• 제목/요약/키워드: Oxygen Flow Rate

검색결과 689건 처리시간 0.027초

이젝터를 이용한 순환양식 시스템 폭기공정의 혼합유동 특성 (Mixed Flow Characteristics of Aeration Process for Recirculation Aquaculture System Using Ejector)

  • 박상규;양희천
    • 대한기계학회논문집B
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    • 제37권9호
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    • pp.847-854
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    • 2013
  • 본 연구는 환형 노즐 이젝터를 이용하여 수평방향 폭기공정의 혼합유동 및 산소전달 특성에 대한 실험적 연구를 목표로 한다. 실험변수는 이젝터 피치와 가압수 유량이며, 측정된 유량과 압력을 이용하여 유량비, 수두비 및 효율을 계산하였다. 이적터에서 분출된 혼합유동의 가시화를 통해 정성적 거동을 고찰하였으며, 용존산소량을 측정하여 총괄 산소전달계수를 도출하였다. 이젝터에서 분출된 혼합유동은 가압수의 운동량과 유입된 공기기포의 미립화에 따라 부력분류 또는 수평분류의 거동을 나타내었다. 기포의 크기에 기인하는 부력과 가압수의 운동량에 지배되는 혼합유동의 도달거리는 가압수와 공기기포의 접촉 면적 및 시간에 크게 영향을 미치기 때문에 산소전달률의 중요한 변수임을 유추할 수 있다.

Combustion of PMMA in Liquid Oxygen Flow

  • Mitsutani, Toru;Ro, Takaaki;Yuasa, Saburo
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2004년도 제22회 춘계학술대회논문집
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    • pp.180-185
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    • 2004
  • Our previous study showed that although the hybrid rocket engine with swirling gaseous oxygen had high performance, a direct injection of LOX with swirl into the combustion chamber of the hybrid rocket engine lowered the performance of the engine, compared to that with gaseous oxygen. In order to clarify this reason, combustion tests of a small PMMA combustor with an inner port diameter of 2 mm were conducted in liquid oxygen flow by comparison with gaseous oxygen flow. Although the oxygen mass fluxes of LOX were about two orders of magnitude larger than those of gaseous oxygen, the fuel regression rate of LOX were remarkably smaller than those of gaseous oxygen. For both liquid and gaseous oxygen, diffusion flames in the port of the grain controlled the combustion process of PMMA in oxygen flow. These results may be explained by the fact that only small amount of LOX vaporized and consumed in the combustion with PMMA while flowing through the port due to relatively larger latent heat of injected liquid oxygen compared to the heat of release by combustion which depended on the burning surface area of PMMA.

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Laboratory Scale 연소로를 적용한 산소 메탄 MILD 연소에 대한 실험적 연구 (Experimental Study for Oxygen Methane MILD Combustion in a Laboratory Scale Furnace)

  • 이필형;황상순
    • 한국연소학회지
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    • 제21권4호
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    • pp.6-15
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    • 2016
  • The oxygen fuel MILD (Moderate or Intense Low-oxygen Dilution) combustion has been considered as one of the promising combustion technology for flame stability, high thermal efficiency, low emissions and improved productivity. In this paper, the effect of oxygen and fuel injection condition on formation of MILD combustion was analyzed using lab scale oxygen fuel MILD combustion furnace. The results show that the flame mode was changed from a diffusion flame mode to a split flame mode via a MILD combustion flame mode with increasing the oxygen flow rate. A high degree of temperature uniformity was achieved using optimized combination of fuel and oxygen injection configuration without the need for external oxygen preheating. In particular, the MILD combustion flame was found to be very stable and constant flame temperature region at 7 KW heating rate and oxygen flow rate 75-80 l/min.

