• 제목/요약/키워드: Minority Band-gap

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AlGaP2 반도체내와 표면의 Mn에 대한 제일원리 해석 (A First Principles Study of Mn on AlGaP2 Semiconductor Surface)

  • 강병섭
    • 반도체디스플레이기술학회지
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    • 제20권1호
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    • pp.12-17
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    • 2021
  • The electronic and magnetic properties for Mn-adsorbed on the chalcopyrite (CH) AlGaP2 semiconductor are investigated by using first-principles FPLMTO method. The clean CH-AlGaP2 without adsorbed Mn is a p-type semiconductor with a direct band-gap. The Mn-adsorbed CH-AlGaP2 exhibits the ferromagnetic state. It is more energetically stable than the other magnetic ones. The interstitial site on P-terminated surface is more energetically favorable one than the Al/Ga-terminated surface, or the other adsorbing sites. In the case of Mn-adsorbed Al/Ga-terminated surface, it is induced a strong coupling between Mn-3d and neighboring P-3p electrons. The holes of partially unoccupied minority Mn-3d state and majority (or minority) Al-3p or P-3p state are induced. Thus a high magnetic moment of Mn is sustained by holes-mediated double-exchange coupling. It is noticeable that the semiconducting and half-metallic characteristics of CH-AlGaP2:Mn thin film is disappeared.

호이슬러 화합물 Co2MnSi에서 전자구조계산을 통한 에너지 간격의 원인에 대한 고찰 (Investigation on the Origin of Band Gap in Heusler Alloy Co2MnSi through First-principles Electronic Structure Calculation)

  • 김동철;이재일
    • 한국자기학회지
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    • 제18권6호
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    • pp.201-205
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    • 2008
  • 호이슬러 구조의 대표적 반쪽금속인, $Co_2MnSi$에서 에너지 간격이 생기는 원인을 실제적인 전자구조 계산을 통해 검토하기 위해 호이슬러 구조에서 부분을 이루는 zinc-blende 구조의 CoMn과 하프 호이슬러 구조를 가진 CoMnSi, 그리고 가상적인 화합물인 $Co_2Mn$의 전자구조를 제일원리 방법을 통해 계산하였다. 각 화합물에서 계산된 상태밀도를 이용하여 띠 혼성이나 에너지 간격 등을 고찰한 결과 $Co_2MnSi$에서 에너지 간격이 생기는 원인이 Galanakis 등이 설명한 방식이 그대로 적용되지 않았으며, Si 원자의 역할 또한 중요함을 알게 되었다. 각 화합물에서 얻은 다수스핀과 소수스핀 전자수를 통해 이들 화합물의 자성도 고찰하였다.

4원 합금 AlGaAs2:Mn의 강자성 (Ferromagnetism of Chalcopyrite AlGaAs2:Mn Quaternary Alloys)

  • 강병섭
    • 한국재료학회지
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    • 제30권12호
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    • pp.666-671
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    • 2020
  • The electronic structure and magnetic properties of chalcopyrite (CH) AlGaAs2 with dopant Mn at 3.125 and 6.25 % concentrations are investigated using first-principles calculations. The CH AlGaAs2 alloy is a p-type semiconductor with a small band-gap. The AlGaAs2:Mn shows that the ferromagnetic (FM) state is the most energetically favorable one. The Mn-doped AlGaAs2 exhibits FM and strong half-metallic ground states.The spin polarized Al(Ga,Mn)As2 state (Al-rich system) is more stable than the (Al,Mn)GaAs2 state (Ga-rich system), which has a magnetic moment of 3.82mB/Mn. The interaction between Mn-3d and As-4p states at the Fermi level dominates the other states.The states at the Fermi level are mainlyAs-4p electrons, which mediate strong interaction between the Mn-3d and As-4p states. It is noticeable that the FM ordering of dopant Mn with high magnetic moment originates from the As(4p)-Mn(3d)-As(4p) hybridization, which is attributed to the partially unfilled As-4pbands. The high FM moment of Mn is due to the double-exchange mechanism mediated by valence-band holes.

Chalcopyrite (Al,Ga)As 반도체와 Mn의 반금속 강자성 (Half-metallic Ferromagnetism for Mn-doped Chalcopyrite (Al,Ga)As Semiconductor)

  • 강병섭;송기문
    • 반도체디스플레이기술학회지
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    • 제19권3호
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    • pp.49-54
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    • 2020
  • We studied the electronic and magnetic properties for the Mn-doped chalcopyrite (CH) AlAs, GaAs, and AlGaAs2 semiconductor by using the first-principles calculations. The chalcopyrite AlGaP2, AlGaAsP, and AlGaAs2 compounds have a semiconductor characters with a small band-gap. The interaction between Mn-3d and As-4p states at the Fermi level dominate rather than the other states. The ferromagnetic ordering of dopant Mn with high magnetic moment is induced due to the Mn(3d)-As(4p) strong coupling, which is attributed by the partially filled As-4p bands. The holes are mediated with keeping their 3d-electrons, therefore the ferromagnetic state is stabilized by this double-exchange mechanism. We noted that the ferromagnetic state with high magnetic moment is originated from the hybridized As(4p)-Mn(3d)-As(4p) interaction mediated by the holes-carrier.

