• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.167.2-167.2
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• 2014

In this work, ZnO shell on mesoporous $SiO_2$ ($ZnO/SiO_2$) was prepared by atomic layer deposition (ALD). Diethylzinc (DEZ) and $H_2O$ were used as precursor of ZnO shell. $ZnO/SiO_2$ sample was characterized by X-ray diffraction (XRD), N2 sorption isotherms, X-ray photoelectron spectroscopy (XPS), Scanning electron microscopy (SEM) and Fourier-transform infrared spectroscopy (FT-IR). $ZnO/SiO_2$ showed higher adsorption capacity of MB than that of bare mesoporous $SiO_2$ and the adsorption capacities of $ZnO/SiO_2$ could be regenerated by UV exposure through the photocatalytic degradation of the adsorbed MB. This system could be used for removing organic dye from water by adsorption and reused after saturation of adsorption due to its photocatalytic regeneration.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.381.1-381.1
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• 2014

In this study, we investigated the deposition behavior and the etch resistivity of plasma polymerized carbon hardmask (ppCHM) film with the variation of process temperature. The etch resistivity of deposited ppCHM film was analyzed by thickness measurement before and after direct contact reactive ion etching process. The physical and chemical properties of films were characterized on the Fourier transform infrared (FT-IR) spectroscope, Raman spectroscope, stress gauge, and ellipsometry. The deposition behavior of ppCHM process with the variation of temperature was correlated refractive index (n), extinction coefficient (k), intrinsic stress (MPa), and deposition rate (A/s) with the hydrocarbon concentration, graphite (G) and disordered (D) peak by analyzing the Raman and FT-IR spectrum. From this experiment we knew an optimal deposition condition for structure of carbon hardmask with the higher etch selectivity to oxide. It was shown the density of ppCHM film had 1.6~1.9 g/cm3 and its refractive index was 1.8~1.9 at process temperature, $300{\sim}600^{\circ}C$. The etch selectivity of ppCHM film was shown about 1:4~1:8 to undoped siliconoxide (USG) film (etch rate, 1300 A/min).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.203-207
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• 2003

Ion implantation has been shown to significantly alter the surface properties of polymers. Polycarbonate(PC) and Polyimide(PI) were irradiated with 50keV $N^+$, $Xe^+$ ions to the fluences of $1{\times}10^{16}{\sim}3{\times}10^{17}\;cm^2$. The ion beam-induced modification of the electrical conductivity and the related structural features have been studied for polymers. The beam-induced chemical and structural modifications have been investigated by using X-ray Phooelectron Spectroscopy(XPS) and Fourier Transform-Infrared Spectroscopy(FT-IR), while the modification of the electrical properties was followed by performing a complete set of sheet resistance measurements. Samples irradiated at higher fluence showed a good conductivity, with a saturation value of $10^7{\Omega}/sq$. The XPS data demonstrate that the modification of the electrical properties is due to the progressive formation with increasing ion fluence of a dense amorphous carbon network, while PF-IR data reveal that material degradations through bond breaking are the main effects.

• 정보과학회 컴퓨팅의 실제 논문지
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• 제22권9호
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• pp.449-454
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• 2016

한글의 자소들은 몇 가지의 획으로 구성되어 있고, 완전한 글자들은 자소들의 조합으로 구성되어 있다. 획과 자소들을 조합하는 과정에서 그 구성들의 크기나 위치가 변화할 수 있으므로 폰트를 제작하는데 많은 노력이 필요하다. 이와 달리 METAFONT는 매개변수 값을 변경하면서 획과 자소의 크기와 위치를 쉽게 변환할 수 있는 시스템을 제공하여 폰트 제작 과정에 효율성을 높일 수 있다. 본 논문은 METAFONT를 기반으로 사용자가 매개변수를 수정하여 다양한 폰트를 자동으로 생성할 수 있는 구조적 한글 폰트 생성기를 제안한다. 본 논문에서 제안한 한글 폰트 생성기는 폰트 임베딩 분야와 폰트 편집기 분야에 적용할 수 있다.

