• Progress in Superconductivity
• /
• 제10권1호
• /
• pp.35-39
• /
• 2008

By using the hybrid physical-chemical vapor deposition (HPCVD) technique, we have fabricated $MgB_2$ thick films on $Al_{2}O_3$ substrates with various impurity layers of Ni, Ti, and SiC. We have found a significant enhancement of the critical current density ($J_c$) for $MgB_2$ films grown on impurity layered substrates, indicating that additional impurity layers were provided as possible pinning sites by chemical doping in $MgB_2$ films. All samples doped by Ni, Ti, and SiC were observed to have high superconducting transition temperatures of 39 - 41 K. The $J_c$ of $MgB_2$ films grown on SiC impurity layered substrates showed three times higher than that of undoped films at high magnetic fields above 1 T.

• 한국결정성장학회지
• /
• 제20권6호
• /
• pp.278-282
• /
• 2010

Tm 도핑에 따른 $BaTiO_3$ ceramics의 전기적 특성과 열화 거동에 미치는 영향에 대하여 core-shell 형성과 가속열화시험에 의한 미세화학변화의 관점에서 연구하였다. $Tm_2O_3$를 첨가하지 않은 $BaTiO_3$와 1 mol%를 첨가한 $BaTiO_3$를 펠렛과 적층 형태의 시편으로 각각 제조하였다. 1 mol% $Tm_2O_3$가 첨가된 유전체 시편의 유전상수는 $Tm_2O_3$를 첨가하지 않은 시편에 비해 약 40% 높게 나타났고 X7R 조건을 만족하였다. 절연저항 또한 1 mol% $Tm_2O_3$가 첨가된 시편은 $5.43{\times}10^{10}{\Omega}$으로 $Tm_2O_3$를 첨가하지 않은 시편의 $1.11{\times}10^{10}{\Omega}$보다 높게 나타났다. 이는 $Tm^{3+}$ 이온이 Ba site와 Ti site에 선택적으로 치환되고 유전체 미세조직 내에 core-shell 구조를 형성하여 전기적 특성을 향상시킨 것으로 설명된다. 각각의 조성에 따라 제조된 적층 시편의 $150^{\circ}C$, 70 V, 24시간 가속열화시험결과에 따르면, 1 mol% $Tm_2O_3$가 첨가된 $BaTiO_3$는 첨가되지 않은 시편에 비해 전극 층으로의 산소확산이 감소됨을 확인하였고, 이는 $Tm^{3+}$ 이온의 Ti site 치환에 의해 발생한 산소공공이 Ni 전극과 반응할 수 있는 과잉 산소를 줄여주기 때문으로 판단된다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
• /
• pp.87.2-87.2
• /
• 2015

Transparent conductors are commonly used in photoelectric devices, where the electric energy converts to light energy or vice versa. Energy consumption devices, such as LEDs, Displays, Lighting devices use the electrical energy to generate light by carrier recombination. Meanwhile, solar cell is the only device to generate electric energy from the incident photon. Most photoelectric devices require a transparent electrode to pass the light in or out from a device. Beyond the passive role, transparent conductors can be employed to form Schottky junction or heterojunction to establish a rectifying current flow. Transparent conductor-embedded heterojunction device provides significant advantages of transparent electrode formation, no need for intentional doping process, and enhanced light-reactive surface area. Herein, we present versatile applications of transparent conductors, such as NiO, ZnO, ITO in photoelectric devices of solar cells and photodetectors for high-performing UV or IR detection. Moreover, we also introduce the growth of transparent ITO nanowires by sputtering methods for large scale application.

• 전기학회논문지
• /
• 제67권10호
• /
• pp.1317-1321
• /
• 2018

PVDF as a semicrystal polymer, having a structure with C-F dipole moments, has been widely investigated because of its excellent chemical stability, mechanical strength, and ferroelectricity. In this study, ferroelectic ${\beta}$ type - PVDF layer was prepared by using an electrostatic spray deposition method and the effects of the addition of Ni-nitrate in precursor solution on the properties of PVDF layer were evaluated. Crystallinity and chemical structure of the PVDF layer were analyzed by a X-ray diffraction and Fourier Transform Infrared Spectrophotometer. Surface structure and fractured cross section of the layer were examined by a field emission-scanning electron microscope. LCR meter was used to obtain the dielectric properties of the layer. As the addition of an inorganic metal salt in PVDF sol, ${\beta}$ type - PVDF crystals were appeared in the hydrated metal salts doped-layer since the strong hydrogen bondings $(O-H{\cdots}F-C)_n$ due to high polarity of OH- were formed.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2002년도 하계학술대회 논문집
• /
• pp.354-357
• /
• 2002

Thermally grown gate oxide on 4H-SiC wafer was investigated. The oxide layers were grown at l150$^{\circ}C$ varying the carrier gas and post activation annealing conditions. Capacitance-Voltage(C-V) characteristic curves were obtained and compared using various gate electrode such as Al, Ni and poly-Si. The interface trap density can be reduced by using post oxidation annealing process in Ar atmosphere. All of the samples which were not performed a post oxidation annealing process show negative oxide effective charge. The negative oxide effective charges may come from oxygen radical. After the post oxidation annealing, the oxygen radicals fixed and the effective oxide charge become positive. The effective oxide charge is negative even in the annealed sample when we use poly silicon gate. Poly silicon layer was dope by POCl$_3$ process. The oxide layer may be affected by P ions in poly silicon layer due to the high temperature of the POCl$_3$ doping process.