• Title/Summary/Keyword: Modified Mask

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Synthesis of vertically aligned silicon nanowires with tunable irregular shapes using nanosphere lithography

  • Gu, Ja-Hun;Lee, Tae-Yun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.88.1-88.1
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    • 2012
  • Silicon nanowires (SiNWs), due to their unusual quantum-confinement effects that lead to superior electrical and optical properties compared to those of the bulk silicon, have been widely researched as a potential building block in a variety of novel electronic devices. The conventional means for the synthesis of SiNWs has been the vapor-liquid-solid method using chemical vapor deposition; however, this method is time consuming, environmentally unfriendly, and do not support vertical growth. As an alternate, the electroless etching method has been proposed, which uses metal catalysts contained in aqueous hydrofluoric acids (HF) for vertically etching the bulk silicon substrate. This new method can support large-area growth in a short time, and vertically aligned SiNWs with high aspect ratio can be readily synthesized with excellent reproducibility. Nonetheless, there still are rooms for improvement such as the poor surface characteristics that lead to degradation in electrical performance, and non-uniformity of the diameter and shapes of the synthesized SiNWs. Here, we report a facile method of SiNWs synthesis having uniform sizes, diameters, and shapes, which may be other than just cylindrical shapes using a modified nanosphere lithography technique. The diameters of the polystyrene nanospheres can be adjustable through varying the time of O2 plasma treatment, which serve as a mask template for metal deposition on a silicon substrate. After the removal of the nanospheres, SiNWs having the exact same shape as the mask are synthesized using wet etching technique in a solution of HF, hydrogen peroxide, and deionized water. Different electrical and optical characteristics were obtained according to the shapes and sizes of the SiNWs, which implies that they can serve specific purposes according to their types.

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Switching Filter using Distribution of Histogram in Salt and Pepper Noise Environments (Salt and Pepper 잡음 환경에서 히스토그램의 분포를 이용한 스위칭 필터)

  • Baek, Ji-Hyeon;Park, Jun-Mo;Kim, Nam-Ho
    • Journal of the Institute of Convergence Signal Processing
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    • v.21 no.3
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    • pp.113-120
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    • 2020
  • With the recent development of communication equipment, the demand for communication equipment is gradually increasing. Accordingly, various signal processing has been studied. In the case of an image, noise removal is an indispensable step because noise propagation problems may occur if noise is not removed in the pre-processing process. Salt and Pepper noise is a typical impulse noise with two extremes. Various studies have been conducted to remove such noise, and there are CWMF, MF and MMF. However, the existing methods are somewhat insufficient in the high-density noise region. Therefore, in this study, we have proposed an algorithm that filters the size of the mask according to the number of noises inside the 7×7 mask and filters it with a modified switching filter using the histogram distribution of the image. In the case of the proposed algorithm, noise can be effectively removed in a high-density noise region. For objective judgment, PSNR was used to compare and analyze with existing algorithms.

Banding Artifacts Reduction Method in Multitoning Based on Threshold Modulation of MJBNM (MJBNM의 임계값 변조를 이용한 멀티토닝에서의 띠 결점 감소 방법)

  • Park Tae-Yong;Lee Myong-Young;Son Chang-Hwan;Ha Yeong-Ho
    • Journal of the Institute of Electronics Engineers of Korea SP
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    • v.43 no.2 s.308
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    • pp.40-47
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    • 2006
  • This paper proposes a multitoning method using threshold modulation of MJBNM(Modified Jointly Blue Noise Mask) for banding artifacts reduction. As banding artifacts in multitoning appear as uniform dot distributions around the intermediate output levels, such multitone output results in discontinuity and visually unpleasing patterns in smooth transition regions. Therefore, to reduce these banding artifacts, the proposed method rearranges the dot distribution by introducing pixels in the neighborhood of output levels that occurs banding artifacts. First of all principal cause of banding artifacts are analyzed using mathematical description. Based on this analytical result, a threshold modulation technique of MJBNM which takes account of chrominance error and correlation between channels is applied. The original threshold range of MJBNM is first scaled linearly sot that the minimum and maximum of the scaled range include two pixel more than adjacent two output levels that cover an input value. In an input value is inside the vicinity of any intermediate output levels produce banding artifacts, the output is set to one of neighboring output levels based on the pointwise comparison result according to threshold modulation parameter that determines the dot density and distribution. In this case, adjacent pixels are introduced at the position where the scaled threshold values are located between two output levels and the minimum and maximum threshold values. Otherwise, a conventional multitoning method is applied. As a result, the proposed method effectively decreased the appearance of banding artifacts around the intermediate output levels. To evaluate the quality of the multitone result, HVS-WRMSE according to gray level for gray ramp image and S-CIELAB color difference for color ramp image are compared with other methods.

