• 제목/요약/키워드: Micro patterning

검색결과 249건 처리시간 0.027초

Characterization of Combined Micro- and Nano-structure Silicon Solar Cells using a POCl3 Doping Process

  • Jeong, Chaehwan;Kim, Changheon;Lee, Jonghwan;Yi, Junsin;Lim, Sangwoo;Lee, Suk-Ho
    • Current Photovoltaic Research
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    • 제1권1호
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    • pp.69-72
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    • 2013
  • Combined nano- and micro-wires (CNMWs) Si arrays were prepared using PR patterning and silver-assisted electroless etching. A $POCl_3$ doping process was applied to the fabrication of CNMWs solar cells. KOH solution was used to remove bundles in CNMWs and the etching time was varied from 30 to 240 s. The lowest reflectance of 3.83% was obtained at KOH etching time of 30 s, but the highest carrier lifetime of $354{\mu}s$ was observed after the doping process at 60 s. At the same etching time, a $V_{oc}$ of 574 mV, $J_{sc}$ of $28.41mA/cm^2$, FF of 74.4%, and Eff. of 12.2% were achieved in the CNMWs solar cell. CNMWs solar cells have potential for higher efficiency by improving the post-process and surface-rear side structure.

전해가공을 이용한 Nitinol 형상기억합금의 그루브 패턴 가공특성에 관한 연구 (The Machining Characteristics of Groove Patterning for Nitinol Shape Memory Alloy Using Electrochemical Machining)

  • 신태희;김백겸;백승엽;이은상
    • 한국생산제조학회지
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    • 제18권6호
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    • pp.551-557
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    • 2009
  • A development of smart materials is becoming a prominent issue on present industries. A smart material, included in functions, is needed for micro fabrication. A shape memory alloy(SMA) in a smart material is best known material. Ni-Ti alloy, composed of nikel and titanium is one of the best shape memory alloy(SMA). Nitinol SMA is used for a lot of high tech industry such as aero space, medical device, micro actuator, sensor system. However, Ni-Ti SMA is difficult to process to make a shape and fabrications as traditional machining process. Because nitinol SMA, that is contained nikel content more than titanium content, has similar physical characteristics of titanium. In this paper, the characteristics of ECM grooving process for nitinol SMA are investigated by experiments. The experiments in this study are progressed for power, gap distance and machining time. The characteristics are found each part. Fine shape in work piece can be found on conditions; current 6A, duty factor 50%, gap distance 15%, gap distance $15{\mu}m$, machining time 10min.

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'아마데우스' 이온빔 나노 패터닝 소프트웨어와 나노 가공 특성 ('AMADEUS' Software for ion Beam Nano Patterning and Characteristics of Nano Fabrication)

  • 김흥배
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.322-325
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    • 2005
  • The shrinking critical dimensions of modern technology place a heavy requirement on optimizing feature shapes at the micro- and nano scale. In addition, the use of ion beams in the nano-scale world is greatly increased by technology development. Especially, Focused ion Beam (FIB) has a great potential to fabricate the device in nano-scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the re-deposition effect due to the sputtered atoms. In recent years, many approaches and research results show that the re-deposition effect is the most outstanding effect to overcome or reduce in fabrication of micro and nano devices. A 2D string based simulation software AMADEUS-2D $(\underline{A}dvanced\;\underline{M}odeling\;and\;\underline{D}esign\;\underline{E}nvironment\;for\;\underline{S}putter\;Processes)$ for ion milling and FIB direct fabrication has been developed. It is capable of simulating ion beam sputtering and re-deposition. In this paper, the 2D FIB simulation is demonstrated and the characteristics of ion beam induced direct fabrication is analyzed according to various parameters. Several examples, single pixel, multi scan box region, and re-deposited sidewall formation, are given.

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300 nm Diameter Cylinder-Shape 나노패턴 기판을 이용한 LEDs의 광학적 특성 (Optical Characterization of Light-Emitting Diodes Grown on the Cylinder Shape 300 nm Diameter Patterned Sapphire Substrate)

  • 김상묵;김윤석
    • 한국재료학회지
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    • 제29권1호
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    • pp.59-64
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    • 2019
  • This study investigates the optical characteristics of InGaN multiple quantum wells(MQWs) light emitting diodes(LEDs) on planar sapphire substrates(PSSs), nano-sized PSS(NPSS) and micro-sized PSS(MPSS). We obtain the results as the patterning size of the sapphire substrates approach the nanometer scale: The light from the back side of the device increases and the total light extraction becomes larger than the MPSS- and planar-LEDs. The experiment is conducted by Monte Carlo ray-tracing, which is regarded as one of the most suitable ways to simulate light propagation in LEDs. The results show fine consistency between simulation and measurement of the samples with different sized patterned substrates. Notably, light from the back side becomes larger in the NPSS LEDs. We strongly propose that the increase in the light intensity of NPSS LEDs is due to an abnormal optical distribution, which indicates an increase of extraction probability through NPSS.

