• 제목/요약/키워드: Mo electrode

검색결과 236건 처리시간 0.024초

Inductively coupled plasma etching of SnO2 as a new absorber material for EUVL binary mask

  • 이수진
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.124-124
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    • 2010
  • Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

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Atomic Layer Deposition of Ruthenium Thin Film from Ru (cymene) (1,5-hexadiene) and O2

  • 정효준;정은애;한정환;박보근;이선숙;황진하;김창균;안기석;정택모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.357.2-357.2
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    • 2014
  • Ruthenium (Ru) 박막은 우수한 화학적 열적 안정성 및 높은 일함수(4.7eV) 특성으로 인해 20 nm급 이하의 차세대 DRAM capacitor의 전극 물질 및 Cu metalization을 위한 seed layer로 각광을 받고 있다. Ru박막의 나노스케일 정보전자소자로의 적용을 위해서는 두께제어가 용이하고 3D 구조에서 우수한 단차 피복 특성을 갖는 atomic layer deposition (ALD)을 이용한 박막 형성이 필수적이다. 이에 본 연구에서는 ALD 방법을 이용하여 0가의(cymene) (1,5-hexadiene) Ru (0) (C16H24Ru) 전구체를 합성, ALD 방법을 이용하여 우수한 초기성장거동을 갖는 Ru 박막을 증착 하였다. 형성된 Ru 박막의 표면 형상, 두께, 밀도를 주사전자현미경(Scanning electron microscopy)과 X-선 반사율 측정(X-ray reflectometer)으로 조사하였다. 또한 전기적 특성을 4침법(four-point-probe)으로 측정하였고, 박막의 화학적 조성과 결정성의 정보를 X-선 광전자분광법(X-ray photoelectron spectroscopy)과 X-선 회절(X-ray diffraction)을 이용하여 확인하였다.

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생체 신호 측정용 저 잡음 저 전력 용량성 계측 증폭기 (A Low Noise Low Power Capacitive Instrument Amplifier for Bio-Potential Detection)

  • 박창범;정준모;임신일
    • 센서학회지
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    • 제26권5호
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    • pp.342-347
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    • 2017
  • We present a precision instrument amplifier (IA) designed for bio-potential acquisition. The proposed IA employs a capacitively coupled instrument amplifier (CCIA) structure to achieve a rail-to-rail input common-mode range and low gain error. A positive feedback loop is applied to boost the input impedance. Also, DC servo loop (DSL) with pseudo resistors is adopted to suppress electrode offset for bio-potential sensing. The proposed amplifier was designed in a $0.18{\mu}m$ CMOS technology with 1.8V supply voltage. Simulation results show the integrated noise of $1.276{\mu}Vrms$ in a frequency range from 0.01 Hz to 1 KHz, 65dB SNR, 118dB CMRR, and $58M{\Omega}$ input impedance respectively. The total current of IA is $38{\mu}A$. It occupies $740{\mu}m$ by $1300{\mu}m$ including the passive on-chip low pass filter.

Organic Thin-Film Transistors Fabricated on Flexible Substrate by Using Nanotransfer Molding

  • Hwang, Jae-Kwon;Dang, Jeong-Mi;Sung, Myung-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.287-287
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    • 2010
  • We report a new direct patterning method, called liquid bridge-mediated nanotransfer molding (LB-nTM), for the formation of two- or three-dimensional structures with feature sizes between tens of nanometers and tens of micron over large areas. LB-nTM is based on the direct transfer of various materials from a mold to a substrate via a liquid bridge between them. This procedure can be adopted for automated direct printing machines that generate patterns of functional materials with a wide range of feature sizes on diverse substrates. Arrays of TIPS-PEN TFTs were fabricated on 4" polyethersulfone (PES) substrates by LB-nTM using PDMS molds. An inverted staggered structure was employed in the TFT device fabrication. A 150 nm-thick indium-tin oxide (ITO) gate electrode and a 200 nm-thick SiO2dielectric layer were formed on a PES substrate by sputter deposition. An array of TIPS-PEN patterns (thickness: 60 nm) as active channel layers was fabricated on the substrate by LB-nTM. The nominal channel length of the TIPS-PEN TFT was 10 mm, while the channel width was 135 mm. Finally, the source and drain electrodes of 200 nm-thick Ag were defined on the substrate by LB-nTM. The TIPS-PEN TFTs can endure strenuous bending and are also transparent in the visible range, and therefore potentially useful for flexible and invisible electronics.

