• 제목/요약/키워드: Ni/$SiO_2$

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Structural Properties of MO-SiO$_2$(M=Zn, Sn, In, Ag, Ni) by Sol-Gel Method (졸겔법으로 제조된 MO-$SiO_2$(M=Zn,Sn,In,Ag,Ni)의 구조특성)

  • Sin, Yong-Uk;Kim, Sang-U
    • Korean Journal of Materials Research
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    • v.11 no.7
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    • pp.603-608
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    • 2001
  • $MO-SiO_2$ (M = Zn, Sn, In, Ag, Ni) binary silica gels were synthesized by sol-gel method and their structural change with the kind of metal ions was characterized by XRD, FT- IR and $^{29}$Si-NMR. Although X-ray analysis showed partial recrystallization of $AgNO_3$ in $Ag-SiO_2$gel, crystalline phase formed by the bonding between metal ion and the silica matrix didn't appear in all $MO-SiO_2$ gels. The FT-IR analysis showed that Zn, Sn and in partially formed Si-O-M bonding in silica matrix and made an shift of absorption peak to by Si-O-Si symmetrical vibration. In addition, $^{29}Si-NMR$ studies showed that Zn, Sn and In didn't affect sol-gel process of silica and were linked with non-bridging oxygen of the linear silica structure, which formed imperfect network because of low temperature sol-gel process. Ag and Ni make a role of catalysis on sol-gel process, resulting in densifying the silica network structure.

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Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering (RF 마그네트론 스퍼터링에 의한 NiO 박막 증착시 산소 유량비가 박막의 결정 배향성에 미치는 영향)

  • 류현욱;최광표;노효섭;박용주;박진성
    • Journal of the Korean Ceramic Society
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    • v.41 no.2
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    • pp.106-110
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    • 2004
  • Nickel oxide (NiO) thin films were prepared on Si(100) substrates at room temperature by RF magnetron sputtering using a NiO target. The effects of oxygen flow ratio for the plasma gas on the preferred orientation and surface morphology of the NiO films were investigated. Highly crystalline NiO film with (100) orientation was obtained when it was deposited in pure Ar gas. For NiO film deposited in pure O$_2$ gas, on the other hand, the orientation of the film changed from (100) to (111) and its deposition rate decreased. The origin of the preferred orientation of the films was discussed. NiO films also showed different surface morphologies and roughnesses with the oxygen flow ratio.

Low Firing Temperature Nano-glass for Multilayer Chip Inductors (칩인덕터용 저온소성 Nano-glass 연구)

  • An, Sung-Yong;Wi, Sung-Kwon
    • Journal of the Korean Magnetics Society
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    • v.18 no.1
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    • pp.43-47
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    • 2008
  • [ $ZnO-Bi_2O_3-Al_2O_3-B_2O_3-SiO_2$ ] nano-glass has been prepared by sol-gel method. The mean particle size was 60.3 nm with narrow size distribution. The nano-galss has been used as a sintering aid for the densification of the NiZnCu ferrites. The ferrite was sintered with nano-glass sintering aids at $840{\sim}900^{\circ}C$, 2 h and the initial permeability, quality factor, density, and saturation magnetization were also measured. The initial permeability of 0.5 wt% nano-glass added toroidal sample for NiZnCu ferrites sintered at $900^{\circ}C$ was 193.3 at 1 MHz. The initial permeability and saturation magnetization were increased with increasing annealing temperature. As a result, $ZnO-Bi_2O_3-Al_2O_3-B_2O_3-SiO_2$ nano-glass systems were found to be useful as sintering aids for multilayer chip inductors.

Study on the Specular Effect in NiO spin-valve Thin Films (NiO 스핀밸브 박막의 Specular Effect에 의한 자기저항비의 향상에 대한 연구)

  • Choi, Sang-Dae;Joo, Ho-Wan;Lee, Ky-Am
    • Journal of the Korean Magnetics Society
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    • v.12 no.6
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    • pp.231-234
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    • 2002
  • Magnetic properties are investigated for top- and bottom-type spin valves of Si/SiO$_2$/NiO(60nm)/Co(2.5nm)/Cu(1.95nm)/Co(4.5nm)/NOL(t nm; Nano Oxide layer). The MR ratios of the bottom-type spin valves with NOL are larger than those of the top-type spin valves. However, the enhancement of the former is lower than the latter. Both of spin-valves also showed almost constant Ap and smaller p. Enhanced MR ratios of spin valves with NOL result mainly from small values of with constant Ap which due to specular diffusive electron scattering at NOL(NiO)/metal interfaces.

