• Title/Summary/Keyword: Mobile Gate

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Design of Integrated a-Si:H Gate Driver Circuit with Low Noise for Mobile TFT-LCD

  • Lee, Yong-Hui;Park, Yong-Ju;Kwag, Jin-Oh;Kim, Hyung-Guel;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.822-824
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    • 2007
  • This paper investigated a gate driver circuit with amorphous silicon for mobile TFT-LCD. In the conventional circuit, the fluctuation of the off-state voltage causes the fluctuation of gate line voltages in the panel and then image quality becomes worse. Newly designed gate driver circuit with dynamic switching inverter and carry out signal reduce the fluctuation of the off-state voltage because dynamic switching inverter is holding the off-state voltage and the delay of carry signal is reduced. The simulation results show that the proposed a-Si:H gate driver has low noise and high stability compared with the conventional one.

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Development of High Aperture Ratio 2.1” QVGA LTPS (Low Temperature Poly Si) LCD Using SLS (Sequential Lateral Solidification) Technology

  • Kang, Myung-Koo;Lee, Joong-Sun;Park, Jong-Hwa;Zhang, Lintao;Joo, Seung-Yong;Kim, Chul-Ho;Kim, Il-Kon;Kim, Sung-Ho;Park, Kyung-Soon;Yoo, Chun-Ki;Kim, Chi-Woo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1033-1034
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    • 2005
  • High resolution 2.1” QVGA LTPS LCD (190ppi) having high aperture ratio of 65% could be successfully developed using state-of-the-art SLS technology and active/gate storage structure. Cost effective P-MOS 6-Mask structure was used. Full gate and transmission gate circuits are integrated in the panel. The high aperture ratio was obtained by using active/gate capacitance structure, which can reduce storage capacitance area. The aperture ratio was increased to 65% from 49% of conventional gate/data capacitance structure. The brightness was increased from 180cd to 270cd without any degradation of optical properties such as contrast ratio, flicker or crosstalk.

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ASG(Amorphous Silicon TFT Gate driver circuit)Technology for Mobile TFT-LCD Panel

  • Jeon, Jin;Lee, Won-Kyu;Song, Jun-Ho;Kim, Hyung-Guel
    • Journal of Information Display
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    • v.5 no.2
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    • pp.1-5
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    • 2004
  • We developed an a-Si TFT-LCD panel with integrated gate driver circuit using a standard 5-MASK process. To minimize the effect of the a-Si TFT current and LC's capacitance variation with temperature, we developed a new a-Si TFT circuit structure and minimized coupling capacitance by changing vertical architecture above gate driver circuit. Integration of gate driver circuit on glass substrate enables single chip and 3-side free panel structure in a-Si TFT-LCD of QVGA ($240{\times}320$) resolution. And using double ASG structure the dead space of TFT-LCD panel could be further decreased.

ASG(Amorphous Silicon TFT Gate driver circuit) Technology for Mobile TFT-LCD Panel

  • Jeon, Jin;Lee, Won-Kyu;Song, Jun-Ho;Kim, Hyung-Guel
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.395-398
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    • 2004
  • We developed an a-Si TFT-LCD panel with integrated gate driver circuit using a standard 5-MASK process. To minimize the effect of the a-Si TFT current and LC's capacitance variation with temperature, we developed a new a-Si TFT circuit structure and minimized coupling capacitance by changing vertical architecture above gate driver circuit. Integration of gate driver circuit on glass substrate enables single chip and 3-side free panel structure in a-Si TFT-LCD of QVGA(240$^{\ast}$320) resolution. And using double ASG structure the dead space of TFT-LCD panel could be further decreased.

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온도 Stress에 따른 High-k Gate Dielectric의 특성 연구

  • Lee, Gyeong-Su;Han, Chang-Hun;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.339-339
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    • 2012
  • 현재 MOS 소자에 사용되고 있는 $SiO_2$ 산화막은 그 두께가 얇아짐에 따라 Gate Leakage current와 여러 가지 신뢰성 문제가 대두되고 있고, 이를 극복하고자 High-k물질을 사용하여 기존에 발생했던 Gate Leakage current와 신뢰성 문제를 해결하고자 하고 있다. 본 실험에서는 High-k(hafnium) Gate Material에 온도 변화를 주었을 때 여러 가지 전기적인 특성 변화를 보는 방향으로 연구를 진행하였다. 기본적인 P-Type Si기판을 가지고, 그 위에 있는 자연적으로 형성된 산화막을 제거한 후 Hafnium Gate Oxide를 Atomic Layer Deposition (ALD)를 이용하여 증착하고, Aluminium을 전극으로 하는 MOS-Cap 구조를 제작한 후 FGA 공정을 진행하였다. 마지막으로 $300^{\circ}C$, $450^{\circ}C$로 30분정도씩 Annealing을 하여, 온도 조건이 다른 3가지 종류의 샘플을 준비하였다. 3가지 샘플에 대해서 각각 I-V (Gate Leakage Current), C-V (Mobile Charge), Interface State Density를 분석하였다. 그 결과 Annealing 온도가 올라가면 Leakage Current와 Dit(Interface State Density)는 감소하고, Mobile Charge가 증가하는 것을 확인할 수가 있었다. 본 연구는 향후 High-k 물질에 대한 공정 과정에서의 다양한 열처리에 따른 전기적 특성의 변화 대한 정보를 제시하여, 향후 공정 과정의 열처리에 대한 방향을 잡는데 도움이 될 것이라 판단된다.

