• 제목/요약/키워드: Nanoindenter

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Characteristics of Plasma Polymer Thin Films for Low-dielectric Application

  • Cho, S.J.;Boo, J.H.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.124-124
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    • 2011
  • This study investigated the interaction of varied plasma power with ultralow-k toluene-tetraethoxysilane (TEOS) hybrid plasma polymer thin films, as well as changing electrical and mechanical properties. The hybrid thin films were deposited on silicon(100) substrates by plasma enhanced chemical vapor deposition (PECVD) system. Toluene and tetraethoxysilane were utilized as organic and inorganic precursors. In order to compare the electrical and the mechanical properties, we grew the hybrid thin films under various conditions such as rf power of plasma, bubbling ratio of TEOS to toluene, and post annealing temperature. The hybrid plasma polymer thin films were characterized by Fourier transform infrared (FT-IR) spectroscopy, atomic force microscopy (AFM), nanoindenter, I-V curves, and capacitance. Also, the hybrid thin films were analyzed by using ellipsometry. The refractive indices varied with the RF power, the bubbling ratio of TEOS to toluene, and the annealing temperature. To analyze their trends of electrical and mechanical properties, the thin films were grown under conditions of various rf powers. The IR spectra showed them to have completely different chemical functionalities from the liquid toluene and TEOS precursors. Also, The SiO peak intensity increased with increasing TEOS bubbling ratio, and the -OH and the CO peak intensities decreased with increasing annealing temperature. The AFM images showed changing of surface roughness that depended on different deposition rf powers. An nanoindenter was used to measure the hardness and Young' modulus and showed that both these values increased as the deposition RF power increased; these values also changed with the bubbling ratio of TEOS to toluene and with the annealing temperature. From the field emission scanning electron microscopy (FE-SEM) results, the thickness of the thin films was determined before and after the annealing, with the thickness shrinkage (%) being measured by using SEM cross-sectional images.

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나노 인덴터를 이용한 플라즈마 디스플레이 소자(PDP)내 격벽의 기계적 물성 평가 (Evaluation of Mechanical Properties of Barrier Ribs for Plasma Display Panel Using Nano Indenter Technology)

  • 정병해;김형순
    • 한국재료학회지
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    • 제13권1호
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    • pp.53-58
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    • 2003
  • For the rib materials in PDP(plasma display panel), an effective method to improve the mechanical properties is to form a composite material by reinforcing a glass matrix with rigid fillers, such as alumina and titania powders. In this study, two types of ribs with different volume percent of fillers and with different glass matrix were tested for hardness, Young's modulus with the Berkovich indentation. As a result, cracks appeared around at the load of 1345 mN for the dense type of rib, while porous one endured until 2427 mN without any crack formation. Young's modulus and hardness decreased at the range: 90∼65 GPa, 9∼4 GPa, respectively as a function of indent load. Thus, a new method with nanoindenter represents a possible evaluation method for mechanical properties of barrier ribs.

기계화학적 극미세 가공기술을 이용한 PDMS 복제몰딩 공정용 서브마이크로 몰드 제작에 관한 연구 (A Study on the Fabrication of Sub-Micro Mold for PDMS Replica Molding Process by Using Hyperfine Mechanochemical Machining Technique)

  • 윤성원;강충길
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.351-354
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    • 2004
  • This work presents a simple and cost-effective approach for maskless fabrication of positive-tone silicon master for the replica molding of hyperfine elastomeric channel. Positive-tone silicon masters were fabricated by a maskless fabrication technique using the combination of nanoscratch by Nanoindenter ⓡ XP and XOH wet etching. Grooves were machined on a silicon surface coated with native oxide by ductile-regime nanoscratch, and they were etched in a 20 wt% KOH solution. After the KOH etching process, positive-tone structures resulted because of the etch-mask effect of the amorphous oxide layer generated by nanoscratch. The size and shape of the positive-tone structures were controlled by varying the etching time (5, 15, 18, 20, 25, 30 min) and the normal loads (1, 5 mN) during nanoscratch. Moreover, the effects of the Berkovich tip alignment (0, 45$^{\circ}$) on the deformation behavior and etching characteristic of silicon material were investigated.

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열간나노임프린트공정을 이용한 평판형 폴리머 소재의 선형 패턴 제작에 관한 연구 (A study on Linear Pattern Fabrication of Plate-type Polymer by Using Thermal Nano Imprint Lithography Process)

  • 정유나;이창수;윤성원;강충길
    • 소성∙가공
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    • 제18권8호
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    • pp.616-624
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    • 2009
  • In this work we demonstrate the hot-embossing process under different forming conditions such as forming temperature, load, and holding time in pressing, in order to determine the suitable conditions required for linear patterning on polymer plates (PC). Results showed that the replicated pattern depth increased in proportion to an increase in the forming temperature, load, and time. The reduction of the workpiece thickness increased according to the holding time in the pressing process. In the process of time, the reduction ratio of the workpiece thickness decreased due to the surface area increment of the workpiece, while the pressure on the workpiece declined. In order to reduce the bulging ratio we introduced a temperature difference between the upper and the lower punch.

원통형 보이스 코일 모터 설계 및 특성 해석 (Design and Characteristic Analysis of a Cylindrical Voice Coil Motor)

  • 이홍교;유용민;권병일
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 B
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    • pp.1034-1036
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    • 2004
  • The most basic form of a direct-drive linear motor is the voice coil motor(VCM). The voice coil motor employs a stationary permanent magnet field assembly in conjunction with a moving coil winding assembly to produce a force proportional to the current applied to the coil. Voice coil motor provide motion capable of extremely fine position sensitivity, limited only by the feedback sensor used to close the control loop. This paper presents dual-servo voice coil motor for improvement of driving range and position resolution. The voice coil motor is a cylindrical shape to improve reliability of a nanoindenter.

