• Title/Summary/Keyword: Oxygen-plasma effect

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Effect of Plasma Treatment on Adhesion Strength between Underfill and Substrate (플라즈마 처리에 따른 언더필과 기판 사이의 접착 강도에 관한 연구)

  • No Bo-In;Jeong Seung-Bu
    • Proceedings of the KWS Conference
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    • 2006.05a
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    • pp.13-15
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    • 2006
  • The effects of plasma treatment on the surfaces of the FR-4 (Flame Resistant-4) and copper substrates are investigated in terms of X-ray photoelectron spectroscopy (XPS), contact angle, and atomic force microscopy (AFM). The adhesion strengths of the underfills/FR-4 substrate and underfills/copper substrate are also studied. As experimental results, the plasma treatments of FR-4 and copper substrate surfaces yield several oxygen complexes in hydrophilic surfaces, which can play an important role in increasing the surface polarity, wettability, and adhesion characteristics of the underfills/substrates.

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Effect of Adding Hydrocarbon Gases for Reduction of NOx and SOx Using PPCP (탄화수소 가스 첨가가 PPCP 장치에 의한 NOx 및 SOx 저감에 미치는 영향)

  • 김홍석;강형수;정태용
    • Transactions of the Korean Society of Automotive Engineers
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    • v.7 no.5
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    • pp.73-80
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    • 1999
  • To decrease NOx and SOx using PPCP(Pulse-induced Plasma Chemical Process). This study is tried to obtain the relation and the basic data under the various conditions such the initial concentrations of NOx and SOx. The additional amount of hydrocarbon gases. The concentration of oxygen and input power etc. Especially, this study is focused on the effects of the additional hydrocarbon gases on the decrease of NOx and SOx.

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The Effect of Oxygen Low Temperature Plasma Treatment on the Wettability of Polypropylene Fabrics (폴리프로필렌 직물의 젖음성에 관한 연구)

  • Kwon, Young-Ah
    • Proceedings of the Korean Fiber Society Conference
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    • 2003.10b
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    • pp.307-308
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    • 2003
  • Improved wettability and dyeability of Polypropylene(PP) fabrics were obtained using glow discharge plasma by grafting nitrogen-containing active groups on the surface. Few studies of glow discharge plasma on PP fabrics exist. The objective of this study was to give a fabric a good affinity for water. (omitted)

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Influence of DBD Plasma Exposure on Normal and Cancer Cells Activity

  • Panngom, Kamonporn;Baik, Ku-Youn;Ryu, Young-Huo;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.172-172
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    • 2012
  • Non-thermal plasma has attracted medical researchers, since they showed higher apoptosis rate in cancer cells than normal cells. However, it is hard to conclude general cancer cell specific effect because comparison between normal and cancer cell activities after plasma treatment have not been reported yet. This research proposes a comparison of Dielectric Barrier Discharge (DBD) plasma effect on three normal cells lines and three cancer cells lines. We measured cell number, mitochondria activity (MTS assay) and amount of hydrogen peroxide (H2O2) for three days. The results show that the number of cancer cells decreased more than normal cells following of exposure time. On the other hand, mitochondria activities and amounts of H2O2 increased following of exposure time. In addition, we found that DBD plasma exposure on cell suspension in media and media only illustrated no difference in mitochondria activity, H2O2 quantity, and cell number. Thus, we can confirm higher apoptosis rate in cancer cells which is related to the reactive oxygen species (ROS) generated by DBD plasma. The related molecular mechanisms were investigated further.

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The Study on the Effect of Plasma Pre-treatment on the Dyeing Properties and the Handle in the Environment Friendly Enzyme Finishing (친환경 효소가공에서 플라즈마 전처리가 염색성과 태에 미치는 영향)

  • Kim, Ji-Hyun
    • Journal of the Korea Fashion and Costume Design Association
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    • v.10 no.3
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    • pp.173-180
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    • 2008
  • Cotton, wool, cotton/wool blended (80:20) and tencel fabrics were treated with low temperature oxygen plasma, enzymes (cellulase or protease), or oxygen plasma-enzyme and they were examined for dyeing and handling properties for environment friendly finishing. The appropriate conditions for cellulase treatment were enzyme concentration of 3g/l, pH of 5, and $60^{\circ}C$ for one hour, and for protease treatment were enzyme concentration of 4g/l, pH of 8, and $60^{\circ}C$ for one hour. The equilibrium uptake of a direct dye on cotton changed with plasma treatment and plasma-cellulase treatment, and the rate of dyeing slightly decreased. When wool was dyed with acid dye, the equilibrium dye uptake did not change with plasma, protease treatment nor plasma-protease treatment, however, the rate of dyeing had increased with plasma-protease treatment. From these results, it is assumed that plasma attacks the surface of the fiber, and enzyme mainly affects the inner part of the fiber. Plasma treatment did not affect mechanical properties related to the handling of fabrics. The handling test showed increased extension at maxmum load(EM), tensile energy(WT) with decreased tensile resilience (RT), and the fabrics became softer but resilience decreased slightly with enzyme treatment. The bending recidity(B), hysteresis of bending moment(2HB), and hysteresis of shear force at five degrees(2HG5) decreased, however, shear stiffness(G) increased. I knew the plasma pre-treatment made fabrics softer with lower koshi(stiffness). The handling of plasma pre-treated fabrics was better than that of enzyme-treated fabrics. When we pre-treated fabrics, the handling test showed decreased coefficient of friction(MIU), geometrical roughness(SMD), while the surface of fabrics became smoother and numeri increased. Even though compression resilience(RC) increased, fukurami(bulky property) and compressive elasticity, decreased due to the linearity of compression-thickness curve(LC) and compression energy(WC).