Simulation of Inductively Coupled $Ar/O_2$ Plasma; Effects of Operating Conditions on Plasma Properties and Uniformity of Atomic Oxygen

  • Park, Seung-Kyu;Kim, Jin-Bae;Kim, Heon-Chang
    • 반도체디스플레이기술학회지
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    • 제8권4호
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    • pp.59-63
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    • 2009
  • This paper presents two dimensional simulation results of an inductively coupled $Ar/O_2$ plasma reactor. The effects of operating conditions on the plasma properties and the uniformity of atomic oxygen near the wafer were systematically investigated. The plasma density had the linear dependence on the chamber pressure, the flow rate of the feed gas and the power deposited into the plasma. On the other hand, the electron temperature decreased almost linearly with the chamber pressure and the flow rate of the feed gas. The power deposited into the plasma nearly unaffected the electron temperature. The simulation results showed that the uniformity of atomic oxygen near the wafer could be improved by lowering the chamber pressure and/or the flow rate of the feed gas. However, the power deposited into the plasma had an adverse effect on the uniformity.

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고품위 자성체 박막 코팅 시스템 (Coating System for High Quality Ferromagnetic Thin Films)

  • 김기범;황윤식;김영식;박장식;박재범
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.231-232
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    • 2007
  • Nickel oxide thin films were deposited by the DC magnetron reactive sputtering process under the conditions such as various oxygen flow rates(0, 3, 6, 8, 10 sccm) with constant 33 sccm argon flow rate for the sputtering time of 40 second with the power of 0.3 kW. Sheet resistances were measured by the four point probes. In order to observe discharge voltage characteristics according to the oxygen flow rates, the sputtering processes were performed under the powers of 0.2kW and 0.3kW. The feasibility of the coating system for high quality ferromagnetic thin films was tested through the electromagnetic simulation and the thin film thickness measurement from the experiment. It was shown that a discharge voltage was decreased under the low power and low oxygen flow rate, since the oxygen was quickly saturated on nickel target surface. The sheet resistance was increased as oxygen flow rate increased. The film thickness deposited by the coating system for ferromagnetic target was improved approximately 10% in comparison with previous coating systems.

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다공 오리피스를 이용한 액체산소 유량측정 (Flow Measurement of Liquid Oxygen using the Multi-hole Orifice)

  • 임하영;이지성;김정한;노용오
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2017년도 제48회 춘계학술대회논문집
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    • pp.1031-1035
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    • 2017
  • 액체산소의 유량을 측정하기 위해 두 가지 형태의 다공성 오리피스 미터를 제작하여 물을 이용하여 $C_d$를 측정하였다. 다공 오리피스 미터와 코리올리 미터를 직렬로 연결하고 액체산소를 흘려보내는 유동시험을 수행하여 물을 이용하여 구한 $C_d$를 이용하여 질량유량을 산출하였다. 코리올리 미터를 기준으로 할 때 A 형(1/2")의 경우 0.4%, B 형(3/4")의 경우 0.8% 이하의 오차를 확인하였다.

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DC Magnetron Sputtering에 의한 ATO 박막의 제조 (I)증착특성 (Preparation of ATO Thin Films by DC Magnetron Sputtering (I) Deposition Characteristics)

  • 윤천;이혜용;정윤중
    • 한국세라믹학회지
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    • 제33권4호
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    • pp.441-447
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    • 1996
  • Sb doped SnO2(ATO:Antinomy doped Tin Oxide) thin films were prepared by a DC magnetron spttuering method using oxide target and the deposition characteristics were investigated. The experimental conditions are as follows :Ar flow rate : 100 sccm oxygen flow rates ; 0-100 sccm deposition temperature ; 250 -40$0^{\circ}C$ DC sputter powder ; 150~550 W and sputtering pressure ; ; 2~7 mTorr. Deposition rate greatly depends not on the deposition temperature but on the reaction pressure oxygen flow rate and sputter power,. when the sputter powder is low ATO thin films with (110) preferred orientation are deposited. And when the sputter power is high (110) prefered orientation appeares with decreasing of oxygen flow rate and increasing of suputte-ring pressure.