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아연도금 강판과 고장력 강판 3겹 점용접물의 용접특성 평가 (Evaluation of Welding Characteristics on 3-lap Spot Joint of Zinc Coned Seel Sheet md High Seength Steel Sheet)

  • 권일현;김회현;백승세;양성모;유효선
    • 한국자동차공학회논문집
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    • 제13권5호
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    • pp.42-49
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    • 2005
  • In general, multi-lap spot weld joints are frequently present in automobile. Most research, however, has been focused on the single-lap spot weld joints until now. In this paper, tensile-shear strength tests are performed to examine the weldability of 3-lap spot joint welded by using the high strength steel sheet and the zinc coated steel sheet. The indentation depth and nugget diameter are used to propose the optimum welding conditions. The weldability is affected by the welding current and welding time for 3-lap spot joint. Meanwhile the expulsions is round to decrease with the increase of electrode force. The optimum welding conditions are presented for 3-lap spot joints of high strength steel sheet and zinc coated steel sheet.

Measurement of Interface Trapped Charge Densities $(D_{it})$ in 6H-SiC MOS Capacitors

  • Lee Jang Hee;Na Keeyeol;Kim Kwang-Ho;Lee Hyung Gyoo;Kim Yeong-Seuk
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2004년도 ICEIC The International Conference on Electronics Informations and Communications
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    • pp.343-347
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    • 2004
  • High oxidation temperature of SiC shows a tendency of carbide formation at the interface which results in poor MOSFET transfer characteristics. Thus we developed oxidation processes in order to get low interface charge densities. N-type 6H-SiC MOS capacitors were fabricated by different oxidation processes: dry, wet, and dry­reoxidation. Gate oxidation and Ar anneal temperature was $1150^{\circ}C.$ Ar annealing was performed after gate oxidation for 30 minutes. Dry-reoxidation condition was $950^{\circ}C,$ H2O ambient for 2 hours. Gate oxide thickness of dry, wet and dry-reoxidation samples were 38.0 nm, 38.7 nm, 38.5 nm, respectively. Mo was adopted for gate electrode. To investigate quality of these gate oxide films, high frequency C- V measurement, gate oxide leakage current, and interface trapped charge densities (Dit) were measured. The interface trapped charge densities (Dit) measured by conductance method was about $4\times10^{10}[cm^{-1}eV^{-1}]$ for dry and wet oxidation, the lowest ever reported, and $1\times10^{11}[cm^{-1}eV^{-1}]$ for dry-reoxidation

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PDP 패널용 전도막 광학 필터 제조에 관한 연구 (A Study on the Manufacture of Optical Filters for PDP Panel in Conductive Types)

  • 김태훈;강봉구;이태훈;손세모
    • 한국인쇄학회지
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    • 제26권2호
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    • pp.31-43
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    • 2008
  • The functional dyes, which has various optical characteristics that can be applicable to field of electronic, photo electronic, such as sensor or electrode, were synthesized. Physical property and optical stability was studied with preparation of conductive type film as a kind of optical filter of plasma display panel, by adapting neon cut off dye, which can selectively absorbing between 580 and 610nm wavelength. The filter was prepared with PSA resin, which has functional group of - COOH and - OH, as binder. And the characters such as spectroscopy, heat-proof / wet-proof, thermal stability and commerciality, which must be held by functional dyes, were examined. Conductive type film is the kind of film includes only neon cut off dyes. For the neon cut off dyes, cyanine dyes can be applied. And it is observed that spectrum of before and after the durability test are not changed due to stability of dyes, as the result of coating on the mesh film with PSA binder.

