• Title/Summary/Keyword: Non-Pt Catalyst

Search Result 33, Processing Time 0.021 seconds

Non-gaseous Plasma Immersion Ion Implantation and Its Applications

  • Han, Seung-Hee;Kim, En-Kyeom;Park, Won-Woong;Moon, Sun-Woo;Kim, Kyung-Hun;Kim, Sung-Min
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.08a
    • /
    • pp.151-151
    • /
    • 2012
  • A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

  • PDF

Study of the Electrode Catalyst for Direct Borohydride Fuel Cel (알칼리 붕소 수소화물 직접이용 연료전지에서의 전극촉매 연구)

  • Jun Chang-Sung;Song Kwang Ho;Kim Sung Hyun;Lee Kwan-Young
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2005.06a
    • /
    • pp.299-302
    • /
    • 2005
  • Direct Borohydride Fuel Cell은 알칼리 붕소 수소화물의 수용액을 이용하는 연료전지로 연료의 직접 산화반응을 통해 기존의 DMFC(직접 메탄을 연료전지)보다 높은 전류밀도와 OUV(Open Circuit Voltage)를 나타낸다. 또한 액체 연료를 사용하므로 장치 구성이 간단하며, 사용하는 연료가 반응성이 높은 알칼리 붕소 수소화물로 이루어져 있기 때문에 탄화수소 계열의 액체 연료와 달리 전기화학 반응이 비귀금속 전극에서도 쉽게 이루어질 수 있다는 장점을 가지고 있다 하지만 강알칼리 조건에서 전기화학 반응이 진행되므로 이에 적합한 재료로 장치를 구성해야 하며, 액체 상태의 연료가 전해질을 투과하는 현상인 크로스오버 문제를 해결해야 하고, 생성물인 $BO_2$-가 침적되어 전지효율을 떨어뜨리는 것을 방지해야 하는 문제점이 있다. 또한 알칼리 붕소 수소화물이 물과 반응하여 수소를 발생시키는 hydrolysis 반응을 억제하여야 하고 직접 산화반응만이 진행될 수 있도록 전지를 구성해야 연료효율을 높일 수 있다. 따라서 본 연구에서는 수소 생성반응일 hydrolysis 반응은 억제하고 연료의 직접 산화반응만을 진행시키기 위한 전극촉매에 대하여 연구하였다. 일반적인 저온형 연료전지의 전극촉매로 사용하는 Pt등의 귀금속 촉매와, 귀금속 촉매를 대체할 수 있는 Ni등의 비귀금속 촉매를 그 연구 대상으로 하였으며, 평가 방법으로는 unit cell station을 이용한 단위전지 성능측정 실험과 Potentiostat/Galvanostat을 이용한 half cell 실험을 병행하여 수행하였다.

  • PDF

Photo-catalytic Oxidation of Cyanide Complexes Associated with Heavy Metals Using UV LED and Pt-dopped TiO2 (자외선 LED와 백금으로 박막된 TiO2 광촉매를 이용한 중금속과 결합한 시안화합물의 광촉매 산화)

  • Seol, Jeong Woo;Kim, Seong Hee;Lee, Woo Chun;Cho, Hyen Goo;Kim, Soon-Oh
    • Journal of the Mineralogical Society of Korea
    • /
    • v.28 no.1
    • /
    • pp.29-38
    • /
    • 2015
  • Cyanide can be leached out from the cyanidation method which has been used to extract high-purity gold and silver from ores, and it becomes a variety of cyanide complexes associated with heavy metals contained in ores. Such cyanide complexes are considered as persistent and non-degradable pollutants which cause adverse effects on humans and surrounding environments. Based on binding force between heavy metals and cyanide, cyanide complexes can be categorized weak acid dissociable (WAD) and strong acid dissociable (SAD). This study comparatively evaluated the performance of photo-catalytic process with regard to forms of cyanide complexes. In particular, both effects of UV LED wavelength and surface modification of photo-catalyst on the removal efficiency of cyanide complexes were investigated in detail. The results indicate that the performance of photo-catalytic oxidation is significantly affected by the form of cyanide complexes. In addition, the effect of UV LED wavelength on the removal efficiency was quite different between free cyanide and cyanide complexes associated with heavy metals. The results support that the surface modification of photo-catalyst, such as doping can improve overall performance of photo-catalytic oxidation of cyanide complexes.