A Study on the Cloth Design for Elderly Women to Mask Their Dorsal Curvature (노년기여성의 배면만곡도 감소효과를 위한 의복디자인 연구)

  • Kim Tae-Kyung;Lee Kyoung-Hi;Park Jung-Soon
    • Journal of the Korean Society of Clothing and Textiles
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    • v.14 no.3 s.35
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    • pp.183-195
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    • 1990
  • The author has studied the effect of clothes design to mask the dorsal curvature that is one of the commonest changes in elderly women. Body measurements including the body type and the status of dorsal curvature were perfor-med on 153 women of over 60 years of age, and then a body form to fit to the mean measure-ments was made to evaluate the effects of various designs to it. With 31 pattern designs modified by changing in their slash lines and gathers using darts, the diminishing effect of the rounded back were evaluated by means of sensory test. The results of this study can be summarized as follows: I . Results from the body measurements 1) The mean body type in elderly women was that of obesity. 2) With the advancement of age, the angle to indicate the degree of dorsal curvature as well as the angle to indicate the posture are increased. II . Concerning to the clothes design to diminish the shape of dorsal curvature 1) Among the designs by the position of darts, the basic pattern (Fig. 5-1-(1)) showed the best effect to mask the shape of dorsal curvature. 2) Out of the applied designs of princess lines, that in which the slash line is pointing toward the shoulder point (Fig. 5-2-(1)) seemed to be most effective. 3) What has angled princess line (Fig. 5-3-(1)) had the most diminishing effect among the waist darts and armhole princess lines. 4) Among the V-shaped designs, the slashed at the shoulder point (Fig. 5-4-(1)) had the best effect to lessen the shape of the dorsal cuuature. 5) Wider angle yoke had better effect to the narrow angle one among the designs with straight yoke, and that with downward direction (Fig. 5-5-(1)) showed the best effect. 6) Between straight wide angle yoke and curved yoke, that of curved one with downward direction (Fig. 5-6-(1)) had better effect as far as the masking effect of dorsal curvature is concerned. 7) Gathers around the neck showed better effect to those around the shoulder, and the more amount of gathers (Fig. 5-7-(1)), there was better effect. 8) The design with midline gathers at the level of horizontal slash line of armhole (Fig. 5-8-(1)) showed better effect to that with seperated gathers. 9) In case of design with gathers at the horizontal line of armhole, it showed the better effect with less amount of gathers in midline ones, but with more amount in the side ones. 10) Considering all 7 different designs with better effect in covering the shape of dorsal curvature, it was evident that the design with gathers was far better than the design with application of slash lines.

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Comparison of Setup Deviations for Two Thermoplastic Immobilization Masks in Glottis Cancer (성문암 세기변조방사선치료에서 두 가지 열가소성 마스크에 대한 환자위치잡이 오차 평가)

