• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.378.1-378.1
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• 2014

In this study, we investigated that the resistance switching characteristics of Nb-doped HfO2 films with increasing Nb doping concentration. The Nb-doped HfO2 based ReRAM devices with a TiN/Nb-doped HfO2/Pt/Ti/SiO2 were fabricated on Si substrates. The Nb-doped HfO2 films were deposited by reactive dc magnetron co-sputtering at $300^{\circ}C$ and oxygen partial ratio of 60% (Ar: 16sccm, O2: 24sccm). Microstructure of Nb-doped HfO2 films and atomic concentration were investigated by XRD, TEM, and XPS, respectively. The Nb-doped HfO2 films showed set/reset resistance switching behavior at various Nb doping concentrations. The process voltage of forming/set is decreased and whereas the initial current level is increased in doped HfO2 films. However, the switching properties of Nb-doped HfO2 were changed above the specific doping concentration of Nb. The change of resistance switching behavior depending on doping concentration was discussed in terms of concentration of non-lattice oxygen and micro-structure of Nb-doped HfO2.

• 한국전기전자재료학회논문지
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• 제11권6호
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• pp.486-492
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• 1998

The amorphous Co-based magnetic films have a large saturation flux density, a low coercive force, and a zero magnetostriction constant. Therefore, they have been studied for application to magnetic recoding heads and micro magnetic devices. However, it was found that the magnetic anisotropy was changed for each film fabrication processes. In this study, we investigated how to control the anisotropy of sputtered amorphous $Co_{89}Nb{8.5}Zr{2.5}$ films. After deposition, the rotational field annealing ant the uniaxial field annealing were performed under the magnetic field of 1.5 kOe. the annealing was done at the temperature range from 400 to $600^{\circ}C$ for one hour. As-deposited amorphous $Co_{89}Nb{8.5}Zr{2.5}$ thin film had saturation magnetization ($4\piM_5$) of 0.8 T, coercive force($_IH_C$) of 1.5 Oe, and anisotropy field($H_k$) of 11 Oe. The amorphous $Co_{89}Nb{8.5}Zr{2.5}$ thin films annealed by rotational field annealing at $500^{\circ}C$ for one hour was found to be isotropy, and $4\piM_5$ of 0.9 T was obtained from these films, Also, the magnetic anisotropy of as-deposited films could be controlled by uniaxial field annealing at $400^{\circ}C$ for one hour. Anisotropy field($H_k$) of 17 Oe and $4\piM_5$ of 1.0 T were obtained by this method.

• 대한치과기공학회지
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• 제26권1호
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• pp.97-104
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• 2004

A new Ti-10Ta-10Nb alloy has designed and examined some possibility of forming more passive oxide film by oxidation treatment which is closely related to corrosion resistance and biocompatibility. Ti-6Al-4V and Ti-10Ta-10Nb alloys were prepared by consumable vacuum arc melting and homogenized at 1050$^{\circ}C$ for 24hours. Alloy specimens were oxidized at the temperature range of 400 to 750$^{\circ}C$ for 30minutes, and the oxide films on Ti alloys were analysed by optical microscope, SEM, XPS and TGA. Cytotoxicity test was performed in MTT assay treated L929 fibroblast cell culture by indirect method. It is found out that the oxide film on Ti-10Ta-10Nb alloy is denser and thinner compared to Ti-6Al-4V alloy. The weight gain during the oxidation was increased rapidly at the temperature above 650$^{\circ}C$ for Ti-6Al-4V alloy and above 700$^{\circ}C$ for Ti-10Ta-10Nb alloy respectively. It was analysed that the passive film of the Ti alloys consisted of TiO2 through X-ray photoelectron spectroscopy (XPS) analysis. It is found out by cytotoxicity test that moderate oxidation treatment lowers cell toxicity, and Ti-10Ta-10Nb alloy showed better result compared to Ti-6Al-4V alloy.