Bi-Te계 열전소재 성능 증대를 위한 Weighted Mobility Ratio 제어 (Control of Weighted Mobility Ratio to Enhance the Performance of Bi-Te-based Thermoelectric Materials)

  • 김민영;김현식;이규형
    • 마이크로전자및패키징학회지
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    • 제28권4호
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    • pp.103-107
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    • 2021
  • 좁은 밴드갭 반도체 특성을 나타내는 열전소재의 온도에 따른 전자전도 및 열전도 특성은 다수 캐리어 뿐 아니라 소수 캐리어의 전도 거동에 의해 결정된다. 따라서 소수 캐리어의 weighted mobility에 대한 다수 캐리어의 weighted mobility의 비율로 정의되는 weighted mobility ratio는 열전소재의 성능 증대에 매우 중요한 인자이다. 본 논문에서는 열전소재의 전자전도 현상에 대한 이론적인 고찰을 바탕으로 weighted mobility ratio 제어가 열전소재의 성능에 미치는 영향을 규명하여 고성능 Bi-Te계 열전소재 개발에 효과적으로 활용할 수 있는 소재 설계 지침을 제공하고자 한다.

CIGS 태양전지의 소수캐리어 확산 거리에 대한 새로운 측정 방안 연구 (Rapid and Accurate Measurement of Diffusion Length of Minority Carriers of CIGS Solar Cells)

  • 이돈환;김영수;모찬빈;남정규;이동호;박성찬;김병준;김동섭
    • Current Photovoltaic Research
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    • 제2권2호
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    • pp.59-62
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    • 2014
  • Minority carrier diffusion length is one of the most important parameters of solar cells, especially for short circuit current density (Jsc). In this report, we proposed the calculating method of the minority carrier diffusion length ($L_n$) in CIGS solar cells through biased quantum efficiency (QE). To verify this method's reliability, we chose two CIGS samples which have different grain size and calculated $L_n$ for each sample. First of all, we calculated out that $L_n$ was 56nm and 97nm for small and large grain sized-cell through this method, respectively. Second, we found out the large grain sized-cell has about 7 times lower defect density than the small grain sized-cell using drive level capacitance profiling (DLCP) method. Consequently, we confirmed that $L_n$ was mainly affected by the micro-structure and defect density of CIGS layer, and could explain the cause of Jsc difference between two samples having same band gap.

Electrical Properties of Tungsten Oxide Interfacial Layer for Silicon Solar Cells

  • Oh, Gyujin;Kim, Eun Kyu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.196.2-196.2
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    • 2015
  • There are various issues fabricating the successful and efficient solar cell structures. One of the most important issues is band alignment technique. The solar cells make the carrier in their active region over the p-n junction. Then, electrons and holes diffuse by minority carrier diffusion length. After they reach the edge of solar cells, there exist large energy barrier unless the good electrode are chosen. Many various conductor with different work functions can be selected to solve this energy barrier problem to efficiently extract carriers. Tungsten oxide has large band gap known as approximately 3.4 eV, and usually this material shows n-type property with reported work function of 6.65 eV. They are extremely high work function and trap level by oxygen vacancy cause them to become the hole extraction layer for optical devices like solar cells. In this study, we deposited tungsten oxide thin films by sputtering technique with various sputtering conditions. Their electrical contact properties were characterized with transmission line model pattern. The structure of tungsten oxide thin films were measured by x-ray diffraction. With x-ray photoelectron spectroscopy, the content of oxygen was investigated, and their defect states were examined by spectroscopic ellipsometry, UV-Vis spectrophotometer, and photoluminescence measurements.

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전하선택접촉 태양전지 적용을 위한 VOx 박막, NiOx 박막, CuIx 박막의 특성 연구 (Characteristics of VOx Thin Film, NiOx Thin Film, and CuIx Thin Film for Carrier Selective Contacts Solar Cells)

  • 전기석;김민섭;이은비;신진호;임상우;정채환
    • Current Photovoltaic Research
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    • 제11권2호
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    • pp.39-43
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    • 2023
  • Carrier-selective contacts (CSCs) solar cells are considerably attractive on highly efficient crystalline silicon heterojunction (SHJ) solar cells due to their advantages of high thermal tolerance and the simple fabrication process. CSCs solar cells require a hole selective contact (HSC) layer that selectively collects only holes. In order to selectively collect holes, it must have a work function characteristic of 5.0 eV or more when contacted with n-type Si. The VOx, NiOx, and CuIx thin films were fabricated and analyzed respectively to confirm their potential usage as a hole-selective contact (HSC) layer. All thin films showed characteristics of band-gap engergy > 3.0 eV, work function > 5.0 eV and minority carrier lifetime > 1.5 ms.