• Fibers and Polymers
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• v.5 no.1
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• pp.52-58
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• 2004

Previous investigation results revealed that after the Low Temperature Plasma (LTP) treatment, the hydrophilicity of wool fiber was improved significantly. Such improvement enhances the wool dyeing and finishing processes which might be due to the changes of the wool surface to a more reactive one. In this paper, wool fibers were treated with LTP with different gases, namely, oxygen, nitrogen and gas mixture (25 % hydrogen/75 % nitrogen). Investigations showed that chemical composition of wool fiber surface varied differently with the different plasma gas used. The surface chemical composition of the different LTP-treated wool fibers was evaluated with different characterization methods, namely FTIR-ATR, XPS and saturated adsorption value. The experimental results were thoroughly discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.74-77
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• 2006

Thin $AuO_x$ layer was formed by $O_2$ plasma treatment on Au electrode. The surface work function of plasma treatment showed higher by 0.5 eV than that of bare Au, reducing the hole injection barrier at the Au/pentacene interface. Using $O_2$ plasma-treated Au source-drain electrodes, the field-effect mobility of bottom-contact pentacene-OTFT was increased from 0.05 to 0.1 $cm^2/Vs$.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1500-1503
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• 2009

In this paper, we studied about atmospheric pressure remote plasma ashing of photoresist(PR), by using a modified dielectric barrier discharge(DBD). The effect of various gas combinations such as $N_2/O_2$, $N_2/O_2+SF_6$ on the changes PR ashing rate was investigated as a function of power. The maximum PR ashing rate of 1850 nm/min was achieved at $N_2$ (70 slm)/ $O_2$ (200 sccm) + $SF_6$ (3 slm). We found that as the oxygen and fluorine radical peaks were increased, the ashing rate is increased, too.

• The Transactions of the Korean Institute of Electrical Engineers D
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• v.52 no.5
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• pp.206-206
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• 2003

It is hard to expect excellent electrical, mechanical and chemical properties from most of the composite materials presently used as insulators due to insufficient wettability property caused by the difference of interfacial properties between the matrix material and the reinforcer. Therefore, various interfacial coupling agents have been developed to improve the interfacial properties of composite materials. But if the wettable coupling agents are used outdoor for a long time, change in quality takes place in the coupling agents themselves, bringing about deterioration of the properties of the composite materials. In this study, glass surface was treated by plasma to examine the effect of dry interface treatment without coupling agent. It was identified that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate and dielectric property were improved.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.5
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• pp.206-212
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• 2003

It is hard to expect excellent electrical, mechanical and chemical properties from most of the composite materials presently used as insulators due to insufficient wettability property caused by the difference of interfacial properties between the matrix material and the reinforcer. Therefore, various interfacial coupling agents have been developed to improve the interfacial properties of composite materials. But if the wettable coupling agents are used outdoor for a long time, change in quality takes place in the coupling agents themselves, bringing about deterioration of the properties of the composite materials. In this study, glass surface was treated by plasma to examine the effect of dry interface treatment without coupling agent. It was identified that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate and dielectric property were improved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.254-255
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• 2005

In this work, the effects of plasma treatment on surface properties of semi conductive silicone rubber were investigated in terms of X-ray photoelectron spectroscopy(XPS). The adhesion characteristics of semiconductive-insulating interface layer of silicone rubber were studied by measuring the T-peel strengths. As a result, semiconductive silicone rubber surfaces treated with plasma discharge led to and increase in oxygen-containing functional groups, resulting in improving the degree of adhesion of the semiconductive-insulating interface layer of silicone rubber. these results are probably due to the modifications of surface functional groups or polar component of surface free energy of the semi conductive silicone rubber.