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기판바이어스 변화에 따른 반응성 마그네트론 스퍼터링에 의한 TiN 코팅 (TiN coatings by reactive magnetron sputtering under substrate bias)

  • 서평섭;한만근;박원근;전성용
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2008년도 추계학술대회 초록집
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    • pp.45-46
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    • 2008
  • Hard coatings of TiN which exhibit a large variation in their electrical resistivities, have been prepared in magnetron sputtering system using bipolar pulsed DC generator. TiN coatings have also been prepared using a DC generator in the same sputtering system under identical deposition conditions. Microstructural, Mechanical, Crystallographic properties of TiN films using continuous and bipolar pulsed DC generators were examined. Field emission scanning microscope and Nanoindenter have been used to characterize the coatings.

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고효율 DC 마그네트론 스파터링법으로 성장시킨 다이아몬드상 카본의 물리적, 전기적 특징 (Physical and Electrical Properties of Amorphous Carbon(a-C) Thin Films Grown by High Rate DC Magnetron Sputtering method)

  • 박용섭;한전건;홍병유
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.83-87
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    • 2003
  • Thin films of amorphous carbon (a-C) generally combine high wear resistance with low friction coefficients and a-C films have widespread applications as protective coatings and passivation of electrical circuit and insulating layer. In this work we deposited the amorphous carbon (a-C) films on silicon substrate with a high rate DC magnetron sputtering system. It is obtained parameters on the deposition rate and physical properties of a-C films using a wide range of Ar gas pressure and DC power. The physical properties of the films were analyzed by Nanoindenter and AFM (Atomic Force Microscopy), The electrical properties were investigated by electrical conductivity measurement.

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마스크리스 나노 패턴제작을 위한 나노스크래치 된 Si(100) 표면의 식각 마스크 효과에 관한 연구 (Study on the Masking Effect of the Nanoscratched Si (100) Surface and Its Application to the Maskless Nano Pattern fabrication)

  • 윤성원;강충길
    • 한국정밀공학회지
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    • 제21권5호
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    • pp.24-31
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    • 2004
  • Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

압입자 첨단마모에 따른 나노압입곡선의 변화 및 이의 보정기법 (Variation of Nanoindentation Curve due to Wear of Indenter Apex and Its Correction Method)

  • 이윤희;김용일;박종서;김광호
    • 비파괴검사학회지
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    • 제33권2호
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    • pp.129-137
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    • 2013
  • 나노압입시험기의 힘교정과 압입자에 대한 3차원 형상 관찰 및 분석이 본 연구에서 진행되었다. 표준분동으로 교정한 마이크로밸런스로 나노압입시험기에서 발생시킨 하중을 측정하여 측정치와 발생치의 비로 압입하중을 교정하였고, 나노압입시험의 시작점인 초기 접촉 하중도 확인할 수 있었다. 삼각뿔 압입자를 원자현미경으로 관찰하여 분석한 결과 비교적 사용이력이 없는 압입자 A와 마모된 압입자 B의 첨단곡률반경은 각각 $19.71{\pm}3.03$ nm와 $1043.94{\pm}50.91$ nm로 결정되었다. 완벽한 삼각뿔 압입자 형상과 중첩하여 압입자 A와 B의 첨단무딘깊이(bluntness depth)를 1.22 nm와 64.56 nm로 결정하였고, 용해실리카 기준시편에 수행한 나노압입시험 결과를 살펴본 결과 두 압입자의 압입하중-변위곡선들이 무딘깊이 차이만큼 수평축으로 서로 어긋나 있음을 확인할 수 있었다. 수평 이동을 통해 보정된 압입곡선의 분석을 통해 개별 압입자 면적함수에 대한 고려없이 1.11 % 이내에서 동일한 용해실리카의 나노경도를 결정할 수 있었다.

반응성 스퍼터링법에서의 RF전력, 기판온도 및 가스유량비가 WCx막의 기계적 특성에 끼치는 효과 (Effects of RF Power, Substrate Temperature and Gas Flow Ratio on the Mechanical Properties of WCx Films Deposited by Reactive Sputtering)

  • 박연규;이종무
    • 한국재료학회지
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    • 제15권10호
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    • pp.621-625
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    • 2005
  • Effects of rf power, pressure, sputtering gas composition, and substrate temperature on the deposition rate of the $WC_x$ coatings were investigated. The effects of rf power and sputtering gas composition on the hardness and corrosion resistance of the $WC_x$ coatings deposited by reactive sputtering were also investigated. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) analyses were performed to determine the structures and compositions of the films, respectively. The hardnesses of the films were investigated using a nanoindenter, scanning electron microscopy, ana a salt-spray test, respectively. The deposition rate of the films was proportional to rf power and inversely proportional to the $CH_4$ content of $Ar/CH_4$ sputtering gas. The deposition rate linearly increased with increasing chamber pressure. The hardness of the $WC_x$ coatings Increased as rf power increased. The highest hardness was obtained at a $Ar/CH_4$ concentration of $10 vol.\%$ in the sputtering gas. The hardness of the $WC_x$ film deposited under optimal conditions was found to be much higher than that of the electroplated chromium film, although the corrosion resistance of the former was slightly lower than that of the latter.