  • Jung, Jae Hong
    • Journal of radiological science and technology
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    • v.40 no.1
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    • pp.63-70
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    • 2017
  • The purpose of this study was compare to the patient setup deviation of two different type thermoplastic immobilization masks for glottis cancer in the intensity-modulated radiation therapy (IMRT). A total of 16 glottis cancer cases were divided into two groups based on applied mask type: standard or alternative group. The mean error (M), three-dimensional setup displacement error (3D-error), systematic error (${\Sigma}$), random error (${\sigma}$) were calculated for each group, and also analyzed setup margin (mm). The 3D-errors were $5.2{\pm}1.3mm$ and $5.9{\pm}0.7mm$ for the standard and alternative groups, respectively; the alternative group was 13.6% higher than the standard group. The systematic errors in the roll angle and the x, y, z directions were $0.8^{\circ}$, 1.7 mm, 1.0 mm, and 1.5 mm in the alternative group and $0.8^{\circ}$, 1.1 mm, 1.8 mm, and 2.0 mm in the alternative group. The random errors in the x, y, z directions were 10.9%, 1.7%, and 23.1% lower in the alternative group than in the standard group. However, absolute rotational angle (i.e., roll) in the alternative group was 12.4% higher than in the standard group. For calculated setup margin, the alternative group in x direction was 31.8% lower than in standard group. In contrast, the y and z direction were 52.6% and 21.6% higher than in the standard group. Although using a modified thermoplastic immobilization mask could be affect patient setup deviation in terms of numerical results, various point of view for an immobilization masks has need to research in terms of clinic issue.

$(Ba, Sr)TiO_3$박막의 전기적 성질과 전도기구 해석

  • 정용국;손병근;이창효
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.69-69
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    • 2000
  • (Ba, Sr)TiO3 (BST)[1-3] 박막은 유전상수가 크고 고주파에서도 유전특성 저하가 적기 때문에 ULSI DRAM(Dynamic Random Access Memory)에 응용 가능한 물질로 최근 각광을 받고 있다. 하지만, 아직 BST 박막을 DRSM에 바로 적용하기 위해선 몇 가지 문제점이 있다. 그 중 누설전류 문제는 디바이스 응용시 매우 중요한 요소이다. 특히, DRAM에서 refresh time와 직접적인 관련이 있어 디바이스 내의 신뢰도 및 전력소모를 결정하는 주된 인자가 된다. 지금까지, BST 박막의 인가전업, 온도, 그리고 전극물질에 따른 누설전류 현상들이 고찰되었고, 이에 관한 많은 전도기구 모델들이 제시되었다. Schottky emission, Poole-Frenkel emission, space charge limited conduction 등이 그 대표적인 예이다. 하지만 아쉽게도 BST 박막의 정확한 누설 전류 전도 기구를 완전히 설명하는데는 아직 한계가 있다. 따라서 본 연구에서는 제작된 BST 커패시터 내의 기본적인 전기적 성질을 조사하고, 정확한 누설전류 기구 규명에 초점을 두고자 한다. 이를 위해 기존의 여러 기구들과 비교 분석할 것이다. 하부전극으로 사용하기 위해 스퍼터링 방법으로 p-Si(100) 기판위에 RuO2 박막을 약 120nm 증착하였다. 증착전의 chamberso의 초기압력은 5$\times$10-6 Torr이하의 압력으로 유지시켰다. Ar/O2의 비는 이전 실험에서 최적화된 9/1로 하였다. BST 박막 증착 시 5분간 pre-sputtering을 실시한 후 하부전극 기판위에 BST 박막을 증착하였다. 증착이 끝난 후 시편을 상온까지 냉각시킨 후 꺼내었다. 전기적 특성을 측정하기 상부전극으로 RuO2와 Al 박막을 각각 상온에서 100nm 증착하였다. 이때 hole mask를 이용하여 반경이 140um인 원형의 상부전극을 증착하였다. BST 박막의 증착온도가 증가하고 Ar/O2 비가 감소할수록 제작된 BST-커패시터의 전기적 성질이 우수하였다. 증착온도 $600^{\circ}C$, ASr/O2=5/5에서 증착된 막의 누설전류는 4.56$\times$10-8 A/cm2, 유전상수는 600 정도의 값을 나타내었다. 인가전압에 따른 BST 커패시터의 transition-current는 Curie-von Schweider 모델을 따랐다. BST 박막의 누설전류 전도기구는 기존의 Schottky 모델이 아니라 modified-Schottky 무델로 잘 설명되었다. Modified-Schottky 모델을 통해 BST 박막의 광학적 유전율 $\varepsilon$$\infty$=4.9, 이동도 $\mu$=0.019 cm2/V-s, 장벽 높이 $\psi$b=0.79 eV를 구하였다.