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A Novel Driving Method for Cost Competitive a-Si TFT-LCD

  • Moon, Su-Hwan;Lim, Hong-Youl;Kim, Dae-Kyu;Lee, Min-Kyung;Ko, Kyung-Tai;Lee, Jun-Ho;Yoon, Sung-Hoe;Kim, Byeong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.470-473
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    • 2009
  • We have developed a novel driving method, Six times Rate Driving(SRD) for the purpose of making cost competitive TFT-LCD. By applying SRD method to an a-Si TFT-LCD, the driving rate was increased six times as it was named but the number of data lines and so its D-Ics were reduced to one sixth of the conventional one which resulted in the cost saving of that much. We also newly designed the gate driver in order to avoid any expansion of the bezel width caused by applying SRD. Our newly developed driving technology, SRD was successfully applied to 7.0-inch WSVGA (1024 ${\times}$ 600) TFT-LCD which can be driven with only one data D-IC and here introduced.

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A Study on Application of Stepwise Gate Signal for a-Si Gate Driver (a-Si Gate 구동회로의 Stepwise Gate 신호적용에 대한 연구)

  • Myung, Jae-Hoon;Kwag, Jin-Oh;Yi, Jun-Sin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.3
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    • pp.272-278
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    • 2008
  • This paper investigated the a-si:H gate driver with the stepwise gate signal. In 1-chip type mobile LCD application the stepwise gate signal for low power consumption can be used by adding simple switching circuit. The power consumption of the a-Si:H gate driver can be decreased by employing the stepwise gate signal in the conventional circuit. In conventional one, the effect of stepwise gate signal can decrease slew rate and increase the fluctuation of gate-off state voltage, In order to increase the slew rate and decrease the gate off state fluctuation, we proposed a new a-Si:H TFT gate driver circuit. The simulation data of the new circuit show that the slew rate and the gate-off state fluctuation are improved, so the circuit can work reliably.

A single-clock-driven gate driver using p-type, low-temperature polycrystalline silicon thin-film transistors

  • Kim, Kang-Nam;Kang, Jin-Seong;Ahn, Sung-Jin;Lee, Jae-Sic;Lee, Dong-Hoon;Kim, Chi-Woo;Kwon, Oh-Kyong
    • Journal of Information Display
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    • v.12 no.1
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    • pp.61-67
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    • 2011
  • A single-clock-driven shift register and a two-stage buffer are proposed, using p-type, low-temperature polycrystalline silicon thin-film transistors. To eliminate the clock skew problems and to reduce the burden of the interface, only one clock signal was adopted to the shift register circuit, without additional reference voltages. A two-stage, p-type buffer was proposed to drive the gate line load and shows a full-swing output without threshold voltage loss. The shift register and buffer were designed for the 3.31" WVGA ($800{\times}480$) LCD panel, and the fabricated circuits were verified via simulations and measurements.

A Design of the XML-based Trans-Gate System for Mobile Device (XML 기반의 이동단말기를 위한 Trans-Gate System 설계)

  • 남궁명희;양혁;황재각;임영환
    • Proceedings of the Korean Information Science Society Conference
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    • 2003.04c
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    • pp.591-593
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    • 2003
  • 현재 모바일 서비스는 이동단말기와 더불어 발전하고 있다. 그러나 이동단말기 마다 다른 플랫폼을 가진 환경에서 유선인터넷 컨텐츠를 가지고 모바일 서비스하기 위해서는 마크업언어인 XML 기술을 이용한 변환이 필요하며 이것을 Trans-Gate System이라 한다. Trans-Gate System은 유선인터넷 컨텐츠를 모바일 디바이스 플랫폼(WML HDML, m-HTML)메 맞게 변환하는 시스템을 설계한다. 이 시스템은 X-Crawler와 Call Manager의 2가지 모듈로 나눠서 기존의 유선 인터넷에 있는 멀티미디어 컨텐츠를 사용자 Device에 맞게 변환하는 시스템이다. 따라서 이 시스템은 기존에 따로 모바일 서비스만을 위한 컨텐츠를 만들지 않아도 되는 장점이 있다.

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Non volatile memory device using mobile proton in gate insulator by hydrogen neutral beam treatment

  • Yun, Jang-Won;Jang, Jin-Nyeong;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.192.1-192.1
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    • 2015
  • We demonstrated the nonvolatile memory functionality of nano-crystalline silicon (nc-Si) and InGaZnOxide (IGZO) thin film transistors (TFTs) using mobile protons that are generated by very short time hydrogen neutral beam (H-NB) treatment in gate insulator (SiO2). The whole memory fabrication process kept under $50^{\circ}C$ (except SiO2 deposition process; $300^{\circ}C$). These devices exhibited reproducible hysteresis, reversible switching, and nonvolatile memory behaviors in comparison with those of the conventional FET devices. We also executed hydrogen treatment in order to figure out the difference of mobile proton generation between PECVD and H-NB CVD that we modified. Our study will further provide a vision of creating memory functionality and incorporating proton-based storage elements onto a probability of next generation flexible memorable electronics such as low power consumption flexible display panel.

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