• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.435-438
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• 2001

Thin films of vanadium oxide(VO$\sub$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\sub$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition and bonding properties of films sputter-deposited under different oxygen gas pressures are characterized through XRO, XPS, RBS and FTIR measurements. All the films prepared below 8% O$_2$ are amorphous, and those prepared without oxygen are gray indicating the presence of V$_2$O$\sub$$_4$/ phase in the films. V$_2$O$\sub$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\sub$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms. located on the V-O plane of V$_2$O$\sub$5/ layer participate more readily in the oxidation process.

• 한국전기전자재료학회논문지
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• 제14권12호
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• pp.1008-1015
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• 2001

Thin films of vanadium oxide(VO$\_$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\_$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition, bonding, optical and electrical properties of films sputter-deposited under different oxygen gas pressures are characterized through XPS, AES, RBS, FTIR, optical absorption and electrical conductivity measurements. V$_2$O$\_$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\_$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms located on the V-O plane of V$_2$O$\_$5/ layer participate more readily in the oxidation process. With increasing oxygen gas pressure indirect and direct optical band gaps are increased, but thermal activation energies are decreased.

• 한국분말재료학회지
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• 제24권2호
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• pp.96-101
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• 2017

Well-dispersed platinum catalysts on ruthenium oxide nanofiber supports are fabricated using electrospinning, post-calcination, and reduction methods. To obtain the well-dispersed platinum catalysts, the surface of the nanofiber supports is modified using post-calcination. The structures, morphologies, crystal structures, chemical bonding energies, and electrochemical performance of the catalysts are investigated. The optimized catalysts show well-dispersed platinum nanoparticles (1-2 nm) on the nanofiber supports as well as a uniform network structure. In particular, the well-dispersed platinum catalysts on the ruthenium oxide nanofiber supports display excellent catalytic activity for oxygen reduction reactions with a half-wave potential ($E_{1/2}$) of 0.57 V and outstanding long-term stability after 2000 cycles, resulting in a lower $E_{1/2}$ potential degradation of 19 mV. The enhanced electrochemical performance for oxygen reduction reactions results from the well-dispersed platinum catalysts and unique nanofiber supports.

• 한국전기전자재료학회논문지
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• 제12권1호
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• pp.56-61
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• 1999

Highly conductive oxide films of BaRuO$_3$ have been grown heteroepitaxially on (100) LaAlO$_3$ single crystalline substrates by using pulsed laser deposition. The films are c-axis oriented with an in-plane epitaxial relationship of <010><100>BaRuO$_3$ // <110>LaAlO$_3$. Atomic force microscopy (AFM) observation shows that they consist of a fine-arranged network of grains and have a mosaic microstructure. Generally temperature-dependent resistivity shows the transition from metallic curve to semiconductor-metallic twofold curve by the deposition conditions for Ru oxide based materials like SrRuO$_3$, CaRuO$_3$, BaRuO$_3$, etc.. This twofold curve comes from the structural similarity of Ru oxide based materials including BaRuO$_3$. We find that the distance of Ru-Ru bonding in the unit cell of BaRuO$_3$ as well as the grain boundary scattering could be the two important causes of these interesting conductive properties.

• Structural Engineering and Mechanics
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• 제84권6호
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• pp.823-829
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• 2022

This study considered the experimental parameters (Nano-graphene oxide reinforced polycarbonate, GFRP) under low-velocity impact load and vibration analysis. The effect of nano-graphene oxide (NGO) on a polycarbonate-based composite was studied. Two test procedures were adopted to obtain experimental results, vibration analysis. The mechanical tests were performed on damaged and non-damaged specimens to determine the damaging effect on the composite specimens. After the test was carried out, the effect of NGO was measured and damping factors were ascertained experimentally. 0. 2 wt% NGO was determined as the optimum amount that best affected the Vibration Analysis. The experiments revealed that the composite's damping properties were increased by adding the nanoparticles to 0.25 wt% and decreased slightly for the specimens with the highest nanoparticles content. Cyclic sinus loading was applied at a frequency of 3.5 Hz. This paper study the frequency effect of 3.5khz frequency damage on mechanical results. Found that high frequency will worthlessly affect the fatigue life in NGO/polycarbonate composite. In 3.5 Hz frequency, it was chosen to decrease the heat by frequency. Transmission electron microscopy (TEM) micrographs were used to investigate the distribution of NGO on the polycarbonate matrix and revealed a homogeneous mixture of nano-composites and strong bonding between NGO and the polycarbonate which increased the damping properties and decreased vibration. Finally, experimental modal analysis was conducted after the high-velocity impact damage process to investigate the defect on the NGO polycarbonate composites.

• 대한치과의사협회지
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• 제56권3호
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• pp.159-166
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• 2018

지르코니아 강화 리튬 실리케이트 세라믹 재료는, 현재 널리 사용되고 있는 e.max(리튬디실리케이트 세라믹) 재료에 비하여 더 개선된 강도를 지니고 있다. 단일 크라운의 수복에 사용될 수 있으며, 1.5mm 의 두께를 확보하는 것이 예지성 있는 치료를 위해 매우 중요하다. Celtra Duo의 경우 열처리를 수행하는 것이 강도나 마모 저항성 측면에서 도움이 될 것이다. 접착을 위해서는 불산의 처리가 도움이 되며, 너무 짧은 시간의 불산은 접착 강도의 개선에 도움을 주지 못할 수 있으므로 충분한 시간의 불산 처리가 필요하다. 지르코니아 강화 리튬 실리케이트 세라믹 재료는 실험실 연구가 지속적으로 수행되고 출판되고 있지만, 아직 신뢰할만한 임상연구는 매우 부족한 실정이다. 추가적인 임상연구를 통해 과학적인 근거를 마련하는 것이 매우 중요한 부분이 될 것이다.