• 한국진공학회지
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• 제2권2호
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• pp.255-260
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• 1993

$Si_3N_4$와 $SiO_2$ 박막을 고순도로 생장시키기 위하여 UHV-LCVD 장치를 제작하였다. 이 장치는 CVD 반응실, 시료주입 장치, 가스주입 장치, 광여기를 위한 레이저 창, 질량분석 장치로 구성되어 있다. UHV-LCVD는 low pressure, low vacuum CVD에 비해 제작상의 어려움이 따르나 초고진공 분위깅에서 반응 가스의 양을 정확히 조절하여 고순도의 박막을 제잘할 수 있었다.

• 한국진공학회지
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• 제1권1호
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• pp.139-144
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• 1992

Ionized Cluster Beam(ICB) 방법을 이용하여 Polyimide(PI) 박막을 증착시켰다. 증 착된 PI 박막의 결정성과 이미드화의 정도를 투과전자현미경(TEM)과 적외선 분광 스펙트럼 (FT-IR)을 이용하여 분석하였다. 최적의 조건에서 증착된 PI 박막은 이미드화가 최대로 증 가하였고 결정구조를 가짐을 관찰할 수 있었다. 이것은 다른 방법으로 제작된 PI 박막과 비 교할 때 훨씬 우수한 것이다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.284-284
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• 2011

Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.44-44
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• 2011

현존하는 초경도 박막물질 중 입방정 질화붕소(cBN)은 철계 금속과의 반응안정성 및 낮은 온도에서의 합성가능성 등 많은 장점을 가지고 있다. 그러나 필수로 수반되는 이온충돌 효과로 인해 박막 내 높은 잔류응력으로 인한 박리 현상으로 응용이 어려운 실정에 있다. 현재까지 이를 개선하기 위해 수소를 첨가하여 박막의 잔류응력을 줄이는 연구, B4C 타겟을 이용하여 B-C-N 의 gradient layer를 설계하여 점진적으로 잔류응력을 감소시키는 연구 등 많은 연구들이 진행되고 있다. 본 연구에서는 MOCVD로 만들어진 NCD(Nano Crystalline Diamond) buffer layer 위에 RF-UBM(unbalanced magnetron) PVD를 이용하여 BN을 증착시켰다. hBN 타겟을 이용하여 2mTorr에서 400W 의 RF 파워를 사용하여 기판에 RF bias를 인가해 실험하였다. cBN 박막과 기판의 lattice mismatch 를 줄이기 위해서 본 연구소에서 제공되는 NCD 기판을 사용하였으며, 다이아몬드 기판과 cBN 박막의 1:1 에피성장을 이루기 위해 상온에서부터 800도까지 온도 변화를 주어 cBN을 증착시켰다. FTIR(Fourier transform infrared spectroscopy)로 $sp^2$구조인 hBN과 $sp^3$구조인 cBN의 성장유무를 확인하였으며, FTIR peak intensity 차이로 박막내 cBN의 함량을 계산하였고, Scratch test로 박막과 기판사이의 밀착력을 상대적으로 비교하였으며, 격자의 에픽성장을 확인하기 위해 FIB 의 작업을 거쳐 HRTEM 으로 각 위치별로 SAD pattern를 이용하여 성장거동을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.236-236
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• 2011

Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

• 한국감성과학회:학술대회논문집
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• 한국감성과학회 2002년도 춘계학술대회 논문집
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• pp.44-50
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• 2002

The fast Fourier transform (FFT) is a good method to estimate spectral density, but the frequency resolution is limited to the sampling window, and thus the precise characteristics of the spectral density for short signals are not clear. To solve the limitation, a multiple band-pass filter was introduced to estimate the precise time course of the spectral density for flash visual evoked potentials (VEPs). Signals were recorded during -200 and 600 ms using balanced noncephalic electrodes, and sampled at 1 K Hz in 12 bits. With 1 Hz and 10 ms resolutions, spectral density was estimated between 10 and 100 Hz. Background powers at the alpha-and beta-bands were high over the posterior scalp, and powers around 200ms were evoked at the same bands over the same region, corresponding to P110 and N165 of VEPs. normalized's spectral density showed evoked powers around 200 ms and suppressed powers following the evoked powers over the posterior scalp. The evoked powers above the 20Hz band were not statistically significant. However, the gamma band was significantly evoked intra-individually; details in the gamma bands were varied among the subjects. Details of spectral density were complicated even for a simple task such as watching flashes; both synchronization and desynchronization occurred with different distributions and different time courses.