• Title/Summary/Keyword: Nano-sized thin film

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Rapid Fabrication of Micro-nano Structured Thin Film for Water Droplet Separation using 355nm UV Laser Ablation (355 nm UV 레이저 어블레이션을 이용한 마이크로-나노 구조의 액적 분리용 박막 필터 쾌속 제작)

  • Shin, Bo-Sung
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.7
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    • pp.799-804
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    • 2012
  • Recently micro-nano structures has widely been reported to improve the performance of waterproof, heat isolation, sound and light absorption in various fields of electric devices such as mobiles, battery, display and solar panels. A lot of micro-sized holes on the surface of thin film provide excellent sound, or heat, or light transmission efficiency more than solid film and simultaneously nano-sized protrusions around micro hole increase the hydrophobicity of the surface of thin film because of lotus leaf effects as generally known previously. In this paper new rapid fabrication process with 355 nm UV laser ablation was proposed to get micro-nano structures on the surface of thin film, which have only been observed at higher laser fluence. Developed thin micro-nano structured film was also investigated the hydrophobic property by measuring the contact angle and demonstrated the possibility to apply to water droplet separation.

Fabrication of the alumina membrane with nano-sized pore array using the thin film aluminum (박막 알루미늄을 이용한 나노미터 크기의 미세기공 형성)

  • Lee, Byoung-Wook;Lee, Jae-Hong;Lee, Eui-Sik;Kim, Chang-Kyu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.120-122
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using thin film aluminum deposited on silicon wafer was fabricated. It is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2M was used for low voltage anodization under 100V, the chromic acid with 0.1M was used for high voltage anodization over 100V. The nano-sized pores with diameter of 60~120nm was obtained by low voltage anodization of 40~90V and those of 200~300nm was obtained by high voltage anodization of 120~160V. Finally, the sample was immersed to the phosphoric acid with 0.1M concentration to etching the barrier layer. The sample will be applied to electronic sensors, field emission display, and template for nano-structure.

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A Dual Micro Gas Sensor Array with Nano Sized $SnO_2$ Thin Film (나노 박막을 이용한 듀얼 $SnO_2$ 마이크로 가스센서 어레이)

  • Chung Wan-Young
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.9
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    • pp.1641-1647
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    • 2006
  • A dual micro gas sensor way for detecting reducing gas and bad order was fabricated using nano sized $SnO_2$ thin film fabrication method. To make nano-sized thin gas sensitive $SnO_2$ thin rilm, thin tin metal layer $2500{\AA}$ thick was oxidized between 600 and $800^{\circ}C$ by thermal oxidation. The gas sensing layers such as $SnO_2,\;SnO_2(+Pt)\;and\;SnO_2(+CuO)$ were patterned by metal shadow mask for simple fabrication process on the silicon substrate. The micro gas sensors with $SnO_2(Pt)$ and $SnO_2(+CuO)$ showed good selectivity to CO gas among reducing gases and good sensitivity to $H_2S$ that is main component of bad odor, separately.

Development of Fabrication Technique of Highly Ordered Nano-sized Pore Arrays using Thin Film Aluminum (박막 알루미늄을 이용한 규칙적으로 정렬된 나노급 미세기공 어레이 제조기술 개발)

  • Lee, Jae-Hong;Kim, Chang-Kyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.8
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    • pp.708-713
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    • 2005
  • An alumina membrane with nano-sized pore array by anodic oxidation using the thin film aluminum deposited on silicon wafer was fabricated. It Is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. While the oxalic acid with 0.2 M was used for low voltage anodization under 100 V, the chromic acid with 0.1 M was used for high voltage anodization over 100 V. The nano-sized pores with diameter of $60\~120$ nm was obtained by low voltage anodization of $40\~80$ V and those of $200\~300$ nm was obtained by high voltage anodization of $140\~200$ V. The pore widening process was employed for obtaining the one-channel with flat surface because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. Finally, the sample was immersed to the phosphoric acid with 0.1 M concentration to etching the barrier layer.

Highly Sensitive MEMS-Type Micro Sensor for Hydrogen Gas Detection by Modifying the Surface Morphology of Pd Catalytic Metal (Pd 촉매금속의 표면형상 변형에 의한 고감도 MEMS 형 마이크로 수소가스 센서 제조공정)

  • Kim, Jung-Sik;Kim, Bum-Joon
    • Korean Journal of Materials Research
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    • v.24 no.10
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    • pp.532-537
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    • 2014
  • In this study, highly sensitive hydrogen micro gas sensors of the multi-layer and micro-heater type were designed and fabricated using the micro electro mechanical system (MEMS) process and palladium catalytic metal. The dimensions of the fabricated hydrogen gas sensor were about $5mm{\times}4mm$ and the sensing layer of palladium metal was deposited in the middle of the device. The sensing palladium films were modified to be nano-honeycomb and nano-hemisphere structures using an anodic aluminum oxide (AAO) template and nano-sized polystyrene beads, respectively. The sensitivities (Rs), which are the ratio of the relative resistance were significantly improved and reached levels of 0.783% and 1.045 % with 2,000 ppm H2 at $70^{\circ}C$ for nano-honeycomb and nano-hemisphere structured Pd films, respectively, on the other hand, the sensitivity was 0.638% for the plain Pd thin film. The improvement of sensitivities for the nano-honeycomb and nano-hemisphere structured Pd films with respect to the plain Pd-thin film was thought to be due to the nanoporous surface topographies of AAO and nano-sized polystyrene beads.