Synthesis of NiO and TiO2 Combined SiC Matrix Nanocomposite and Its Photocatalytic MB Degradation

  • Zambaga, Otgonbayar;Jun Hyeok, Choi;Jo Eun, Kim;Byung Jin, Park;Won-Chun, Oh
    • Korean Journal of Materials Research
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    • v.32 no.11
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    • pp.458-465
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    • 2022
  • Interest in the use of semiconductor-based photocatalyst materials for the degradation of organic pollutants in a liquid phase has grown, due to their excellent performance and response to the light source. Herein, we fabricated a NiO-SiC-TiO2 ternary structured photocatalyst which had reduced bandgap energy, with strong activation under UV-light irradiation. The synthesized samples were examined using XRD, SEM, EDX, TEM, DRS, EIS techniques and photocurrent measurement. The results confirmed that the two types of metal oxides were well bonded to the SiC fiber surface. The junction of the new photocatalyst exhibited a large number of photoexcited electrons and holes. The holes tended to oxidize the water and form a hydroxyl radical, which promoted the decomposition of methylene blue. The close contact between the 2D SiC fiber and metal oxide semiconductors expanded the scope of absorption wavelength, and enhanced the usability of the ternary photocatalyst for the degradation of methylene blue. Among three synthesized samples, the NiO-SiC-TiO2 showed the best photocatalytic effect, and was considered to have excellent photoelectron transfer due to the synergy effect between the metal oxide and SiC.

Effects of Sintering Additives and Atmospheres on the Piezoelectric and Sintering Properties of $Pb_{0.98}Cd_{0.02}Zr_{0.36}Ti_{0.39}Ni_{0.083}Nb_{0.167}O_3$ (소결첨가제와 분위기가 $Pb_{0.98}Cd_{0.02}Zr_{0.36}Ti_{0.39}Ni_{0.083}Nb_{0.167}O_3$의 소결 및 압전 특성에 미치는 영향)

  • 문종하;박진성;박현수
    • Journal of the Korean Ceramic Society
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    • v.33 no.11
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    • pp.1260-1266
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    • 1996
  • The effects of SiO2 MnO2 and sintering atmospheres (O2, N2) on the piezoelectric properties and densification behaviors of Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 were investigated. The addition of SiO2 to the system enhanced the rate of densification but supressed the rate of grain growth. On the other hand the addition of MnO2 to the system did not nearly affect the rate of densification but increased slightly the rate of grain growth The densification of Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 containing of SiO2 or MnO2 was promoted with increasing the partial pressure of O2. The relative dielectric constant ($\varepsilon$r) and piezoelectric constant (d33) of Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 containing of SiO2 or MnO2 sintered under O2 atmosphere were higher than under N2 atmosphere. Whereas the mechanical quality factor (Qm) of specimens sintered under O2 atmosphere were lower than under N2 atmosphere. Thus the sintering atmosphere of O2 and N2 in Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 containing of SiO2 or MnO2 acted as donor and acceptor respectively. As the amount of SiO2 increased the relative dielectric constant ($\varepsilon$r) and piezoelectric constant (d33) of Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 but the mechanical quality factor (Qm) did not nearly change, In the case of the addition of MnO2 to the system the relative dielectric constant ($\varepsilon$r) and piezoelectric constant (d33) of Pb0.98Cd0.02Zr0.36Ti0.39Ni0.083Nb0.167O3 sintered under O2 atmosphere decreased rapidly with increasing the amount of MnO2 but they were unchanged with increasing the amount of MnO2 under N2 sintering atmosphere. Therefore the differences of the relative dielect-ric constant ($\varepsilon$r) and piezoelectric constant (d33) due to sintering atmosphere were diminished as the amount of MnO2 increased.

