• 제목/요약/키워드: Micro-display

검색결과 479건 처리시간 0.031초

Development of Fast Moving Ball Actuator Mode for Novel Electronic-Paper Displays

  • Park, Hyo-Joo;Choi, Hong;Lee, Dong-Hyuck;Kim, Dong-Woo;Bae, Byung-Sung;Kim, We-Yong;Kim, Byung-Uk;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.935-936
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    • 2009
  • In this paper, we describe the basic operating mechanism of our novel reflective display, Fast Moving Ball Actuator (FMBA) mode[1], using micro-sized metal coated polymer ball in fluid medium. Metal surface of the ball can be charged up by contact electrode and their locations can be controlled by applied field to obtain optically on and off state. In the medium with high viscosity, the response speed of the moving ball might be reached into their terminal velocity and changed in proportion to the frequency of applied voltage on the electrodes.

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Enhanced Properties of IZO Thin Film Prepared by Nano-Powder Target

  • Ji, Seung-Hun;Youn, Hyun-Oh;Seo, Sung-Bo;Kim, Mi-Sun;Sohn, Sun-Young;Kim, Jong-Jae;Kim, Hwa-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1428-1429
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    • 2009
  • Compared to the indium zinc oxide (IZO) film fabricated by micro-powder target, the IZO film with nano-powder target exhibited improved optoelectronic properties of wide bandgap, high transmittance, surface uniformity, and low sheet resistance due to the high film density.

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미세 엔드밀을 이용한 마이크로 격벽 가공기술 연구 (A study on the micro barrier rib machining using micro endmilling)

  • 이선우;민승기;제태진;이응숙;최두선
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1997년도 추계학술대회 논문집
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    • pp.977-980
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    • 1997
  • Ultraprecision machining process and MEMS technology have been taken more and more important position in machining of micro parts such as PDP and IT components, as the application field of micro parts increases. A micro machining center is very effective equipment for the fabrication of micro parts, because of its benefits such as lower power consumption, high precision and lower machining cost. Therefore, we study the possibility of application to the micro machining of barrier ribs used in PDP and also analyse the machining characteristics. The fabricated barrier rib has 30~$200\mu\textrm{m}$ pitch and was made by the flat endmill with the diameter of 0.2mm, 40, 000rpm condition.

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대면적 롤금형 미세패턴 가공공정 기술 (Micro Pattern Machining on Larger Surface Roll Molds)

  • 송기형;이동윤;박경희;이석우;김현철;제태진
    • 한국기계가공학회지
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    • 제11권2호
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    • pp.7-12
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    • 2012
  • In order to cope with the requirements of smaller patterns, larger surfaces and lower costs in the fields of displays, optics and energy, greater attentions are now being paid to the development of micro-pattern machining technology. Compared with flat moulds, large drums with micro patterns (roll moulds) have the advantages of short delivery, ease of manufacturing larger surfaces, and continuous moulding. This paper introduced the machining process technology of the roll moulds for display industry. The environmental effects were discussed and the importance of temperature maintenance was experimentally emphasized. The real time monitoring system for micro machining was introduced. A commercial solution was used to simulate the micro grooving and a deformation model of micro machined pattern was finally introduced.

Formation of an Aluminum Parting Layer in the Fabrication of Field Emitter Arrays Using Reflow Method

  • Kang, Seung-Youl;Jung, Moon-Youn;Cho, Young-Rae;Song, Yoon-Ho;Lee, Sang-Kyun;Kim, Do-Hyung;Lee, Jin-Ho;Cho, Kyoung-Ik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.219-220
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    • 2000
  • We propose a new method for the formation of an aluminum parting layer in the fabrication of field emitter arrays, in which we used a reflow property of aluminum at a lower temperature than the deformation point of glass. After the sputtered aluminum layer on the gate metal was etched for the formation of gate holes, we carried out a rapid thermal annealing process, by which the aluminum slightly diffused into the gate hole. This reflowed aluminum could be used as a parting layer and emitter arrays were easily fabricated using this method.

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VA Mode의 LCOS에서 Cell Gap의 변화에 따른 전기광학적 특성 (Electro-optical Characteristics of VA mode LCOS depending on Cell Gap)

  • 강정원;손홍배
    • 반도체디스플레이기술학회지
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    • 제7권3호
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    • pp.41-43
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    • 2008
  • The electro-optical characteristics of the Liquid Crystal on Silicon (hereinafter "LCOS") micro-display on vertically alignment (VA) mode were studied depending on various cell gaps. 5 different cell gaps, such as $1.4{\mu}m,\;1.8{\mu}m,\;2.1{\mu}m,\;2.4{\mu}m$ and $2.8{\mu}m$, were selected. The reflectance-voltage (R-V) characteristics, distributions of reflected light and reflectance were calculated with 3-dimmensional LC code. At the center of cell, the smallest $1.4{\mu}m$ cell gap showed the lowest reflectance and the largest $2.8{\mu}m$ cell gap showed the highest reflectance due to the surface anchoring effect. In case of $2.1{\mu}m$ cell gap, the sum of reflectance overall cell was the highest value. Considering the reflectance and RV curve characteristic, the optimized cell gap was $2.1{\mu}m$.

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헤드업 디스플레이 휘도 증가를 위한 LED 합성비율과 영상잡음에 대한 연구 (A Synthesis Ratio of Light Emitting Diodes and Quantization Noise for Increasing Brightness of Head-up Displays)

  • 지용석
    • 방송공학회논문지
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    • 제21권5호
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    • pp.816-823
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    • 2016
  • 본 논문은 디스플레이 휘도를 증가시키기 위하여 적색, 녹색, 청색 고휘도 Light Emitting Diode(LED)를 광원으로 사용하고, Digital Micro Device(DMD) 패널을 적용한 헤드업 디스플레이에서 세 개의 LED 광원 합성 비율과 합성에 따른 양자화 노이즈를 최소화시키는 LED 합성 비율을 연구하였고, 밝기에 영향을 미치는 녹색 LED 구동 비율과 접합 온도에 대하여 분석하였다. 이를 통하여 39%의 LED 중첩 방법을 통하여 황색과 청록색의 2차원 색을 합성하여 33.3%의 휘도 증대 효과를 얻을 수 있었다. 또한 양자화노이즈를 억제하고 영상 화질 측면에서 우수한 색정밀도를 얻을 수 있었다.

다중빔 리소그래피를 위한 초소형 컬럼의 전자빔 광학 해석에 관한 연구 (Study on The Electron-Beam Optics in The Micro-Column for The Multi-Beam Lithography)

  • 이응기
    • 반도체디스플레이기술학회지
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    • 제8권4호
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    • pp.43-48
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    • 2009
  • The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

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