엑스선 그레이 스케일 리소그래피를 활용한 반원형 단면의 서브 마이크로 선 패턴의 바이오멤스 플랫폼 응용 (X-ray grayscale lithography for sub-micron lines with cross sectional hemisphere for Bio-MEMS application)

  • 김강현;김종현;남효영;김수현;임근배
    • 센서학회지
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    • 제30권3호
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    • pp.170-174
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    • 2021
  • As the rising attention to the medical and healthcare issue, Bio-MEMS (Micro electro mechanical systems) platform such as bio sensor, cell culture system, and microfluidics device has been studied extensively. Bio-MEMS platform mostly has high resolution structure made by biocompatible material such as polydimethylsiloxane (PDMS). In addition, three dimension structure has been applied to the bio-MEMS. Lithography can be used to fabricate complex structure by multiple process, however, non-rectangular cross section can be implemented by introducing optical apparatus to lithography technic. X-ray lithography can be used even for sub-micron scale. Here in, we demonstrated lines with round shape cross section using the tilted gold absorber which was deposited on the oblique structure as the X-ray mask. This structure was used as a mold for PDMS. Molded PDMS was applied to the cell culture platform. Moreover, molded PDMS was bonded to flat PDMS to utilize to the sub-micro channel. This work has potential to the large area bio-MEMS.

능동 폴리머 펜 어래이를 이용한 미세 패터닝 (Micro Patterning Using Active Polymer Pen Array)

  • 한윤수;홍지화
    • 한국전기전자재료학회논문지
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    • 제26권12호
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    • pp.853-857
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    • 2013
  • We design, develope and test a parallel active polymer pen lithography (PPL) device, which consists of individually addressable elastomeric probe tips. The PPL array chip is fabricated using soft lithography method with polydimethylsiloxane (PDMS) material. Individual probe can be pneumatically actuated via a computer controlled interface. We demonstrate parallel writing with 16 individually addressed pens, with each pen producing a different pattern in the same run. The largest proof-of-concept array fabricated is $4{\times}4$ with a spacing of $250{\mu}m$ in both x and y axes.

핫엠보싱 공정에서의 미세 패턴 성형에 관한 연구 (Study of nano patterning rheology in hot embossing process)

  • 김호;김광순;김헌영;김병희
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.371-376
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    • 2003
  • The hot embossing process has been mentioned as one of major nanoreplication techniques. This is due to its simple process, low cost, high replication fidelity and relatively high throughput. As the initial step of quantitating the embossing process, simple parametric study about embossing time have been carried out using high-resolution masters which patterned by the DRIE process and laser machining. Under the various embossing time, the viscous flow of thin PMMA films into microcavities during Compression force has been investigated. Also, a study about simulating the viscous flow during embossing process has planned and continuum scale FDM analysis was applied on this simulation. With currently available test data and condition, simple FDM analysis using FLOW3D was made attempt to match simulation and experiment.

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국부증착용 마이크로 샤도우 마스크 제작 (Fabrication of Miniaturized Shadow-mask for Local Deposition)

  • 김규만;유르겐부르거
    • 한국정밀공학회지
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    • 제21권8호
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    • pp.152-156
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    • 2004
  • A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

1차원 표면 패터닝 기법을 통한 마이크로-나노 유체 에너지 변환 소자 시스템 (Micro/Nano fluidic energy conversion system using 1D surface patterning technique)

  • 김상희;이정훈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1694-1695
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    • 2011
  • 최근 에너지에 대한 관심의 증대 및 센서 노드로의 개발을 위해 무전원 동력 장치(sustainable energy conversion system)에 대한 관심이 크게 증대되고 있다. 본 연구에서는 수압(hydraulic pressure)을 이용하여 전기를 발생시키는 새로운 개념의 나노유체 에너지 변환 시스템에 대한 연구를 진행하였다. 표면 패터닝 기법을 통해 제작된 나노 채널 및 일차원 마이크로 유체 기반의 플루이딕 소자를 이용하여 외부저항, 버퍼용액의 농도, 압력에 따른 streaming potential을 구하였다. electrokinetic 현상과 이에 따른 유체의 streaming potential을 이용하여 압력(pressure)을 전기적으로 변환시키는 에너지 변환용 나노 유체시스템을 본 논문을 통해 제안하고자 한다.

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Pattern Characteristic by Electrostatic Field Induced Drop-On-Demand Ink-jet Printing

  • Choi, J.Y.;Kim, Y.J.;Son, S.U.;Kim, Y.M.;Lee, S.H.;Byun, D.Y.;Ko, H.S.
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2007년도 춘계학술대회A
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    • pp.451-454
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    • 2007
  • This paper presents the pattern characteristic using the electrostatic drop-on-demand ink-jet printing system. In order to achieve the pattern characteristic of electrostatic inkjet printing, the capillary inkjet head system is fabricated using capillary tube, Pt wire and electrode, and is packaged by acrylic board for the accurate alignment between wire and electrode-hole. The applied DC voltage of 1.4 $\sim$ 2.0 kV used for the observation of electrostatic droplet ejection. Electrostatic droplet ejection is directly observed using a high-speed camera. For investigated pattern characteristic, conductive inkjet silver ink used. The higher voltage has a good condition which has micro dripping mode. Also, the droplet size decreases with increasing the supplied DC voltage. This paper shows the pattern which is formed by about 300um. Also, capillary inkjet head system will be applied industrial area comparing conventional electrostatic inkjet head system.

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