• Journal of Korean Society of Water and Wastewater
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• v.20 no.1
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• pp.94-103
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• 2006

The pollution in closing water can be caused by not only artificial factor like sewage but also natural factor like elution from sediment. In this study we analyzed Sediment Oxygen Demand (SOD) for verification of sediment purification effect and sediment elution experiment as well as general items like COD, TN, TP, SS to complement and assess the effect of sediment and water quality. The experiment result showed that the release rate of OSD system were 4 times and 3 times as large as control for P and Fe respectively. SOD for operated OSD system and control were $12.18gO_2{\cdot}m^{-2}{\cdot}d^{-1}$ and $47.95gO_2{\cdot}m^{-2}{\cdot}d^{-1}$. From water qualities analyzed by COD, TN, TP, SS, chlorophyll-a, the removal efficiency increase of TN, TP, chlorophyll-a and COD were about 10~20%, 40~50% and 10% respectively. In conclusion, OSD can contribute to improvement of both the waterbody and the sediment environment effectively.

• Environmental Engineering Research
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• v.23 no.1
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• pp.1-9
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• 2018

The degradation of methylene blue (MB) in an aqueous solution by nano-metallic particles (NMPs) was studied to evaluate the possibility of applying NMPs to remove MB from the wastewater. Scanning electron microscopy (SEM), Fourier-transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to characterize the synthesized NMPs before and after the reaction. The effects of the NMP dosage, the initial pH, the initial concentration of MB and the amount of $H_2O_2$ on the MB degradation outcomes were studied. The highest removal rate of MB was achieved to be 100% with an initial MB concentration of 5 mg/L, followed by 99.6% with an initial concentration of 10 mg/L under the following treatment conditions: dose of NMP of 0.15 g/L, concentration of $H_2O_2-100mM$ and a temperature of $25^{\circ}C$. The SEM analysis revealed that the nano particles were not spherical in shape. FTIR spectra shows occurrence of metal oxides on the surfaces of the NMPs. The XPS analyses results represent that Fe, Zn, N, Ca, C and O were occurred on the surfaces of the NMPs. The degradation of MB was suitable for the pseudo-first-order kinetics.

• Applied Chemistry for Engineering
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• v.4 no.4
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• pp.746-752
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• 1993

Quantitative measurements have been made by using equilibrium dialysis techniques on the extent of complexation between PCB and dissoved humic acid(HA). This research investigates the effectiveness of activated carbon adsorption for the removal of PCB from organic free water and humid acid background solution by using bench-scale equilibrium and rate tests. It was found that the extent of complexation depended on the pH, calcium concentration, ionic strength, and the concentration of humic acid. When HA was present, activated carbon capacity was greatly reduced due to complexation and competitive adsorption effects and the adsorption characteristics became complicated by the presence of various species such as the unassociated HA, PCB, and PCB-HA complexes.

• Journal of Environmental Science International
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• v.13 no.2
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• pp.161-165
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• 2004

This study has been conducted to develop a new recycling technology of sewage sludge using a carbonization process. The carbonizing yield, the calorific value and EC(electric conductivity) of carbonized sewage sludge had a tendency to be decreased with increase of the carbonizing temperature and time, but pH and the C/N were increased with increase the carbonizing temperature and time. The whole pore volume of carbonized sludge processed in the carbonizing furnace was /g, which was smaller than that in the electric furnace. But, the rates of mesopore and macropore were found to account for 100% therein. Rate of color and organic materials removal for dyeing wastewater were determined 70~97%, 78~83% on cotton yarn, 88~96%, 69~80% on wool wastewater and 77~89%, 77~87% on towel compared with powder activated carbon. Effect of carbonized sludge on chrysanthemum growth was investigated. Plant height and number of leaves was better mixture of carbonized sludge than comparison.

• Proceedings of the Korean Environmental Health Society Conference
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• 2005.12a
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• pp.51-53
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• 2005

Disposal of waterwork sludge is important problem in WTP(water treatment plant). Purpose of this study is treated municipal waste water chemically using sludge that is produced in waterwork plant by link to reutilize waterwork sludge. Municipal waste water that use in an experiment used is produced at C university, and is SS 220 mg/L, BOD 145 mg/L, COD 160 mg/L, T-N 52 mg/L and T-P 2.6 mg/L. Used Alum, polymer coagulant and coagulant aid (diatomite, powered activated carbon) as CaO, coagulant as alkaline aid by chemical treatment medicine. In case of does slow speed agitation and stations after pours waterwork sludge in sewage and alkaline aid and coagulant at rapidly mixing the colloidal creation speed is fast and fine colloids concentration was high but settling time is shortened a little and removal rate of pollutant improved by $60{\sim}99%$.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.21 no.4
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• pp.556-562
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• 2012

Micro electrical discharge machining (${\mu}EDM$) has been used for non-conventional material removal. One drawback of ${\mu}EDM$ is low productivity. In this study, we tried to find the optimal machining conditions to manufacture the micro hole with an optimal machining time without loss of accuracy. Taguchi method was used to figure out the relation between machining parameters and characteristics of the process. It was found that the electrode wear, the entrance and exit clearance gave a significant effect on the diameter of the micro hole when the diameter of the electrode was identical. Grey relational analysis was used to determine the optimal machining condition for minimum machining time without loss of accuracy. The obtained optimal machining condition was the input voltage of 80V, the capacitance of 680pF, the resistance of $500{\Omega}$, the feed rate of $1.5{\mu}m$/s and the spindle speed of 2900rpm. The machining time was reduced to 48% without loss of accuracy under the optimal machining condition.

