structure shows lower friction coefficient but higher wear rate than 4YSZ by EB-PVD which has columnar structure. For 4YSZ by APS, such results are expected due to the sliding wear accompanied with local delamination of splats.

Ceramic Coating by Electron Beam PVD for Nanos-Tructure Control (나노구조 제어를 위한 EB-PVD법에 의반 세라믹스 코팅)

  • Matsbara, Hideaki
    • Ceramist
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    • 제9권6호
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    • pp.24-29
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    • 2006
  • Electron beam physical vapor deposition (EB-PVD) process has currently been applied to thermal barrier coatings (TBCs) for aircraft engines. Due to unique columnar structure, EB-PVD TBCs have advantages in resistances to thermal shock and thermal cycle for their applications, compared to films prepared by plasma spray By the EB-PVD equipment, we successfully obtained yttria-stabilized zirconia (YSZ) layer which has columnar and feather like structure including a large amount of nano size pores and gaps. The EB-PVD technique has been developed for coating functional perovskite type oxides such as (La, Sr)MnO3. Electrode properties have been improved by interface and structural control.

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Simultaneous Co-deposition of Zn-Mg Alloy Layers on Steel Strip by PVD Process

  • Kim, Tae-Yeob;Goodenough, Mark
    • Corrosion Science and Technology
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    • 제10권6호
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    • pp.194-198
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    • 2011
  • This is the first release of an interim report on the development of coating technology of Zn-Mg alloy layers on steel strip by EML-PVD (electromagnetic levitation - physical vapor deposition) process in an air-to-air type continuous PVD pilot plant. It intends to introduce a basic principle of the EML-PVD process together with the high speed PVD pilot plant built in Posco. Due to the agitation effect provided by the high frequency induction coil, simultaneous evaporation of Zn and Mg from a droplet could produce alloy coating layers with Mg content of 6% to 12% depending on the composition of the droplet inside the coil. For its superior corrosion resistance, Zn-Mg alloy coated steel would be a very promising material for automotive, electrical appliances, and construction applications.

Integration of Chemical Vapor Deposition and Physical Vapor Deposition for the Al Interconnect (Al 배선 형성을 위한 화학증착법과 물리증착법의 조합 공정에 관한 연구)

  • 이원준;김운중;나사균;이연승
    • Proceedings of the Materials Research Society of Korea Conference
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.101-101
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    • 2003
  • Al 박막의 화학증착(CVD)과 Al-Cu 합금박막의 물리증착(PVD)을 조합하는 CVD-PVD Al 공정은 수평방향의 배선과 수직방향의 via를 동시에 형성할 수 있으므로 공정단순화 및 생산원가절감 측면에서 장점이 있어서 DRAM 둥의 반도체 소자의 배선공정으로 매우 유망하다[1]. 본 연구에서는 CVD-PVD Al 공정을 이용하여 초고집적소자의 Al via와 Al 배선을 동시에 형성할 때 층간절연막의 영향을 조사하고 그 원인을 규명하였다. Al CVD를 위한 원료기체로는 dimethylaluminum hydride [($CH_3$)$_2$AlH]를 사용하였고 PVD는 38$0^{\circ}C$에서 실시하였다 층간절연막에 따른 CVD-PVD Al의 via hole 매립특성을 조사한 결과, high-density plasma(HDP) CVD oxide의 경우에는 via hole 매립특성이 우수하였으나, hydrogen silscsquioxane (HSQ)의 경우에는 매립특성이 우수하지 않아서 via 저항이 불균일 하였다. 이는 via 식각 후 wet cleaning 과정에서 HSQ에 흡수된 수분이 lamp를 이용한 degassing 공정에 의해서 완전히 제거되지 않아 CVD-PVD 공정 중에 탈착되어 Al reflow에 나쁜 영향을 미치기 때문으로 판단된다. CVD-PVD 공정 전에 40$0^{\circ}C$, $N_2$ 분위기에서 baking하여 HSQ 내의 수분을 충분히 제거함으로써 via 매립특성을 향상시킬 수 있었다. CVD-PVD Al 공정은 aspect ratio 10:1 이상의 via hole도 완벽하게 매립할 수 있었고 이에의해 제조된 Al 배선은 기존의 W plug 공정에 의해 제조된 배선에 비해 낮은 via 저항을 나타내었다.

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Electrical Properties of YSZ Electrolyte Film Prepared by Electron Beam PVD (EB-PVD법에 의해 제조된 YSZ 전해질의 전기적 특성)

  • Shin, Tae-Ho;Yu, Ji-Haeng;Lee, Shiwoo;Han, In-Sub;Woo, Sang-Kuk;Hyun, Sang-Hoon
    • Journal of the Korean Ceramic Society
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    • 제42권2호
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    • pp.117-122
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    • 2005
  • Electron Beam Physical Vapor Deposition (EB-PVD) is a typical technology for thermal barrier coating with Yttria Stabilized Zirconia (YSZ) on aero gas turbine engine. In this study EB-PVD method was used to fabricate dense YSZ film on NiO-YSZ as a electrolyte of Solid Oxide Fuel Cell (SOFC). Dense YSZ films of -10 $\mu$m thickness showed nano surface structure depending on deposition temperature. Electrical conductivities of YSZ film and electric power density of the single cell were evaluated after screen- printing $LaSrCoO_3$ as a cathode.

Tendency of PVD coating technology on Metal cutting tools (금속 절삭공구에 대한 PVD 코팅기술의 동향)

  • Kim, Jong-Seong
    • Journal of the Korean Society for Precision Engineering
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    • 제18권8호
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    • pp.11-17
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    • 2001
  • Industrial use of physical vapor deposition(PVD) has been widely expanded during last two decades, and in the mean time plasma assistance in PVD has become an essential tool in preparing compound films with dense microstructure. The principles of electron beam-based plating, balanced and unbalanced magnetron sputtering and cathodic arc deposition. consisting three basic configuration of plasma assisted PVD(PAPVD)process, were reviewed. Recent technical development in PVD coating process were discussed. This paper tries to show tendency for developing new coating film on cutting tools.

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