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http://dx.doi.org/10.4283/JKMS.2011.21.5.185

Trend and Prospect of Thin Film Processing Technology  

Jeong, Jae-In (Hybrid Materials Research Department, Research Institute of Industrial Science and Technology)
Yang, Ji-Hooon (Hybrid Materials Research Department, Research Institute of Industrial Science and Technology)
Publication Information
Journal of the Korean Magnetics Society / v.21, no.5, 2011 , pp. 185-192 More about this Journal
Abstract
The technique of producing thin film plays a crucial role in modern science and technology as well as in industrial purposes. Numerous efforts have been made to get high quality thin film through surface treatment of materials. PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two of the most popular deposition techniques used in both scientific study and industrial use. It is well known that the film deposited by PVD and CVD commonly possesses a columnar microstructure which affects many film properties. In recent years, various types of deposition sources which feature high material uses and excellent film properties have been developed. Electromagnetic levitation source appeared as an alternative deposition source to realize high deposition rate for industrial use. Complex film structures such as nano multilayer and multi-components have been prepared to achieve better film properties. Glancing angle deposition (GLAD) has also been developed as a technique to engineer the columnar structure of thin films on the micro- and nanoscale. In this paper, the trends and major issues of thin film technology based on PVD and CVD have been discussed together with the prospect of thin film technology.
Keywords
thin film; physical vapor deposition; chemical vapor deposition; nature mimicking; glancing angle deposition; electromagnetic levitation source;
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