Mechanical characterization of 100 nm-thick Au thin film using strip bending test (띠 굽힘 시험을 통한 100 nm 두께 금 박막의 기계적 특성 평가)

  • Kim, J.H.;Lee, H.J.;Han, S.W.;Baek, C.W.;Kim, J.M.;Kim, Y.K.
    • Proceedings of the KSME Conference
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    • 2004.04a
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    • pp.252-257
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    • 2004
  • Nanometer-sized structures are being applied to many devices including micro/nano electronics, optoelectronics, quantum devices, MEMS/NEMS, biosensors, etc. Especially, the thin film with submicron thickness is a basic structure for fabricating these devices, but its mechanical behaviors are not well understood. The mechanical properties of the thin film are different from those of the bulk structure and are difficult to measure because of its handling inconvenience. Several techniques have been applied to mechanical characterization of the thin film, such as nanoindentation test, micro/nano tensile test, strip bending test, etc. In this study, we focus on the strip bending test because of its high accuracy and moderate specimen preparation efforts, and measure Au thin film, which is a very popular material in micro/nano electronic devices. Au film is deposited on Si substrate by evaporation process, of which thickness is 100nm. Using the strip bending test, we obtain elastic modulus, yield and ultimate tensile strength, and residual stress of Au thin film.

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Developments of Transparent ac-PDPs

  • Choi, Hak-Nyun;Lee, Seog-Young;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1621-1624
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    • 2008
  • Transparent ac-PDP test panel was prepared via a combination of materials including ITO sustaining electrodes, thin film dielectric layer and nano-sized phosphor powders. The thin film dielectric layer was prepared by E-beam evaporation process and phosphor layer was deposited on metal mesh pattern by electrophoretic deposition process. The optical transmittance and luminance of the panel indicated that full color transparent ac-PDP is feasible with the approach.

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Development of process technique of the alumina membrane with nano-sized pore array (나노미터 크기의 미세구조물을 제작하기 위한 공정기술 개발)

  • Lee, J.H.;Lee, B.W.;Kim, C.K.;Lee, K.H.
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.1971-1973
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    • 2005
  • We fabricated an alumina membrane with nano-sized pore array by anodic oxidation using the thin film aluminum deposited on silicon wafer. It is important that the sample prepared by metal deposition method has a flat aluminum surface and a good adhesion between the silicon wafer and the thin film aluminum. The oxidation time was controlled by observation of current variation. The nano-sized pores with diameter of $60{\sim}120nm$ was obtained by $40{\sim}80$ voltage. The pore widening process was employed for obtaining the flat surface because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of rough surface. Finally, the sample was immersed to the phosphoric acid with 0.1M concentration to etching the barrier layer. The sample will be applied to electronic sensors, field emission display, and template for nano- structure.

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Anisotropy Coupling in Patterned Thin Films with Mixed Uniaxial Anisotropies

  • Nam, Yoon Jae;Lee, Tae Young;Lim, Sang Ho
    • Journal of Magnetics
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    • v.19 no.3
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    • pp.232-236
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    • 2014
  • Anisotropy coupling in thin films with mixed induced and shape anisotropies is investigated. A 200-nm-thick Co-Fe-Pd-B thin film with a large induced anisotropy of 57 Oe is fabricated and then patterned into micron-sized cells to provide shape anisotropy, whose strength has a similar magnitude to that of the induced anisotropy for enhancing the anisotropy coupling. The angles between the two mixed anisotropies considered are $0^{\circ}$, $90^{\circ}$, and $110^{\circ}$. Hysteresis loops measured under in-plane magnetic fields along various directions indicate no anisotropy coupling behaviour for all the three angles examined in this study.

Granular Thin Film of Titanium Dioxide for Hydrogen Gas Sensor (입상의 이산화티타늄 박막을 이용한 수소센서)

  • Song, Hye-Jin;Oh, Dong-Hoon;Jung, Jin-Yeun;Nguyen, Duc Hoa;Cho, You-Suk;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.19 no.6
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    • pp.325-329
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    • 2009
  • Titanium dioxide thin films were fabricated as hydrogen sensors and its sensing properties were tested. The titanium was deposited on a $SiO_2$/Si substrate by the DC magnetron sputtering method and was oxidized at an optimized temperature of $850^{\circ}C$ in air. The titanium film originally had smooth surface morphology, but the film agglomerated to nano-size grains when the temperature reached oxidation temperature where it formed titanium oxide with a rutile structure. The oxide thin film formed by grains of tens of nanometers size also showed many short cracks and voids between the grains. The response to 1% hydrogen gas was ${\sim}2{\times}10^6$ at the optimum sensing temperature of $200^{\circ}C$, and ${\sim}10^3$ at room temperature. This extremely high sensitivity of the thin film to hydrogen was due partly to the porous structure of the nano-sized sensing particles. Other sensor properties were also examined.