• 한국표면공학회지
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• 제39권6호
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• pp.263-267
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• 2006

As technology advances, there is a demand for development of hard solid lubricant coating. (Ti, Cr, Zr)N-$MoS_2$ films were deposited on AISI H13 tool steel substrate by co-deposition of $MoS_2$ with (Ti, Cr, Zr)N using a D.C. magnetron sputtering process. The influence of the $N_2Ar$ gas ratio, the amount of $MoS_2$ in the films and the bias voltage on the mechanical and structural properties of the films were investigated. The highest hardness level was observed at the $N_2/Ar$ gas ratio of 0.3. Hardness of the films did not change much with the increase of the $MoS_2$ content in the films. As the substrate bias potential was increased, hardness level of the film reached maximum at -150 V. Surface morphology of these films indicated that high hardness was attributed to the fine dome structure.

• 한국표면공학회지
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• 제43권6호
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• pp.266-271
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• 2010

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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• pp.135-136
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• 2002

Molybdenum Nitrided (MoNx) films were deposited by DC planar magnetron sputtering. Silicon wafers and real nitrided stainless steel piston rings are employed as substrates. 12 different combinations of nitrogen and argon partial pressure, from 1:7 to 7:1, were applied to deposit MoNx films. X-ray diffraction (XRD) was used to determine the phase structures of films. When nitrogen vs. argon partial pressure is 1:7, the film is mainly $Mo_2N$ phase. With increase of nitrogen partial pressure, MoN phase emerges, but $Mo_2N$ phase still exists. Composition analysis with atomic emission spectrometry (AES) also agreed with this. The films have very high nanohardness (max 2400Hv) and good adhesion to the substrates.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 1997년도 제25회 춘계학술대회
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• pp.232-241
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• 1997

The tribological behavior for MoS$_2$ bonded films is evaluated according to the international standard testing methods, such as ASTM D 2625(Falex tester) and ASTM D 2714(LFW-1 tester). It has been well known that the tribological behavior for MoS$_2$ bonded films is affected by several factors. However, in this work, the wear life for MoS$_2$ bonded films is mainly experimentally measured with different contact geometry, and evaluated in terms of the frictional heating according to the contact geometry of tribotester. The test results show that the wear life of MoS$_2$ bonded films is significantly affected not only by the frictional heating, but also by the contact pressure, test running-in conditions, and the contact conformity.

• Journal of Magnetics
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• 제4권2호
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• pp.69-72
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• 1999

Magnetic properties and crystallographic structure of e-beam evaporated Co/Cr and Co/Mo multilayer thin films were investigated using VSM and XRD. Co/Cr and Co/Mo multilayer thin films are confirmed as an alternating layered structure. The structure of films with thicker Co layers than Cr and Mo layers are found to be a hcp structure with the c-axis perpendicular to the film plane. The direction of the film plane is the easy magnetization one. There is a no significant difference in shape of hysteresis loops between Co/Cr and Co/Mo multilayer films. It is found that Mo layer is more effective than Cr for preparing Co layer with c-axis normal to the film plane.

• Tribology and Lubricants
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• 제13권3호
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• pp.20-27
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• 1997

The tribological behavior for $MoS_2$ bonded films is evaluated according to the international standard testing methods, such as ASTM D 2625 (Falex tester) and ASTM D 2714 (LFW1 tester). It has been well known that the tribological behavior for $MoS_2$ bonded films is affected by several factors. However, in this work, the wear life for $MoS_2$ bonded films is mainly experimentally measured with different contact geometry, and evaluated in terms of the frictional heating according to the contact geometry of tribotester. The test results show that the wear life of $MoS_2$ bonded films is significantly affected not only by the frictional heating, but also by the contact pressure, test running-in conditions, and the contact conformity.

