• Title/Summary/Keyword: Non-chemical

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Non-Conventional Roughages in Tropical and Sub-Tropical Asian-Australasian Countries - Review -

  • Nitis, I.M.
    • Asian-Australasian Journal of Animal Sciences
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    • v.12 no.3
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    • pp.449-459
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    • 1999
  • Non-conventional roughage (NCR) is shrub and tree fodders, crop residues and agroindustrial oy-products which is not commonly used as livestock feed traditionally and commercially. Eventhough many sources of NCR is available, the farmers perceptions on NCR not only vary from country to country in tropical and sub-tropical Asian-Australasian countries, but also vary from region to region within the country. Chemical composition and nutritive value of NCR are not only vary from species to species but also vary between species within the genera, between provenances/cultivars within the species and such variations are affected by season, climatic zone, topography and land utilization. The nutritive value of NCR can be improved by physical, chemical and biological treatments and conservation. Feeding NCR to ruminant and non-ruminant is not only improve performance of the livestock but also economically feasible. Future direction of NCR is inventarization, exchange information through NCR information centre, integration with either agrisilvicultural, agrisilvipastoral or silvipastoral system, and use of genetic engineering to produce high quality NCR that ultimately become conventional roughage for agroindustry and agribissiness.

The study on the $SiO_2$ film non-uniformity by Plasma Enhanced Chemical Vapor Deposition (PECVD로 증착된 $SiO_2$의 non-uniformity 특성 연구)

  • Ham, Yong-Hyun;Kwon, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.73-73
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    • 2008
  • In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

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