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Spinal Cord Stimulation for Refractory Angina Pectoris - A Case Report -

  • Lee, Seong-Heon;Jeong, Hye-Jin;Jeong, Sin-Ho;Lee, Hyung-Gon;Choi, Jeong-Il;Yoon, Myung-Ha;Kim, Woong-Mo
    • The Korean Journal of Pain
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    • 제25권2호
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    • pp.121-125
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    • 2012
  • Refractory angina pectoris is defined as angina refractory to optimal medical treatment and standard coronary revascularization procedures. Despite recent therapeutic advances, patients with refractory angina pectoris are not adequately treated. Spinal cord stimulation is a minimally invasive and reversible technique which utilizes electrical neuromodulation by means of an electrode implanted in the epidural space. It has been reported to be an effective and safe treatment for refractory angina pectoris. We report a case of spinal cord stimulation which has effectively relieved chest pain due to coronary artery disease in a 40-year-old man. This is the first report of spinal cord stimulation for treatment of refractory angina pectoris in South Korea.

Fabrication of Doping-Free Hydrogenated Amorphous Silicon Thin Film Solar Cell Using Transition Metal Oxide Window Layer and LiF/Al Back Electrode

  • 정형환;김동호;권정대;정용수;정권범;박성규
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.193-193
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    • 2013
  • 실리콘 박막 태양전지는 광 흡수층에서 형성된 정공과 전자를 효과적으로 분리하기 위해 p형과 n형으로 도핑된 층을 형성하는 p-i-n구조를 갖게 된다. 이러한 도핑 층을 형성하기 위해 B2H6와 PH3와 같은 독성 가스를 사용하기 때문에, 공정 안정성과 환경적인 이슈가 대두된다. 또한 도핑은 추가적으로 실리콘 박막 태양전지의 안정화 효율을 지속적으로 저하시키는 요인이 된다. 이러한 문제점을 개선하기 위하여, 창층으로 MoO3, V2O5, WO3 등과 같이 높은 일함수를 갖는 전이금속 산화물을 사용하고, 광 흡수층으로 i-Si:H을, 후면 전극으로 낮은 일함수를 나타내는 LiF/Al을 사용하였다. 전이금속 산화물과 LiF/Al의 큰 일함수 차이에 의해서 흡수층인 i-Si:H 에서 생성된 캐리어들은 효과적으로 분리되고 수집이 된다. 금속 산화물은 스퍼터링 공정에 의하여 이루어졌으며, 스퍼터링 공정조건에 따라 산화도가 조절되며, 이러한 산화도에 따라 태양전지의 셀 특성이 결정된다. 도핑 층이 없는 새로운 형태의 실리콘 박막 태양전지는 기존 비정질 실리콘 박막 태양전지에 비해 높은 안정화 효율을 나타내며, 이는 도핑 층이 없기 때문에 기존 실리콘 박막 태양전지의 열화현상에 따른 효율저하가 발생하지 않는 장점을 지내고 있다.

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차세대 2차원 소재, MXenes의 연구 동향 (Research trends of MXenes as the Next-generation Two-dimensional Materials)

  • 이호준;윤예준;장진광;변종민
    • 한국분말재료학회지
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    • 제28권2호
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    • pp.150-163
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    • 2021
  • Interest in eco-friendly materials with high efficiencies is increasing significantly as science and technology undergo a paradigm shift toward environment-friendly and sustainable development. MXenes, a class of two-dimensional inorganic compounds, are generally defined as transition metal carbides or nitrides composed of few-atoms-thick layers with functional groups. Recently MXenes, because of their desirable electrical, thermal, and mechanical properties that emerge from conductive layered structures with tunable surface terminations, have garnered significant attention as promising candidates for energy storage applications (e.g., supercapacitors and electrode materials for Li-ion batteries), water purification, and gas sensors. In this review, we introduce MXenes and describe their properties and research trends by classifying them into two main categories: transition metal carbides and nitrides, including Ti-based MXenes, Mo-based MXenes, and Nb-based MXenes.