• Journal of Surface Science and Engineering
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• v.29 no.5
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• pp.357-362
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• 1996

Several applications of radio-frequency (RF) thermal plasma to film formation are reviewed. Three types of injection plasma processing (IPP) technique are first introduced for the deposition of materials. Those are thermal plasma chemical vapor deposition (CVD), plasma flash evaporation, and plasma spraying. Radio-frequency (RF) plasma and hybrid (combination of RF and direct current(DC)) plasma are next introduced as promising thermal plasma sources in the IPP technique. Experimental data for three kinds of processing are demonstrated mainly based on our recent researches of depositions of functional materials, such as high temperature semiconductor SiC and diamond, ionic conductor $ZrO_2-Y_2O_3$ and high critical temperature superconductor $YBa_2Cu_3O_7-x$. Special emphasis is given to thermal plasma flash evaporation, in which nanometer-scaled clusters generated in plasma flame play important roles as nanometer-scaled clusters as deposition species. A novel epitaxial growth mechanism from the "hot" clusters namely "hot cluster epitaxy (HCE)" is proposed.)" is proposed.osed.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.529-530
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• 2006

This paper concerned with SPS (spark plasma sintering), hot pressing of sinter nanometer WC-Co powder and discussed the density, hardness, microstructures and grain sizes of the alloys sintered. The results showed that the two sintered techniques could produce high density alloys and play well on the grain growth, but SPS could lower the sintering temperature and shorten sintering time. Besides, the hardness of the sintered cemented alloys that was dependent on the grain size and densification could also be improved.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.330-333
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• 2005

The fabrication of mold fur nano imprint lithography (NIL) is experimentally reported using the scanning probe lithography (SPL) technique, instead of the conventional I-beam lithography technique. The nanometer scale patterning structure is fabricated by the localized generation of oxide patterning on the silicon (100) wafer surface with a thin oxide layer, The fabrication method is based on the contact mode of scanning probe microscope (SPM) in air, The precision cleaning process is also performed to reach the low roughness value of $R_{rms}=0.084 nm$, which is important to increase the reproducibility of patterning. The height and width of the oxide dot are generated to be 15.667 nm and 209.5 nm, respectively, by applying 17 V during 350 ms.

• Journal of Magnetics
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• v.10 no.3
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• pp.113-117
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• 2005

Some polycrystalline ferromagnetic mms are composed of continuously connected nanometer scale islands with random crystallite orientations. The nanometer perturbations of the mm introduce a large number of nearly degenerate local field configurations that are indistiguishable on a macroscopic scale. As a first step, this situation is modelled as a thin ferromagnetic disc coupled by exchange and dipole interactions to a homogeneous ferromagnetic plane, where the disc and plane have different easy axes. The model is solved to find the partial $N\acute{e}el$ domain walls that minimize the magnetic energy. The two solutions give a bistable configuration that, for appropriate geometries, provides an important microsopic ferromagnetic degree of freedom for the mm. These results are used to interpret recent measurements of exchange biased bilayer films.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 2000.06a
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• pp.87-125
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• 2000

A new paradigm of crystal growth was suggested in a charged cluster model, where charged clusters of nanometer size are suspended in the gas phase in most thin film processes and are a major flux for thin film growth. The existence of these hypothetical clusters was experimentally confirmed in the diamond and silicon CVD processes as well as in gold and tungsten evaporation. These results imply new insights as to the low pressure diamond synthesis without hydrogen, epitaxial growth, selective deposition and fabrication of quantum dots, nanometer-sized powders and nanowires or nanotubes. Based on this concept, we produced such quantum dot structures of carbon, silicon, gold and tungsten. Charged clusters land preferably on conducting substrates over on insulating substrates, resulting in selective deposition. if the behavior of selective deposition is properly controlled, charged clusters can make highly anisotropic growth, leading to nanowires or nanotubes.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.07a
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• pp.136-136
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• 1997

• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.103.2-103.2
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• 2009

• Proceedings of the Optical Society of Korea Conference
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• 2007.07a
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• pp.59-60
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• 2007

• Proceedings of the Korean Vacuum Society Conference
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• 2004.08a
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• pp.187-187
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• 2004

• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.407-408
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• 2006