• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.429-430
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• 2010

• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.17-21
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• 2010

Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

• Journal of the Semiconductor & Display Technology
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• v.20 no.4
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• pp.29-37
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• 2021

A 7 nm technology node using extreme ultraviolet lithography with a wavelength of 13.5 nm has been recently developed and applied to the semiconductor manufacturing process. Furthermore, the development of sub-3 nm technology nodes continues to be required. In this study, design factors of an electrostatic deflector for an ultra-miniaturized microcolumn system that can realize an electron wavelength of below 1.23 nm with an acceleration voltage of above 1 eV were investigated using a three-dimensional simulator. Particularly, the optimal design of the electrostatic octupole floating deflector was derived by optimizing the design elements and improving the driving method of the 1 keV low energy ultra-miniaturized microcolumn deflector. As a result, the entire wide field of view greater than 330 ㎛ at a working distance of 4 mm was realized with an ultra-high-resolution electron beam spot smaller than 10 nm. The results of this study are expected to be a basis technology for realizing a wafer-scale multi-array microcolumn system, which is expected to innovatively improve the throughput per unit time, which is the biggest drawback of electron beam lithography.

• Journal of Positioning, Navigation, and Timing
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• v.7 no.1
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• pp.37-42
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• 2018

This paper proposed a microstrip antenna that can perform jamming of satellite signals from the GPS L5, GLONASS G3, BDS B2 frequency bands (1164 - 1217 MHz) that are employed mainly for military purposes among the GNSS frequencies using unmanned aircrafts over the enemy's sky in time of emergency. The single element in the proposed antenna can be easily mounted to unmanned aircrafts. This study analyzed the characteristics of miniaturization and beam of radiating elements by applying the image theories and perturbation effect to satisfy the uniform level at ${\pm}45^{\circ}$ of beam steering goal due to the phase delay after antenna array. The designed microstrip antenna had a miniaturized radiating element area (x-y plane), which was reduced by 76.3% compared to that of basic microstrip antenna, and its beam width was $190^{\circ}$ in the E-plane and $140^{\circ}$ in the H plane. In addition, the simulation was conducted to determine the characteristics due to the phase delay by arranging the designed single microstrip antenna by $1{\times}4$ array and the results showed that beam steering of ${\pm}45^{\circ}$ is possible in the H-plane on the basis of $0^{\circ}$. Thus, the proposed antenna was verified to be effective in satellite signal jamming in the air as it was attached to the lower end of unmanned aircrafts.

• Journal of Sensor Science and Technology
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• v.17 no.5
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• pp.369-374
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• 2008

A novel fiber optic surface plasmon resonance (SPR) sensor using cyclic olefin copolymer (COC) prism with the spectral modulation is presented. The SPR sensor chip is fabricated using the SU-8 photolithography, Ni-electroplating and COC injection molding process. The sidewall of the COC prism is partially deposited with Au/Cr (45/2.nm thickness) by e-beam evaporator, and the thermal bonding process is conducted for micro fluidic channels and optical fibers alignment. The SPR spectrum for a phosphate buffered saline (0.1.M PBS, pH.7.2) solution shows a distinctive dip at 1300.nm wavelength, which shifts toward longer wavelength with respect to the bovine serum albumin (BSA)concentrations. The sensitivity of the wavelength shift is $1.16\;nm{\cdot}{\mu}g^{-1}{\cdot}{\mu}l^{-1}$. From the wavelength of SPR dips, the refractive indices (RI) of the BSA solutions can be theoretically calculated using Kretchmann configuration, and the change rate of the RI was found to be $2.3{\times}10^{-5}RI{\cdot}{\mu}g^{-1}{\cdot}l^{-1}$. The realized fiber optic SPR sensor with a COC prism has clearly shown the feasibility of a new disposable, low cost and miniaturized SPR biosensor for biochemical molecular analyses.