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A Study on Stamp Process Life Time in Thermal NIL  

Cho, Cheon-Soo (Department of Intelligent Machinery System, Pusan Nat'l Univ.)
Lee, Moon-Jae (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.)
Oh, Ji-In (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.)
Lim, O-Kaung (Department of Intelligent Machinery System, Pusan Nat'l Univ.)
Jeong, Myung-Yung (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.2, 2011 , pp. 239-244 More about this Journal
Abstract
Nano Imprint Lithography(NIL) is technique for copying a pattern from stamp with nano size pattern in order to replicated the materials. It is very important to demold in order to make NIL process effectively. Self Assembled Monolayers(SAM) coater is manufactured by means of decreasing surface energy with the stamp surface treatment to improve release characteristics. Manufactured device contains tilting and rotation option for increasing process life time by coating on the sidewall of the pattern in stamp. The stamp coated with optimized tilting angle $30^{\circ}$ and rotation speed of 10rpm has more imprinting cycles than the stamping coated without tilting and rotation. Effective SAM coating on the sidewall of the pattern in stamp will improve by 50% of process life time.
Keywords
Nano Imprint Lithography; Release Layer; Self Assembled Monolayers;
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Times Cited By KSCI : 4  (Citation Analysis)
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