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A Modified Adaptive Switching Median Filter for Image Restoration (영상복원(映像復原)을 위한 변형(變形)된 적응(適應) 스위칭 메디안 필터)

  • Jin, Bo;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.11 no.7
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    • pp.1373-1379
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    • 2007
  • A modified adaptive switching median filter for impulse noise removal, which has the noise detection step and the noise filtering step, is proposed in this paper. In the noise detection step, we use the detection threshold which is earned by calculating the intensity differences between pixels nearby with each other in localized window, to determine whether the pixels in the image are noise or not. Then in the noise filtering step, we will only remove the corrupted pixels and remain the good pixels. By the noise detection result, we can easily get the local noise density of the image, and use it to consider the filtering mask size and the times of filtering iteration according to different localized noise corruptions. For Setting the simulation result, we compared the proposed method to conventional median filters with several test images corrupted by various impulse noise densities. We also use the peak signal-to-noise ratio (PSNR) to evaluate restoration performance, the simulation results demonstrate that the proposed method shows better results than other median-based type filters.

Modified Gaussian Filter Algorithm using Quadtree Segmentation in AWGN Environment (AWGN 환경에서 쿼드트리 분할을 사용한 변형된 가우시안 필터 알고리즘)

  • Cheon, Bong-Won;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.25 no.9
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    • pp.1176-1182
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    • 2021
  • Recently, with the development of artificial intelligence and IoT technology, automation, and unmanned work are progressing in various fields, and the importance of image processing, which is the basis of AI object recognition, is increasing. In particular, in systems that require detailed data processing, noise removal is used as a preprocessing step, but the existing algorithm does not consider the noise level of the image, so it has the disadvantage of blurring in the filtering process. Therefore, in this paper, we propose a modified Gaussian filter that determines the weight by determining the noise level of the image. The proposed algorithm obtains the noise estimate for the AWGN of the image using quadtree segmentation, determines the Gaussian weight and the pixel weight, and obtains the final output by convolution with the local mask. To evaluate the proposed algorithm, it was simulated compared to the existing method, and superior performance was confirmed compared to the existing method.

Modified Center Weight Filter Algorithm using Pixel Segmentation of Local Area in AWGN Environments (AWGN 환경에서 국부영역의 화소분할을 사용한 변형된 중심 가중치 필터 알고리즘)

  • Cheon, Bong-Won;Kim, Nam-Ho
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2022.10a
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    • pp.250-252
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    • 2022
  • Recently, with the development of IoT technology and AI, unmanned and automated systems are progressing in various fields, and various application technologies are being studied in systems using algorithms such as object detection, recognition, and tracking. In the case of a system operating based on an image, noise removal is performed as a pre-processing process, and precise noise removal is sometimes required depending on the environment of the system. In this paper, we propose a modified central weight filter algorithm using pixel division of local regions to minimize the blurring that tends to occur in the filtering process and to emphasize the details of the resulting image. In the proposed algorithm, when a pixel of a local area is divided into two areas, the center of the dominant area among the divided areas is set as a criterion for the weight filter algorithm. The resulting image is calculated by convolving the transformed center weight with the pixel value inside the filtering mask.

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Modification of Dielectric Surface in Organic Thin-Film Transistor with Organic Molecule

  • Kim, Jong-Moo;Lee, Joo-Won;Kim, Young-Min;Park, Jung-Soo;Kim, Jai-Kyeong;Ju, Byeong-Kwon;Oh, Myung-Hwan;Kim, Jong-Seung;Jang, Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1030-1033
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    • 2004
  • We herewith report for the effect of dielectric surface modification on the electrical characteristics of organic thin-film transistors (OTFTs). The kist-jm-1 as an organic molecule for the surface modification is deposited onto the surface of zirconium oxide ($ZrO_2$) gate dielectric layer. The OTFTs are elaborated on the flexible plastic substrates through 4-level mask process to yield a simple fabrication process. In this work, we also have examined the dependence of electrical performance on the interface surface state of gate dielectric/pentacene, which may be modified by chemical properties in the gate dielectric surface.

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