• 한국세라믹학회지
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• 제34권1호
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• pp.95-101
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• 1997

평균입경이 22.1$\mu$m인 알루미늄 분말을 사용하여 무가압 분말 충전 성형법으로 52%의 상대밀도를 갖는 성형체를 제조하였다. 산화반응의 활성화 에너지는 TG의 무게 변화로부터 구하였으며, 16~64kJ/mol 범위의 값을 나타내었다. 활성화에너지의 변화와 미세구조의 관찰로부터 산화반응이 산화막의 파괴와 용출에 의존함을 확인하였다. 알루미늄 성형체를 1000~140$0^{\circ}C$에서 4~60시간동안 산화반응시켰을 때, 알루미늄의 산화반응이 시간보다 온도에 의존하였다. 140$0^{\circ}C$에서 60시간동안 산화반응시킨 시편의 산화율은 92%를 나타내었으며, 이 시편을 다시 1$600^{\circ}C$에서 15시간 소결시켰을 때, 소결체는 62%의 상대밀도를 나타내었다.

• 한국전기전자재료학회논문지
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• 제15권1호
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• pp.15-23
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• 2002

In this study, metal/ZnO contacts were thermally annealed at different temperatures (as-dep., 400$^{\circ}C$, 600$^{\circ}C$, 800$^{\circ}C$, 1000$^{\circ}C$) for the investigation of electrical properties, and surface and interface characteristics. The analysis of the element composition and the chemical bonding state of the surface was made by the XPS(X-ray photoelectron spectroscopy). An attempt was made to establish the electrical property-microstructure relationship for the (Ti, Au)/ZnO. The Ti/ZnO contact exhibits an ohmic characteristics with a relatively high contact resistance of 4.74${\times}$10$\^$-1/ $\Omega$$\textrm{cm}^2$ after an annealing at 400$^{\circ}C$. The contact showed a schottky characteristics when the samples were annealed at higher temperature than 400$^{\circ}C$. The transition from the ohmic to schottky characteristics was contributed from the formation of the oxide layers as was confirmed by the peaks for O-O and Ti-O bondings in XPS analysis. For the Au/ZnO contact the lowest contact resistance was obtained from the as-deposited sample. The resistance was slowly increased with annealing temperature up to 600$^{\circ}C$. The ohmic characteristics were maintained eden fort 600$^{\circ}C$ annealing. The XPS analysis showed that the Au-O intensity was dramatically decreased with temperature above 600$^{\circ}C$.

• 마이크로전자및패키징학회지
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• 제19권1호
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• pp.39-45
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• 2012

Cu-Cu 패턴의 직접접합 공정을 위하여 Buffered Oxide Etch(BOE) 및 Hydrofluoric acid(HF)의 습식 조건에 따른 Cu와 $SiO_2$의 식각 특성에 대한 평가를 수행하였다. 접촉식 3차원측정기(3D-Profiler)를 이용하여 Cu와 $SiO_2$의 단차 및 Chemical Mechanical Polishing(CMP)에 의한 Cu의 dishing된 정도를 분석 하였다. 실험 결과 BOE 및 HF 습식 식각 시간이 증가함에 따라 단차가 증가 하였고, BOE가 HF보다 더 식각 속도가 빠른 것을 확인하였다. BOE 및 HF 습식 식각 후 Cu의 dishing도 식각시간 증가에 따라 감소하였다. 식각 후 산화막 유무를 알아보기 위해 Cu표면을 X-선 광전자 분광법(X-ray Photoelectron Spectroscopy, XPS)를 이용하여 분석 한 결과 HF습식 식각 후 BOE습식 식각보다 Cu표면산화막이 상대적으로 더 얇아 진 것을 확인하였다.

• 마이크로전자및패키징학회지
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• 제16권3호
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• pp.31-37
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• 2009

3차원 소자 집적을 위한 저온접합 공정 개발을 위해 Cu-Cu 열 압착 접합을 $300^{\circ}C$에서 30분간 실시하고 $N_2+H_2$, $N_2$분위기에서 전 후속 열처리 효과에 따른 정량적인 계면접착에너지를 4점굽힘시험법을 통해 평가하였다. 전 열처리는 100, $200^{\circ}C$의 $N_2+H_2$ 가스 분위기에서 각각 15분간 처리하였고, 계면접착에너지는 2.58, 2.41, 2.79 $J/m^2$로 전 열처리 전 후에 따른 변화가 없었다. 하지만 250, $300^{\circ}C$의 $N_2$ 분위기에서 1시간씩 후속 열처리 결과 2.79, 8.87, 12.17 $J/m^2$으로 Cu 접합부의 계면접착에너지가 3배 이상 향상된 결과를 얻을 수 있었다.