• Title/Summary/Keyword: Optical fiber chip

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Characteristics of pre-extracted hemicelluloses from Korean mixed wood by hot water and alkali solution and its effect on handsheet properties (열수 및 알칼리 용액을 이용하여 국산 목재 칩으로부터 선추출한 헤미셀룰로오스의 특성과 이에 따른 수초지 물성 변화)

  • Seo, Dong-Il;Lee, Sang-Hoon;Sim, Kyu-Jeong;Lee, Hak-Lae;Youn, Hye-Jung
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.43 no.5
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    • pp.60-67
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    • 2011
  • Hemicelluloses pre-extracted from Korean mixed wood chip were investigated as a wet-end additive. Hemicelluloses dissolved in hot water and alkali solution were isolated by ethyl alcohol precipitation from pre-extractives. They showed molecular weight of 9,000 ~ 27,000 g/mol as revealed by size exclusion chromatography. The reduction of molecular weight through hot water extraction was caused by autohydrolysis. Chemical composition of the hemicelluloses were analyzed with high-performance liquid chromatography and UV-Vis spectroscopy. As the surface charge of isolated hemicelluloses were negative, the adsorption of hemicelluloses onto softwood unbleached kraft pulp fiber was promoted by poly-DADMAC. The physical properties of handsheets increased as the molecular weight of hemicellulose increased. On the other hands, the optical property decreased with hemicellulose adsorption.

A study on the vibration cutting of high-hardness mold steel (고경도 금형강의 진동 가공에 대한 연구)

  • Kim, Jong-Su
    • Design & Manufacturing
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    • v.16 no.3
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    • pp.39-43
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    • 2022
  • In this study, we designed an vibration cutting tool that can achieve improvements such as low cutting force, interrupted chip evacuation and better surface quality of cutting performance to obtain high-quality surface roughness and improvement of tool wear, which is an issue in the machining of high-hardness mold steel. Among the resonance frequency modes of the vibration cutting tool, the bending mode was used to maximize the driving amplitude of the vibration tool tip, and the resonance frequency was confirmed through the finite element method. After measuring the actual resonant frequency of the designed tool using an optical fiber sensor, the cutting force and machining surface of vibration cutting and conventional cutting were compared and analyzed in the turning process of high hardness mold steel (STAVAX). As a result of the experiment, the cutting force was reduced by about 20 % compared to the conventional cutting process, and the surface roughness was also improved by about 60 %. This study suggested that the tool wear and surface quality of high-hardness steel can be improved through the vibration cutting method in the machining of high hardness mold steel.

SOA-Integrated Dual-Mode Laser and PIN-Photodiode for Compact CW Terahertz System

  • Lee, Eui Su;Kim, Namje;Han, Sang-Pil;Lee, Donghun;Lee, Won-Hui;Moon, Kiwon;Lee, Il-Min;Shin, Jun-Hwan;Park, Kyung Hyun
    • ETRI Journal
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    • v.38 no.4
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    • pp.665-674
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    • 2016
  • We designed and fabricated a semiconductor optical amplifier-integrated dual-mode laser (SOA-DML) as a compact and widely tunable continuous-wave terahertz (CW THz) beat source, and a pin-photodiode (pin-PD) integrated with a log-periodic planar antenna as a CW THz emitter. The SOA-DML chip consists of two distributed feedback lasers, a phase section for a tunable beat source, an amplifier, and a tapered spot-size converter for high output power and fiber-coupling efficiency. The SOA-DML module exhibits an output power of more than 15 dBm and clear four-wave mixing throughout the entire tuning range. Using integrated micro-heaters, we were able to tune the optical beat frequency from 380 GHz to 1,120 GHz. In addition, the effect of benzocyclobutene polymer in the antenna design of a pin-PD was considered. Furthermore, a dual active photodiode (PD) for high output power was designed, resulting in a 1.7-fold increase in efficiency compared with a single active PD at 220 GHz. Finally, herein we successfully show the feasibility of the CW THz system by demonstrating THz frequency-domain spectroscopy of an ${\alpha}$-lactose pellet using the modularized SOA-DML and a PD emitter.

Optimum Use of Forest Biomass Generated from the National Forest Management Operation (Part 1) - Study of Characteristics of Kraft Pulps Made from Single Wood Species - (숲가꾸기 산물의 최적용도 개발을 위한 연구 (제1보) - 단일 수종으로 제조된 크라프트 펄프의 특성 연구 -)

  • Park, Hyun-Jin;Kim, Chul-Hwan;Lee, Jee-Young;Lee, Gyeong-Sun;Lee, Ji-Young;Sheikh, M.I.;Sim, Sung-Woong;Yim, Su-Jin;Lee, Young-Min;Ahn, Byung-Il
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.44 no.5
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    • pp.63-71
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    • 2012
  • This study was carried out to investigate pulping properties of the forest biomass arising from the national forest management operation. The forest biomass was collected and classified into many groups according to their species and age. After the chips were made from the forest biomass, the measurement of chip size and chemical analysis were performed. To make the pulps from the forest biomass, the kraft pulping was applied and thereafter the physical and optical properties of kraft pulps were measured. The pulp fibers from the forest biomass had the similar mean fiber length, but their properties became different according to wood species and ages. Differently from the other species, kraft pulps from chestnut wood had the highest kappa number. Acacia, paulownia and chestnut woods made kraft pulps with lower tensile strength and brightness than the others. It could be concluded that acacia, paulownia and chestnut woods must be screened out in order to make a good quality of kraft pulps while being collected during Forest Management Operation.

Implant Isolation Characteristics for 1.25 Gbps Monolithic Integrated Bi-Directional Optoelectronic SoC (1.25 Gbps 단일집적 양방향 광전 SoC를 위한 임플란트 절연 특성 분석)

  • Kim, Sung-Il;Kang, Kwang-Yong;Lee, Hai-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.8
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    • pp.52-59
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    • 2007
  • In this paper, we analyzed and measured implant isolation characteristics for a 1.25 Gbps monolithic integrated hi-directional (M-BiDi) optoelectronic system-on-a-chip, which is a key component to constitute gigabit passive optical networks (PONs) for a fiber-to-the-home (FTTH). Also, we derived an equivalent circuit of the implant structure under various DC bias conditions. The 1.25 Gbps M-BiDi transmit-receive SoC consists of a laser diode with a monitor photodiode as a transmitter and a digital photodiode as a digital data receiver on the same InP wafer According to IEEE 802.3ah and ITU-T G.983.3 standards, a receiver sensitivity of the digital receiver has to satisfy under -24 dBm @ BER=10-12. Therefore, the electrical crosstalk levels have to maintain less than -86 dB from DC to 3 GHz. From analysed and measured results of the implant structure, the M-BiDi SoC with the implant area of 20 mm width and more than 200 mm distance between the laser diode and monitor photodiode, and between the monitor photodiode and digital photodiode, satisfies the electrical crosstalk level. These implant characteristics can be used for the design and fabrication of an optoelectronic SoC design, and expended to a mixed-mode SoC field.

Plasma Etching Process based on Real-time Monitoring of Radical Density and Substrate Temperature

  • Takeda, K.;Fukunaga, Y.;Tsutsumi, T.;Ishikawa, K.;Kondo, H.;Sekine, M.;Hori, M.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.93-93
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    • 2016
  • Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

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