• Corrosion Science and Technology
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• 제2권3호
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• pp.117-126
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• 2003

Due to excellent corrosion resistance and mechanical properties, austenitic stainless steel is widely used as the material for chemical plants. nuclear power plants, and food processing facilities. But, the zone affected by heat in the range of 400 to $800^{\circ}C$ during welding loses corrosion resistance and tensile strength since Cr-carbide precipitation like $Cr_{23}C_6$ forms at the grain boundary and thereby takes place the intergranular corrosion. In this study, AISI 304 stainless steel with the added Nb of 0.3 to 0.7 wt% was solutionized at $1050^{\circ}C$ and sensitized at $650^{\circ}C$. Specimen was welded by MIG. The phase and the microstructure of the specimens were examined by an optical microscope, a scanning electron microscope, and a x-ray diffractometer. The corrosion characteristics of specimens were tested by electrolytic etching and by double loop electrochemical potentiokinetic reactivation method(EPR) in the mixed solution of 0.5M $H_2SO_4$ + 0.01M KSCN. The melting zone had dendritic structure constituted of austenitic phase and $\delta$-ferrite phase. Cr carbide at the matrix did not appear, as Nb content increased. At the grain boundaries of the heat affected zone, the precipitates decreased and the twins appeared. The hardness increased, as Nb content increased. The hardness was highest in the order of the heat affected zone>melted zone>matrix. According to EPR curve, as the Nb content decreased, the reactivation current density(Ir) and the activation current density(la) were highest in the order of the melted zone

• 센서학회지
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• 제6권4호
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• pp.316-327
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• 1997

높은 큐리온도를 가진 다결정 세라믹스 $Sr_{2}Nb_{2}O_{7}$ 및 $La_{2}Ti_{2}O_{7}$을 화학적공침법으로 제조하고 하소분말의 입도분포와 상구조 및 소결특성 등을 조사하였으며, 소결온도에 따른 입자배향도와 전기적 특성을 선행연구 고상반응법 및 용융염합성법과 비교하였다. 화학적공침법을 이용함으로써 고상반응법에 비해 $100{\sim}150^{\circ}C$ 낮은 하소온도에서 단일상을 얻을 수 있었고, 특히 $Sr_{2}Nb_{2}O_{7}$의 경우, $700^{\circ}C$에서 중간 생성물 $Sr_{5}Nb_{4}O_{15}$가 생성된 후 $800^{\circ}C$의 낮은 하소온도에서 단일상이 나타났으며 얻어진 하소분말도 미세하고 균일하였다. 화학적공침법에 의해 $1500^{\circ}C$에서 소결한 $Sr_{2}Nb_{2}O_{7}$ 세라믹스는 이론밀도의 97%에 달하는 우수한 소결성을 보였을 뿐만 아니라 (0k0) 방향의 입자배향도가 현저히 컸으며, 결과적으로 절단방향에 따른 유전특성의 이방성을 나타내어 a-cut 방향의 유전율은 단결정에 비해 손색이 없었다.

• 한국자기학회지
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• 제3권2호
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• pp.130-134
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• 1993

초급냉법중 단롤법으로 제작한 $Fe_{73.5-X}Co_{X}Cu_{1}Nb_{3}Si_{13.5}B_{9}(x=2,\;4)$ 비정질 합금을 $400~650^{\circ}C$에서 열처리하여 자기적 특성을 조사하였다. $Fe_{71.5}Co_{2}Cu_{1}Nb_{3}Si_{13.5}B_{9}$ 비정질 합금의 최적 열처리 온도는 $550^{\circ}C$이며, 이온도에서 열처 리된 시료의 상대 투자율과 항자력은 1 kHz에서 각각 $1.1{\times}10^{4}$, 0.22 Oe이다. $Fe_{69.5}Co_{4}Cu_{1}Nb_{3}Si_{13.5)B_{9}$의 경우는 $600^{\circ}C$에서 열처리 했을때 상대 투자율과 항자력이 각각 $1.0{\times}10^{4}$, 0.19 Oe로 가장 우수한 연자성 특성을 보였다. X-선 실험결과, 이러한 연자성 특성의 향상은 $\alpha$-Fe(Si) 결정립의 형성에 의한 것임을 확인 할 수 있었으며, 강자성 공명 실험에 의하면 최적 열처리 조건은 공명 흡수선의 반치폭이 급격히 증가하기 직전의 온도임을 알 수 있었다.

