• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.560-560
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• 2012

We report a one-step fabrication method of Poly(9,9-dioctylfluorene) (PFO) nanowire array with pronounced ${\beta}$-Phase. We use liquid-bridge-mediated nanotransfer molding (LB-nTM) which is a new direct nano-patterning method based on the direct transfer of various materials from a mold to a substrate via liquid layer. The formation of the ${\beta}$-phase morphology in the resulting PFO nanowire array was evidenced by the presence of an absorption peak at 435nm. With the collection polarizer oriented parallel to the wire long axis, the PL emission was most intense and an emission dichroic ratio, DRE, of 3.7 was determined. The nanowire array have been investigated by scanning electron microscopy (SEM). Also, we simply fabricated structure of device of ITO/PFO nanowire arrays/Al and the electroluminescence spectra were recorded at various applied voltage.

• Journal of Ocean Engineering and Technology
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• v.27 no.2
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• pp.114-120
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• 2013

A superhydrophobic surface means that the contact angle between the solid surface and a water droplet is more than $150^{\circ}$. Materials with a superhydrophobic surface have a self-cleaning function because of the Lotus effect, in which water is not absorbed by the material but rolls off of it. If such a Lotus effect can be applied to the surface of underwater vessels, submarines, torpedos, and so on, enhanced vessels can be made based on this lubricant effect reducing the friction coefficient for the liquid. Because polymer composites can be easily applied in various nanotechniques, they are more advantageous than conventional materials like iron in terms of a superhydrophobic surface. Furthermore, a superhydrophobic surface bring enhanced anticorrosion and ecotechnology because no paint is needed on underwater vessels.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1122-1124
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• 2009

Organic thin-film transistors (OTFTs) were fabricated by using the transfer patterning method. In order to remove Au pattern easily, UV-curable polymer mold was surface treated. Au source/drain (S/D) pattern was transferred to insulator-coated substrate surface. Fabricated OTFTs were compared to OTFTs using vacuum-deposited Au S/D. Additionally, transistor diodes were characterized.

• Ceramist
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• v.21 no.1
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• pp.64-79
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• 2018

Recent years, OLEDs have been progressed intensively and been widely applied to Display and Lighting industry,Almost 100% internal quantum efficiency was achieved by developing new materials and structure optimization. However, external quantum efficiency was still low due to total internal reflection of light inside OLED devices and absorption of light at the surface of metal electrode. In order to improve external quantum efficiency of OLED devices, various kinds of optical functional structures were introduced to inside and outside of OLED devices to increase light extraction efficiency. In this paper, various efforts to apply optical functional structures in OLED devices were reviewed and way to improve light extraction efficency of OLED devices were discussed.

• Electrical & Electronic Materials
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• v.9 no.1
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• pp.59-66
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• 1996

Polyimides containing cyclobutane ring in main chain is known to be thermally stable and able to be developed in organic solvents after photolysis with 254 nm UV light. This type of polyimides can be used as promising positive photoresist in VLSI fabrication process. In the current VLSI process, photoresist films are formed by spin coating. The film thickness is more than several hundred nano meters. It seems that there is room for improvement of film coating process by introducing Langmuir Blodgett technique. Thereby ultra thin film photoresist can be formed, and higher density of integration in VLSI be achieved. In the present work, depositing procedure of LB films of this polyimide was investigated. LB film thickness was measured by ellipsometry to evaluate deposited film status. Chemical imidization procedure was studied to avoid several problems in thermal imidization. The pattern of submicron dimension has successfully formed on LB film of 8nm thick, which found showing good contrast.

• Polymer Science and Technology
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• v.20 no.5
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• pp.472-480
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• 2009

반도체 미세화가 진행되면서, 이를 성공하기 위해 많은 재료물질이 요구되어진다. 이 중 미세 패턴의 붕괴를 막고 깊은 패턴을 새기기 위해서 필요한 hardmask 재료가 있다. Hardmask는 유기실리콘 재료와 탄소 함량이 높은 재료로 주로 구성되고, 이들은 193 nm 빛과 관련된 광학적 특성을 가지면서 특정 플라즈마에 대한 에치 저항성을 가지는 물성을 가지도록 디자인/합성/배합되어져 있다. 또한, 접합되는 다른 박막과의 compatibility및 용매에 대한 solubility 등이 적절해야만 나노미터 수준의 defect 없는 패턴을 구현할 수 있다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.92.1-92.1
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• 2013

Molecular electronics has been the subject of intese research for many years because of the fundamental interest in molecular charge transport and potential applications, such as (bio)nanosensors and molecular memory devices. Molecular electronics requires a method for making reliable eletrical contacts to singlemolecules. To date, several approaches have been reported: scanning-probe microscopy, mechanical break junctions, nano patterning, and direct deposition of electrode on a self-assembled monolayers. However, most methods are laborious and difficult for large-scale application and more importantly, cannot control the number of moleucles in the junction. Recently, DNA has been used as a template for metallic nanostructures (e.g., Ag, Pd, and Au nanowires) through DNA metallization process. Furthermore, oligodeoxynucleotides have been tethered to organic molecules by using conventional organic reactions. Collectively, these techniques should provide an efficient route toward reliable and reproducible molecular electronic devices with large-scale fabrication. Therefore, I will present a paradigm for the fabrication of moleuclar electronic devices by using micrometer-sized DNA-singe organic molecule and DNA triblock structures.

• International Journal of Precision Engineering and Manufacturing
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• v.6 no.4
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• pp.49-54
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• 2005

In this paper, micro structuring technique using localized electrochemical deposition (LECD) with ultra short pulses was investigated. Electric field in electrochemical cell was localized near the tool tip end region by applying pulses of a few hundreds of nano second duration, Pt-Ir tip was used as a counter electrode and copper was deposited on the copper substrate in mixed electrolyte of 0.5 M $CuSO_4$ and 0.5 M $H_2SO_4$, The effectiveness of this technique was verified by comparison with ECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration were investigated. The proper condition was selected based on the results of the various experiments. Micro columns less than $10{\mu}m$ in diameter were fabricated using this technique. The real 3D micro structures such as micro spring and micro pattern were made by the presented method.

• Journal of the Korean institute of surface engineering
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• v.47 no.6
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• pp.362-367
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• 2014

We report the design, fabrication of a $Si_3N_4$ probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress $Si_3N_4$ material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.

• KSBB Journal
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• v.22 no.6
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• pp.433-437
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• 2007

A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.