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Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface (플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거)

  • Cho, Sun-Hee;Lee, Won-Jong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.12
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    • pp.1078-1084
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    • 2006
  • Impurity contamination induced by $CF_4\;and\;HBr/Cl_2/O_2$ plasma etching on Si surface was examined by using surface spectroscopes. XPS(x-ray photoelectron spectroscopy) surface analysis showed that F of 0.4 at % exists in the surface layer in the form of Si-F bonding but Br and Cl are below the detection limit $(0.1{\sim}1.0%)$ of the spectroscope. Static-SIMS(secondary ion mass spectrometry) surface analysis showed that the etched Si surface was contaminated with etching gas elements such as H, F, Cl and Br, and they existed to the depth of about $20{\sim}40nm$. The etched Si surface was treated with three different methods that were HF dip, thermal oxidation followed by HF dip and oxygen-plasma oxidation followed by HF dip. They showed an effect in reducing the impurity contamination and the oxygen-plasma oxidation followed by HF dipping method appears to be a little bit more effective.

Surface Modification Effect and Mechanical Property of para-Aramid Fiber by Low-temperature Plasma Treatment (저온 플라즈마 처리를 이용한 파라 아라미드 섬유의 표면 개질 효과 및 역학적 특성)

  • Park, Sung-Min;Kwon, Il-Jun;Kim, Myung-Soon;Kim, Sam-Soo;Choi, Jae-Young;Yeum, Jeong-Hyun
    • Textile Coloration and Finishing
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    • v.24 no.2
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    • pp.131-137
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    • 2012
  • para-Aramid fibers were treated by low-temperature plasma to improve the adhesion. The surface of para-aramid fibers were treated with gaseous plasma of several discharge power and treatment time in oxygen gas at 1Torr pressure. The treated fibers at low-temperature plasma were taken oxygen-containing functional groups and micro-crator on the surface. The modified fibers were measured by dynamic contact angle analyzer and XPS(X-ray photoelectron spectroscopy). The Interfacial adhesion properties of aramid fabric and polyurethane resin were determined by T-peel test. The surface of aramid fibers were observed by FE-SEM photographs. It was found that surface modification and chemical component ratio of the aramid fibers were improved wettability and adhesion characterization.

Adhesion and Electrical Performance by Plasma Treatment on Semiconductive-Insulation Interface Layer of Silicone Rubber (실리콘 고무의 플라즈마 표면처리된 반도전-절연계면 처리에 따른 접착특성과 절연성능)

  • Hwang, Sun-Mook;Lee, Ki-Taek;Hong, Joo-Il;Huh, Chang-Su
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05b
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    • pp.11-14
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    • 2004
  • In this paper, the effect of adhesion properties of semiconductive-insulating interface layer of silicone rubber on electrical properties was investigated. The modifications produced on the silicone surface by oxygen plasma were accessed using ATR-FTIR, contact angle and AFM. Adhesion was obtained from T-peel tests of semiconductive layer having different treatment durations. In addition, ac breakdown test was carried out for elucidating the change of electrical property with duration of plasma treatment. From the results, the treatment in the oxygen plasma produced a noticeable increase in surface energy, which can be mainly ascribed to the the creation of O-H and C=O. It is observed that adhesion performance was determined by not surface energy but roughness level of silicone surface. It is found that ac dielectric strength was increased with improving the adhesion between the semiconductive and insulating interface.

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Hydrogen Production by the Photocatalystic Effects in the Microwave Water Plasma

  • Jang, Soo-Ouk;Kim, Dae-Woon;Koo, Min;Yoo, Hyun-Jong;Lee, Bong-Ju;Kwon, Seung-Ku;Jung, Yong-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.284-284
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    • 2010
  • Currently, hydrogen has been produced by Steam Reforming or partial oxidation reforming processes mainly from oil, coal, and natural gas and results in the production of $CO_2$. However, these are influenced greatly on the green house effect of the earth. so it is important to find the new way to produce hydrogen utilizing water without producing any environmentally harmful by-products. In our research, we use microwave water plasma and photocatalyst to improve dissociation rate of water. At low pressure plasma, electron have high energy but density is low, so temperature of reactor is low. This may cause of recombination in the generated hydrogen and oxygen from splitting water. If it want to high dissociation rate of water, it is necessary to control of recombination of the hydrogen and oxygen using photocatalyst. We utilize the photocatalytic material($TiO_2$, ZnO) coated plasma reactor to use UV in the plasma. The quantity of hydrogen generated was measured by a Residual Gas Analyzer.

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A Study on the Cleaning Characteristics according to the process gas of Low-Pressure Plasma (저압 플라즈마 세정가스에 따른 세정특성 연구)

  • Koo, H.J.;Ko, K.J.;Chung, C.K.
    • Clean Technology
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    • v.7 no.3
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    • pp.203-214
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    • 2001
  • A silicon oxide cleaning characteristic and its mechanism were studied in RF plasma cleaning system with various gases such as $CHF_3$, $CF_4$, Argon, oxygen and mixing gas. The experimental parameters - working pressure (100 mTorr), RF power (300 W, 500 W), electrode distance (5cm, 8cm, 11.5cm), cleaning time (90, 180 seconds), gas flow (50 sccm) were fixed to compare cleaning efficiency by gas types. The results were as follows. First, the argon plasma is retaining only physical sputtering effect and etch rate was low. Second, the oxygen plasma showed good cleaning efficiency in electrode distace of 5cm, 300W, 180secs, but surface roughness increased. Third, $CF_4$ Plasma could get the best cleaning efficiency. Fourth, $CHF_3$ plasma could know that addition gas that can lower the CFx/F ratio need. We could not get good cleaning efficiency in case of added argon to $CHF_3$. But, we could get good cleaning efficiency in case added oxygen.

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