• Journal of Environmental Science International
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• v.23 no.5
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• pp.985-993
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• 2014

For the field application of dielectric barrier discharge plasma reactor, a multi-plasma reactor was investigated for the inactivation of microorganisms in sewage. We also considered the possibility of degradation of non-biodegradable matter ($UV_{254}$) and total organic carbon (TOC) in sewage. The multi-plasma reactor in this study was divided into high voltage neon transformers, gas supply unit and three plasma modules (consist of discharge, ground electrode and quartz dielectric tube). The experimental results showed that the inactivation of microorganisms with treated water type ranked in the following order: distilled water > synthetic sewage effluent >> real sewage effluent. The dissolved various components in the real sewage effluent highly influenced the performance of the inactivation of microorganisms. After continuous plasma treatment for 10 min at 180 V, residual microorganisms appeared below 2 log and $UV_{254}$ absorbance (showing a non-biodegradable substance in water) and TOC removal rate were 27.5% and 8.5%, respectively. Therefore, when the sewage effluent is treated with plasma, it can be expected the inactivation of microorganisms and additional improvement of water quality. It was observed that the $NH_4{^+}$-N and $PO{_4}^{3-}$-P concentrations of sewage was kept at the constant plasma discharging for 30 min. On the other hand, $NO_3{^-}$-N concentration was increased with proceeding of the plasma discharge.

• Journal of the Korean Society for Precision Engineering
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• v.19 no.8
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• pp.134-140
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• 2002

Chemical mechanical polishing of aluminum and photoresist using colloidal silica-based slurry was experimented. The effects of slurry pH, silica concentration, and oxidizer ($H_2O_2$) concentration on surface roughness and removal rate were studied. The optimum slurry conditions for reduction of micro-scratch were investigated. The optimum chemical mechanical polishing with the colloidal silica-based slurry was compared with conventional chemical mechanical polishing with alumina-based slurry. Chemical mechanical polishing of the aluminum with the colloidal silica-based slurry showed improved result but chemical mechanical polishing of the photoresist did not. The improved result was comparative with that of chemical mechanical polishing with filtered alumina-based slurry which one of desirable methods to reduce the micro-scratch.

• Journal of the Korean Applied Science and Technology
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• v.23 no.2
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• pp.153-159
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• 2006

The photocatalytic degradation of methylene blue(MB) was investigated using $TiO_2$ as photocatalyst and UV radiation. $TiO_2$ supported with activated carbon(AC) was prepared by SOL-GEL method and depended on several parameters such as the mass ratio of $TiO_2/AC$, pH and experimental time. The presence of the anatase and rutile crystal phase was determined by XRD analyses of the prepared $TiO_2$. The degradation of MB with $TiO_2/AC$ was about 20% higher than that of AC alone. A variation of photodegradation was negligible under UV radiation conditions ( ${\geq}$ 40W). It was experimentally showed that the photodegradation rate was increased with increasing the amount of photocatalyst. The optimal catalyst was prepared by impregmation of $5wt%-TiO_2$ with AC and was calcined at $300^{\circ}C$, and showed about 99% removal efficiency for 3hrs.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.37.2-37.2
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• 2011

반도체공정에서 Photo-lithography는 특정 광원을 사용하여 구현하고자 하는 패턴을 기판상에 형성하는 기술이다. 이러한 Photo-lithography 공정에서는 패턴이 형성되어 있는 마스크가 핵심적인 역할을 하며 반도체소자의 전체적인 성능을 결정한다. 이에 따라 Photo-lithography용 마스크에 사용되는 Blank 마스크는 Defect의 최소화 및 우수한 평탄도 등의 조건들이 요구되고 있다. 이러한 Blank 마스크 재료로 광원을 효율적으로 투과시키는 성질이 우수하고 다른 재료에 비해 열팽창계수가 작은 석영기판이 사용되고 있다. 석영 기반의 마스크는 UV Lithography에서 주로 사용되고 있으며 그 밖에 UV-NIL (Nano Imrpint Lithography), EUVL (Extreme Ultra Violet Lithography) 등에도 이용되고 있다. 석영기판을 가공하여 Blank 마스크로 제작하기 위해 석영기판의 Lapping/Polishing 등이 핵심기술이며 현재 일본에서 전량 수입에 의존하고 있어, 이에 대한 연구의 필요성이 절실한 상황이다. 본 연구에서는 Blank 마스크제작을 위한 석영기판의 Polishing 공정에 사용되는 Ceria Slurry의 특성 연구 및 이에 따른 연마평가를 실시하였으며 첨가제의 조건에 따른 pH/Viscosity/Stability 등의 물리적인 특성을 관찰하여 석영기판 Polishing에 효율적인 Ceria slurry의 최적조건을 도출했다. 또한, 조건에 따른 Slurry의 정확한 분석을 위해 Zeta Potential Analyzer를 이용하여 연마입자의 크기 및 Zeta Potential에 대한 평가를 실시한 후 연마제와 석영기판의 Interaction force를 측정하였다. 상기 실험에 의해 얻어진 최적화된 연마 공정 조건하에서 Ceria slurry를 사용하여 연마평가를 실시함으로써 Removal Rate/Roughness 등의 결과를 관찰하였다. 본 연구를 통해 반도체 photo mask 제작을 위한 Ceria slurry의 주요특성을 파악하고 석영기판의 Polishing에 효율적인 조건을 도출함으로써 Lithography 마스크를 효율적으로 제작할 수 있을 것으로 예상된다.