• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.135-136
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• 2012

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.12S
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• pp.1157-1164
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• 2003

This paper shows the results of atomistic modeling for the interaction between spherical nano abrasive and substrate in chemical mechanical polishing processes. Atomistic modeling was achieved from 2-dimensional molecular dynamics simulations using the Lennard-Jones 12-6 potentials. The abrasive dynamics was modeled by three cases, such as slipping, rolling, and rotating. Simulation results showed that the different dynamics of the abrasive results the different features of surfaces. This model can be extended to investigate the 3-dimensional chemical mechanical polishing processes.

• Journal of the Korean Society for Precision Engineering
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• v.33 no.5
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• pp.385-392
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• 2016

Recently in the display industry, demands for high-luminance and resolution of display devices have been steadily increasing. Generally, micro linear patterns are applied to an optical film in order to improve its properties of light. However, these patterns are easily viewed to eyes and moire phenomenon can be occurred. Micro random patterns are proposed as a method to solve these problems, increasing light-luminance and light-diffusion. However, conventional pattern manufacturing technologies have long processing times and high costs making it difficult to apply to large area molds. In order to combat this issue, micro-random patterns are formed by using a roll to plate indentation method along with abrasive paper tools composed of AlSiO2, SiC, and diamond grains. Also, forming properties, such as size and fill-factor of random patterns, are analyzed depending on type, mesh of abrasive paper tools, and indentation forces.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.487-487
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• 2009

One of the critical consumables in chemical mechanical polishing (CMP) is a specialized solution or slurry, which typically contains both abrasives and chemicals acting together to planarize films. In single abrasive slurry (SAS), the solid phase consists of only one type of abrasive particle. On the other hand, mixed abrasive slurry (MAS) consists of a mixture of at least two types of abrasive particles. In this paper, we have studied the CMP characteristics of mixed abrasive slurry (MAS) retreated by adding of $CeO_2$ abrasives within 1:10 diluted silica slurry (DSS). The slurry designed for optimal performance should produce reasonable removal rates, acceptable polishing selectivity with respect to the underlying layer, low surface defects after polishing, and good slurry stability. The modified abrasives in MAS are evaluated with respect to their particle size distribution, surface morphology, and CMP performances such as removal rate and non-uniformity. As an experimental result, we obtained the comparable slurry characteristics compared with original silica slurry in the viewpoint of high removal rate and low non-uniformity.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.301-302
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• 2010

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.433-434
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• 2009

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.5
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• pp.514-520
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• 2009

In configuring an automated polishing system, a monitoring scheme to estimate the surface roughness is necessary. In this study, a precision polishing process, magnetic abrasive finishing (MAF), along with an in-process monitoring setup was investigated. A magnetic tooling is connected to a CNC machining to polish the surface of stavax(S136) die steel workpieces. During finishing experiments, both AE signals and force signals were sampled and analysed. The finishing results show that MAF has nano scale finishing capability (upto 8nm in surface roughness) and the sensor signals have strong correlations with the parameters such as gap between the tool and workpiece, feed rate and abrasive size. In addition, the signals were utilized as the input parameters of artificial neural networks to predict generated surface roughness. Among the three networks constructed -AE rms input, force input, AE+force input- the ANN with sensor fusion (AE+force) produced most stable results. From above, it has been shown that the proposed sensor fusion scheme is appropriate for the monitoring and prediction of the nano scale precision finishing process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.78-81
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• 2003

Polishing Processes are widely used in the glass, optical, die and semiconductor industry and are conventionally carried out using abrasive slurry and a polishing pad. But abrasive slurry process has a weak point that is high cost of handling of used slurry and hard controllability of slurry. Recently, some researches have attempted to solve these problems and one method is the development of a fixed abrasive pad. FAP has a couple of advantages including clean environment, lower CoC, easy controllability and higher form accuracy. But FAP also has a weak point that is need of dressing because of glazing and loading. The paper introduces the basic concept and fabrication technique of FAP using hydrophilic polymers with swelling characteristics in water and explains the self-conditioning phenomenon. Experimental results demonstrate to achieve nano surface roughness of soda lime glass for optical application

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.20 no.3
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• pp.274-279
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• 2011

In this study, new abrasives that were composed of iron powder and carbon nanotube (CNT) particle were attempted to be abrasives for magnetic abrasive polishing. Because the CNT particles itself are very small ones with high hardness and magnetic strength, these properties are effective for magnetic abrasive polishing of nonmagnetic materials. As an experimental result for evaluating the machining characteristics in magnetic abrasive polishing, the CNT particles showed better performance than the conventional abrasives such as Fe and CBN powder.

• Nano
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• v.13 no.12
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• pp.1850144.1-1850144.13
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• 2018

A nano-$MoS_2$/montmorillonite K-10 (K10) composite was prepared and characterized. The composite contains two types of 2H-$MoS_2$ nanoparticles. One is the hollow spherical $MoS_2$ with a size range of 75 nm, and the other is the spherical nano cluster of $MoS_2$ with a size range of 30 nm. The two kinds of nano-$MoS_2$ were formed via assembly of numerous $MoS_2$ nano-platelets with a size of ~10 nm. A tribological comparison was then made among nano-$MoS_2$/K10, K10, nano-$MoS_2$ and a mechanical mixture of K10 and nano-$MoS_2$. K10 reduced the wear but slightly increased the friction. Nano-$MoS_2$ remarkably reduced both friction and wear. The mechanical mixture demonstrated better wear resistance than nano-$MoS_2$, indicating a synergistic anti-wear effect of nano-$MoS_2$ and K10. The synergistic effect was reinforced using nano-$MoS_2$/K10 instead of the mechanical mixture. A part of the $MoS_2$ in the contact region always lubricated the friction pair, and the rest formed a tribofilm. K10 segregated the friction pair to alleviate the ablation wear but magnified the abrasive wear. S-$MoS_2$ protects K10 and they together function as both a lubricant and an isolating agent to reduce the ablation and abrasive wear.