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Ni/ZnO-based Adsorbents Supported on Al2O3, SiO2, TiO2, ZrO2: A Comparison for Desulfurization of Model Gasoline by Reactive Adsorption

  • Meng, Xuan;Huang, Huan;Weng, Huixin;Shi, Li
    • Bulletin of the Korean Chemical Society
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    • v.33 no.10
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    • pp.3213-3217
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    • 2012
  • Reactive adsorption desulfurization (RADS) experiments were conducted over a series of commercial metal oxide supports ($Al_2O_{3-}$, $SiO_{2-}$, $TiO_{2-}$ and $ZrO_{2-}$) supported Ni/ZnO adsorbents. The adsorbents were characterized by X-ray diffraction (XRD), temperature programmed reduction (TPR), and Fourier transform infrared spectroscopy (FTIR) in order to find out the influence of specific types of surface chemistry and structural characteristics on the sulfur adsorptive capacity. The desulfurization performance of all the studied adsorbents decreased in the following order: Ni/ZnO-$TiO_2$ > Ni/ZnO-$ZrO_2$ > Ni/ZnO-$SiO_2$ > Ni/ZnO-$Al_2O_3$. Ni/ZnO-$TiO_2$ shows the best performance and the three hour sulfur capacity can achieve 12.34 mg S/g adsorbent with a WHSV of $4h^{-1}$. Various characterization techniques suggest that weak interaction between active component and support component, high dispersion of NiO and ZnO, high reducibility and large total Lewis acidity of the adsorbents are important factors in achieving better RADS performance.

Phase transformation and magnetic properties of NiFe thin films on Si(100) wafer and SiO2/Si(100) substrate by co-sputtering (Si(100) wafer와 SiO2/Si(100) 기판에 동시 스퍼터링법으로 증착된 NiFe 합금 박막의 상변화 및 자기적 특성)

  • Kang, Dae-Sik;Song, Jong-Han;Nam, Joong-Hee;Cho, Jeong-Ho;Chun, Myoung-Pyo
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.20 no.5
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    • pp.216-220
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    • 2010
  • Ni-Fe alloys have various applications such as thin film inductor, thin film transformer, magnetic head's shield case, etc. Magnetic properties of Ni-Fe thin films depend on the process parameters such as thickness, contents, deposition rate, substrates, etc. In this study, NiFe films with a thickness of about 150nm were deposited on Si(100) wafer and $SiO_2$/Si(100) substrate at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Their phase formation and magnetic properties as a function of annealing temperature were investigated with XRD, FE-SEM and VSM. The assputtered films have BCC structure. With increasing annealing temperature, NiFe thin film for $SiO_2$/Si(100) substrate transformed completely from BCC to FCC phase above $500^{\circ}C$, but some BCC phase remained above $500^{\circ}C$ on Si(100) wafer. For samples annealed at $450^{\circ}C$, squareness ratio of NiFe thin film shows peak value and its saturation magnetization is around 0.0118 emu, which means that the optimum annealing temperature of NiFe thin film seems to be $450^{\circ}C$. The saturation magnetization of films decreased rapidly above the annealing temperature of $500^{\circ}C$ due to phase transformation from BCC to FCC phase.

An Influence of Additional Metals over Ni/SiO2 or Ni/Al2O3 on the Formation of CFC-1113 from CFC-113 (CFC-113로부터 CFC-1113의 합성시 Ni/SiO2(또는 Al2O3) 촉매상에서 다른 금속의 첨가효과)

  • Kim, JinHo;Park, Kun-You;Ha, Baik-Hyon
    • Applied Chemistry for Engineering
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    • v.10 no.2
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    • pp.237-241
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    • 1999
  • Nickel was impregnated on the $SiO_2$ and $Al_2O_3$ supports and applied to the reduction reaction of CFC-113 ($CF_2Cl$-$CFCl_2$) with hydrogen to 3FCl ($CF_2$=CFCl, CFC-1113). The conversion was rapidly declined on the Ni/$SiO_2$(or $Al_2O_3$) and the deactivation accelerated as the increase of Ni content. However, the selectivity of 3FCl was maintained at around 80% level. The simultaneous coprecipitation of copper and lithium on Ni/$Al_2O_3$ improved both the conversion and selectivity to 3FCl, but an excessive amount of lithium reduced the conversion as well as the selectivity of 3FCl. However, in the case of Ni/$SiO_2$, the conversion was greatly reduced possibly due to a loss of silica support with high surface area by the reaction of $SiO_2$ with HF. Such a reduction in conversion also can be ascribed to the decrease in active sites, caused by the addition of alkali metal compound, LiOH.

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