• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.903-906
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• 2008

We developed the advanced LTPS (A-LTPS) manufacturing process. The a-Si TFT process was combined with selectively enlarging laser crystallization (SELAX) technology to improve the carrier mobility in the region where the peripheral circuits are to be fabricated. A 2.4-inch IPS-pro LCD panel for personal digital assistant use was successfully fabricated using the developed technology.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.461-466
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• 2007

There has been a great interest in printing technology as a low cost and mass production method for the application of printed electronics such as printed TFT, solar cell, RFID Tag, printed battery, and so on. In this study, apparatuses of gravure-offset printing are developed for fine line-width/gap printing and examining pattern distortion occurred in gravure-offset printing process. The fine line-width/gap pattern shows that it is possible to make around 20 micro-meter line-width/gap printing patterns. Pattern distortion is modeled, and the amount and shape of the distortion are calculated by using commercial FEM code. The roll-to-roll printing system under development consists of unwinder/rewinder, two printing units, one coating unit, drying units, guiding unit, vision system, and other auxiliary devices. For multi-layer printing, the system is designed to be capable of printing two different materials.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.698-700
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• 2003

LGP (Light-Guide Panel) of TFT-LCD Backligh/Frontlight is one of the major components which affect on the product quality of LCD. Since the brightness distribution of LGP is sensitive to the process error in manufacturing, the optical characteristics such as reflection and absorption of LGP pattern should be modeled including the process error. LGP is developed by using the fast and reliable design technology, which uses the concept of the inverse-design, makes the model on the characteristics of uncertainty in the manufacturing process, and designs the dispersion pattern analytically without try-and-error by using an artificial intelligence. The PEA(Process-Error-Adaptive) design gives the best solution in handling the process error. The offset of target in feedback system makes such the best pattern design possible that the brightness distribution is nearly same (more than 90%) with target in regardless of the miscellaneous errors in mass production. The present design method has been also applied to frontlight and multi-side-lamp(eg., four-side-four-lamp) backlight.