• 한국재료학회지
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• 제23권9호
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• pp.495-500
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• 2013

Mo-based thin films are frequently used as back electrode materials because of their low resistivity and high crystallinity in CIGS chalcopyrite solar cells. Mo:Na/Mo bilayer thin films with $1{\mu}m$ thickness were deposited on soda lime glass by varying the thickness of each layer using dc-magnetron sputtering. The effects of the Mo:Na layer on morphology and electrical property in terms of resistivity were systematically investigated. The resistivity increased from $159{\mu}{\Omega}cm$ to $944{\mu}{\Omega}cm$; this seemed to be caused by increased surface defects and low crystallinity as the thickness of Mo:Na layer increased from 100 nm to 500 nm. The surface morphologies of the Mo thin films changed from a somewhat coarse fibrous structures to irregular and fine celled structures with increased surface cracks along the cell boundaries as the thickness of Mo:Na layer increased. Na contents varied drastically from 0.03 % to 0.52 % according to the variation of Mo:Na layer thickness. The change in Na content may be ascribed to changes in surface morphology and crystallinity of the thin films.

• 한국재료학회지
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• 제9권11호
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• pp.1144-1147
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• 1999

광 변조량, 광학밀도, 응답시간, 순환전위전류특성을 조사하여 열처리 효과에 따른 $\textrm{MoO}_3$박막의 일렉트로크로믹 특성을 연구하였다. XRD 분석 결과 as-deposited $\textrm{MoO}_3$박막과 $350^{\circ}C$ 이하로 열처리된 박막은 비정질로 밝혀졌으며, $450^{\circ}C$에서열처리한 $\textrm{MoO}_3$박막은 결정질로 나타났다. As-deposited $\textrm{MoO}_3$박막을 사용한 일렉트로크로믹 소자가 열처리된 박막을 사용한 소자에비하여 광변조 특성과 전기화학적 특성에서 좋은 일렉트로크로믹 현상을 보여주었다. $\textrm{MoO}_3$박막의 열처리 온도에 따른 효과는 일렉트로크로믹 특성과 가역변색에서 광변조특성과 전기화학적 특성을 감소시키며, 열화현상을 촉진하는 것으로 나타났다.

• 전기화학회지
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• 제12권3호
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• pp.258-262
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• 2009

The composition and semiconducting properties of the passive films formed on Ni- (15, 30)Cr-5Mo alloys in pH 8.5 buffer solution were examined. The depth concentration profile of passive films formed on Ni-(15, 30)Cr-5Mo in pH 8.5 buffer solution showed that Mo enhances the enrichment of Cr. The Mott-Schottky plot for the passive film on Ni-(15, 30)Cr- 5Mo closely resembled that for the film on Cr, whereas those for the less Cr-enriched film on Mo-free alloys showed similar behavior to that for the film on Ni. The acceptor density was reduced by increasing Cr content in Ni-(15, 30)Cr-(0, 5)Mo alloys, but addition of Mo considerably increased the acceptor density.

• 한국전기전자재료학회논문지
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• 제36권6호
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• pp.588-593
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• 2023

The advantage of OTFT technology is that large-area circuits can be manufactured on flexible substrates using a low-cost solution process such as inkjet printing. Compared to silicon-based inorganic semiconductor processes, the process temperature is lower and the process time is shorter, so it can be widely applied to fields that do not require high electron mobility. Materials that have utility as electrode materials include carbon that can be solution-processed, transparent carbon thin films, and metallic nanoparticles, etc. are being studied. Recently, a technology has been developed to facilitate charge injection by coating the surface of the Al electrode with solution-processable titanium oxide (TiOx), which can greatly improve the performance of OTFT. In order to commercialize OTFT technology, an appropriate method is to use a complementary circuit with excellent reliability and stability. For this, insulators and channel semiconductors using organic materials must have stability in the air. In this study, carbon-doped Mo (MoC) thin films were fabricated with different graphite target power densities via unbalanced magnetron sputtering (UBM). The influence of graphite target power density on the structural, surface area, physical, and electrical properties of MoC films was investigated. MoC thin films deposited by the unbalanced magnetron sputtering method exhibited a smooth and uniform surface. However, as the graphite target power density increased, the rms surface roughness of the MoC film increased, and the hardness and elastic modulus of the MoC thin film increased. Additionally, as the graphite target power density increased, the resistivity value of the MoC film increased. In the performance of an organic thin film transistor using a MoC gate electrode, the carrier mobility, threshold voltage, and drain current on/off ratio (I_on/I_off) showed 0.15 cm²/V·s, -5.6 V, and 7.5×10⁴, respectively.