• 한국재료학회지
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• 제11권4호
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• pp.290-293
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• 2001

세라믹 타겟인 Sr$_2$Nb$_2$O$_{7}$ (SNO)과 Bi$_2$O$_3$을 장착한 RF-마그네트론 스퍼터링을 이용하여 SrBi$_2$Nb$_2$O$_{9}$ (SBN) 박막을 p-type Si(100) 기판 위에 증착하였다. 증착시 두 타겟의 파워비를 조절하여 조성의 변화에 따른 SBN 박막의 구조적 및 전기적 특성을 조사하였다. 증착된 SBN 박막은 $700^{\circ}C$의 산소분위기에서 1시간 동안 열처리를 하였으며 상부전극으로 Pt를 증착한 후 산소분위기에서 30분 동안 $700^{\circ}C$에서 전극 후열처리를 실시하였다. 증착된 SBN 박막은 $700^{\circ}C$ 열터리 후에 페로브스카이트 상을 나타냈으며 SNO 타겟과 Bi$_2$O$_3$타겟의 파워가 120 W/100 W 일 때 가장 좋은 전기적 특성을 나타내었다. 이때의 조성은 EPMA(Electron Probe X-ray Micro Analyzer) 분석을 통하여 확인하였으며 Sr:Bi:Nb의 비가 약 1:3:2임을 나타내었다. 이러한 과잉의 Bi조성을 가진 SBN 박막은 3-9 V의 인가전압에서 1.8 V-6.3 V의 우수한 메모리 윈도우 값을 나타내었으며 누설전류 값은 인가전압 5 V에서 1.54$\times$$10^{-7}$ A/$\textrm{cm}^2$였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.657-661
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• 2002

PZT powder was prepared by partial oxalate method using $(Zr_{0.53}Ti_{0.47})O_2$, $Pb(NO_3)_2$ and $(COOH)_2{\cdot}2H_2O$ as a precipitant. $Nb_2O_5$ additive effect on microstructure and piezoelectric properties of PZT ceramics were investigated. The coexistence of rhombohedral and tetragonal phases of PZT ceramics at the sintering temperature of $1100^{\circ}C$ was revealed from the X-ray diffraction patterns. The grain size PZT ceramics was decreased with the increase $Nb^{5+}$. and the sinterbility of PZT ceramics was decreased with the increase $Nb^{5+}$ addition. The electromechanical coupling factors $K_p$ show above 0.60 at $1100^{\circ}C$ sintering temperature by $Nb_2O_5$ addition above 0.6mol%.

• 한국세라믹학회지
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• 제33권10호
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• pp.1101-1108
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• 1996

No-doped PZT thin films have been fabricated on Pt/Ti/SiO2/Si substrate using Sol-Gel technique. A fast annealing metho (three times of intermediate and final annealing) was used for the preparation of multi-coated 1800$\AA$ thick Nb-doped PZT thin films. As Nb doping percent was increased leakage current was lowered approximately 2 order but dielectic properties were degraded due to the appearance of pyrochlore phase and domain pinning. Futhermore the increase of the final annealing temperature up to 74$0^{\circ}C$lowered the pyrochlore phase content resulting in enhancing the dielectric properties of the Nb doped films. The 3%-Nb doped PZT thin films with 5% excess Pb showed a capacitance density of 24.04 fF/${\mu}{\textrm}{m}$2 a dielectric loss of 0.13 a switchable polarization of 15.84 $\mu$C/cm2 and a coercive field of 32.7 kV/cm respectively. The leakage current density of the film was as low as 1.47$\times$10-7 A/cm2 at the applied voltage of 1.5 V.

• 열처리공학회지
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• 제16권2호
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• pp.83-89
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• 2003

As a research for developing fine-grained high strength low carbon steels, the effects of austenitization temperature and hot deformation on microstructure was investigated in 0.15 wt.% carbon steels with microalloying elements such as Nb and Ti. When the steels were reheated at $1250^{\circ}C$, Nb containing steel showed very coarse austenite grain size of $200{\mu}m$ whereas Nb-Ti steel did fine one of $70{\mu}m$ because Ti carbonitrides could suppress the austenite grain growth. In case of 50% reduction at $850^{\circ}C$, the austenite grains in the Nb steel partially recrystallized while those in the Nb-Ti steel fully recrystallized probably due to finer prior austenite grains.For the Nb-Ti steel, ferrite grain size was not sensitively changed with austenitization temperature and compression strain and, severe deformation of 80% reduction was not essentially necessary to refine ferrite grains to about $3{\mu}m$ which could be obtained through lighter deformation of 40% reduction.