• Title/Summary/Keyword: Microwave Plasma

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A Study on the Carbonization and Strengthening of PAN Fiber by Microwave Plasma (마이크로웨이브 플라즈마를 이용한 탄화공정 및 PAN fiber의 강도 향상에 관한 연구)

  • Choi, Ji-Sung;Joo, Jung-Hoon;Lee, Hun-Su
    • Journal of the Korean institute of surface engineering
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    • v.45 no.2
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    • pp.89-94
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    • 2012
  • A study to replace a high temperature thermal carbonization process with microwave plasma process is carried for PAN fiber as a starting material. Near atmospheric pressure microwave plasma (1 Torr~45 Torr) was used to control to get the fiber temperature up to $1,000^{\circ}C$. Even argon is an inert gas, its plasma state include high internal energy particles; ion (15.76 eV) and metastable (11.52 eV). They are very effective to lower the necessary thermal temperature for carbonization of PAN fiber and the resultant thermal budget. The carbonization process was confirmed by both EDS (energy dispersive spectroscopy) of plasma treated fibers and OES (optical emission spectroscopy) during processing step as a real time monitoring tool. The same trend of decreasing oxygen content was observed in both diagnostic methods.

Role of Exogenous Nitric Oxide Generated through Microwave Plasma Activate the Oxidative Signaling Components in Differentiation of Myoblast cells into Myotube

  • Kumar, Naresh;Shaw, Priyanka;Attri, Pankaj;Uhm, Han Sup;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.158-158
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    • 2015
  • Myoblast are myogenic precursors that proliferate, activate, and differentiate on muscle injury to sustain the regenerative capacity of skeletal muscle; The neuronal isoform of nitric oxide synthase (nNOS, termed also NOS-I) is expressed in normal adult skeletal muscle, suggesting important functions for Nitric oxide (NO) in muscle biology1,2,3. However, the expression and subcellular localization of NO in muscle development and myoblast differentiation are largely unknown. In this study, we examined effects of the nitric oxide generated by a microwave plasma torch, on proliferation/differentiation of rat myoblastic L6 cells. Experimental data pertaining to nitric oxide production are presented in terms of the oxygen input in units of cubic centimetres per minute. The various levels of nitric oxide are observed depending on the flow rate of nitrogen gas, the ratio of oxygen gas, and the microwave power4. In order to evaluate the potential of nitric oxide as an activator of cell differentiation, we applied nitric oxide generated from the microwave plasma torch to L6 skeletal muscles. Differentiation of L6 cells into myotubes was significantly enhanced the differentiation after nitric oxide treatment. Nitric oxide treatment also increase the expression of myogenesis marker proteins and mRNA level, such as myogenin and myosin heavy chain (MHC), as well as cyclic guanosine monophosphate (cGMP), However during the myotube differentiation we found that NO activate oxidative stress signaling erks expression. Therefore, these results establish a role of NO and cGMP in regulating myoblast differentiation and elucidate their mechanism of action, providing a direct link with oxidative stress signalling, which is a key player in myogenesis. Based on these findings, nitric oxide generated by plasma can be used as a possible activator of cell differentiation and tissue regeneration.

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MICOWAVE PLASMA BURNER

  • Hong, Yong-Cheol;Shin, Dong-Hun;Lee, Sang-Ju;Jeon, Hyung-Won;Lho, Taihyeop;Lee, Bong-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.95-95
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    • 2010
  • An apparatus for generating flames and more particularly the microwave plasma burner for generating high-temperature large-volume plasma flame was presented. The plasma burner was composed of micvrowave transmission lines, a field applicator, discharge tube, coal and gas supply systems, and a reactor. The plasma burner is operated by injecting coal powders into a 2.45 GHz microwave plasma torch and by mixing the resultant gaseous hydrogen and carbon compounds with plasma-forming gas. We in this work used air, oxygen, steam, and their mixtures as a discharge gas or oxidant gas. The microwave plasma torch can instantaneously vaporize and decompose the hydrogen and carbon containing fuels. It was observed that the flame volume of the burner was more than 50 times that of the torch plasma. The preliminary experiments were carried out by measuring the temperature profiles of flames along the radial and axial directions. We also investigated the characteristics for coal combustion and gasification by analyzing the byproducts from the exit of reactor. As expected, various byproducts such as hydrogen, carbon monoxide, carbon dioxide, hydrogen sulfide, etc. were detected. It is expected that such burner cab be applied to coal gasification, hydrocarbon reforming, industrial boiler of power plants, etc.

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Control the growth direction of carbon nanofibers under direct current bias voltage applied microwave plasma enhanced chemical vapor deposition system

  • Kim Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.5
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    • pp.198-201
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    • 2005
  • Carbon nanofibers were formed on silicon substrate which was applied by negative direct current (DC) bias voltage using microwave plasma-enhanced chemical vapor deposition method. Formation of carbon nanofibers were varied according to the variation of the applied bias voltage. At -250 V, we found that the growth direction of carbon nanofibers followed the applied direction of the bias voltage. Based on these results, we suggest one of the possible techniques to control the growth direction of the carbon nanofibers.

Characteristics of the Contact Angle Using the Microwave Plasma Treatment on Scintillator Panel Substrates (마이크로웨이브 플라즈마 처리를 통한 섬광체 패널 기판의 접촉가 특성변화)

  • Kim, Byoungwook;Kim, Youngju;Ryu, Cheolwoo;Choi, Byoungjung;Kwon, Youngman;Lee, Youngchoon;Kim, Myungsoo;Cho, Gyuseong
    • Journal of Radiation Industry
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    • v.8 no.1
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    • pp.43-47
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    • 2014
  • By measuring decrease change of the contact angle after microwave plasma treatment on the glass and Al as a scintillator panel sample substrate, the adhesive performance of scintillator panel can be expected to improve. Also resolution and sensitivity of scintillator panel after microwave plasma treatment can be expected to maintain highly.

Study of Non-uniform Plasma Layer Variation with Optically-Controlled Microwave Pulses

  • Wang, Xue;Yun, Ji-Hun;Kim, Yong-K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.90-91
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    • 2009
  • We study of the variation on non-uniform plasma in different layer of the semiconductor. The transient response in different plasma layer has been evaluated theoretically. The reflection function of dielectric microstrip lines resulting from the presence of plasma are evaluated by the transmission line model. The diffusion length is small compared to the absorption depth. The variation of characteristic response in plasma layer with microwave pulses which has in localized has been evaluated.

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Crystal Structure Ana1ysis of the Diamond Films Grown by MPCVD (MPCVD에 의한 다이아몬드 박막의 결정구조 해석)

  • 원종각;김종성;흥근조;권상직
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.391-394
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    • 1999
  • The diamond thin films are deposited on silicon using MPCVD(Microwave Plasma Chemical Vapor Deposition) method at various deposition microwave power and time. Diamond is deposited with 100 sccm H$_2$ and 2 sccm CH$_4$ by MPCVD. The crystallinity of diamond thin films were increased with increase of microwave power. The growth rate of diamond thin films were increased with increase of time.

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Study of transient response in dielectric microstrip line with opto-microwave pulses

  • Wang, Xue;Kim, Ji-Hyoung;Yun, Ji-Hun
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.2 no.2
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    • pp.63-68
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    • 2009
  • We study on the transient response in non-uniform microstrip lines with optically controlled microwave pulses. The transient response of the microwave pulses in plasma layer has been evaluated by reflection function of dielectric microstrip lines. The variation of characteristic response in plasma layer with localized pulses has been evaluated analytically. Reflection the change of the reflection amplitude has been observed.

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