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인산형 연료전지의 발전성능에 미치는 반응기체 영향 (Effects of reactant gases on phosphoric acid fuel cell performance)

  • 송락현;김창수;신동렬
    • 대한전기학회논문지
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    • 제45권3호
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    • pp.374-379
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    • 1996
  • Effects of reactant gas flow rates and starvation on phosphoric acid fuel cell performance were studied. As the reactant gas flow rates increased, the cell performance increased and then the cell maintained constant performance. The optimum flow rates of hydrogen, oxygen and air under galvanostatic condition of 150 mA/cm$_{2}$ are found to be 5cc/min cm$_{2}$ 5cc/min cm$_{2}$ and 15cc/min cm$_{2}$ at room temperature and 1 atm, respectively. Also the open circuit voltage of single cell decreased with increasing oxygen flow rate due probably to the decreased probably to the decreased oxygen pressure in the cathode side. Hydrogen and oxygen starvation resulted in voltage loss of about 5mV and 0-2mV, respectively. The voltage loss was independent of starvation time. These results were discussed from point of view of electrochemical reaction of the cell. (author). 9 refs., 8 figs.

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The Effect of the Oxygen Flow Rate on the Electronic Properties and the Local Structure of Amorphous Tantalum Oxide Thin Films

  • Denny, Yus Rama;Lee, Sunyoung;Lee, Kangil;Kang, Hee Jae;Yang, Dong-Seok;Heo, Sung;Chung, Jae Gwan;Lee, Jae Cheol
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.398-398
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    • 2013
  • The electronic properties and the local structure of tantalum oxide thin film with variation of oxygen flow rate ranging from 9.5 to 16 sccm (standard cubic centimeters per minute) have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), and X-ray absorption spectroscopy (XAS). The XPS results show that the Ta4f spectrum for all films consist of the strong spin-orbit doublet $Ta4f_{7/2}$ and $Ta4f_{5/2}$ with splitting of 1.9 eV. The oxygen flow rate of the film results in the appearance of new features in the Ta4f at binding energies of 23.2 eV, 24.4 eV, 25.8, and 27.3 eV, these peaks attribute to $Ta^{1+}$, $Ta^{2+}$, $Ta^{4+}$/$Ta^{2+}$, and $Ta^{5+}$, respectively. Thus, the presence of non-stoichiometric state from tantalum oxide ($TaO_x$) thin films could be generated by the oxygen vacancies. The REELS spectra suggest the decrease of band gap for tantalum oxide thin films with increasing the oxygen flow rate. The absorption coefficient ${\mu}$ and its fine structure were extracted from the fluorescence mode of extended X-ray absorption fine structure (EXAFS) spectra. In addition, bond distances (r), coordination numbers (N) and Debye-Waller factors (${\sigma}^2$) each film were determined by a detailed of EXAFS data analysis. EXAFS spectrapresent both the increase of coordination number of the first Ta-O shell and a considerable reduction of the Ta-O bond distance with the increase of oxygen flow rate.

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Microwave Plasma Process에 의한 N-Hexane으로부터 다이아몬드 박막제작 및 특성 (Fabrication and Properties of Diamond Thin-Film from N-Hexane by Using Microwave Plasma Process)

  • 한상보;권태진;박상현;박재윤;이승지
    • 조명전기설비학회논문지
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    • 제25권4호
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    • pp.79-87
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    • 2011
  • In this paper, the best conditions for the deposition of the high quality diamond thin-film from N-hexane as a carbon source in the microwave plasma process was carried out. Major parameters are the deposition time, flow rates of oxygen and hexane. The deposition time for the steady state thin-film was required more than 4[h], and the suitable flow rates of hexane and oxygen for the high-quality thin-film are 0.4[sccm] and 0.1~0.2[sccm], respectively. In addition, amorphous carbons such as DLC and graphite were grown by increasing the flow rate of hexane, and it decreased by increasing the flow rate of oxygen. Specifically, the growth rate is about 1.5[${\mu}mh-1$] under no addition of oxygen and it decreased about 60[%] as ca. 1.0[${\mu}mh-1$] with oxygen.