• Journal of Nutrition and Health
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• v.33 no.3
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• pp.289-295
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• 2000

In the present work we investigated the effect of regular physical exercise on the activities of erythrocyte antioxidant enzyme, plasma total radical-trapping antioxidant potential(TRAP) and plasma level of lipid peroxidation(malondialdehyde, MDA) in 64 healthy male, aged 34-67 years. The study population were divided in two groups: small amount of exerciser(exercise time less than 10min/d) and moderate amount of exerciser(exercise time more than 20min/d) according to their physical exercise habits measured by a questionnaire. Erythrocyte superoxide dismutase(SOD), glutathione peroxidase(GSH-Px) and catalase(CAT), plasma TRAP, as well as plasma MDA were determined. Erythrocyte GSH-Px and plasma TRAP were higher in moderate amount of exercisers than those in small amount of exercisers by 17% and 26%, respectively. No significant differences were observed in erythrocyte SOD, CAT and plasma MDA between the two groups. Mean exercise time was positively correlated with the erythrocyte GSH-Px activity and plasma TRAP significantly. The results would sugest that regular moderate exercise enhances antioxidant defences against reactive oxygen species and may increase the likelihood of a healthier life span.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.10
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• pp.941-944
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• 2005

In this experiment, OLEDs(Organic Light Emitting Diodes) was fabricated to confirm effect of Plasma treatment which increase the hole injection characteristic from anode. Device structure was $ITO/2-TNATA/{\alpha}-NPD/DPVBi/BAlq/Alq_3/Al:Li$. We used DPVBi (4, 4 - Bis (2,2-diphenylethen-1-yls) - Biphenyl) as a blue emitting material. To optimize the process condition of plasma treatment, we used 2 gases of the oxygen and nitrogen gas under 120 mTorr with 100 W, 200 W, and 400 W plasma power. The current efficiency of $N_2$ plasma is more efficient than that of $O_2$ plasma. At $1000 cd/m^2$, we obtained the maximum current efficiency of 6.45 cd/A using $N_2$ gas with 200 W plasma power.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.180-180
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• 2010

The design and implementation of high rate deposition process and anti-scratch property of silicon oxide film by PECVD with UHF power were investigated according to the effect of UHF input power with HF bias. New regime of high rate deposition of SiOx films by hybrid plasma process was investigated. The dissociation of OMCTS (C8H24Si4O4) precursor was controlled by plasma processes. SiOx films were deposited on polyethylene terephthalate (PET) and polycarbonate substrate by plasma enhanced chemical vapor deposition (PECVD) using OMCTS with oxygen carrier gas. As the input energy increased, the deposition rate of SiOx film increased. The plasma diagnostics were performed by optical emission spectrometry. The deposition rate was characterized by alpha-step. The mechanical properties of the coatings were examined by nano-indenter and pencil hardness, respectively. The deposition rate of the SiOx films could be controlled by the appropriate intensity of excited neutrals, ionized atoms and UHF input power with HF bias at room temperature, as well as the dissociation of OMCTS.

• Journal of Sensor Science and Technology
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• v.14 no.6
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• pp.423-429
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• 2005

In this paper, we proposed the fabrication process of the stable e-beam evaporation and the patterning of metals layer on the polydimethylsiloxane (PDMS) substrate. The metal layer was deposited under the various deposition rate, and its effect to the electrical and mechanical properties (e.g.: adhesion-strength of metal layer) was investigated. The influence of surface roughness to the adhesion-strength was also examined via the tape test. Here, we varied the roughness by changing the reactive ion etching (RIE) duration. The electrode patterning was performed through the conventional photolithography and chemical etching process after e-beam deposition of $200{\AA}$ Ti and $1000{\AA}$ Au. As a result, the adhesion strength of metal layer on the PDMS surface was greatly improved by the oxygen plasma treatment. The e-beam evaporation on the PDMS surface is known to create the wavy topography. Here, we found that such wavy patterns do not effect to the electrical and mechanical properties. In conclusion, the metal patterns with minimum $20{\mu}m$ line width was produced well via the our fabrication process, and its electrical conductance was almost similar to the that of metal patterns on the silicon or glass substrates.