• 제목/요약/키워드: Nano pattern

검색결과 478건 처리시간 0.052초

집속이온빔의 가공 공정 메카니즘 연구 (Manufacturing Mechanism of FIB-CVD using Focused Ion Beam)

  • 강은구;최병열;이석우;홍원표;최헌종
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.925-928
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05$\mu\textrm{m}$ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.

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Fabrication of Printed Microfluidics Channel by using Thermal Roll-Imprinting

  • Yu, Jong-Su;Jo, Jeong-Dai;Yoon, Seong-Man;Kim, Hee-Yeoun;Kim, Dong-Soo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1472-1475
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    • 2009
  • The microfluidics channel were fabricated using thermal roll-imprinting process on plastic substrates. As rollimprinting surface is heated directly at $100^{\circ}C$ and printing process proceed 380/400 kgf pressure, we fabricated microfluidic patterns separated line of $40.04{\mu}m$, serpentine line of $113.89{\mu}m$ and depth of imprint pattern is $15.35{\mu}m$, it means to get fine pattern has more than 70% imprint rate in designed mask.

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절삭 깊이의 무작위 제어를 적용한 다이아몬드 선삭공정에서 소재회전 반경에 따른 미세패턴의 크기변화 분석 연구 (A study on size variation of micro-pattern according to turning radius of workpiece in diamond turning with controlled random cutting depth)

  • 정지영;한준세;최두선;제태진
    • Design & Manufacturing
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    • 제14권1호
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    • pp.63-68
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    • 2020
  • Ultra-high brightness and thin displays need to optical micro-patterns which can uniformly diffuse the lights and low loss. The micro random patterns have characteristics to rise the optical efficiency such as light extraction, uniform diffusion. For this reason, various fabrication processes are studied for random patterns. In this study, the micro random patterns were machined by diamond turning which used a controlled cutting tool path with random cutting depth. The machined patterns had random shape and directionality along the circumferential direction. The average width and length of machined random pattern according to rotation radius were 40.13㎛~55.51㎛ and 37.25㎛~59.49㎛, and these results were compared with the designed result. Also, the machining error according to rotation radius in diamond turning using randomly controlled cutting depth was discussed.

고온 임프린팅을 통한 알루미늄합금 표면의 마이크로/나노 구조 성형 기술 (Hot Imprinted Hierarchical Micro/Nano Structures on Aluminum Alloy Surfaces)

  • 문인용;이호원;오영석;김세종;김지훈;강성훈
    • 소성∙가공
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    • 제28권5호
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    • pp.239-246
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    • 2019
  • Various surface texturing techniques have been studied because of the effective applicability of micro or nano scale surface patterns. Particularly, the most promising types of patterns include the hierarchical patterns, which consists of micro/nano structures. Different processes such as MEMS, laser machining, micro cutting and micro grinding have been applied in the production of hierarchical patterns on various material surfaces. This study demonstrates the process of hot imprinting to induce the hierarchical patterns on the Al alloy surfaces. Wire electrical discharge machining (WEDM) process was used to imprint molds with micro scale sinusoidal pattern. In addition, the sinusoidal pattern with rough surface morphology was obtained as a result of the discharge craters. Consequently, the hierarchical patterns consisting of the sinusoidal pattern and the discharge craters were prepared on the imprinting mold surface. Hot imprinting process for the Al plates was conducted on the prepared mold, and the replication performance was analyzed. As a result, it was confirmed that the hierarchical patterns of the mold were effectively duplicated on the surface of Al plate.

양극산화 알루미늄막을 이용한 나노패턴 성형용 금형제작에 대한 연구 (A Study on the Fabrication of Nano-Pattern Mold Using Anodic Aluminum Oxide Membrane)

  • 오정길;김종선;강정진;김종덕;윤경환;황철진
    • 소성∙가공
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    • 제19권2호
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    • pp.73-78
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    • 2010
  • Recently, many researches on the development of super-hydrophobic surface have been concentrated on the fabrication of nano-patterned products. Nano-patterned mold is a key to replicate nano-patterned products by mass production process such as injection molding and UV molding. The present paper proposes the new fabricating method of nano-patterned mold at low cost. The nano-patterned mold was fabricated by electroforming the anodic aluminum oxide membrane filled with UV curable resin in nano-hole by capillary phenomenon. As a result, the final mold with nano-patterns which have the holes with the diameter of 100~200 nm was fabricated. Furthermore, the UV-molded products with clear nano- patterns which have the pillars with the diameter of 100~200nm were achieved.

Thermal NIL 용 스탬프 공정 수명에 관한 연구 (A Study on Stamp Process Life Time in Thermal NIL)

  • 조천수;이문재;오지인;임오강;정명영
    • 한국정밀공학회지
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    • 제28권2호
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    • pp.239-244
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    • 2011
  • Nano Imprint Lithography(NIL) is technique for copying a pattern from stamp with nano size pattern in order to replicated the materials. It is very important to demold in order to make NIL process effectively. Self Assembled Monolayers(SAM) coater is manufactured by means of decreasing surface energy with the stamp surface treatment to improve release characteristics. Manufactured device contains tilting and rotation option for increasing process life time by coating on the sidewall of the pattern in stamp. The stamp coated with optimized tilting angle $30^{\circ}$ and rotation speed of 10rpm has more imprinting cycles than the stamping coated without tilting and rotation. Effective SAM coating on the sidewall of the pattern in stamp will improve by 50% of process life time.